JPS61194196A - Electroplating method of tin-lead alloy - Google Patents

Electroplating method of tin-lead alloy

Info

Publication number
JPS61194196A
JPS61194196A JP3415685A JP3415685A JPS61194196A JP S61194196 A JPS61194196 A JP S61194196A JP 3415685 A JP3415685 A JP 3415685A JP 3415685 A JP3415685 A JP 3415685A JP S61194196 A JPS61194196 A JP S61194196A
Authority
JP
Japan
Prior art keywords
tin
plating
lead alloy
electric conduction
bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3415685A
Other languages
Japanese (ja)
Other versions
JPH0549760B2 (en
Inventor
Shigeki Matsumoto
茂樹 松本
Yoichi Nakano
洋一 中野
Daiji Tonai
藤内 大二
Motoaki Matsuda
元秋 松田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
NEC Kyushu Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd, NEC Kyushu Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP3415685A priority Critical patent/JPS61194196A/en
Publication of JPS61194196A publication Critical patent/JPS61194196A/en
Publication of JPH0549760B2 publication Critical patent/JPH0549760B2/ja
Granted legal-status Critical Current

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  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To eliminate the generation of the abnormal deposition of the aciculae on a plating coated surface by stopping or reversing intermittently the electric conduction in case of performing the electroplating of tin-lead alloy by using an organic sulfonic acid bath. CONSTITUTION:In case of performing the electroplating of tin-lead alloy by using an organic sulfonic acid bath for plating tin-lead alloy, both the forward electric conduction for forming the plating and the stop of this electric conduction or the electric conduction in the reverse direction are intermittently performed. For example, in case of 2A/dm<2> current density, about <=80sec preferably about 20-60sec are made to one unit in the forward electric conduction and about >=3sec preferably about 5-20sec are made to one unit in the stop or the reverse of the electric conduction. Thereby the abnormal deposition of the aciculae and the yarns is prevented to increase the reliability and the product yield of the plated material.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、有機スルホン酸浴を用いる錫−鉛合金メッキ
方法の改善に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to improvements in tin-lead alloy plating methods using organic sulfonic acid baths.

[従来の技術] かつて電子部品の露出金属部には防錆及び半田付は性を
目的に電気錫メッキが施されていたが、このメッキはボ
イスカーと称されるひげ状の結晶が発生するため電気回
路の短絡等のトラブルがあり、近年小型化、精密化され
た電子部品、例えばICパッケージの7ウターリード等
においてはホイスカーの発生が少ない錫−鉛合金メッキ
が施されている。このような錫−鉛合金メッキの浴とし
て従来量も多く用いられているのはホウフ・ン化物浴で
あるが、この浴を用いた場合排水中のホウフッ化イオン
を除去する必要がある。しかし、ホウフッ化イオンを十
分に除去することは困難であるため、ホウフッ化物浴に
代わるメッキ浴が求められ、そのような錫−鉛合金メッ
キ浴として有機スルホン酸浴が発表され、実用化される
に至っている。
[Prior art] In the past, exposed metal parts of electronic components were electroplated with tin for rust prevention and soldering purposes, but this plating caused whisker-like crystals called voice ker. Due to problems such as short circuits in electric circuits, electronic parts that have become smaller and more precise in recent years, such as the outer leads of IC packages, are coated with tin-lead alloy plating, which causes fewer whiskers. A borofluoride bath has conventionally been used in large quantities as a bath for such tin-lead alloy plating, but when this bath is used, it is necessary to remove borofluoride ions from the waste water. However, it is difficult to remove borofluoride ions sufficiently, so a plating bath to replace the borofluoride bath is required, and an organic sulfonic acid bath was announced and put into practical use as such a tin-lead alloy plating bath. It has reached this point.

