JPH02131547U - - Google Patents

Info

Publication number
JPH02131547U
JPH02131547U JP3698589U JP3698589U JPH02131547U JP H02131547 U JPH02131547 U JP H02131547U JP 3698589 U JP3698589 U JP 3698589U JP 3698589 U JP3698589 U JP 3698589U JP H02131547 U JPH02131547 U JP H02131547U
Authority
JP
Japan
Prior art keywords
gas
sputtering
pipes
target
space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3698589U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3698589U priority Critical patent/JPH02131547U/ja
Publication of JPH02131547U publication Critical patent/JPH02131547U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP3698589U 1989-03-29 1989-03-29 Pending JPH02131547U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3698589U JPH02131547U (enrdf_load_stackoverflow) 1989-03-29 1989-03-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3698589U JPH02131547U (enrdf_load_stackoverflow) 1989-03-29 1989-03-29

Publications (1)

Publication Number Publication Date
JPH02131547U true JPH02131547U (enrdf_load_stackoverflow) 1990-11-01

Family

ID=31543696

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3698589U Pending JPH02131547U (enrdf_load_stackoverflow) 1989-03-29 1989-03-29

Country Status (1)

Country Link
JP (1) JPH02131547U (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10212575A (ja) * 1997-01-29 1998-08-11 Sony Corp スパッタリング装置
JP2001107228A (ja) * 1999-10-07 2001-04-17 Anelva Corp 反応性スパッタリング装置
JP2007039712A (ja) * 2005-08-01 2007-02-15 Ulvac Japan Ltd スパッタリング装置、成膜方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6137964A (ja) * 1984-07-30 1986-02-22 Matsushita Electric Ind Co Ltd スパツタリング装置
JPS6396270A (ja) * 1986-10-13 1988-04-27 Mitsubishi Electric Corp スパツタリング装置
JPS644473A (en) * 1987-06-26 1989-01-09 Mitsubishi Electric Corp Sputtering device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6137964A (ja) * 1984-07-30 1986-02-22 Matsushita Electric Ind Co Ltd スパツタリング装置
JPS6396270A (ja) * 1986-10-13 1988-04-27 Mitsubishi Electric Corp スパツタリング装置
JPS644473A (en) * 1987-06-26 1989-01-09 Mitsubishi Electric Corp Sputtering device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10212575A (ja) * 1997-01-29 1998-08-11 Sony Corp スパッタリング装置
JP2001107228A (ja) * 1999-10-07 2001-04-17 Anelva Corp 反応性スパッタリング装置
JP2007039712A (ja) * 2005-08-01 2007-02-15 Ulvac Japan Ltd スパッタリング装置、成膜方法

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