JPH021298B2 - - Google Patents

Info

Publication number
JPH021298B2
JPH021298B2 JP57215059A JP21505982A JPH021298B2 JP H021298 B2 JPH021298 B2 JP H021298B2 JP 57215059 A JP57215059 A JP 57215059A JP 21505982 A JP21505982 A JP 21505982A JP H021298 B2 JPH021298 B2 JP H021298B2
Authority
JP
Japan
Prior art keywords
photoresist
developing
development
element pattern
duct suction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57215059A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59104643A (ja
Inventor
Kenzo Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP57215059A priority Critical patent/JPS59104643A/ja
Publication of JPS59104643A publication Critical patent/JPS59104643A/ja
Publication of JPH021298B2 publication Critical patent/JPH021298B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57215059A 1982-12-08 1982-12-08 ホトレジストの現像方法 Granted JPS59104643A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57215059A JPS59104643A (ja) 1982-12-08 1982-12-08 ホトレジストの現像方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57215059A JPS59104643A (ja) 1982-12-08 1982-12-08 ホトレジストの現像方法

Publications (2)

Publication Number Publication Date
JPS59104643A JPS59104643A (ja) 1984-06-16
JPH021298B2 true JPH021298B2 (enExample) 1990-01-11

Family

ID=16666073

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57215059A Granted JPS59104643A (ja) 1982-12-08 1982-12-08 ホトレジストの現像方法

Country Status (1)

Country Link
JP (1) JPS59104643A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0611024B2 (ja) * 1986-12-29 1994-02-09 東京エレクトロン株式会社 現像方法
JPH0611023B2 (ja) * 1986-12-29 1994-02-09 東京エレクトロン株式会社 現像方法

Also Published As

Publication number Publication date
JPS59104643A (ja) 1984-06-16

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