JPH02129220A - Epoxy resin molding material for sealing electronic component and preparation thereof - Google Patents
Epoxy resin molding material for sealing electronic component and preparation thereofInfo
- Publication number
- JPH02129220A JPH02129220A JP28219588A JP28219588A JPH02129220A JP H02129220 A JPH02129220 A JP H02129220A JP 28219588 A JP28219588 A JP 28219588A JP 28219588 A JP28219588 A JP 28219588A JP H02129220 A JPH02129220 A JP H02129220A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- epoxy
- group
- groups
- molding material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 42
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 42
- 239000012778 molding material Substances 0.000 title claims abstract description 28
- 238000007789 sealing Methods 0.000 title claims description 5
- 238000002360 preparation method Methods 0.000 title 1
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 24
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 15
- 229920001281 polyalkylene Polymers 0.000 claims abstract description 15
- 125000001033 ether group Chemical group 0.000 claims abstract description 14
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 13
- 229920005573 silicon-containing polymer Polymers 0.000 claims abstract description 13
- 239000002245 particle Substances 0.000 claims abstract description 10
- 238000002156 mixing Methods 0.000 claims abstract description 8
- 150000001875 compounds Chemical class 0.000 claims description 29
- 229920001296 polysiloxane Polymers 0.000 claims description 25
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 11
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 claims description 10
- 239000004593 Epoxy Substances 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 239000011256 inorganic filler Substances 0.000 claims description 7
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000001133 acceleration Effects 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 230000035939 shock Effects 0.000 abstract description 14
- 238000000465 moulding Methods 0.000 abstract description 12
- 229920005989 resin Polymers 0.000 abstract description 12
- 239000011347 resin Substances 0.000 abstract description 12
- 229920003986 novolac Polymers 0.000 abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000843 powder Substances 0.000 abstract description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 abstract description 3
- 125000002947 alkylene group Chemical group 0.000 abstract description 3
- 229930003836 cresol Natural products 0.000 abstract description 3
- 239000000945 filler Substances 0.000 abstract description 3
- 150000007945 N-acyl ureas Chemical group 0.000 abstract 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- -1 glycidyl ester Chemical class 0.000 description 9
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 230000007423 decrease Effects 0.000 description 7
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 229940117927 ethylene oxide Drugs 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- HTVITOHKHWFJKO-UHFFFAOYSA-N Bisphenol B Chemical compound C=1C=C(O)C=CC=1C(C)(CC)C1=CC=C(O)C=C1 HTVITOHKHWFJKO-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QEZIKGQWAWNWIR-UHFFFAOYSA-N antimony(3+) antimony(5+) oxygen(2-) Chemical compound [O--].[O--].[O--].[O--].[Sb+3].[Sb+5] QEZIKGQWAWNWIR-UHFFFAOYSA-N 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 150000001638 boron Chemical class 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 239000010680 novolac-type phenolic resin Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000035911 sexual health Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical compound NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Details Of Resistors (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は電子部品封止用エポキシ樹脂成形材料に関し、
さらに詳しくは、尉熱?fi撃性、耐熱性、耐湿性及び
成形作業性に優れた電子部品封止用エポキシ樹脂成形材
料に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an epoxy resin molding material for encapsulating electronic components.
For more information, see Jonetsu? The present invention relates to an epoxy resin molding material for encapsulating electronic components that has excellent impact resistance, heat resistance, moisture resistance, and molding workability.
[従来の技術]
従来、コイル、コンデンサ、トランジスタ、ICなどの
電子部品封止用としては、エポキシ樹脂成形材料が広く
用いられている。この理由としては、エポキシ樹脂が電
気特性、耐熱性1機械特性。[Prior Art] Conventionally, epoxy resin molding materials have been widely used for encapsulating electronic components such as coils, capacitors, transistors, and ICs. The reason for this is that epoxy resin has electrical properties, heat resistance, and mechanical properties.
インサートとの接着性などの諸特性にバランスがとれて
いるためである。This is because various properties such as adhesion with the insert are well balanced.
しかし、電子部品のパッケージは小形、薄形化の傾向に
あり、これに伴い温度サイクル時にパッケージがクラッ
クするという問題が生じる。これに対して、IC封止用
エポキシ樹脂成形材料の分野では、シリコーン化合物を
用いた耐熱衝撃性の改良が一般的に行なわれている。However, there is a tendency for electronic component packages to become smaller and thinner, resulting in the problem of packages cracking during temperature cycling. On the other hand, in the field of epoxy resin molding materials for IC sealing, thermal shock resistance is generally improved using silicone compounds.
[発明が解決しようとする課題]
シリコーン化合物を用いたエポキシ樹脂成形材料の改質
は、耐熱衝撃性については有効であるが。[Problems to be Solved by the Invention] Modification of epoxy resin molding materials using silicone compounds is effective in terms of thermal shock resistance.
