JPH0220369B2 - - Google Patents
Info
- Publication number
- JPH0220369B2 JPH0220369B2 JP26047885A JP26047885A JPH0220369B2 JP H0220369 B2 JPH0220369 B2 JP H0220369B2 JP 26047885 A JP26047885 A JP 26047885A JP 26047885 A JP26047885 A JP 26047885A JP H0220369 B2 JPH0220369 B2 JP H0220369B2
- Authority
- JP
- Japan
- Prior art keywords
- piston
- electrode
- processed
- gas
- electrostatic chuck
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000003860 storage Methods 0.000 claims description 4
- 238000004381 surface treatment Methods 0.000 claims 1
- 238000001020 plasma etching Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000428 dust Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Jigs For Machine Tools (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26047885A JPS62120932A (ja) | 1985-11-20 | 1985-11-20 | 静電チヤツク装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26047885A JPS62120932A (ja) | 1985-11-20 | 1985-11-20 | 静電チヤツク装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62120932A JPS62120932A (ja) | 1987-06-02 |
| JPH0220369B2 true JPH0220369B2 (enrdf_load_stackoverflow) | 1990-05-09 |
Family
ID=17348508
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26047885A Granted JPS62120932A (ja) | 1985-11-20 | 1985-11-20 | 静電チヤツク装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62120932A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2692323B2 (ja) * | 1989-08-08 | 1997-12-17 | 富士電機株式会社 | 半導体ウエハ保持装置 |
| JP2817585B2 (ja) * | 1993-09-10 | 1998-10-30 | 住友金属工業株式会社 | 試料の離脱方法 |
-
1985
- 1985-11-20 JP JP26047885A patent/JPS62120932A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62120932A (ja) | 1987-06-02 |
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