ところでこの有機スルホン酸浴を用いた場合、メッキ被
覆表面に針状又は糸状の異常析出が発生することがある
。この異常析出発生のメカニズムについてはいまだ明ら
かでないが、カソード表面の結晶構造、結晶の異方成長
性、化学的親和力等が原因となってデンドライト前駆体
が生成し、この前駆体に局部的に高電流密度の電流が流
れ、加速度的に成長するためと考えられる。この異常析
出は前記した錫メッキの場合のホイスカーと同様に電気
回路の短絡の原因となり電子部品等の信頼性を損うので
、これを確実に防止することが信頼性確保の北からも、
又メッキ製品歩留り南北のためからも強イ要請されてい
た。
By the way, when this organic sulfonic acid bath is used, needle-like or thread-like abnormal precipitation may occur on the plated surface. Although the mechanism behind this abnormal precipitation is not yet clear, dendrite precursors are formed due to the crystal structure of the cathode surface, anisotropic crystal growth, chemical affinity, etc. This is thought to be because a current with a current density flows and grows at an accelerated rate. Similar to the whiskers in the case of tin plating mentioned above, this abnormal precipitation causes short circuits in electric circuits and impairs the reliability of electronic parts, so it is important to prevent this from the viewpoint of ensuring reliability.
There was also a strong request from both sides to improve the yield of plated products.

従来、に記のような有機スルホン酸浴を用いる錫−鉛合
金メッキにおける異常析出を防止するために、被メッキ
物の酸浸漬、電解脱脂又は化学研磨等の1ij処理を施
したり、下地メッキを施したりする方法があるが作業工
程が増して製造工程が煩雑になる上、異常析出を必ずし
も十分に抑制することができない。また、モ滑化剤をメ
ッキ浴に添加して活性へを不活性化する方法も知られて
いるが異常析出を効果的に防止するには平滑化剤の選択
やメッキ浴の管理などが厳しく要求されるため・K ”
L< 1実施が困難な方法である。
Conventionally, in order to prevent abnormal precipitation in tin-lead alloy plating using an organic sulfonic acid bath as described below, the object to be plated is subjected to 1ij treatment such as acid immersion, electrolytic degreasing, or chemical polishing, or the base plating is Although there is a method of applying the same, it increases the number of work steps and complicates the manufacturing process, and it is not always possible to sufficiently suppress abnormal precipitation. Another known method is to add a smoothing agent to the plating bath to inactivate the active material, but in order to effectively prevent abnormal precipitation, the selection of the smoothing agent and the control of the plating bath must be strictly controlled. Because it is requested・K”
L<1 This is a difficult method to implement.

[発明が解決しようとする問題点] 本発明の目的は、J:述の従来技術が有する。前処理や
下地メッキのような追加の工程が必要であるという問題
、あるいは困難な平滑化剤の選択や管理が必要であると
いう問題を解決することである。換言すると、本発明の
目的は、有機スルホン酸浴を用いる錫−鉛合金メッキ法
における上記異常析出発生のトラブルを、前処理、下地
メッキ等の追加工程や添加剤等の手段によらずに解消し
、安定的にかつ廉価に錫−鉛合金メッキを行ない得る方
法を提供することにある。
[Problems to be Solved by the Invention] The object of the present invention is to overcome the problems of the prior art described in J. The purpose is to solve the problem of the need for additional steps such as pre-treatment and base plating, or the need for difficult selection and management of smoothing agents. In other words, the purpose of the present invention is to eliminate the problem of abnormal precipitation occurring in the tin-lead alloy plating method using an organic sulfonic acid bath without using additional steps such as pretreatment or base plating or using additives. The object of the present invention is to provide a method for stably and inexpensively performing tin-lead alloy plating.

[問題点を解決するための手段] 本発明は、前記問題点を解決するものとして。[Means for solving problems] The present invention aims to solve the above problems.

錫−鉛合金メッキ用有機スルホン酸浴を用いる電気錫−
鉛合金メッキ法において、通電を間欠的に停止又は逆転
することを特徴とする電気錫−鉛合金メッキ法を提供す
るものである。
Electric tin using organic sulfonic acid bath for tin-lead alloy plating
The present invention provides an electric tin-lead alloy plating method characterized by intermittently stopping or reversing current flow in the lead alloy plating method.

