JPH0213945B2 - - Google Patents
Info
- Publication number
- JPH0213945B2 JPH0213945B2 JP60132390A JP13239085A JPH0213945B2 JP H0213945 B2 JPH0213945 B2 JP H0213945B2 JP 60132390 A JP60132390 A JP 60132390A JP 13239085 A JP13239085 A JP 13239085A JP H0213945 B2 JPH0213945 B2 JP H0213945B2
- Authority
- JP
- Japan
- Prior art keywords
- dielectric film
- diffraction grating
- photoresist
- semiconductor substrate
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 17
- 239000004065 semiconductor Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 6
- 230000000737 periodic effect Effects 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 230000002265 prevention Effects 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 description 8
- 230000010355 oscillation Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 2
- NCGICGYLBXGBGN-UHFFFAOYSA-N 3-morpholin-4-yl-1-oxa-3-azonia-2-azanidacyclopent-3-en-5-imine;hydrochloride Chemical compound Cl.[N-]1OC(=N)C=[N+]1N1CCOCC1 NCGICGYLBXGBGN-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60132390A JPS61289688A (ja) | 1985-06-18 | 1985-06-18 | 回折格子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60132390A JPS61289688A (ja) | 1985-06-18 | 1985-06-18 | 回折格子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61289688A JPS61289688A (ja) | 1986-12-19 |
| JPH0213945B2 true JPH0213945B2 (enrdf_load_stackoverflow) | 1990-04-05 |
Family
ID=15080262
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60132390A Granted JPS61289688A (ja) | 1985-06-18 | 1985-06-18 | 回折格子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61289688A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11036145B2 (en) * | 2018-12-21 | 2021-06-15 | Applied Materials, Inc. | Large area self imaging lithography based on broadband light source |
-
1985
- 1985-06-18 JP JP60132390A patent/JPS61289688A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61289688A (ja) | 1986-12-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |