JPH021240B2 - - Google Patents
Info
- Publication number
- JPH021240B2 JPH021240B2 JP6580783A JP6580783A JPH021240B2 JP H021240 B2 JPH021240 B2 JP H021240B2 JP 6580783 A JP6580783 A JP 6580783A JP 6580783 A JP6580783 A JP 6580783A JP H021240 B2 JPH021240 B2 JP H021240B2
- Authority
- JP
- Japan
- Prior art keywords
- bath
- plating
- hydrochloric acid
- lead
- added
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 32
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 29
- 229940046892 lead acetate Drugs 0.000 claims description 9
- -1 lead acetate Chemical compound 0.000 claims description 8
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 claims description 7
- 229910021626 Tin(II) chloride Inorganic materials 0.000 claims description 7
- 238000005476 soldering Methods 0.000 claims description 7
- 239000001119 stannous chloride Substances 0.000 claims description 7
- 235000011150 stannous chloride Nutrition 0.000 claims description 7
- 150000003839 salts Chemical class 0.000 claims description 6
- 150000001728 carbonyl compounds Chemical class 0.000 claims description 5
- 230000002378 acidificating effect Effects 0.000 claims description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 3
- 239000002202 Polyethylene glycol Substances 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 3
- 125000005037 alkyl phenyl group Chemical group 0.000 claims description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 3
- 229920001223 polyethylene glycol Polymers 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 2
- 229920004890 Triton X-100 Polymers 0.000 description 11
- 239000013504 Triton X-100 Substances 0.000 description 11
- GKQHIYSTBXDYNQ-UHFFFAOYSA-M 1-dodecylpyridin-1-ium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+]1=CC=CC=C1 GKQHIYSTBXDYNQ-UHFFFAOYSA-M 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- BWHOZHOGCMHOBV-UHFFFAOYSA-N Benzalacetone Natural products CC(=O)C=CC1=CC=CC=C1 BWHOZHOGCMHOBV-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- LIAWOTKNAVAKCX-UHFFFAOYSA-N hydrazine;dihydrochloride Chemical compound Cl.Cl.NN LIAWOTKNAVAKCX-UHFFFAOYSA-N 0.000 description 4
- BWHOZHOGCMHOBV-BQYQJAHWSA-N trans-benzylideneacetone Chemical compound CC(=O)\C=C\C1=CC=CC=C1 BWHOZHOGCMHOBV-BQYQJAHWSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 235000010482 polyoxyethylene sorbitan monooleate Nutrition 0.000 description 3
- 229920000053 polysorbate 80 Polymers 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- KJPRLNWUNMBNBZ-QPJJXVBHSA-N (E)-cinnamaldehyde Chemical compound O=C\C=C\C1=CC=CC=C1 KJPRLNWUNMBNBZ-QPJJXVBHSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 229940117916 cinnamic aldehyde Drugs 0.000 description 2
