JPH02129098A - 不純物添加半導体結晶の製造方法 - Google Patents
不純物添加半導体結晶の製造方法Info
- Publication number
- JPH02129098A JPH02129098A JP28047888A JP28047888A JPH02129098A JP H02129098 A JPH02129098 A JP H02129098A JP 28047888 A JP28047888 A JP 28047888A JP 28047888 A JP28047888 A JP 28047888A JP H02129098 A JPH02129098 A JP H02129098A
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- impurity
- semiconductor crystal
- heat treatment
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28047888A JPH02129098A (ja) | 1988-11-08 | 1988-11-08 | 不純物添加半導体結晶の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28047888A JPH02129098A (ja) | 1988-11-08 | 1988-11-08 | 不純物添加半導体結晶の製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19576093A Division JPH06293600A (ja) | 1993-08-06 | 1993-08-06 | 不純物添加半導体結晶の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02129098A true JPH02129098A (ja) | 1990-05-17 |
| JPH0367998B2 JPH0367998B2 (enExample) | 1991-10-24 |
Family
ID=17625638
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28047888A Granted JPH02129098A (ja) | 1988-11-08 | 1988-11-08 | 不純物添加半導体結晶の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02129098A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06293600A (ja) * | 1993-08-06 | 1994-10-21 | Stanley Electric Co Ltd | 不純物添加半導体結晶の製造方法 |
| US5535699A (en) * | 1993-05-31 | 1996-07-16 | Mitsubishi Denki Kabushiki Kaisha | Method of making II-VI semiconductor infrared light detector |
| JP2009161401A (ja) * | 2008-01-08 | 2009-07-23 | Mitsubishi Chemicals Corp | 単結晶中の不純物元素含有量の制御方法、単結晶および半導体デバイス |
-
1988
- 1988-11-08 JP JP28047888A patent/JPH02129098A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5535699A (en) * | 1993-05-31 | 1996-07-16 | Mitsubishi Denki Kabushiki Kaisha | Method of making II-VI semiconductor infrared light detector |
| JPH06293600A (ja) * | 1993-08-06 | 1994-10-21 | Stanley Electric Co Ltd | 不純物添加半導体結晶の製造方法 |
| JP2009161401A (ja) * | 2008-01-08 | 2009-07-23 | Mitsubishi Chemicals Corp | 単結晶中の不純物元素含有量の制御方法、単結晶および半導体デバイス |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0367998B2 (enExample) | 1991-10-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE69229265T2 (de) | Verfahren zur herstellung und dotierung hochisolierender dünner schichten aus monokristallinem galliumnitrid | |
| DE2225824A1 (de) | Halbleiterbauelement mit einem isolierenden substrat und einer monokristallinen halbleiterschicht und verfahren zur herstellung eines solchen halbleiterbauelements | |
| DE2538325A1 (de) | Verfahren zur herstellung von halbleiterbauelementen | |
| JPH03236218A (ja) | 化合物半導体装置およびその製造方法 | |
| US7341787B2 (en) | Process for producing highly doped semiconductor wafers, and dislocation-free highly doped semiconductor wafers | |
| DE112021001085T5 (de) | Herstellungsverfahren für Halbleiter-Siliziumwafer | |
| US3994755A (en) | Liquid phase epitaxial process for growing semi-insulating GaAs layers | |
| DE2819781A1 (de) | Verfahren zur herstellung eines epitaktischen iii-v- halbleiterplaettchens | |
| JPH02129098A (ja) | 不純物添加半導体結晶の製造方法 | |
| DE2832153C2 (de) | Verfahren zur Herstellung von Halbleitervorrichtungen | |
| US4929564A (en) | Method for producing compound semiconductor single crystals and method for producing compound semiconductor devices | |
| JPS6158879A (ja) | シリコン薄膜結晶の製造方法 | |
| KR100774070B1 (ko) | 실리콘 에피텍셜 웨이퍼의 제조방법 | |
| US4028147A (en) | Liquid phase epitaxial process for growing semi-insulating GaAs layers | |
| DE69103464T2 (de) | Halbisolierende Indiumphosphid-Einkristalle und Verfahren zu ihrer Herstellung. | |
| US4032950A (en) | Liquid phase epitaxial process for growing semi-insulating gaas layers | |
| JPH04245419A (ja) | 半導体基板の製造方法 | |
| JP2576131B2 (ja) | 化合物半導体結晶の処理方法 | |
| US4384398A (en) | Elimination of silicon pyramids from epitaxial crystals of GaAs and GaAlAs | |
| US5051376A (en) | Method for producing semiconductor device and semiconductor device produced thereby | |
| US3074146A (en) | Production of unipolar transistors | |
| JP2932787B2 (ja) | 化合物半導体ウェハの製造方法 | |
| JPH06293600A (ja) | 不純物添加半導体結晶の製造方法 | |
| JPS6164119A (ja) | 半導体装置の製造方法 | |
| RU2534106C1 (ru) | Способ получения крупногабаритных малодислокационных монокристаллов антимонида галлия |