多くの場合、成形性に支障が生じる。即ち、溶融成形時
にシリコーン化合物がしみ出して、金型や成形品外観に
汚れが発生する。これは一般に、シリコーン化合物とエ
ポキシ樹脂の相溶性が大きく異なることに起因する。し
たがって、シリコーン化合物とエポキシ樹脂の相互作用
を高め溶融成形時の分離、しみ出しを防止することが重
要になる。In many cases, moldability is impaired. That is, the silicone compound oozes out during melt molding, causing stains on the mold and the appearance of the molded product. This is generally due to the large difference in compatibility between silicone compounds and epoxy resins. Therefore, it is important to enhance the interaction between the silicone compound and the epoxy resin to prevent separation and seepage during melt molding.
本発明はかかる欠点を解決するために為されたものであ
り、耐熱衝撃性、耐熱性が良好で、かつ成形性にも優れ
た電子部品封止用エポキシ樹脂成形材料を提供しようと
するものである。The present invention has been made to solve these drawbacks, and aims to provide an epoxy resin molding material for encapsulating electronic components that has good thermal shock resistance, heat resistance, and excellent moldability. be.
[課題を解決するための手段]
発明者らは上記の課題を解決するために鋭意検討を重ね
た結果、エポキシ樹脂系に特定の化合物を組合せて配合
することにより上記の目的を達成しうろことを見いだし
、本発明を完成するに至った。[Means for Solving the Problems] As a result of intensive studies to solve the above problems, the inventors have found that the above objects can be achieved by blending specific compounds into an epoxy resin system. They discovered this and completed the present invention.
すなわち1本発明の電子部品封止用エポキシ樹脂成形材
料は
(A)1分子中に2個以上のエポキシ基を有するエポキ
シ樹脂、
(B)1分子中に2個以上のフェノール性水酸基を有す
る化合物、
(C)ポリアルキレンエーテル基を有するシリコーン重
合体、
(D)ウレイド基(H2NGONH−)を有するシラン
カップリング剤。Namely, the epoxy resin molding material for encapsulating electronic components of the present invention is (A) an epoxy resin having two or more epoxy groups in one molecule, and (B) a compound having two or more phenolic hydroxyl groups in one molecule. , (C) a silicone polymer having a polyalkylene ether group, (D) a silane coupling agent having a ureido group (H2NGONH-).
(E)最大粒径200μm以下の無機質充填剤を必須成
分としてなることを特徴とする。(E) It is characterized by containing an inorganic filler having a maximum particle size of 200 μm or less as an essential component.
本発明においてもちいられる(A)成分の1分子中に2
個以上のエポキシ基を有するエポキシ樹脂としては、電
子部品封止用エポキシ樹脂成形材料で一般に使用されて
いるものであれば制限はなく、フェノールノボラック型
エポキシ樹脂、オルソクレゾールノボラック型エポキシ
樹脂をはじめとするフェノール類とアルデヒド類のノボ
ラック樹脂をエポキシ化したもの、ビスフェノールA、
ビスフェノールB、ビスフェノールF、ビスフェノール
Sなどのジグリシジルエーテル、フタル酸、ダイマー酸
などの多塩基酸とエピ二ロルヒドリンの反応により得ら
れるグリシジルエステル型エボキシ樹脂、ジアミノジフ
ェニルメタン、イソシアヌル酸などのポリアミンとエピ
クロルヒドリンの反応により得られるグリシジルアミン
型エポキシ樹脂、オレフィン結合を過酢酸などの過酸で
酸化して得られる線状脂肪族エポキシ樹脂、及び脂環族
エポキシ樹脂などがあり、これらを適宜何種類でも併用
することができる。In one molecule of component (A) used in the present invention, 2
There are no restrictions on the epoxy resin having 2 or more epoxy groups, as long as it is commonly used in epoxy resin molding materials for encapsulating electronic components, including phenol novolac type epoxy resins, orthocresol novolac type epoxy resins, etc. Epoxidized novolak resin of phenols and aldehydes, bisphenol A,
Diglycidyl ethers such as bisphenol B, bisphenol F and bisphenol S, glycidyl ester type epoxy resins obtained by the reaction of polybasic acids such as phthalic acid and dimer acid with epichlorohydrin, and polyamines such as diaminodiphenylmethane and isocyanuric acid and epichlorohydrin. There are glycidylamine type epoxy resins obtained by reaction, linear aliphatic epoxy resins obtained by oxidizing olefin bonds with peracids such as peracetic acid, and alicyclic epoxy resins, and any number of these can be used in combination as appropriate. be able to.
本発明において用いられる(B)成分の1分子中に2個
以上のフェノール性水酸基を有する化合物としては、フ
ェノール、クレゾール、キシレノール、レゾルシン、カ
テコール、ビスフェノールA、ビスフェノールFなどの
フェノール類とホルムアルデヒドとを酸性触媒下で縮合
反応させて太られるノボラック型フェノール樹脂、ビス
フェノールA、ビスフェノールF、ポリパラビニルフェ
ノール樹脂、レゾルシン、カテコール、ハイドロキノン
などの多価フェノールなどがあり、単独又は2種類以上
併用してもよい、また、(A)のエポキシ樹脂との当量
比((B)の水酸基数/(A)のエポキシ基数)は、特
に限定はされないが、0゜7〜1.3が好ましい。Compounds having two or more phenolic hydroxyl groups in one molecule of component (B) used in the present invention include phenols such as phenol, cresol, xylenol, resorcinol, catechol, bisphenol A, and bisphenol F, and formaldehyde. There are novolac-type phenolic resins that can be thickened by condensation reaction under acidic catalysts, bisphenol A, bisphenol F, polyparavinylphenol resins, and polyhydric phenols such as resorcinol, catechol, and hydroquinone, which can be used alone or in combination of two or more. The equivalent ratio of (A) to the epoxy resin (number of hydroxyl groups in (B)/number of epoxy groups in (A)) is not particularly limited, but is preferably 0.7 to 1.3.