- KJPRLNWUNMBNBZ-UHFFFAOYSA-N cinnamic aldehyde Natural products O=CC=CC1=CC=CC=C1 KJPRLNWUNMBNBZ-UHFFFAOYSA-N 0.000 description 2
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 229910001432 tin ion Inorganic materials 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- HWSZZLVAJGOAAY-UHFFFAOYSA-L lead(II) chloride Chemical compound Cl[Pb]Cl HWSZZLVAJGOAAY-UHFFFAOYSA-L 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Description
本発明は高電流密度,高温度という条件の下に
針状晶を生ずることなく、良好な外観を有する電
着面を得ることができる塩酸酸性電気はんだめつ
き浴に関する。
従来はんだめつき浴は硫酸浴,ホウフツ化浴の
酸性浴が主流であり、ラツクめつきおよびバレル
めつきを中心に使用されており、高速性を追求す
るジエツトめつき,フローめつきはほとんど行わ
れていない。すなわち高速性には高温度,強撹拌
が必要であるが、上記の酸性浴の場合、高温度,
強撹拌の下では2価の錫イオンが4価に酸化さ
れ、沈殿物を生成して浴寿命に達してしまうから
である。それでも上述のホウフツ化浴はある程度
の高速性は得られているようであるが、満足でき
ものではなく、それに作業者に対する安全性,フ
ツ化物の排水処理に難点があり、また種々の材料
に対する腐食性が強く、めつき装置の材料選定が
難しくなる等の欠点がある。
発明者はこれら従来のはんだめつき浴のもつ難
点に鑑み、作業上の危険度が低く、排水処理も容
易な塩酸浴を検討することにした。しかるに従来
塩酸酸性浴は電着面が粗雑で針状晶が生じ易く、
良好な外観を有する電着面を得ることが困難であ
り、工業的な実用域に達していなかつた。
本発明の目的は作業上の危険度が低く、排水処
理も容易であるとともに、針状晶を生じることな
く緻密で良好な外観を有する電着面を得ることで
き、しかも高速化が達成しうる塩酸酸性電気はん
だめつき浴を提供することにあり、その特徴とす
るところは、塩化第1錫、酢酸鉛、塩酸を主成分
とする基本めつき液に、アルキルピリジニウム塩
と不飽和カルボニル化合物を添加したところにあ
る。
また、塩化第1錫、酢酸鉛、塩酸を主成分とす
る基本めつき液に、アルキルピリジニウム塩と不
飽和カルボニル化合物を添加し、さらにポリエチ
レングリコールアルキルフエニルエーテル、また
はポリオキシエチレン系化合物を添加したことを
特徴とする。
本発明の基本浴は塩化第1錫,酢酸鉛,塩酸を
主成分とする。鉛塩としては塩化鉛,一酸化鉛,
二酸化鉛等は希塩酸に浴けにくいため使用が困難
である。
添加剤として、塩化ラウリルピリジニウムはデ
ンドライド状の析出を押え得る効果があり、1〜
5g/の範囲で充分な効果がある。しかしなが
ら塩化ラウリルピリジニウムのみでは、高速フロ
ーめつきを行う場合に電着面が黒みがかつたざら
ざらした面しか得られず、高速化が達成できな
い。ベンザルアセトンはこの高速フローめつきを
可能にし、0.01〜g/〜0.1g/の範囲で充
分なレベリング作用がある。なおベンザルアセト
ンそのものは水に不溶であるため、あらかじめ塩
化ラウリルピリジニウム等の界面活性剤に混合し
溶解させたうえで使用する必要がある。
上記の基本浴に、上記塩化ラウリルピリジニウ
ム等のアルキルピリジニウム塩と上記のベンザル
アセトンやシンナムアルデヒド等の不飽和カルボ
ニル化合物とを添加したのみでも針状晶のない、
良好な外観を有する電着面を得ることが可能であ
る。
トリトンX―100(商品名):ポリエチレングリ
コールアルキルフエニルエーテルは、さらに高速
めつきを可能にする。トリトンX―100は、塩化
ラウリルピリジニウムの添加による液の黄色化、
および長時間使用による液の濁りを押さえ、浴を
安定化し浴寿命を伸ばすとともに、結晶の急激な
成長を抑制し、めつき速度の高速化剤としての作
用を奏し、表1に示す如く、添加の有無により良
好な電着面を有する最高電流密度範囲が変化す
る。なおトリトンX―100の替りに、ツイーン80
(商品名):ポリオキシエチレンソルビタモノオレ
エイトを用いた場合にも同様の作用効果を奏す
る。トリトンX―100,ツイーン80の添加量は3
ml/〜5ml/の範囲で充分である。
The present invention relates to a hydrochloric acid acid electrosoldering bath capable of obtaining an electrodeposited surface with a good appearance without forming needle crystals under conditions of high current density and high temperature. Conventionally, acidic baths such as sulfuric acid baths and hofting baths have been the mainstream for soldering baths, and are mainly used for loose plating and barrel plating, while jet plating and flow plating, which pursue high speed, are mostly used. Not done. In other words, high speed requires high temperature and strong stirring, but in the case of the above acidic bath, high temperature and strong stirring are necessary.
