JPH02125653A - Hybrid integrated circuit device - Google Patents

Hybrid integrated circuit device

Info

Publication number
JPH02125653A
JPH02125653A JP63279856A JP27985688A JPH02125653A JP H02125653 A JPH02125653 A JP H02125653A JP 63279856 A JP63279856 A JP 63279856A JP 27985688 A JP27985688 A JP 27985688A JP H02125653 A JPH02125653 A JP H02125653A
Authority
JP
Japan
Prior art keywords
pads
integrated circuit
insulating substrate
hybrid integrated
circuit device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63279856A
Other languages
Japanese (ja)
Inventor
Hideto Nitta
新田 秀人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP63279856A priority Critical patent/JPH02125653A/en
Publication of JPH02125653A publication Critical patent/JPH02125653A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • H01L2224/05554Shape in top view being square
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19107Disposition of discrete passive components off-chip wires

Abstract

PURPOSE:To reduce the number of layers of an insulating board for cutting down the manufacturing cost by a method wherein pads provided on first and the second semiconductor chips correspond to one another and are arranged symmetrically, and they are connected by pattern wirings and metallic fine wires formed on the insulating board. CONSTITUTION:The first and the second semiconductor chips 2A, 2B provided with respective pads 21A-24A, 21B-24B which correspond to one another and are arranged symmetrically are mounted on an insulating board 1 while multiple pattern wirings 3 and multiple metallic fine wires 4 respectively connecting the corresponding pads 21A-24A, 21B-24B are provided. Consequently, the pattern wirings 3 and the metallic fine wires 4 are not intersected with one another thereby enabling the pattern wiring 3 to be formed in the same layer on the insulating board 1. Through these procedures, the layer numbers of the insulating substrate 1 can be reduced thereby cutting down the manufacturing cost.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は混成集積回路装置に関し、特に対応するバット
同志を互に接続する複数の半導体チップを備えた混成集
積回路装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a hybrid integrated circuit device, and more particularly to a hybrid integrated circuit device including a plurality of semiconductor chips whose corresponding butts are interconnected.

〔従来の技術〕[Conventional technology]

従来、この種の混成集積回路装置は、第3図に示すよう
に、D−RAMのように同一機能、同一構造の複数の半
導体チップ2Aを絶縁性基板IA上に搭載し、これら半
導体チップの対応するパッド(21A〜24A)同志を
互に接続する場合、゛パターン配線3Aが交差するため
に絶縁性基板IAを多層化してパターン配線3Aを形成
する構造となっていた。
Conventionally, this type of hybrid integrated circuit device, as shown in FIG. When the corresponding pads (21A to 24A) are connected to each other, the pattern wiring 3A is formed by multilayering the insulating substrate IA because the pattern wiring 3A intersects with each other.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来の混成集積回路装置は、同一機能、構造の
複数の半導体チップ2人の対応するパッド(21A〜2
4A)同志を互いに接続する場合、多層化した絶縁性基
板IAによりパターン配線3Aを形成する構造となって
いるので、絶縁性基板IAの製造コストが高くなるとい
う欠点がある。
The above-described conventional hybrid integrated circuit device has a plurality of semiconductor chips having the same function and structure with corresponding pads (21A to 2).
4A) When connecting comrades to each other, the structure is such that the pattern wiring 3A is formed using a multilayered insulating substrate IA, which has the drawback of increasing the manufacturing cost of the insulating substrate IA.

本発明の目的は、絶縁性基板の製造コストを低減するこ
とができる混成集積回路装置を提供することにある。
An object of the present invention is to provide a hybrid integrated circuit device that can reduce the manufacturing cost of an insulating substrate.

