JPH02173269A - Carbon jig for cvd device - Google Patents
Carbon jig for cvd deviceInfo
- Publication number
- JPH02173269A JPH02173269A JP32858788A JP32858788A JPH02173269A JP H02173269 A JPH02173269 A JP H02173269A JP 32858788 A JP32858788 A JP 32858788A JP 32858788 A JP32858788 A JP 32858788A JP H02173269 A JPH02173269 A JP H02173269A
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- jig
- base material
- film
- glassy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052799 carbon Inorganic materials 0.000 title claims abstract description 52
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 50
- 229910021397 glassy carbon Inorganic materials 0.000 claims abstract description 23
- 239000000463 material Substances 0.000 claims abstract description 22
- 239000011148 porous material Substances 0.000 claims description 10
- 230000003647 oxidation Effects 0.000 abstract description 8
- 238000007254 oxidation reaction Methods 0.000 abstract description 8
- 229920005989 resin Polymers 0.000 abstract description 8
- 239000011347 resin Substances 0.000 abstract description 8
- 229920001187 thermosetting polymer Polymers 0.000 abstract description 7
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 239000000126 substance Substances 0.000 abstract description 3
- 150000001721 carbon Chemical class 0.000 abstract description 2
- 239000007849 furan resin Substances 0.000 abstract description 2
- 239000005011 phenolic resin Substances 0.000 abstract description 2
- 229920001568 phenolic resin Polymers 0.000 abstract description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract 1
- 239000010408 film Substances 0.000 description 19
- 239000011248 coating agent Substances 0.000 description 17
- 238000000576 coating method Methods 0.000 description 17
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- 239000002296 pyrolytic carbon Substances 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003575 carbonaceous material Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000571 coke Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、CVD装置用カーボン治具に係り、特に半導
体デバイス用シリコンウェーハに対して薄膜を形成する
ホットウォール形プラズマCVD装置等に用いられるカ
ーボンプレート若しくはカーボンディスク電極又は電極
間の連結部材等のCVD装置用カーボン治具に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a carbon jig for CVD equipment, and in particular is used in hot wall type plasma CVD equipment, etc. that forms thin films on silicon wafers for semiconductor devices. The present invention relates to a carbon jig for a CVD apparatus such as a carbon plate or a carbon disk electrode or a connecting member between electrodes.
従来、この種のカーボン治具は、コークスを粉砕して粉
末状のカーボン材料を作製する工程、粉末状のカーボン
材料に適宜のバインダを添加して混練する工程、混線材
料を成形して成形素体を作製する工程、成形素体を焼成
する工程、及び焼成素体を熱処理によって黒鉛化する工
程を経て作製されていた。Conventionally, this type of carbon jig has been used in the process of pulverizing coke to produce a powdered carbon material, adding an appropriate binder to the powdered carbon material and kneading it, and molding a mixed wire material to form a molding element. It was produced through a process of producing a body, firing the molded body, and graphitizing the fired body by heat treatment.
カーボン治具は、半導体デバイス用シリコンウェーハか
載置され、ホットウォール形のプラズマCVD装置内に
挿入された状態で、半導体デバイス用シリコンウェーへ
に対し適宜の熱処理を施すために電極として使用されて
いた。従って、カーボン治具上にも窒化物あるいは酸化
物が付着され、使用回数を重ねるに従って次第にプラズ
マが安定して発生しにくくなり、ひいては半導体デバイ
ス用シリコンウェーハ上に均一なCVD膜が形成されに
くくなっていたので、付着された窒化物あるいは酸化物
を取り除く必要があり、フレオンガス等を用いて定期的
にカーボン治具を洗浄していた。The carbon jig is used as an electrode to perform appropriate heat treatment on the silicon wafer for semiconductor devices when it is inserted into a hot-wall type plasma CVD apparatus. Ta. Therefore, nitrides or oxides are also deposited on the carbon jig, and as the jig is used over and over again, it gradually becomes difficult to generate stable plasma, which in turn makes it difficult to form a uniform CVD film on silicon wafers for semiconductor devices. Therefore, it was necessary to remove the adhered nitrides or oxides, and the carbon jig was periodically cleaned using Freon gas or the like.
この定期的な洗浄に伴ってカーボン治具からカーボン粒
子が脱落し易くなり、プラズマCVD処理中に脱落して
半導体デバイス用シリコンウェーハに付着するおそれが
あった。これを防止するため、カーボン治具の表面にガ
ラス状カーボン膜、熱分解炭素膜を形成したものであっ
た。With this periodic cleaning, carbon particles tend to fall off from the carbon jig, and there is a risk that they may fall off and adhere to silicon wafers for semiconductor devices during plasma CVD processing. In order to prevent this, a glassy carbon film or a pyrolytic carbon film was formed on the surface of the carbon jig.