This is because under strong stirring, divalent tin ions are oxidized to tetravalent tin ions, forming precipitates and reaching the end of the bath life. Still, although the above-mentioned borofusting bath seems to have achieved a certain degree of high speed, it is not satisfactory, and there are also problems with safety for workers, difficulty in treating fluoride waste water, and corrosion of various materials. There are drawbacks such as strong adhesiveness and difficulty in selecting materials for plating equipment. In view of these drawbacks of conventional soldering baths, the inventors decided to consider a hydrochloric acid bath that is less dangerous to work with and easier to treat as waste water. However, conventional hydrochloric acid acid baths have a rough electrodeposited surface and tend to produce needle-like crystals.
It is difficult to obtain an electrodeposited surface with a good appearance, and the method has not reached the level of industrial practical use. The objects of the present invention are to provide a low operational risk, easy wastewater treatment, and the ability to obtain an electrodeposited surface that is dense and has a good appearance without forming needle crystals, and moreover, to achieve high speed. Our objective is to provide a hydrochloric acid acidic electric soldering bath, and its features include a basic plating solution containing stannous chloride, lead acetate, and hydrochloric acid as main components, as well as an alkylpyridinium salt and an unsaturated carbonyl compound. It is located at the point where the is added. In addition, an alkylpyridinium salt and an unsaturated carbonyl compound are added to a basic plating solution whose main components are stannous chloride, lead acetate, and hydrochloric acid, and then polyethylene glycol alkyl phenyl ether or a polyoxyethylene compound is added. It is characterized by what it did. The basic bath of the present invention contains stannous chloride, lead acetate, and hydrochloric acid as main components. Lead salts include lead chloride, lead monoxide,
Lead dioxide and the like are difficult to use because they are difficult to bathe in dilute hydrochloric acid. As an additive, laurylpyridinium chloride has the effect of suppressing dendrite-like precipitation.
There is a sufficient effect within the range of 5g/. However, when laurylpyridinium chloride is used alone, when performing high-speed flow plating, only a dark and rough electrodeposited surface is obtained, and high speed cannot be achieved. Benzalacetone enables this high-speed flow plating and has a sufficient leveling effect in the range of 0.01 to 0.1 g/. Since benzalacetone itself is insoluble in water, it must be mixed and dissolved in a surfactant such as laurylpyridinium chloride before use. Even by simply adding an alkylpyridinium salt such as laurylpyridinium chloride and an unsaturated carbonyl compound such as benzalacetone or cinnamaldehyde to the above basic bath, no needle crystals can be obtained.
It is possible to obtain electrodeposited surfaces with good appearance. Triton X-100 (trade name): Polyethylene glycol alkyl phenyl ether enables even faster plating. Triton X-100 yellows the liquid due to the addition of laurylpyridinium chloride,
It suppresses the turbidity of the solution due to long-term use, stabilizes the bath, extends the bath life, suppresses the rapid growth of crystals, and acts as a plating speed accelerating agent, as shown in Table 1. The maximum current density range that provides a good electrodeposited surface changes depending on the presence or absence of the electrodeposition. In addition, instead of Triton X-100, Tween 80
(Product name): Similar effects can be obtained when polyoxyethylene sorbita monooleate is used. The amount of Triton X-100 and Tween 80 added is 3
A range of ml/~5ml/ is sufficient.
【表】
実施例 1
塩化第1錫 30g/
酢酸鉛 10g/
塩 酸 0.5N
二塩酸ヒドラジン 4g/
塩化ラウリルピリジニウム 2g/
ベンザルアセトン 0.05g/
トリトンX―100 3ml/
この浴の種々の電流密度でのめつき表面状態を
示す写真を第1図に示す。また上記組成におい
て、トリトンX―100を含まない浴の種々の電流
密度でのめつき表面状態を示す写真を第2図に示
す。第1図,第2図から明らかなようにトリトン
X―100無添加浴はめつき表面が粗くごつごつし
ているが、トリトンX―100添加浴のめつき表面
は緻密で平滑であり、良好なめつき外観が得られ
る。またトリトンX―100を添加することによつ
て高い電流密度範囲で良好なめつき外観が得ら
れ、高速化が達成できる。
はんだめつき析出物中の錫と鉛の割合を表2に
示す。[Table] Example 1 Stannous chloride 30g / Lead acetate 10g / Hydrochloric acid 0.5N Hydrazine dihydrochloride 4g / Laurylpyridinium chloride 2g / Benzalacetone 0.05g / Triton X-100 3ml / At various current densities of this bath A photograph showing the condition of the plated surface is shown in FIG. Further, FIG. 2 shows photographs showing the state of the plating surface at various current densities in baths having the above composition but not containing Triton X-100. As is clear from Figures 1 and 2, the plating surface of the Triton X-100 additive-free bath is rough and rugged, but the plating surface of the Triton X-100 additive bath is dense and smooth, resulting in good plating. Appearance is obtained. Furthermore, by adding Triton X-100, a good plating appearance can be obtained in a high current density range, and high speeds can be achieved. Table 2 shows the proportions of tin and lead in the solder deposits.