〔課題を解決するための手段〕[Means to solve the problem]

本発明の混成集積回路装置は、絶縁性基板上に、所定の
位置に回路接続用の複数のパッドを備えた第1の半導体
チップと、前記各パッドと対応しかつ互いに鏡映対称と
なる位置に設けられた回路接続用の複数のパッドを備え
た第2の半導体チ・ノブと、前記第1及び第2の半導体
チップの対応する各パッド間をそれぞれ接続するための
複数のパターン配線と、これら各パターン配線を介して
1符記第1及び第2の半導体チップの対応する各パッド
間をそれぞれ接続する複数の金属細線とを有している。
A hybrid integrated circuit device of the present invention includes a first semiconductor chip provided with a plurality of pads for circuit connection at predetermined positions on an insulating substrate, and positions corresponding to each of the pads and mirror-symmetrical to each other. a second semiconductor chip/knob provided with a plurality of pads for circuit connection provided in the semiconductor chip; a plurality of pattern wirings for respectively connecting the corresponding pads of the first and second semiconductor chips; It has a plurality of thin metal wires that respectively connect the corresponding pads of the first and second semiconductor chips marked 1 through these pattern wirings.

〔実施例〕〔Example〕

次に、本発明の実施例について図面を参照して説明する
Next, embodiments of the present invention will be described with reference to the drawings.

第1図は本発明の一実施例を説明するための中間工程の
混成集積回路装置の平面図である。
FIG. 1 is a plan view of a hybrid integrated circuit device in an intermediate process for explaining one embodiment of the present invention.

この実施例は、絶縁性基板1上に搭載され、所定の位置
に回路接続用の複数のパッド21A〜24^を備えた第
1の半導体チップ2Aと、この半導体チップ2Aの各パ
ッド21A〜24Aと対応しかつ互いに鏡映対称の位置
に設けられた回路接続用の複数のパッド218〜24B
を備え、半導体チップ2Aと同一機能をもつ第2の半導
体チップ2Bと、絶縁性基板1上に形成され、これら第
1及び第2の半導体チップ2A 、2mの対応するパッ
ド21^〜24^、218〜24B間をそれぞれ接続す
るための複数のパターン配線3と、これら各パターン配
線3を介して第1及び第2の半導体チップ2,2Bの対
応する各パッド21^〜24A、21B〜24 a間を
それぞれ接続する複数の金属細線4とを有する構造とな
っている。
This embodiment includes a first semiconductor chip 2A mounted on an insulating substrate 1 and provided with a plurality of pads 21A to 24A for circuit connection at predetermined positions, and each pad 21A to 24A of this semiconductor chip 2A. A plurality of pads 218 to 24B for circuit connection provided in positions corresponding to and mirror-symmetrical to each other.
a second semiconductor chip 2B having the same function as the semiconductor chip 2A; A plurality of pattern wirings 3 for connecting between 218 to 24B, respectively, and corresponding pads 21^ to 24A, 21B to 24a of the first and second semiconductor chips 2 and 2B via these pattern wirings 3. It has a structure including a plurality of thin metal wires 4 connecting between the two.

第1図から分るように、対応するパッド21A21B 
、22A   22a 、23A   23B24A 
 248間をそれぞれ接続するパターン配線3及び金属
細線4は互いに交差することがないので、パターン配線
3を絶縁性基板1.の同一層内に形成することができ、
絶縁性基板1の層数を低減することができる。
As can be seen from FIG. 1, the corresponding pads 21A21B
, 22A 22a , 23A 23B24A
Since the pattern wiring 3 and the thin metal wire 4 that respectively connect between the 248 and 248 do not cross each other, the pattern wiring 3 is connected to the insulating substrate 1. can be formed in the same layer of
The number of layers of the insulating substrate 1 can be reduced.

第2図は本発明を適用した完成状態の混成集積回路の断
面図である。
FIG. 2 is a sectional view of a completed hybrid integrated circuit to which the present invention is applied.

半導体チップ2A、2Bを搭載し配線した絶縁性基板1
は、リードフレーム5のアイランド部51上に接着固定
され、絶縁性基板1上のパッドが金属細線4によりリー
ド端子52に接続され、そして樹脂部6で封止される構
造となっている。
Insulating substrate 1 on which semiconductor chips 2A and 2B are mounted and wired
is adhesively fixed onto an island portion 51 of a lead frame 5, a pad on an insulating substrate 1 is connected to a lead terminal 52 by a thin metal wire 4, and then sealed with a resin portion 6.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は、対応するパッドを互いに
鏡映対称となる位置に配置した第1及び第2の半導体チ
ップを絶縁性基板上に搭載し、これら対応するバ・yド
間を絶縁性基板上に形成されたパターン配線と金属細線
とにより接続する構造とすることにより、これらパター
ン配線及び金属細線が互いに交差することがないのでパ
ターン配線を絶縁性基板の同一層内に形成することがで
き、従って絶縁性基板の層数を低減することができ、絶
縁性基板の製造コストを低減することができる効果があ
る。
As explained above, the present invention mounts the first and second semiconductor chips, in which the corresponding pads are arranged in mirror-symmetrical positions to each other, on an insulating substrate, and insulates the corresponding pads from each other. By creating a structure in which the pattern wiring formed on the insulating substrate is connected to the thin metal wire, the pattern wiring and the thin metal wire do not cross each other, so the pattern wiring can be formed in the same layer of the insulating substrate. Therefore, the number of layers of the insulating substrate can be reduced, and the manufacturing cost of the insulating substrate can be reduced.

