JPS5955011A - Heating equipment - Google Patents
Heating equipmentInfo
- Publication number
- JPS5955011A JPS5955011A JP16566882A JP16566882A JPS5955011A JP S5955011 A JPS5955011 A JP S5955011A JP 16566882 A JP16566882 A JP 16566882A JP 16566882 A JP16566882 A JP 16566882A JP S5955011 A JPS5955011 A JP S5955011A
- Authority
- JP
- Japan
- Prior art keywords
- furnace
- quartz tube
- opened
- longitudinal direction
- closed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
Abstract
Description
【発明の詳細な説明】
（１）、発・明の、技術分野 ・ ・、
。[Detailed description of the invention] (1) Technical field of the invention
.
本発明□は加熱装置、詳しくはウェハの熱処理等に使用
する炉と石英管から成る加熱装置の炉の改良に関する。The present invention □ relates to a heating device, and more particularly, to an improvement of a heating device furnace consisting of a furnace and a quartz tube used for heat treatment of wafers, etc.
・、、 ・ 。・、、 ・・ .
（２）技術の背景 ・ 、 。(2) Technology background.
例えば：ウエハの熱処理には第１図に概略正面図で示さ
れる装置が用いられ、同図において、１は炉、２は石英
管、３は処理・室、３ａは調・温機、′４はウェハ、・
５はウェハを保持す・るホルダー、・６はクリーンベン
チ、７はコイ、ル、８は排気管を示す。For example: For heat treatment of wafers, an apparatus shown in a schematic front view in Fig. 1 is used, in which 1 is a furnace, 2 is a quartz tube, 3 is a processing chamber, 3a is a temperature controller, '4 is a wafer,・
5 is a holder for holding a wafer, 6 is a clean bench, 7 is a coil, and 8 is an exhaust pipe.
（１）
ウェハ４の熱処理に際しては、クリーンベンチ６の下で
所定数のり工へ４をホルダー５の上に図示の如く立てて
配置しく図にばウェハはその二部めみを示す）１、ホル
ダー５を処理室３内に配置された炉１内め石英管２内に
搬入する。ウニ′へ４の石英管２への搬入および石英管
２がらの搬出め後に、ウェハ４はクリ−ンベンチ６から
噴出されるクリーンエア・にさらされるように構成され
、他方、処理室３に・隣接する他の室には排気管８が配
置され炉１内、の空気を排気する。□炉１の下方には処
理室３および炉１１め、温度を調整する調温Ｉ８′３８
′が配置されている：。・・
炉１は第２図の横・方向断面図に示□される構成のもの
であり、、第：２図・以下において既に図示された部分
と同じ部分は同□、−符号を付して示すも・のとして、
７ａはコイル７のための碍子、９ば断熱材□を示す。コ
イル７は所望の・温度分布を得るため・に、例え□ば図
示の□如く石英管を囲む如ぐに延びる配置とし、そ□れ
を′３個配設する。上記した石英管□は直径２００ ”
３０（ｌ ｌｌ１ｌｌｓ・長さ１〜２ ｍのものが一般
に市（２）
版台れ使用されていや。・場合によっては、炉１の、■
。(1) When heat-treating the wafer 4, put a predetermined number of glues under the clean bench 6 and place the wafer 4 upright on the holder 5 as shown in the figure. The holder 5 is carried into the quartz tube 2 in the furnace 1 arranged in the processing chamber 3. After loading the wafer 4 into the quartz tube 2 and unloading the quartz tube 2, the wafer 4 is exposed to clean air blown out from the clean bench 6, and on the other hand, the wafer 4 is exposed to the clean air blown out from the clean bench 6. An exhaust pipe 8 is arranged in another adjacent chamber to exhaust the air inside the furnace 1. □ Below the furnace 1 are the processing chamber 3 and the furnace 11, and a temperature control I8'38 that adjusts the temperature.
′ is placed:. ...The furnace 1 has the configuration shown in the horizontal and directional cross-sectional view of Figure 2, and the same parts as those already shown in Figure 2 and below are designated with the same □ and - symbols. As shown,
7a indicates an insulator for the coil 7, and 9 indicates a heat insulating material □. In order to obtain a desired temperature distribution, the coils 7 are arranged so as to surround the quartz tube, for example, as shown in the figure, and three of them are arranged. The quartz tube □ mentioned above has a diameter of 200"
30 (lll1lls・1 to 2 m long is generally used as a plate stand.・In some cases, the
.
まわりを管で囲み、この管に冷却水を通して炉１をン令
去１−ｔ１４ことが１゛〒わ□れする。 ゛
・：′１：・′ ” ・。It is surrounded by a pipe, and cooling water is passed through the pipe to turn on the furnace 1.゛
・：′１：・′” ・.