本発明において用いられる(C)成分は一般式
で示す構造を有するシリコーン重合体である。ここでR
1は一般に壬R−0士単位の繰り返しにより成るポリア
ルキレンエーテル基であり、Rはメチレン基又はポリメ
チレン基及びその誘導体である。R2は
などのエポキシ基又は−R3−COORなどのカルボキ
シル基である。ここで、R3、R4は
+CF1.士 などの低級アルキレン基である。Component (C) used in the present invention is a silicone polymer having a structure represented by the general formula. Here R
1 is generally a polyalkylene ether group consisting of repeating units R-0, and R is a methylene group or a polymethylene group and its derivatives. R2 is an epoxy group such as or a carboxyl group such as -R3-COOR. Here, R3 and R4 are +CF1. It is a lower alkylene group such as .
う
本発明の主目的である耐熱衝撃性及び成形性(成形時の
しみ出し)に対して、特にポリアルキレンエーテル基が
重要な役割をはたしており、−最大
%式%
(ただし、a、bはa/b≦0.5の関係を有する整数
である)で示す構造が好適であり、分子量としては40
0〜4000が好適である。この理由としてa/bは0
.5以上ではエチレンオキシド成分の親水性のため耐湿
性が低下することがあるためである。この観点から、a
/bは0又は0.2以下がさらに望ましい、また、分子
量については400以下では耐熱衝撃性、耐湿性に対し
効果が少ないか。For thermal shock resistance and moldability (bleeding during molding), which are the main objectives of the present invention, polyalkylene ether groups in particular play an important role. The structure represented by (a/b is an integer having the relationship of 0.5) is preferable, and the molecular weight is 40
0 to 4000 is suitable. The reason for this is that a/b is 0
.. This is because if it is 5 or more, the moisture resistance may decrease due to the hydrophilic nature of the ethylene oxide component. From this point of view, a
It is more desirable that /b is 0 or 0.2 or less, and if the molecular weight is 400 or less, it will have little effect on thermal shock resistance and moisture resistance.
又は低下し、分子量4000以上では成形時の流動性に
支障の生じることがある。さらにR1のポリアルキレン
エーテル基の比率は(C)成分のシリコーン重合体に対
し、10〜60重量%が好ましいが。If the molecular weight is 4,000 or more, fluidity during molding may be impaired. Furthermore, the ratio of the polyalkylene ether group of R1 is preferably 10 to 60% by weight based on the silicone polymer of component (C).
特に限定するものではない、この理由としては10重量
%未満ではベース樹脂との相溶性が悪く、成形時にしみ
出し等の問題が発生しやすく、60重量%を超えるとポ
リアルキレンエーテル基の親水性により耐湿性が低下し
やすいためである。また、R2のエポキシ基又はカルボ
キシル基の比率も特に限定するものではないが、(C)
成分のシリコーン重合体の官能基当量として1000〜
10000の範囲が好適であり、さらに好ましくは15
00〜4000の範囲である。この理由としては官能基
当量1000未満及び10000を超えると耐熱衝撃性
に効果が少ないためである。(C)成分のシリコーン重
合体の分子量は特に制限するものではないが、5000
〜5ooooが好ましい、この理由としては5000以
下では耐熱衝撃性に対し効果が少なく、5oooo以上
では成形材料の粘度が高くなり成形時に流動性が低下す
るためである。There is no particular limitation, and the reason for this is that if it is less than 10% by weight, it will have poor compatibility with the base resin and problems such as seepage will occur during molding, and if it exceeds 60% by weight, the polyalkylene ether group will become hydrophilic. This is because moisture resistance tends to decrease. Furthermore, the ratio of the epoxy group or carboxyl group in R2 is not particularly limited, but (C)
1000 to 1000 as the functional group equivalent of the component silicone polymer
A range of 10,000 is preferred, more preferably 15
The range is from 00 to 4000. The reason for this is that when the functional group equivalent is less than 1,000 or more than 10,000, there is little effect on thermal shock resistance. The molecular weight of the silicone polymer as component (C) is not particularly limited;
~5oooo is preferable, because if it is less than 5000, there is little effect on thermal shock resistance, and if it is more than 5000, the viscosity of the molding material increases and fluidity during molding decreases.