【表】
表2から明らかなように、電流密度40A/dm2
〜70A/dm2の範囲内で析出物中の鉛の割合ほぼ
一定となり、現場作業におけるめつき管理が容易
になる。
また錫と鉛の濃度を種々変化させることによつ
て、同一電流密度における析出物中の鉛の割合を
2%〜70%を大きな幅で変化させ得る。
なお二塩酸ヒドラジンは高温(50℃,60℃以
上)下での浴の安定化を図る作用を有する。すな
わち高温になると錫が2価から4価に酸化されて
しまい、比重が下がつてめつきの密着性が悪くな
るが、二塩酸ヒドラジンは4価の錫を2価に還元
する還元剤としての作用をするため浴の安定化が
図れる。二塩酸ヒドラジンの濃度は1〜20g/
の範囲で効果がある。還元剤としてはその他に、
ハイドロキノン,次亜リン酸等の硫酸基をもたな
いものであれば浴の安定化に有効であり、これら
を単独あるいは共存させて使用し得る。
実施例 2
塩化第1錫 30g/
酢酸鉛 10g/
塩 酸 0.5N
ハイドロキノン 2g/
塩化ラウリルピリジニウム 2g/
シンナムアルデヒド 0.05g/
ツイーン80 3ml/
本実施例においても実施例1と同等のめつき速
度とめつき外観が得られた。
なお酢酸鉛の替りに、塩化亜鉛、三酸化アンチ
モン等の他の金属化合物を添加すればそれぞれの
合金浴としての機能も果し得る。また酢酸鉛を入
れなければ錫浴として使用可能である。
以上のように本発明によれば、従来粗雑な外観
しか得られなかつた塩酸酸性はんだめつき浴にお
いても、平滑で緻密な電着面を高速で得ることが
できる。特に本発明のめつき浴においては、
40A/dm2〜70A/dm2の高電流密度範囲内での
使用が達成でき、従来のはんだめつき浴が5A/
dm2〜10A/dm2であつたことを考えると、めつ
き時間は1/6以下に短縮でき、例えば半導体装
置用のリードフレームのめつき処理において、は
んだめつき工程を、極めて短時間で行われるスポ
ツト銀めつきと同一のめつきラインに組込むこと
も可能になるなどの著効を奏する。
また本発明においては高速フローめつきばかり
でなく、通常の浴めつきにおいても従来より高い
電流密度範囲で使用することができ、めつき時間
を短縮化できる。
以上本発明につき好適な実施例を挙げて種々説
明したが、本発明はこの実施例に限定されるもの
ではなく、発明の精神を逸脱しない範囲内で多く
の改変を施し得るのはもちろんのことである。[Table] As is clear from Table 2, the current density is 40A/dm 2
Within the range of ~70 A/dm 2 , the proportion of lead in the precipitate becomes almost constant, making it easier to manage plating in field work. Furthermore, by varying the concentrations of tin and lead, the proportion of lead in the precipitate at the same current density can be varied over a wide range from 2% to 70%. Note that hydrazine dihydrochloride has the effect of stabilizing the bath at high temperatures (50°C, 60°C or higher). In other words, at high temperatures, tin is oxidized from divalent to tetravalent, lowering its specific gravity and impairing the adhesion of plating, but hydrazine dihydrochloride acts as a reducing agent to reduce tetravalent tin to divalent. This makes it possible to stabilize the bath. The concentration of hydrazine dihydrochloride is 1-20g/
It is effective within the range of In addition, as a reducing agent,
Hydroquinone, hypophosphorous acid, and other substances that do not have sulfuric acid groups are effective in stabilizing the bath, and these may be used alone or in combination. Example 2 Stannous chloride 30g/Lead acetate 10g/Hydrochloric acid 0.5N Hydroquinone 2g/Laurylpyridinium chloride 2g/Cinnamaldehyde 0.05g/Tween 80 3ml/This example had the same plating speed and plating as Example 1. Appearance obtained. Note that if other metal compounds such as zinc chloride and antimony trioxide are added in place of lead acetate, they can also serve as an alloy bath for each of them. It can also be used as a tin bath if lead acetate is not added. As described above, according to the present invention, a smooth and dense electrodeposited surface can be obtained at high speed even in a hydrochloric acid soldering bath, which conventionally produced only a rough appearance. In particular, in the plating bath of the present invention,
Usage within the high current density range of 40A/dm 2 to 70A/dm 2 can be achieved, reducing the conventional soldering bath to 5A/dm 2 .