これは、先の問題に対処するため、第3図に示すように
、カーボン基材Uの表面にガラス状カーボンあるいは熱
分解炭素の被膜12を形成してなるカーボン治具である
。図中13は開気孔である。In order to solve the above problem, this is a carbon jig in which a coating 12 of glassy carbon or pyrolytic carbon is formed on the surface of a carbon base material U, as shown in FIG. In the figure, 13 is an open hole.
しかしながら、上記従来のCVD装置用カーボン治具に
おいては、炭素基材の表面にガラス状カーボンあるいは
熱分解炭素の被膜が単にのっているだけの状態であり、
被膜自体の機械的強度が十分でなく、問題解決の要求を
十分に満足するものではなかった。一方、被膜の強度を
高めるため、膜斥を厚くしようとすると被膜生成の際の
熱処理工程で熱膨張の差などにより、被膜にクラックや
剥離が生じてしまい、厚い被膜(5−以上)を形成する
ことが困難であった。However, in the conventional carbon jig for CVD equipment described above, a coating of glassy carbon or pyrolytic carbon is simply placed on the surface of the carbon base material.
The mechanical strength of the coating itself was insufficient, and it did not fully satisfy the requirements for solving the problem. On the other hand, if you try to thicken the film to increase the strength of the film, cracks and peeling will occur in the film due to differences in thermal expansion during the heat treatment process during film formation, resulting in a thick film (5- or more). It was difficult to do so.
そこで、本発明は、ガラス状カーボンの被膜の膜厚を増
して機械的強度を向上させ、ひいては耐薬品性、耐酸化
性及びライフを大幅に向上し得るCVD装置用カーボン
治具の提供を目的とする。Therefore, an object of the present invention is to provide a carbon jig for a CVD device that can increase the thickness of the glassy carbon film to improve mechanical strength and, in turn, significantly improve chemical resistance, oxidation resistance, and life. shall be.
前記課題を解決するため、本発明は、カーボン基材中の
開気孔にガラス状カーボンを充填し、かつこのカーボン
基材の表面にガラス状カーボンの被膜を形成したもので
ある。In order to solve the above problems, the present invention fills open pores in a carbon base material with glassy carbon, and forms a film of glassy carbon on the surface of this carbon base material.
カーボン基材のカサ密度は、1.50〜1.90g/c
fflとすることが効果的である。The bulk density of the carbon base material is 1.50 to 1.90 g/c
It is effective to set it to ffl.
開気孔に対するガラス状カーボンの充填率は、60%以
上とするとよい。The filling ratio of glassy carbon to the open pores is preferably 60% or more.
被膜の膜J¥は、2μs〜1軸とするとよい。The film J¥ of the film is preferably 2 μs to 1 axis.
被膜の開気孔率は、0.1−1.0%とするとよい。The open porosity of the coating is preferably 0.1-1.0%.
上記手段においては、カーボン基材中の開気孔がガラス
状カーボンの充填によって減少し、カーボン基材中に満
たされる気体又は液体の瓜が減少する一方、充填された
ガラス状カーボンが同種の被膜のアンカーとなる。In the above means, the open pores in the carbon substrate are reduced by filling with glassy carbon, and the amount of gas or liquid filled in the carbon substrate is reduced, while the filled glassy carbon is filled with the same kind of coating. Become an anchor.
カーボン基材のカサ密度が[,50g/cj未満である
と機械的強度が低下する一方、カサ密度が1690g
/ aidを超えるとコスト高になる。If the bulk density of the carbon base material is less than [,50 g/cj, the mechanical strength will decrease, but if the bulk density is 1690 g
/ aid, the cost will be high.
開気孔に対するガラス状カーボンの充填率が6096未
満であるとカーボン基材中に満たされる気体や液体によ
って被膜にクラックや剥離が生じると共に、被膜を保持
する力が小さくなる。If the filling ratio of glassy carbon to the open pores is less than 6096, the coating will crack or peel due to the gas or liquid filled in the carbon base material, and the force for holding the coating will be reduced.
被膜の膜厚が2−未満であると被膜としての効果が生ぜ
ず、1關を超えると被膜形成の熱処理の過程においてそ
の収縮からクラックや剥離を生じる。If the film thickness of the film is less than 2 mm, it will not be effective as a film, and if it exceeds 1 thickness, cracks or peeling will occur due to shrinkage during the heat treatment process for film formation.