さらに、本発明の効果を適切に発生させるために、エポ
キシ基を有する(C)成分のシリコーン化合物と(B)
成分のフェノール樹脂を、エポキシ基とフェノール性水
酸基の反応を促進する硬化促進剤の存在下で、あらかじ
め加熱混合することができる。この硬化促進剤としては
、例えば1゜8−ジアザ−ビシクロ(5,4,O)ウン
デセン−7、トリエチレンジアミン、ベンジルジメチル
アミン、トリエタノールアミン、ジメチルアミノエタノ
ール、トリス(ジメチルアミノメチル)フェノールなど
の三級アミン類、2−メチルイミダゾール、2−フェニ
ルイミダ−ゾル、2−フェニル−4−メチルイミダ−ゾ
ル、2−ヘブダデシルイミダーゾルなどのイミダ−ゾル
類、トリブチルホスフィン、メチルジフェニルホスフィ
ン、トリフェニルホスフィン、ジフェニルホスフィン、
フェニルホスフィンなどの有機ホスフィン類、テトラフ
ェニルホスホニウム−テトラフェニルボレート、トリフ
ェニルホスフィン−テトラフェニルボレート、2−エチ
ル−4−メチルイミダ−ゾル−テトラフェニルボレート
、N−メチルモルホリン−テトラフェニルボレートなど
のテトラフェニルボロン塩などがあり、適宜1種類又は
2種類以上を使用できる。(B)成分と(C)成分の加
熱混合の条件としては、特に限定するものではないが。Furthermore, in order to appropriately produce the effects of the present invention, a silicone compound (C) having an epoxy group and a silicone compound (B) having an epoxy group.
The component phenolic resin can be heated and mixed in advance in the presence of a curing accelerator that promotes the reaction between the epoxy group and the phenolic hydroxyl group. Examples of the curing accelerator include 1°8-diaza-bicyclo(5,4,O)undecene-7, triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, and tris(dimethylaminomethyl)phenol. Tertiary amines, imidasols such as 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-hebdadecylimidazole, tributylphosphine, methyldiphenylphosphine, triphenyl phosphine, diphenylphosphine,
Organic phosphines such as phenylphosphine, tetraphenyl such as tetraphenylphosphonium-tetraphenylborate, triphenylphosphine-tetraphenylborate, 2-ethyl-4-methylimidazole-tetraphenylborate, N-methylmorpholine-tetraphenylborate, etc. There are boron salts, etc., and one type or two or more types can be used as appropriate. The conditions for heating and mixing the components (B) and (C) are not particularly limited.
無溶剤下又は適当な溶剤を用いて、120℃〜180℃
、1時間から10時間の範囲が好ましい。この条件下で
(B)成分のフェノール性水酸基と(C)成分のエポキ
シ基が有効に反応することが可能であり、耐熱衝撃性及
び成形時のしみ出し防止に対し特に有効である。この場
合(C)成分のエポキシ当量が重要であり、有効に効果
を発揮するためには、前出のごとくエポキシ当[150
0〜4000の範囲が好ましい。120°C to 180°C without solvent or using a suitable solvent
, a range of 1 hour to 10 hours is preferred. Under these conditions, the phenolic hydroxyl group of component (B) and the epoxy group of component (C) can react effectively, which is particularly effective for improving thermal shock resistance and preventing seepage during molding. In this case, the epoxy equivalent of component (C) is important, and in order to effectively exhibit the effect, the epoxy equivalent [150
A range of 0 to 4000 is preferred.
さらに、本発明の効果を適切に発生させるために、カル
ボキシル基を有する(C)成分のシリコーン化合物と(
A)成分のエポキシ樹脂を、エポキシ基とカルボキシル
基の反応を促進する硬化促進剤の存在下で、あらかじめ
加熱混合することができる。この硬化促進剤としては、
前出のエポキシ基とフェノール性水酸基の反応を促進す
る硬化促進剤と同様なものを、適宜1種類又は2種類以
上を使用できる。(A)成分と(C)成分の加熱混合の
条件としては、特に限定するものではないが、無溶剤下
又は適当な溶剤を用いて、120℃〜180℃、1時間
から10時間の範囲が好ましい。Furthermore, in order to appropriately produce the effects of the present invention, a silicone compound (C) having a carboxyl group and (
The epoxy resin of component A) can be heated and mixed in advance in the presence of a curing accelerator that promotes the reaction between epoxy groups and carboxyl groups. As this curing accelerator,
One or more types of curing accelerators similar to the aforementioned curing accelerators that promote the reaction between epoxy groups and phenolic hydroxyl groups can be used as appropriate. The conditions for heating and mixing component (A) and component (C) are not particularly limited, but may be in the range of 120°C to 180°C for 1 to 10 hours without a solvent or using an appropriate solvent. preferable.
この条件下で(A)成分のエポキシ基と(C)成分のカ
ルボキシル基が有効に反応することが可能であり、耐熱
wr撃性及び成形時のしみ出し防止に対し特に有効であ
る。この場合(C)成分のカルボキシル当量が重要であ
り、有効に効果を発揮するためには、前出のごとくカル
ボキシル当#、1500〜4000の範囲が好ましい。Under these conditions, the epoxy group of component (A) and the carboxyl group of component (C) can react effectively, which is particularly effective for heat impact resistance and prevention of seepage during molding. In this case, the carboxyl equivalent of component (C) is important, and in order to effectively exhibit the effect, the carboxyl equivalent is preferably in the range of 1,500 to 4,000 as described above.
