JPH02146165U - - Google Patents
Info
- Publication number
- JPH02146165U JPH02146165U JP5432989U JP5432989U JPH02146165U JP H02146165 U JPH02146165 U JP H02146165U JP 5432989 U JP5432989 U JP 5432989U JP 5432989 U JP5432989 U JP 5432989U JP H02146165 U JPH02146165 U JP H02146165U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- vapor phase
- epitaxial growth
- reaction
- phase epitaxial
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 239000012808 vapor phase Substances 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 claims 4
- 239000013078 crystal Substances 0.000 claims 1
- 239000004570 mortar (masonry) Substances 0.000 claims 1
- 239000002994 raw material Substances 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5432989U JPH02146165U (zh) | 1989-05-11 | 1989-05-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5432989U JPH02146165U (zh) | 1989-05-11 | 1989-05-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02146165U true JPH02146165U (zh) | 1990-12-12 |
Family
ID=31576296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5432989U Pending JPH02146165U (zh) | 1989-05-11 | 1989-05-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02146165U (zh) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013521655A (ja) * | 2010-03-03 | 2013-06-10 | ビーコ・インストゥルメンツ・インコーポレイテッド | 傾斜縁を有するウエハキャリア |
| CN105755450A (zh) * | 2010-12-30 | 2016-07-13 | 维易科仪器公司 | 使用承载器扩展的晶圆加工 |
-
1989
- 1989-05-11 JP JP5432989U patent/JPH02146165U/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013521655A (ja) * | 2010-03-03 | 2013-06-10 | ビーコ・インストゥルメンツ・インコーポレイテッド | 傾斜縁を有するウエハキャリア |
| JP2016184742A (ja) * | 2010-03-03 | 2016-10-20 | ビーコ・インストゥルメンツ・インコーポレイテッド | 傾斜縁を有するウエハキャリア |
| CN105755450A (zh) * | 2010-12-30 | 2016-07-13 | 维易科仪器公司 | 使用承载器扩展的晶圆加工 |
| US9938621B2 (en) | 2010-12-30 | 2018-04-10 | Veeco Instruments Inc. | Methods of wafer processing with carrier extension |
| US10167554B2 (en) | 2010-12-30 | 2019-01-01 | Veeco Instruments Inc. | Wafer processing with carrier extension |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH02146165U (zh) | ||
| JPS577923A (en) | Manufacture of receiving table for processing single silicon crystal wafer | |
| JPS6318618A (ja) | サセプタ−用カバ− | |
| JPH01140816U (zh) | ||
| JPS6311575U (zh) | ||
| JPS63140619U (zh) | ||
| JPS62201927U (zh) | ||
| JPH0320434U (zh) | ||
| JPS5931711Y2 (ja) | 化合物半導体の溶液成長装置 | |
| JP2500421Y2 (ja) | 低圧化学気相生成装置 | |
| JPH02132935U (zh) | ||
| JPS622524A (ja) | 気相成長装置 | |
| JPH0235814Y2 (zh) | ||
| JPS63186775U (zh) | ||
| JPS63276273A (ja) | 炭化珪素半導体素子の製造方法 | |
| JPS631024A (ja) | エピタキシヤル成長装置 | |
| JPS6486557A (en) | Semiconductor device and its manufacture | |
| JPS62148574U (zh) | ||
| JPS62129070U (zh) | ||
| JPS6329929U (zh) | ||
| JPH0533525U (ja) | 枚葉式ｃｖｄ装置 | |
| JPS6262432U (zh) | ||
| JPH04134839U (ja) | 気相成長用サセプタ | |
| JPS5812941U (ja) | 気相成長装置用サセプタ | |
| JPH04132694A (ja) | 薄膜成長法 |