本発明の方法においては、メッキ形成の順方向の通電と
該通電の停止もしくは逆転(逆方向への通電)を間欠的
に行う0通電および停止もしくは逆転の好ましい時間は
被メッキ物の材質、メッキ浴組成、電流密度等により影
響されるので一律には言えないが、通常の電流密度であ
る2A/drn’においては、それぞれの実用的に好ま
しい時間は1通電が約80秒以下、より好ましくは20
〜60秒を一単位とし、通電の停止もしくは逆転は3秒
以上、より好ましくは5〜20秒を一単位とする範囲で
ある。異常析出防止の効果の点からすると通電の時間は
短かい程、停止時間は長い程よいが、通電時間が短か過
ぎたり停止時間が長過ぎたりするとメンキ形成の能率が
低下し好ましくない。また、+11!電時間が80秒を
超えたり、停止時間が3秒未満と短か過ぎると、異常析
出を十分に防IFすることが困難である0通電を停止さ
せないで間欠的に逆転させる場合には、停止の場合より
も短かい逆転時間で同等の効果が得られるが、逆転時に
は析出したメッキ層の溶解が起るので順方向の通電時間
に比し長過ぎないように適宜の時間を選択する必要があ
る。
In the method of the present invention, energization in the forward direction of plating formation and stopping or reversal of the energization (current energization in the opposite direction) are performed intermittently. This cannot be said uniformly because it is affected by bath composition, current density, etc., but at a normal current density of 2A/drn', each practical preferred time is about 80 seconds or less for one energization, more preferably 20
One unit is ~60 seconds, and the stopping or reversal of energization is within a range of 3 seconds or more, more preferably 5 to 20 seconds. From the viewpoint of the effect of preventing abnormal precipitation, the shorter the energization time and the longer the stop time, the better; however, if the energization time is too short or the stop time is too long, the efficiency of coating formation will decrease, which is undesirable. Also, +11! If the current flow exceeds 80 seconds or the stop time is too short, such as less than 3 seconds, it will be difficult to sufficiently prevent abnormal deposition. The same effect can be obtained with a shorter reversal time than in the case of , but since the deposited plating layer will dissolve during reversal, it is necessary to select an appropriate time so that it is not too long compared to the forward current application time. be.

上記のように通電を間欠的に停止又は逆転させることに
よる電流の波形は特に限定されず1例えば矩形波、ステ
ップ波、三角波、調波など何れであっても良い。
The waveform of the current generated by intermittently stopping or reversing the current flow as described above is not particularly limited, and may be any one such as a rectangular wave, step wave, triangular wave, or harmonic wave.

本発明の方法に用いられる錫−鉛合金メッキ用有機スル
ホン酸浴は、錫および鉛の、アルカノールスルホン酸、
フェノールスルホン酸等の有機スルホン酸の塩を主成分
とするメッキ浴として知られ、例えば石原薬品■製のア
ルカノールスルホン酸はんだメッキ浴(AS浴)、フェ
ノールスルホン酸はんだメッキ浴(PS浴);西独マッ
クスシュレッター社製のスロットレットに浴等を挙げる
ことができる。
The organic sulfonic acid bath for tin-lead alloy plating used in the method of the present invention includes tin and lead, alkanol sulfonic acid,
Known as plating baths whose main ingredients are salts of organic sulfonic acids such as phenolsulfonic acid, such as alkanolsulfonic acid solder plating bath (AS bath) and phenolsulfonic acid solder plating bath (PS bath) manufactured by Ishihara Pharmaceutical Co., Ltd. Baths and the like can be mentioned as slotlets made by Max Schletter.

[作用] 本発明の方法により異常析出が効果的に防止される理由
は必ずしも明らかではないが、次のように推定される。
[Effect] Although the reason why abnormal precipitation is effectively prevented by the method of the present invention is not necessarily clear, it is presumed as follows.