本発明において用いられる(D)成分のウレイド基を有
するシランカップリング剤は
一般式
%式%
で示されるシランモノマーである。ここで、Rは+CH
2−%などの低級アルキレン基であり、Xはメ1−キシ
基、エトキシ基などの加水分解性基である。本発明にお
いては(D)成分を用いることにより、電子部品封止用
エポキシ樹脂成形材料とリードフレーム(Cu系、Fe
系など)、rc素子上のアルミ配線やパッシベーション
(無機質の保護膜)との接着を良好なレベルに保つこと
が可能になる。すなわち、本発明において(D)成分を
使用しない場合も、耐熱衝撃性、成形性について良好な
性能を示すが、(C)成分のシリコーン化合物の影響に
より、電子部品封止用エポキシ樹脂成形材料の接着性が
低下する傾向にあり、この結果耐湿性の低下を招く場合
がある。これはICがはんだ処理等の厳しい工程を経た
場合、特に問題が生じやすい、これに対し発明者らが鋭
意検討を行なった結果、(D)成分を使用することで接
着力を向上でき、耐湿性も格段に向上できることを見い
だした。したがって耐熱衝撃性、耐湿性などの信頼性に
優れ、かつ成形性の良好な電子部品封止用エポキシ樹脂
成形材料を得るためには、(D)成分が必要不可欠であ
る。The ureido group-containing silane coupling agent (D) used in the present invention is a silane monomer represented by the general formula %. Here, R is +CH
It is a lower alkylene group such as 2-%, and X is a hydrolyzable group such as a me-1-oxy group or an ethoxy group. In the present invention, by using component (D), an epoxy resin molding material for electronic component sealing and a lead frame (Cu-based, Fe
etc.), it is possible to maintain a good level of adhesion with the aluminum wiring and passivation (inorganic protective film) on the RC element. That is, in the present invention, even when component (D) is not used, good performance is shown in terms of thermal shock resistance and moldability, but due to the influence of the silicone compound of component (C), the epoxy resin molding material for encapsulating electronic components is Adhesion tends to decrease, which may result in a decrease in moisture resistance. This problem is particularly likely to occur when the IC undergoes a severe process such as soldering.As a result of intensive study by the inventors, the use of component (D) can improve adhesive strength and provide moisture resistance. I have found that my sexual health can also be significantly improved. Therefore, component (D) is indispensable in order to obtain an epoxy resin molding material for encapsulating electronic components that is excellent in reliability such as thermal shock resistance and moisture resistance, and has good moldability.
本発明において用いられる(E)成分の無機質充填剤は
、最大粒径が200μm以下であれば、特に限定するも
のではないが、溶融シリカ、結晶性シリカ、アルミナ、
ジルコン、窒化珪素、窒化ホウ素、炭化珪素、珪酸カル
シウム、炭酸カルシウム、ベリリア、スピネル、ムライ
トなどの粉体、またはこれらを球形化したビーズなどを
1種類以上用いることができる。最大粒径が200μm
以下の理由としては、充填剤の粒径が粗い場合、成形時
に金型のゲート部分につまり、未充填不良を生じるため
である。(E)成分の無機質充填剤の配合量としては、
特に限定するものではないが、40〜80容量%が好ま
しい、さらに好ましくは耐熱衝撃性の観点から、60〜
80容量%が望ましい。The inorganic filler of component (E) used in the present invention is not particularly limited as long as the maximum particle size is 200 μm or less, but includes fused silica, crystalline silica, alumina,
One or more types of powders such as zircon, silicon nitride, boron nitride, silicon carbide, calcium silicate, calcium carbonate, beryllia, spinel, and mullite, or beads obtained by spheroidizing these powders can be used. Maximum particle size is 200μm
The following reason is that if the particle size of the filler is coarse, it will clog at the gate portion of the mold during molding, resulting in non-filling defects. The amount of the inorganic filler (E) component is as follows:
Although not particularly limited, it is preferably 40 to 80% by volume, more preferably 60 to 80% by volume from the viewpoint of thermal shock resistance.
80% by volume is desirable.
また、本発明の電子部品封止用エポキシ樹脂成形材料に
は、難燃剤、離型剤、着色剤などを適宜使用することが
できる。Furthermore, flame retardants, mold release agents, colorants, and the like can be used as appropriate in the epoxy resin molding material for encapsulating electronic components of the present invention.
以上のような原材料を用いて成形材料を作製する一般的
な方法としては、所定の配合量の原材料混合物をミキサ
ー等によって充分混合した後、熱ロール、押出機等によ
って混線し、冷却、粉砕することによって、成形材料を
得ることができる。A general method for producing molding materials using the raw materials mentioned above is to thoroughly mix a raw material mixture of a predetermined amount using a mixer, etc., then mix the mixture using a hot roll, extruder, etc., cool it, and crush it. By this, a molding material can be obtained.
本発明で得られる成形材料を用いて電子部品を封止する
方法としては、低圧トランスファー成形法が最も一般的
であるが、インジェクション成形法、圧縮成形法、注型
法によっても可能である。The most common method for sealing electronic components using the molding material obtained in the present invention is low-pressure transfer molding, but injection molding, compression molding, and casting are also possible.