、（３）従来技車と間郷、弁、、、、、、、、、。,(3) Conventional technique car and Mago ,ben.
」１記した装置において、ウェハ４の熱処理が１０〜２
０回繰り返して行われると、石英管２の内壁が汚れるの
で、石英＊２を炉「め：外に取り出して清浄にしなけれ
ばならない。そのため、従来は石英、管２を！１の長平
方向にクリーンベンチ６の下あ第′１映にウェハ２．の
ホ）、Ｉｙ７−．５が不今部装置、 。” In the apparatus described in 1, the heat treatment of the wafer 4 was performed for 10 to 2 hours.
If this process is repeated 0 times, the inner wall of the quartz tube 2 becomes dirty, so the quartz *2 must be taken out of the furnace and cleaned. At the bottom of the clean bench 6, Iy7-.5 is the wafer 2.
まで弓、１き、出し、その、隼忌、で石英管２の清浄を
行なってきた。この場合龜、石蓼管２を炉１の長手方向
に炉１の外Ｊ引入市ず１ｉに車間が、かかるだけでなく
、石英管２の清浄によっｔクリ−ンベンチ □６′ア下
のラリー□ンなｊ尖部がン４ ｇ”’Ａ Ｑことになり
、もとのクリージな状態１こｉ−の′４ど時間がかかり
、作業性を低下させる問題があった＝この間□題は、□
嵌：近の技術にお：いてはｍ１７ｉＱ示筆炉１が多重に
、例えば３本の炉：が」二下方向龜間隔□をおいて配置
されるようになったため、更比恕化する傾向に□ある。Until now, I have been cleaning the quartz tube 2 using the bow, cleaning, removing, and Hayabusa. In this case, not only does it take a long time to pull the quartz tube 2 out of the furnace 1 in the longitudinal direction of the furnace 1, but also the cleaning of the quartz tube 2 requires a clean bench. The apex of the rally □ turned out to be 4 g'''A Q, and there was a problem that it took time to restore the original creasy state 1 -'4 and reduced work efficiency = During this time □ problem □
Insert: In recent technology, m17iQ writing furnaces 1 are now arranged multiple times, for example, three furnaces are arranged at a distance of two downwards distances, so there is a tendency for the writing furnaces to become more compact. There is □ in.
・１″ＩＩ’ 、、 ［′、、 １． 、、、：
’ ”” ” ””、 ’ 。・1″II' ,, [′,, 1. ,,,:
'``''``'','.
（３）
、：′ ・（４）発明の目的
、 本発明は上記従来の問題点に鑑み、石英管と□
：□冑ノ１とｈ’ｚ ４ ｍる加熱装置において、石英
管の出入がい、容易、になしうる炉を提供することを目
０ヤと、する。(3) , :' ・(4) Purpose of the invention In view of the above-mentioned conventional problems, the present invention has been developed by combining a quartz tube and a □
Our goal is to provide a furnace in which a quartz tube can be easily inserted and removed in a heating device with 1 and 4 m.
レ ′（５）発明の構成 □
、 そしてこの目的は本発明によれば１．熱処理さ□
れる物品が搬入、搬出される縦裏め石英管が炉の一内部
に配置された加熱装置において、ＦＩＩＪ記炉はそ■□
、の長手方向に２分割され、２ｉ１１！□れた使手部分
は蝶番部←よ？て開閉可叩ダ■慇と、した伜とを特徴２
する加熱装置を提供す４０８°＝Ｊ″１櫟成、・さ。(5) Structure of the invention □ And this object according to the present invention is 1. Heat treated□
The FIIJ furnace is a heating device in which a vertically lined quartz tube through which articles are brought in and taken out is placed inside the furnace.
is divided into two in the longitudinal direction, 2i11! □The bent part is the hinge part←? It can be opened and closed with a tap. Features 2
408°=J″1, which provides a heating device for heating.
れる。It will be done.
（６）発明の実施例、。(6) Examples of the invention.
以下、本発明実施ｉｉ＋＋を画−ｉこよ−て詳述す鷹゛
。Embodiment ii++ of the present invention will be described in detail below with reference to the drawings.