被膜の開気孔率が0,1%未満であると使用時の昇降温
の際に、カーボン基材中に存在する気体又は液体により
、被膜にクラックや剥離等が生じてライフが著しく低下
し望ましくない。If the open porosity of the coating is less than 0.1%, the gas or liquid present in the carbon base material will cause cracks and peeling of the coating when the temperature rises and cools during use, resulting in a significant reduction in the life of the coating, which is undesirable. do not have.
以下、本発明の一実施例を第1図と共に説明する。 An embodiment of the present invention will be described below with reference to FIG.
各種のカーボン基材に熱硬化性樹脂(例えばフェノール
樹脂やフラン樹脂)を減圧含浸した後、80℃の78度
で1日保持して半硬化状態にし、そこに更に同種の熱硬
化性樹脂をカーボン基祠1の表面にコーティングし、そ
の後に200℃の温度に1時間保持して熱硬化性樹脂を
硬化させた後、不活性雰囲気中において2000℃の温
度で熱処理して熱硬化性樹脂をガラス状カーボンに転換
し、第1図に示すように、カーボン基材1の開気孔2に
ガラス状カーボン3が充填され、かつこのカーボン基材
1の表面にガラス状カーボンの被膜4が形成されたCV
D1置用カーボン治具を得た。After impregnating various types of carbon base materials with thermosetting resins (such as phenolic resins and furan resins) under reduced pressure, they are kept at 80°C (78°C) for one day to semi-cure, and then the same type of thermosetting resin is added thereto. The surface of the carbon base 1 is coated, and then the thermosetting resin is cured by holding it at a temperature of 200°C for 1 hour, and then heat-treated at a temperature of 2000°C in an inert atmosphere to harden the thermosetting resin. As shown in FIG. 1, the open pores 2 of the carbon base material 1 are filled with glassy carbon 3, and a coating 4 of glassy carbon is formed on the surface of the carbon base material 1. CV
A carbon jig for D1 placement was obtained.
各カーボン治具のカサ密度、気孔率、曲げ強度及びライ
フは、比較例を併記した第1表に示すようになった。The bulk density, porosity, bending strength, and life of each carbon jig are shown in Table 1, which also includes comparative examples.
弔
表
従って、カーボン基材のカサ密度をl、50〜1.90
g/−とし、かつ被膜の気孔率を0.1−1.0%とす
ることにより曲げ強度及びライフを向上し得ることがわ
かる。Accordingly, the bulk density of the carbon base material is l, 50 to 1.90.
It can be seen that the bending strength and life can be improved by setting the ratio to g/- and the porosity of the coating to 0.1-1.0%.
そして、開気孔に対するガラス状カーボンの充填率は、
60%以上が好ましく、かつ被膜の膜JVは、2μs〜
l11111の範囲が好ましかった。Then, the filling ratio of glassy carbon to the open pores is:
60% or more is preferable, and the film JV of the film is 2 μs to
The range l11111 was preferred.
又、上記実施例及び従来例のカーボン治具並びに被膜を
形成しない未処理のカーボン治具に、酸化消耗試験(8
00℃の温度の空気中に放置)を施したところ、第2図
に示すようになった。In addition, the carbon jigs of the above examples and conventional examples, as well as the untreated carbon jigs that do not form a film, were subjected to an oxidation consumption test (8
When the sample was left in air at a temperature of 00°C), the result was as shown in Figure 2.
従って、本発明品は、60分後でも重量減少率が低く、
耐酸化性に著しく優れていることがわかる反面、未処理
品は、60分でほとんど形状かなくなり、又、従来品は
、30分を過ぎたあたりからff1ffi減少率が高く
なり、耐酸化性が劣るようになることがわかる。これは
、ガラス状カーボンの被膜が酸化されて劣化すると共に
、開気孔中の気体の膨張により被膜にクラックが発生し
たため、剥離が生じてカーボン基材が直接酸化の影響を
受けたためである。Therefore, the product of the present invention has a low weight loss rate even after 60 minutes,
While it can be seen that the oxidation resistance is extremely excellent, the untreated product almost loses its shape after 60 minutes, and the conventional product has a high ff1ffi reduction rate after 30 minutes, indicating that the oxidation resistance is poor. You can see that it will become inferior. This is because the glassy carbon coating was oxidized and deteriorated, and cracks were generated in the coating due to the expansion of gas in the open pores, resulting in peeling and the carbon base material being directly affected by oxidation.