[作用]
本発明により耐熱衝撃性、耐熱性、耐湿性及び成形性に
優れた電子部品封止用エポキシ樹脂成形材料が得られる
理由としては、(A)のエポキシ樹脂、(B)のフェノ
ール性水酸基を有する化合物及び(E)の無機質充填剤
を主とした成形材料に、 (C)のポリアルキレンエー
テル基を有するシリコーン化合物を可撓剤として使用し
、さらに(D)成分のウレイド基を有するシランカップ
リング剤を接着向上剤として使用したことによると推察
される。(C)のシリコーン化合物はベース樹脂に非相
溶なポリシロキサンと比較的相溶性の良いポリアルキレ
ンエーテルの共重合体であり、ベース樹脂中に微粒子分
散した相分離構造を形成すると考えら九る。こ九により
、ベース樹脂の耐熱性(ガラス転移温度等)の低下が殆
ど無く、有効に可撓化が達成できる。ここでポリアルキ
レンエーテル基の効果としては、ベース樹脂と比較的相
溶性が良いため、ベース樹脂中へのシリコーン化合物の
分散性を高める作用をすると考えられる。[Function] The reason why the present invention provides an epoxy resin molding material for encapsulating electronic components with excellent thermal shock resistance, heat resistance, moisture resistance, and moldability is that (A) the epoxy resin and (B) the phenolic resin. A silicone compound having a polyalkylene ether group (C) is used as a flexibilizer in a molding material mainly consisting of a compound having a hydroxyl group and an inorganic filler (E), and further has a ureido group (D). This is presumably due to the use of a silane coupling agent as an adhesion promoter. The silicone compound (C) is a copolymer of polysiloxane, which is incompatible with the base resin, and polyalkylene ether, which is relatively compatible, and is thought to form a phase-separated structure with fine particles dispersed in the base resin. . Due to this, there is almost no decrease in the heat resistance (glass transition temperature, etc.) of the base resin, and flexibility can be effectively achieved. Here, the effect of the polyalkylene ether group is that it has relatively good compatibility with the base resin, so it is thought to work to improve the dispersibility of the silicone compound in the base resin.
さらに成形時にシリコーン化合物が分離してしみ出すこ
とを防止すると考えられる8以上の効果はベース樹脂と
(C)のシリコーン化合物をあらかじめ加熱混合した場
合さらに発揮される。(D)成分の効果としては、シリ
コーン変性により低下した接着性を向上し良好な耐湿性
を維持できる。Furthermore, the effect of 8 or more, which is considered to prevent the silicone compound from separating and seeping out during molding, is even more effective when the base resin and the silicone compound (C) are mixed in advance by heating. The effect of component (D) is that it can improve the adhesion that has decreased due to silicone modification and maintain good moisture resistance.
[実施例]
以下実施2例により本発明を説明するが、本発明の範囲
はこれらの実施例に限定されるものではない。[Examples] The present invention will be explained below with reference to two examples, but the scope of the present invention is not limited to these examples.
実施例1
エポキシ当量200、軟化点70℃のクレゾールノボラ
ック型エポキシ樹脂80重量部、エポキシ当量375、
軟化点80℃、臭素化ビスフェノールA型エポキシ樹脂
20重量部、水酸基当量106、軟化点83℃のフェノ
ールノボラック樹脂48重量部、トリフェニルホスフィ
ン1.5重量部、カルナバワックス2重量部、二酸化ア
ンチモン8重量部、カーボンブラック1.5重量部、最
大粒径150μm、平均粒径15μmの溶融シリカ粉5
00重量%及びシリコーン化合物としてエチレノキシド
とプロピレノキシドの共重合体(モル比2:81分子i
2500)とエポキシ基をそれぞれ側鎖基として有する
ポリエーテル分40置部%エポキシ当、fZ2500の
シリコーン重合体(1)20重置部と、カップリング剤
としてウレイド基を有するトリメトキシシラン5重量部
を配合し、10インチ径の加熱ロールを使用して、混線
温度約80℃、混線時間約10分の条件で混練した。そ
の後、3mm径のスクリーンを持つ粉砕機にて粉砕して
エポキシ樹脂成形材料を作製した実施例2
実施例1のフェノールノボラック樹脂48重量部とシリ
コーン化合物(I)20重量部をあらかじめトリフェニ
ルホスフィン0.5重量部とともに150℃、3時間加
熱混合して使用した以外は実施例1と同様に作製した。Example 1 Epoxy equivalent: 200, cresol novolak type epoxy resin with softening point of 70°C: 80 parts by weight, epoxy equivalent: 375,
20 parts by weight of brominated bisphenol A epoxy resin with a softening point of 80°C, hydroxyl equivalent of 106, 48 parts by weight of a phenol novolak resin with a softening point of 83°C, 1.5 parts by weight of triphenylphosphine, 2 parts by weight of carnauba wax, 8 parts by weight of antimony dioxide. Parts by weight, 1.5 parts by weight of carbon black, fused silica powder with a maximum particle size of 150 μm and an average particle size of 15 μm 5
00% by weight and a copolymer of ethyleneoxide and propylenoxide as a silicone compound (mole ratio 2:81 molecules i
2500) and a polyether having an epoxy group as a side group, 40 parts per epoxy, 20 parts by weight of silicone polymer (1) of fZ2500, and 5 parts by weight of trimethoxysilane having a ureido group as a coupling agent. were blended and kneaded using a 10-inch diameter heating roll under conditions of a mixing temperature of about 80° C. and a mixing time of about 10 minutes. Thereafter, 48 parts by weight of the phenol novolak resin of Example 1 and 20 parts by weight of silicone compound (I) were mixed in advance with 0 parts by weight of triphenylphosphine. It was produced in the same manner as in Example 1, except that it was heated and mixed with .5 parts by weight at 150° C. for 3 hours.