本発”３”（７）’ ”１１ｔ ｈｔｆ、例÷嵐る□加
熱装置１−におい７′ｉよ、方向面晶晶□′１こ糸さ糺
る晶＜、石□・奏−′党は′涼来浦りあもア番イφ諭す
るが、炉１１をその長手方向に使手部分１１１１ど１１
１ｂとに２分割し、蝶番部１３によって例え赫枦半１部
：分１ ｔ：ｌｉ＋が一閉可’ｍ’□赴如□くに：構成
１シミ右英管２を′辷炉１１の長手方向で置、：、、′
、、：
・ 、 ゛ １ ′・−
（４）
はなく図に矢印で示す如く炉１１の縦軸に垂直な方向に
出入可能にする。、なお使手部分１．１ｂに代え使手部
分ｊｌ ａを開閉可岸な構成とルでもよい。This is ``3''(7)' ``11t htf, example ÷ storm □ heating device 1-smell 7'i, oriented crystal □' 1 thread is glued crystal<, stone □・sound-' party ``Ria Suzukiura also teaches the number φ, but the furnace 11 is moved in the longitudinal direction of the handle part 1111 and 11.
1b and 2, and use the hinge part 13 to divide it into two parts. Placed in the direction:,,′
,, : ・ , ゛ 1 ′・− (4) Instead, it is possible to enter and exit the furnace 11 in a direction perpendicular to the vertical axis as shown by the arrow in the figure. However, instead of the handle part 1.1b, the handle part jla may be configured to be able to be opened and closed.
蝶番部１３は炉１１の長手方向に複数個適宜間隔をおい
て設けても、・または強固な材、料で１個所に設けても
よい。・ 、・ 、、、、・、・従来例にお
いて、コイル７は適正な温度分布を得る目的で３個用意
したが、本発明の実施例においては、３個のコ・イル１
７を第４・図＋ａ＋に示す如くに配置し、コイル１７の
１１−・は、第４図山〕に示す如くに構成する。コ・イ
ル１７を、従、来例とは異なり図示の如くに配置するこ
とは、従来の技術で問題なくなし・うる、。炉１１の碍
子７ａ、断、熱材９を用いる内部槽、成は第２図に示す
構成とほぼ同じに、・また、加熱装置全体の横、成も第
１図呻示すも・のとほぼ同、しに構成しうる。 ・
・ 、 ・ ・ 、、 ・・以上に説明・し、た炉に
おい□ては、石英管２が炉１１の縦軸の垂直方向・に取
り：１ｉｌｌ′シうるので、処理室３の内部の、スペ、
−・・スを考慮し、第、３図の矢印に示す如ぐ水平線に
対し斜め方向に例えばほぼ４５°の（５）
角度で出し入れできるようにしても、または、使手部分
１１ａ 、Ｉｌｂを同時に開閉しうる構造とし、石英管
２を垂直方向に出し入れしうるようにしてもよい。いず
れの方向に出し入れするにせよ、図示の実施例において
は従来例に、比□べぎわめで容易に、かつ、短時間内に
石英管の出□し入れを・なすことが可能となる。
・・また、炉１１を以上に
説明した如く開閉自在・に・構成することによって、例
えば炉を冷却する必要のあるときは、単純に炉を開くだ
けで冷却に要する時間を短縮することが可能となる。こ
の場合、従来の排気管８で処理室全体め空気を、排気す
る構成とするとよい。 、′： ・□更に
は、炉から出された石英管の清浄はクリーンベンチの配
置された室以外のところでなされるのでミクリーンベン
チのグリーンな状態を汚染することがなく、クリーンベ
ンチの使用になんら１支障を来た。すことがない・。
・□ なお以上においては□、つ□
エバの熱処理を例・に□本発明にがかる装置を説明した
が、本発明の適用（６）
範囲はその場合に開穿されるものではなく、ウェハの熱
処理以外の目的に用いられる加熱装置にも及ぶものであ
る。A plurality of hinge parts 13 may be provided at appropriate intervals in the longitudinal direction of the furnace 11, or they may be provided at one location using a strong material.・ ・ ・ ・ ・ ・ ・ In the conventional example, three coils 7 were prepared for the purpose of obtaining an appropriate temperature distribution, but in the embodiment of the present invention, three coils 1 were prepared.
7 are arranged as shown in FIG. The arrangement of the coil 17 as shown in the drawings, which is different from the conventional and conventional examples, can be done without problems using conventional techniques. The structure of the insulator 7a of the furnace 11, the insulation, and the internal tank using the heat material 9 are almost the same as those shown in FIG. The same can be configured.・
・ ・ ・ ・ ・ ・ In the furnace described above, the quartz tube 2 can be taken in a direction perpendicular to the vertical axis of the furnace 11, so that the inside of the processing chamber 3 is Supe,
- Taking into account It may be structured so that it can be opened and closed at the same time, so that the quartz tube 2 can be taken in and out in the vertical direction. Regardless of the direction in which the quartz tube is inserted or removed, in the illustrated embodiment, it is possible to insert and remove the quartz tube much more easily and in a shorter time than in the conventional example.