【図面の簡単な説明】[Brief explanation of drawings]

第1図及び第2図はそれぞれ本発明の一実施例を説明す
るための中間工程及び完成状態の混成集積回路装置の平
面図及び断面側面図、第3図は従来の混成集積回路装置
の一例の中間工程における平面図である。 1、LA’・・・絶縁性基板、2A、2B・・・半導体
チップ、3,3A・・・パターン配線、4・・・金属細
線、5・・・リードフレーム、6・・・樹脂部、21A
〜24A、21B〜24 a・・・パッド、51・・・
アイランド部、52・・・リード端子。
1 and 2 are a plan view and a sectional side view of a hybrid integrated circuit device in an intermediate process and a completed state, respectively, for explaining an embodiment of the present invention, and FIG. 3 is an example of a conventional hybrid integrated circuit device. It is a top view in the intermediate process of. 1, LA'... Insulating substrate, 2A, 2B... Semiconductor chip, 3, 3A... Pattern wiring, 4... Metal thin wire, 5... Lead frame, 6... Resin part, 21A
~24A, 21B~24 a...pad, 51...
Island part, 52...Lead terminal.

Claims (1)

【特許請求の範囲】[Claims]  絶縁性基板上に、所定の位置に回路接続用の複数のパ
ッドを備えた第1の半導体チップと、前記各パッドと対
応しかつ互いに鏡映対称となる位置に設けられた回路接
続用の複数のパッドを備えた第2の半導体チップと、前
記第1及び第2の半導体チップの対応する各パッド間を
それぞれ接続するための複数のパターン配線と、これら
各パターン配線を介して前記第1及び第2の半導体チッ
プの対応する各パッド間をそれぞれ接続する複数の金属
細線とを有することを特徴とする混成集積回路装置。
a first semiconductor chip provided with a plurality of pads for circuit connection at predetermined positions on an insulating substrate; and a plurality of pads for circuit connection provided at positions corresponding to and mirror-symmetrical to each of the pads. a second semiconductor chip having a pad, a plurality of pattern wirings for respectively connecting the corresponding pads of the first and second semiconductor chips, and a plurality of pattern wirings for respectively connecting the corresponding pads of the first and second semiconductor chips; A hybrid integrated circuit device comprising a plurality of thin metal wires connecting corresponding pads of a second semiconductor chip.
JP63279856A 1988-11-04 1988-11-04 Hybrid integrated circuit device Pending JPH02125653A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63279856A JPH02125653A (en) 1988-11-04 1988-11-04 Hybrid integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63279856A JPH02125653A (en) 1988-11-04 1988-11-04 Hybrid integrated circuit device

Publications (1)

Publication Number Publication Date
JPH02125653A true JPH02125653A (en) 1990-05-14

Family

ID=17616898

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63279856A Pending JPH02125653A (en) 1988-11-04 1988-11-04 Hybrid integrated circuit device

Country Status (1)

Country Link
JP (1) JPH02125653A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0954028A4 (en) * 1996-11-12 2005-05-04 Tif Co Ltd Memory module

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4989157A (en) * 1972-12-29 1974-08-26
JPS5248418B2 (en) * 1975-11-07 1977-12-09

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4989157A (en) * 1972-12-29 1974-08-26
JPS5248418B2 (en) * 1975-11-07 1977-12-09

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0954028A4 (en) * 1996-11-12 2005-05-04 Tif Co Ltd Memory module

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