実施例3
実施例1で使用したシリコーン化合物(f)のエポキシ
基をカルボキシル基に変更したシリコーン化合物(TI
)を使用した以外は実施例1と同様に作製した。Example 3 A silicone compound (TI
) was produced in the same manner as in Example 1, except for using.
実施例4
実施例3のエポキシ樹脂80重量部とシリコーン化合物
(H)20重量部をあらかじめトリフェニルホスフィン
0.5重量部とともに150℃、3時間加熱混合して使
用した以外は実施例1と同様に作製した。Example 4 Same as Example 1 except that 80 parts by weight of the epoxy resin of Example 3 and 20 parts by weight of the silicone compound (H) were heated and mixed together with 0.5 parts by weight of triphenylphosphine at 150°C for 3 hours. It was created in
比較例1
実施例1のシリコーン化合物(1)とウレイド基を有す
るシランカップリング剤を除き、エポキシ基を有するシ
ランカップリング剤を5重量部使用した以外は実施例1
と同様に作製した。Comparative Example 1 Example 1 except that the silicone compound (1) of Example 1 and the silane coupling agent having a ureido group were excluded, and 5 parts by weight of the silane coupling agent having an epoxy group was used.
It was prepared in the same manner as .
比較例2
比較例1にエポキシ当量3000のエポキシ変性ジメチ
ルシリコーンオイル20重量部使用した以外は比較例1
と同様に作製した。Comparative Example 2 Comparative Example 1 except that 20 parts by weight of epoxy modified dimethyl silicone oil with an epoxy equivalent of 3000 was used in Comparative Example 1.
It was prepared in the same manner as .
比較例3
実施例2のウレイド基を有するシランカップリング剤に
替えて、エポキシ基を有するシランカップリング剤を5
重量部使用した以外は実施例2と同様に作製した。Comparative Example 3 In place of the silane coupling agent having a ureido group in Example 2, a silane coupling agent having an epoxy group was used.
It was produced in the same manner as in Example 2 except that the weight part was used.
比較例4
実施例4のウレイド基を有するシランカップリング剤に
替えて、エポキシ基を有するシランカップリング剤を5
重量部使用した以外は実施例4と同様に作製した。Comparative Example 4 In place of the silane coupling agent having a ureido group in Example 4, a silane coupling agent having an epoxy group was used.
It was produced in the same manner as in Example 4 except that the weight part was used.
表1に実施例及び比較例で得られた成形材料の特性を、
表2に特性評価法の詳細を示す。Table 1 shows the properties of the molding materials obtained in Examples and Comparative Examples.
Table 2 shows details of the characteristic evaluation method.
この結果、実施例1〜4で得られた成形材料はシリコー
ン化合物無添加の比較例1と比べ、耐熱衝撃性、耐湿性
が格段に向上し、成形品外観、パリなどの成形性も優れ
、耐熱性の指標であるガラス転移温度の低下も少ない、
これに対し、比較例2はポリアルキレンエーテル基を有
しないシリコーン化合物を用いたため成形品外観、パリ
に問題がある。また、比較例3及び比較例4はポリアル
キレンエーテル基を有するシリコーン化合物により変性
しているものの、ウレイドシランカップリング剤を使用
していないため耐湿性に劣る。As a result, the molding materials obtained in Examples 1 to 4 had significantly improved thermal shock resistance and moisture resistance, as well as excellent moldability such as molded product appearance and crispness, compared to Comparative Example 1 without the addition of silicone compounds. There is little decrease in glass transition temperature, which is an indicator of heat resistance.
On the other hand, Comparative Example 2 uses a silicone compound that does not have a polyalkylene ether group, so there are problems with the appearance and texture of the molded product. Furthermore, although Comparative Examples 3 and 4 were modified with a silicone compound having a polyalkylene ether group, they were inferior in moisture resistance because no ureido silane coupling agent was used.
[発明の効果][Effect of the invention]
Claims (6)
ポキシ樹脂、 (B)1分子中に2個以上のフェノール性水酸基を有す
る化合物、 (C)ポリアルキレンエーテル基を有するシリコーン重
合体、 (D)ウレイド基(H_2NCONH−)を有するシラ
ンカップリング剤、 (E)最大粒径200μm以下の無機質充填剤を必須成
分としてなることを特徴とする電子部品封止用エポキシ
樹脂成形材料。1. (A) an epoxy resin having two or more epoxy groups in one molecule, (B) a compound having two or more phenolic hydroxyl groups in one molecule, (C) a silicone polymer having a polyalkylene ether group, ( An epoxy resin molding material for encapsulating electronic components, comprising as essential components D) a silane coupling agent having a ureido group (H_2NCONH-), and (E) an inorganic filler having a maximum particle size of 200 μm or less.