前述したように諸要因により形成されたデンドライト前
駆体が異常析出へと成長する過程にはカソードの近傍に
形成される拡散二重層が重要な役割を果すと考えられる
。即ち、カソード近傍のカチオンが電着により消費され
て拡散二重層の濃度勾配が大きくなる結果デンドライト
前駆体が突起状に成長し、この突起に高電流密度の電流
が流れて突起が加速度的に成長し異常析出になるものと
推定される0本発明の方法により通電を間欠的に停止す
ると停止時間中にカソード沖合から拡散二重層ヘカオチ
ンの移動が起って拡故−重層の濃度勾配が緩和され、そ
の結果デンドライト前駆体の成長か抑制されるものと考
えられる。間欠的に通電を逆転させた場合には濃度勾配
の緩和が一部速やかに行われるものと考えられる。
As mentioned above, the diffusion double layer formed near the cathode is thought to play an important role in the process in which dendrite precursors formed due to various factors grow into abnormal precipitation. In other words, the cations near the cathode are consumed by electrodeposition, and the concentration gradient of the diffused double layer increases. As a result, dendrite precursors grow into protrusions, and a current with a high current density flows through these protrusions, causing the protrusions to grow at an accelerated pace. It is estimated that abnormal precipitation will occur. If the current supply is stopped intermittently using the method of the present invention, the diffusion double layer hechaotine will migrate from offshore of the cathode during the stop time, and the concentration gradient of the spreading double layer will be alleviated. It is thought that as a result, the growth of dendrite precursors is suppressed. It is thought that when the current supply is intermittently reversed, the concentration gradient is partially alleviated quickly.

[実施例] 以下1本発明の方法を実施例により具体的に説明する。[Example] The method of the present invention will be specifically explained below using examples.

実施例1 揺動カソードラックを備えたメッキ装置にAS−S(ア
ルカノールスルホン酸第1錫) 200 g/1.AS
−P (アルカノールスルホン酸鉛) 20g1Q、M
S−A(アルカンスルホン酸)70g/lを主成分とし
て含有するメッキ浴(石原AS浴、商品名)を充填し、
錫−鉛合金板を陽極に用い5通電と停止の時間をそれぞ
れ60秒及び5秒とし、極間距離200mm、 陰極電
流密度2A/dゴ、温度20℃で12分前、カソードラ
ックに取付けた42アロイテストピースにメッキしたが
、異常析出は認められなかった。
Example 1 AS-S (stannous alkanol sulfonate) 200 g/1. A.S.
-P (lead alkanol sulfonate) 20g1Q, M
Filled with a plating bath (Ishihara AS bath, trade name) containing 70 g/l of S-A (alkanesulfonic acid) as the main component,
A tin-lead alloy plate was used as the anode, and the energization and deactivation times were 60 seconds and 5 seconds, respectively, the distance between the electrodes was 200 mm, the cathode current density was 2 A/d, the temperature was 20°C, and the plate was installed on the cathode rack for 12 minutes. 42 alloy test piece was plated, but no abnormal precipitation was observed.

実施例2 スロントレットSN(錫)180g/立、スロ、、トレ
、トPB(鉛)7g/立、スロットレットA(酸)15
0g/iを主成分として含胸するメッキ浴(スロットレ
ントに浴、商品名)を用い、通電と停止の時間をそれぞ
れ20秒及び5秒とし、実施例1と同様にメッキした結
果、異常析出は認められなかった。
Example 2 Slotlet SN (tin) 180 g/vert, Slo, Tore, To PB (lead) 7 g/vert, Slotlet A (acid) 15
As a result of plating in the same manner as in Example 1, using a plating bath containing 0 g/i as the main component (slot rent bath, trade name) and setting the energization and stop times to 20 seconds and 5 seconds, respectively, no abnormal precipitation occurred. I was not able to admit.

実施例3 通電の停也の代りにその間逆方向の通電を行なう以外は
実施例1と同様にメッキを行なったが、異常析出は認め
られなかった。
Example 3 Plating was carried out in the same manner as in Example 1 except that instead of stopping the energization, energization was conducted in the opposite direction during the period, but no abnormal deposition was observed.

比較例 実施例2と同じメッキ浴を用い、通常の直流電源により
12分間メッキを行なった。テストピース上に長さ約1
00ル程度の針状析出が認められた。
Comparative Example Using the same plating bath as in Example 2, plating was carried out for 12 minutes using a normal DC power supply. Approximately 1 length on the test piece
Acicular precipitation of about 0.00 l was observed.