...Also, by configuring the furnace 11 so that it can be opened and closed as described above, for example, when the furnace needs to be cooled, it is possible to shorten the time required for cooling by simply opening the furnace. becomes. In this case, it is preferable to use a conventional exhaust pipe 8 to exhaust air from the entire processing chamber. ,': ・□Furthermore, since the quartz tube taken out from the furnace is cleaned in a room other than the room where the clean bench is located, it does not contaminate the green state of the micro-clean bench, making it easier to use the clean bench. There was no hindrance. There is nothing to do.
・□ In the above, □, tsu□
Although the apparatus according to the present invention has been explained using heat treatment of wafers as an example, the scope of application of the present invention (6) is not to open holes in such cases, but to heating apparatuses used for purposes other than heat treatment of wafers. It also extends to
（７）発明の効果
以上、詳細に説明した如く、本発明の装置においては、
加熱用の炉において、炉の内部に配置される石英管等の
出し入れが容易になされ、炉の冷却時間が短縮され、ク
リーンベンチに対する汚染が回避されうるので、半導体
の製造歩留りの向上に効果大であり、炉が生産性向上の
ため多重に配置されるようになると、かかるす１果はよ
り大になる。(7) Effects of the invention As explained in detail above, in the apparatus of the present invention,
In a heating furnace, quartz tubes placed inside the furnace can be easily taken in and out, the cooling time of the furnace is shortened, and contamination of the clean bench can be avoided, which is highly effective in improving semiconductor manufacturing yields. However, as furnaces are arranged in multiple locations to improve productivity, this effect becomes even greater.
第１図は従来の加熱装置の配置を示す当該装置の正面図
、第２図は第１図の炉の横方向断面図、第３図は本発明
にかかる炉の横方向断面図、第４図＋ａ）ば第３図の炉
の正面図、第４図ｆｂ）は第４図ｆａ）の炉の一部の斜
視図である。
１．１１−・炉、２−・−石英管、３−処理室、３ａ−
調温機、４−ウェハ、５−・ホルダー、（７）
６・−クリーンベンチ、７．１７− コイル、８−・−
排気管、ｌｌａ、 Ｌｌｂ−使手部分、１３−蝶番部
（８）
第１図
第２図
第３図
第４図
７１７FIG. 1 is a front view of a conventional heating device showing the arrangement thereof, FIG. 2 is a cross-sectional view of the furnace shown in FIG. 1, FIG. 3 is a cross-sectional view of the furnace according to the present invention, and FIG. Figure +a) is a front view of the furnace of Figure 3, and Figure 4fb) is a perspective view of a part of the furnace of Figure 4fa). 1.11-・furnace, 2-・-quartz tube, 3-processing chamber, 3a-
Temperature controller, 4-Wafer, 5-Holder, (7) 6-Clean bench, 7.17- Coil, 8--
Exhaust pipe, lla, Llb-handle part, 13-hinge part (8) Fig. 1 Fig. 2 Fig. 3 Fig. 4 717
Claims (1)
管が炉の内部に配置された加熱装・置１．において、前
記炉はその長手方向に２分割され、２分割された炉半部
分は蝶・番部によ、、って開□閉可能・な構成としたこ
とを特徴とする加熱装置。 ・ 、・, goods to be heat treated are brought in.1. 1. A heating device/equipment in which the vertically long quartz tube to be carried out is placed inside the furnace. A heating device characterized in that the furnace is divided into two parts in the longitudinal direction, and the two halves of the furnace can be opened and closed by hinges.・ 、・
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16566882A JPS5955011A (en) | 1982-09-22 | 1982-09-22 | Heating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16566882A JPS5955011A (en) | 1982-09-22 | 1982-09-22 | Heating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5955011A true JPS5955011A (en) | 1984-03-29 |
Family
ID=15816746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16566882A Pending JPS5955011A (en) | 1982-09-22 | 1982-09-22 | Heating equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5955011A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62144333A (en) * | 1985-12-18 | 1987-06-27 | Teru Saamuko Kk | Heater |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5721744A (en) * | 1980-07-15 | 1982-02-04 | Fuji Electric Co Ltd | Apparatus for heat treatment at high temperature |
-
1982
- 1982-09-22 JP JP16566882A patent/JPS5955011A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5721744A (en) * | 1980-07-15 | 1982-02-04 | Fuji Electric Co Ltd | Apparatus for heat treatment at high temperature |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62144333A (en) * | 1985-12-18 | 1987-06-27 | Teru Saamuko Kk | Heater |
| JPH03771B2 (en) * | 1985-12-18 | 1991-01-08 | Tokyo Erekutoron Sagami Kk |
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