以上のように本発明によれば、カーボン基材中の開気孔
がガラス状カーボンの充填によって減少し、カーボン基
材中に満たされる気体又は液体の量が減少する一方、充
填されたガラス状カーボンか同種の被膜のアンカーとな
るので、被膜の膜厚を増して機械的強度を向上させるこ
とができ、ひいては耐薬品性、耐酸化性及びライフを大
幅に向上することができる。As described above, according to the present invention, the open pores in the carbon base material are reduced by filling with glassy carbon, and the amount of gas or liquid filled in the carbon base material is reduced. Since it serves as an anchor for a similar type of coating, it is possible to increase the thickness of the coating and improve its mechanical strength, which in turn can significantly improve chemical resistance, oxidation resistance, and life.
第1図は本発明の一実施例を示すCVD装置用カーボン
治具の断面図、第2図はその酸化消耗試験結果の説明図
、第3図は従来のCVD装置用カーボン治具の説明図で
ある。
】・・・カーボン基材 2・・・開気孔3・・・
ガラス状カーボン 4・・・被 膜第1図
第3
第2図
図
出 願 人 東芝セラミックス株式会社ナン7#/ム
井−アイく(列in)Fig. 1 is a cross-sectional view of a carbon jig for a CVD apparatus showing an embodiment of the present invention, Fig. 2 is an explanatory view of the results of an oxidation consumption test, and Fig. 3 is an explanatory view of a conventional carbon jig for a CVD apparatus. It is. ]...Carbon base material 2...Open pores 3...
Glassy carbon 4...Coating Figure 1 Figure 3 Figure 2 Applicant Toshiba Ceramics Corporation Nan 7#/Mui-Iku (column in)
Claims (1)
填し、かつこのカーボン基材の表面にガラス状カーボン
の被膜を形成したことを特徴とするCVD装置用カーボ
ン治具。(1) A carbon jig for a CVD apparatus, characterized in that open pores in a carbon base material are filled with glassy carbon, and a film of glassy carbon is formed on the surface of the carbon base material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63328587A JP2553389B2 (en) | 1988-12-26 | 1988-12-26 | Carbon jig for CVD equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63328587A JP2553389B2 (en) | 1988-12-26 | 1988-12-26 | Carbon jig for CVD equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02173269A true JPH02173269A (en) | 1990-07-04 |
JP2553389B2 JP2553389B2 (en) | 1996-11-13 |
Family
ID=18211940
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63328587A Expired - Fee Related JP2553389B2 (en) | 1988-12-26 | 1988-12-26 | Carbon jig for CVD equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2553389B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0803897A2 (en) * | 1996-04-22 | 1997-10-29 | Nisshinbo Industries Inc. | Electrode for plasma etching |
EP0814174A1 (en) * | 1996-06-20 | 1997-12-29 | Qqc, Inc. | Glassy carbon coatings having water repellant and corrosion-erosion-, and wear-resistant characteristics |
US6245313B1 (en) | 1998-05-19 | 2001-06-12 | Toshiba Machine Co., Ltd. | Process for manufacturing a product of glassy carbon |
JP2019026888A (en) * | 2017-07-28 | 2019-02-21 | トヨタ自動車株式会社 | Film removal method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5239684A (en) * | 1975-09-25 | 1977-03-28 | Squibb & Sons Inc | Compounds having antiiinflammation and preparation method thereof |
JPS62270491A (en) * | 1986-05-15 | 1987-11-24 | Seitetsu Kagaku Co Ltd | Production of susceptor |
-
1988
- 1988-12-26 JP JP63328587A patent/JP2553389B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5239684A (en) * | 1975-09-25 | 1977-03-28 | Squibb & Sons Inc | Compounds having antiiinflammation and preparation method thereof |
JPS62270491A (en) * | 1986-05-15 | 1987-11-24 | Seitetsu Kagaku Co Ltd | Production of susceptor |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0803897A2 (en) * | 1996-04-22 | 1997-10-29 | Nisshinbo Industries Inc. | Electrode for plasma etching |
EP0803897B1 (en) * | 1996-04-22 | 2002-09-11 | Nisshinbo Industries Inc. | Electrode for plasma etching; apparatus and process using such electrode |
EP0814174A1 (en) * | 1996-06-20 | 1997-12-29 | Qqc, Inc. | Glassy carbon coatings having water repellant and corrosion-erosion-, and wear-resistant characteristics |
US6245313B1 (en) | 1998-05-19 | 2001-06-12 | Toshiba Machine Co., Ltd. | Process for manufacturing a product of glassy carbon |
JP2019026888A (en) * | 2017-07-28 | 2019-02-21 | トヨタ自動車株式会社 | Film removal method |
Also Published As
Publication number | Publication date |
---|---|
JP2553389B2 (en) | 1996-11-13 |
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