[発明の効果] 本発明により電気錫−鉛メー、キにおける針状。[Effect of the invention] According to the present invention, electric tin-lead metals and needles in electric tin-lead metals are formed.

糸状の異常析出が効果的に防止され、メッキ物のイご頼
性向上、製品歩留向上に太きく寄与できた。
Abnormal string-like precipitation was effectively prevented, making a significant contribution to improving the reliability of plated products and improving product yield.

また1本発明によれば、メッキのメッキ厚、組成等のバ
ラツキも小さくできる利点もある。
Another advantage of the present invention is that variations in plating thickness, composition, etc. can be reduced.

さらに、本発明の方法は被メッキ物の前処理や下地メi
キが不要であり、また特別の添加剤を使用しないのでそ
の管理なども不要であり、簡便、紙庫でかつ安定した実
用性の高い方法である。
Furthermore, the method of the present invention can be used for pre-treatment of objects to be plated and
Also, since no special additives are used, there is no need to manage them, and it is a simple, paper storage, stable, and highly practical method.

Claims (1)

【特許請求の範囲】[Claims] 1、錫−鉛合金メッキ用有機スルホン酸浴を用いる電気
錫−鉛合金メッキ法において、通電を間欠的に停止又は
逆転することを特徴とする電気錫−鉛合金メッキ法。
1. An electric tin-lead alloy plating method using an organic sulfonic acid bath for tin-lead alloy plating, which is characterized by intermittent stopping or reversal of current flow.
JP3415685A 1985-02-22 1985-02-22 Electroplating method of tin-lead alloy Granted JPS61194196A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3415685A JPS61194196A (en) 1985-02-22 1985-02-22 Electroplating method of tin-lead alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3415685A JPS61194196A (en) 1985-02-22 1985-02-22 Electroplating method of tin-lead alloy

Publications (2)

Publication Number Publication Date
JPS61194196A true JPS61194196A (en) 1986-08-28
JPH0549760B2 JPH0549760B2 (en) 1993-07-27

Family

ID=12406339

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3415685A Granted JPS61194196A (en) 1985-02-22 1985-02-22 Electroplating method of tin-lead alloy

Country Status (1)

Country Link
JP (1) JPS61194196A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63118093A (en) * 1986-11-05 1988-05-23 Tanaka Electron Ind Co Ltd Method for tinning electronic parts
JPH04280993A (en) * 1991-03-11 1992-10-06 Electroplating Eng Of Japan Co Plating method
EP0825281A1 (en) * 1996-08-21 1998-02-25 Lucent Technologies Inc. Tin electroplating process
JP2006257492A (en) * 2005-03-17 2006-09-28 Nec Corp Alloy plating method and alloy plating device
JP2009249640A (en) * 2008-04-01 2009-10-29 Mitsubishi Materials Corp Anode material for solder plating
EP1430166B1 (en) * 2001-03-13 2017-02-08 MacDermid Limited Method for depositing tin alloys

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63118093A (en) * 1986-11-05 1988-05-23 Tanaka Electron Ind Co Ltd Method for tinning electronic parts
JPH04280993A (en) * 1991-03-11 1992-10-06 Electroplating Eng Of Japan Co Plating method
EP0825281A1 (en) * 1996-08-21 1998-02-25 Lucent Technologies Inc. Tin electroplating process
US5750017A (en) * 1996-08-21 1998-05-12 Lucent Technologies Inc. Tin electroplating process
EP1430166B1 (en) * 2001-03-13 2017-02-08 MacDermid Limited Method for depositing tin alloys
JP2006257492A (en) * 2005-03-17 2006-09-28 Nec Corp Alloy plating method and alloy plating device
JP4725145B2 (en) * 2005-03-17 2011-07-13 日本電気株式会社 Alloy plating method and alloy plating apparatus
JP2009249640A (en) * 2008-04-01 2009-10-29 Mitsubishi Materials Corp Anode material for solder plating

Also Published As

Publication number Publication date
JPH0549760B2 (en) 1993-07-27

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