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Individual
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Individual
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Priority claimed from JP55121690Aexternal-prioritypatent/JPS5747706A/ja
Application filed by IndividualfiledCriticalIndividual
Priority to JP24887089ApriorityCriticalpatent/JPH02217395A/ja
Publication of JPH02217395ApublicationCriticalpatent/JPH02217395A/ja
Publication of JPH0357075B2publicationCriticalpatent/JPH0357075B2/ja
PHASE BEHAVIOR IN THE SILICON-BORON SYSTEM: PREPARATION OF SILICON BORIDES BY CHEMICAL VAPOR DEPOSITION (THERMODYNAMICS, CVD, MORPHOLOGY, REACTOR DESIGN, EQUILIBRIUM CALCULATIONS)