JPH0213780B2 - - Google Patents
Info
- Publication number
- JPH0213780B2 JPH0213780B2 JP54082A JP54082A JPH0213780B2 JP H0213780 B2 JPH0213780 B2 JP H0213780B2 JP 54082 A JP54082 A JP 54082A JP 54082 A JP54082 A JP 54082A JP H0213780 B2 JPH0213780 B2 JP H0213780B2
- Authority
- JP
- Japan
- Prior art keywords
- cover plate
- base plate
- photomask
- refractive index
- index matching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000012530 fluid Substances 0.000 claims description 31
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000007789 sealing Methods 0.000 claims 1
- 239000003566 sealing material Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 description 23
- 239000002184 metal Substances 0.000 description 23
- 239000000758 substrate Substances 0.000 description 20
- 229920002120 photoresistant polymer Polymers 0.000 description 18
- 239000000463 material Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 14
- 230000004075 alteration Effects 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000011253 protective coating Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000002542 deteriorative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 229920002631 room-temperature vulcanizate silicone Polymers 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000002508 contact lithography Methods 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- YTCQFLFGFXZUSN-BAQGIRSFSA-N microline Chemical compound OC12OC3(C)COC2(O)C(C(/Cl)=C/C)=CC(=O)C21C3C2 YTCQFLFGFXZUSN-BAQGIRSFSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- -1 phthalate ester Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US22245181A | 1981-01-05 | 1981-01-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57154242A JPS57154242A (en) | 1982-09-24 |
| JPH0213780B2 true JPH0213780B2 (fr) | 1990-04-05 |
Family
ID=22832261
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP54082A Granted JPS57154242A (en) | 1981-01-05 | 1982-01-05 | Photomask and manufacture thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57154242A (fr) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5179575A (fr) * | 1975-01-06 | 1976-07-10 | Hitachi Ltd | |
| JPS55121443A (en) * | 1979-03-14 | 1980-09-18 | Mitsubishi Electric Corp | Photomask base plate |
| JPS55121442A (en) * | 1979-03-14 | 1980-09-18 | Mitsubishi Electric Corp | Photomask base plate |
| JPS5687043A (en) * | 1979-12-19 | 1981-07-15 | Hitachi Ltd | Mask for exposure |
| JPS56130749A (en) * | 1980-03-18 | 1981-10-13 | Nec Corp | Photomask for projective exposure |
-
1982
- 1982-01-05 JP JP54082A patent/JPS57154242A/ja active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5179575A (fr) * | 1975-01-06 | 1976-07-10 | Hitachi Ltd | |
| JPS55121443A (en) * | 1979-03-14 | 1980-09-18 | Mitsubishi Electric Corp | Photomask base plate |
| JPS55121442A (en) * | 1979-03-14 | 1980-09-18 | Mitsubishi Electric Corp | Photomask base plate |
| JPS5687043A (en) * | 1979-12-19 | 1981-07-15 | Hitachi Ltd | Mask for exposure |
| JPS56130749A (en) * | 1980-03-18 | 1981-10-13 | Nec Corp | Photomask for projective exposure |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57154242A (en) | 1982-09-24 |
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