JPH022282B2 - - Google Patents
Info
- Publication number
- JPH022282B2 JPH022282B2 JP24229585A JP24229585A JPH022282B2 JP H022282 B2 JPH022282 B2 JP H022282B2 JP 24229585 A JP24229585 A JP 24229585A JP 24229585 A JP24229585 A JP 24229585A JP H022282 B2 JPH022282 B2 JP H022282B2
- Authority
- JP
- Japan
- Prior art keywords
- shroud
- film
- cylinder
- aluminum
- cooling fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000919 ceramic Substances 0.000 claims description 22
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 15
- 229910052782 aluminium Inorganic materials 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 239000002245 particle Substances 0.000 claims description 13
- 239000004065 semiconductor Substances 0.000 claims description 13
- 239000012809 cooling fluid Substances 0.000 claims description 12
- 239000006185 dispersion Substances 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 8
- 230000002093 peripheral effect Effects 0.000 claims description 8
- 239000002612 dispersion medium Substances 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 description 9
- 229910001220 stainless steel Inorganic materials 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24229585A JPS62101018A (ja) | 1985-10-28 | 1985-10-28 | 半導体製造装置用シユラウドの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24229585A JPS62101018A (ja) | 1985-10-28 | 1985-10-28 | 半導体製造装置用シユラウドの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62101018A JPS62101018A (ja) | 1987-05-11 |
| JPH022282B2 true JPH022282B2 (enrdf_load_html_response) | 1990-01-17 |
Family
ID=17087109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24229585A Granted JPS62101018A (ja) | 1985-10-28 | 1985-10-28 | 半導体製造装置用シユラウドの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62101018A (enrdf_load_html_response) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101583981B1 (ko) * | 2014-09-04 | 2016-01-11 | (주)지오투정보기술 | 고속이동차량 기반 wlan 신호 수집 장치 및 방법 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009110060A1 (ja) | 2008-03-04 | 2009-09-11 | 東京濾器株式会社 | 通気管の消音構造及びケースの消音構造 |
-
1985
- 1985-10-28 JP JP24229585A patent/JPS62101018A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101583981B1 (ko) * | 2014-09-04 | 2016-01-11 | (주)지오투정보기술 | 고속이동차량 기반 wlan 신호 수집 장치 및 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62101018A (ja) | 1987-05-11 |
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