Considering that dm 2 to 10 A/dm 2 , the plating time can be reduced to less than 1/6. For example, in the plating process of lead frames for semiconductor devices, the solder plating process can be completed in an extremely short time. It has great effects such as being able to be incorporated into the same plating line as the spot silver plating that is carried out. Further, in the present invention, it is possible to use not only high-speed flow plating but also normal bath plating in a higher current density range than conventional ones, and the plating time can be shortened. Although the present invention has been variously explained above with reference to preferred embodiments, the present invention is not limited to these embodiments, and it goes without saying that many modifications can be made without departing from the spirit of the invention. It is.
第1図はトリトンX―100添加浴の、第2図は
トリトンX―100無添加浴のそれぞれのめつき表
面状態を示すSEM写真である。
Figure 1 is a SEM photograph showing the plating surface condition of the Triton X-100 additive bath, and Figure 2 is the Triton X-100 additive-free bath.
Claims (1)
本めつき液に、アルキルピリジニウム塩と不飽和
カルボニル化合物を添加したことを特徴とする塩
酸酸性電気はんだめつき浴。 2 塩化第1錫、酢酸鉛、塩酸を主成分とする基
本めつき液に、アルキルピリジニウム塩と不飽和
カルボニル化合物を添加し、さらにポリエチレン
グリコールアルキルフエニルエーテル、またはポ
リオキシエチレン系化合物を添加したことを特徴
とする塩酸酸性電気はんだめつき浴。[Scope of Claims] 1. Hydrochloric acid acid electric soldering characterized by adding an alkylpyridinium salt and an unsaturated carbonyl compound to a basic plating solution containing stannous chloride, lead acetate, and hydrochloric acid as main components. bath. 2. An alkylpyridinium salt and an unsaturated carbonyl compound were added to a basic plating solution containing stannous chloride, lead acetate, and hydrochloric acid as main components, and then polyethylene glycol alkyl phenyl ether or polyoxyethylene compound was added. A hydrochloric acid acidic electric soldering bath characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6580783A JPS59193296A (en) | 1983-04-14 | 1983-04-14 | Hydrochloric acid solder-electroplating bath |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6580783A JPS59193296A (en) | 1983-04-14 | 1983-04-14 | Hydrochloric acid solder-electroplating bath |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59193296A JPS59193296A (en) | 1984-11-01 |
JPH021240B2 true JPH021240B2 (en) | 1990-01-10 |
Family
ID=13297663
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6580783A Granted JPS59193296A (en) | 1983-04-14 | 1983-04-14 | Hydrochloric acid solder-electroplating bath |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59193296A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100434878B1 (en) * | 1999-12-30 | 2004-06-07 | 주식회사 포스코 | Method for manufacturing black coloured electrogalvanized steel sheet |
-
1983
- 1983-04-14 JP JP6580783A patent/JPS59193296A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59193296A (en) | 1984-11-01 |
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