4000の分子量と、一般式 ▲数式、化学式、表等があります▼ (ただし、a,bはa/b≦0.5の関係を有する整数
である) を有する平均分子量が5000〜50000のシリコー
ン重合体である請求項1記載の電子部品封止用エポキシ
樹脂成形材料。2. The polyalkylene ether group of component (C) is 400 or more
Silicone weight with an average molecular weight of 5,000 to 50,000 and a general formula ▲ There are mathematical formulas, chemical formulas, tables, etc. The epoxy resin molding material for electronic component sealing according to claim 1, which is a combination.
00であるエポキシ基を有するシリコーン重合である請
求項1記載の電子部品封止用エポキシ樹脂成形材料。3. Component (C) further has an epoxy equivalent of 1500 to 40
The epoxy resin molding material for encapsulating electronic components according to claim 1, which is a silicone polymer having an epoxy group of 0.00.
4000であるカルボキシル基を有するシリコーン重合
である請求項1記載の電子部品封止用エポキシ樹脂成形
材料。4. Component (C) further has a carboxyl equivalent of 1500 to
The epoxy resin molding material for encapsulating electronic components according to claim 1, which is a silicone polymer having a carboxyl group of 4,000.
化合物(B)とポリアルキレンエーテル基およびエポキ
シ基を有するシリコーン重合体(C)とをエポキシ基と
フェノール性水酸基の反応を促進する硬化促進剤の存在
下であらかじめ加熱混合したものに、1分子中に2個以
上のエポキシ基を有するエポキシ樹脂(A)、ウレイド
基を有するシランカップリング剤(D)および最大粒径
200μm以下の無機充填剤(E)を加えて混合するこ
とを特徴とする電子部品封止用エポキシ樹脂成形材料の
製造方法。5. Curing acceleration of the compound (B) having two or more phenolic hydroxyl groups in one molecule and the silicone polymer (C) having polyalkylene ether groups and epoxy groups to promote the reaction between the epoxy groups and the phenolic hydroxyl groups An epoxy resin (A) having two or more epoxy groups in one molecule, a silane coupling agent (D) having a ureido group, and an inorganic filler with a maximum particle size of 200 μm or less are mixed in advance by heating in the presence of the agent. A method for producing an epoxy resin molding material for encapsulating electronic components, the method comprising adding and mixing an agent (E).
樹脂(A)とポリアルキレンエーテル基およびカルボキ
シル基を有するシリコーン重合体(C)とをカルボキシ
ル基とエポキシ基の反応を促進する硬化促進剤の存在下
であらかじめ加熱混合したものに、1分子中に2個以上
のフェノール性水酸基を有する化合物(B)、ウレイド
基を有するシランカップリング剤(D)および最大粒径
200μm以下の無機充填剤(E)を加えて混合するこ
とを特徴とする電子部品封止用エポキシ樹脂成形材料の
製造方法。6. A curing accelerator that promotes the reaction between carboxyl groups and epoxy groups between an epoxy resin (A) having two or more epoxy groups in one molecule and a silicone polymer (C) having a polyalkylene ether group and a carboxyl group. A compound (B) having two or more phenolic hydroxyl groups in one molecule, a silane coupling agent (D) having a ureido group, and an inorganic filler with a maximum particle size of 200 μm or less are mixed in advance with heating in the presence of A method for producing an epoxy resin molding material for encapsulating electronic components, which comprises adding and mixing (E).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28219588A JPH02129220A (en) | 1988-11-08 | 1988-11-08 | Epoxy resin molding material for sealing electronic component and preparation thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28219588A JPH02129220A (en) | 1988-11-08 | 1988-11-08 | Epoxy resin molding material for sealing electronic component and preparation thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02129220A true JPH02129220A (en) | 1990-05-17 |
Family
ID=17649311
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28219588A Pending JPH02129220A (en) | 1988-11-08 | 1988-11-08 | Epoxy resin molding material for sealing electronic component and preparation thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02129220A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11279425A (en) * | 1998-03-26 | 1999-10-12 | Asahi Glass Co Ltd | Hardenable composition |
JP2003026769A (en) * | 2001-05-09 | 2003-01-29 | Hitachi Chem Co Ltd | Epoxy resin molding material for sealing and electronic part device |
KR100504289B1 (en) * | 2001-12-28 | 2005-07-27 | 제일모직주식회사 | Epoxy Molding Compound Composition With Excellent Crack Resistance At High Temperature |
-
1988
- 1988-11-08 JP JP28219588A patent/JPH02129220A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11279425A (en) * | 1998-03-26 | 1999-10-12 | Asahi Glass Co Ltd | Hardenable composition |
JP2003026769A (en) * | 2001-05-09 | 2003-01-29 | Hitachi Chem Co Ltd | Epoxy resin molding material for sealing and electronic part device |
KR100504289B1 (en) * | 2001-12-28 | 2005-07-27 | 제일모직주식회사 | Epoxy Molding Compound Composition With Excellent Crack Resistance At High Temperature |
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