JPH0212016B2 - - Google Patents
Info
- Publication number
- JPH0212016B2 JPH0212016B2 JP14917081A JP14917081A JPH0212016B2 JP H0212016 B2 JPH0212016 B2 JP H0212016B2 JP 14917081 A JP14917081 A JP 14917081A JP 14917081 A JP14917081 A JP 14917081A JP H0212016 B2 JPH0212016 B2 JP H0212016B2
- Authority
- JP
- Japan
- Prior art keywords
- gate
- electrode
- field effect
- source
- gate electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005669 field effect Effects 0.000 claims description 16
- 239000003990 capacitor Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 2
- 230000003321 amplification Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7831—Field effect transistors with field effect produced by an insulated gate with multiple gate structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
- H01L29/812—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a Schottky gate
- H01L29/8124—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a Schottky gate with multiple gate
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14917081A JPS5850780A (ja) | 1981-09-21 | 1981-09-21 | 電界効果トランジスタ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14917081A JPS5850780A (ja) | 1981-09-21 | 1981-09-21 | 電界効果トランジスタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5850780A JPS5850780A (ja) | 1983-03-25 |
JPH0212016B2 true JPH0212016B2 (de) | 1990-03-16 |
Family
ID=15469324
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14917081A Granted JPS5850780A (ja) | 1981-09-21 | 1981-09-21 | 電界効果トランジスタ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5850780A (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5972773A (ja) * | 1982-10-20 | 1984-04-24 | Matsushita Electric Ind Co Ltd | 電界効果トランジスタ |
JPS6349017A (ja) * | 1986-08-19 | 1988-03-01 | 株式会社クボタ | 脱穀機 |
JPH022179A (ja) * | 1988-06-13 | 1990-01-08 | Fujitsu Ltd | メタル・セミコンダクタ・fet |
-
1981
- 1981-09-21 JP JP14917081A patent/JPS5850780A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5850780A (ja) | 1983-03-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS6348196B2 (de) | ||
JPH06349859A (ja) | 電界効果トランジスタ | |
JPS6155971A (ja) | シヨツトキ−ゲ−ト電界効果トランジスタ | |
JPS63278375A (ja) | 半導体集積回路装置 | |
JPH0212016B2 (de) | ||
JPH0531313B2 (de) | ||
US4951099A (en) | Opposed gate-source transistor | |
US5539228A (en) | Field-effect transistor with high breakdown voltage provided by channel recess offset toward drain | |
US5945695A (en) | Semiconductor device with InGaP channel layer | |
EP0113540A2 (de) | Halbleiteranordnungen und Verfahren deren Herstellung | |
JP2569626B2 (ja) | 半導体集積回路装置 | |
JPH0715018A (ja) | 電界効果トランジスタ | |
JP2867420B2 (ja) | 化合物半導体装置 | |
JPS60223167A (ja) | 半導体装置 | |
JPS6348869A (ja) | 半導体装置 | |
JPS60137071A (ja) | シヨツトキゲ−ト電界効果トランジスタ | |
JPS6196770A (ja) | 半導体装置 | |
JPH04155840A (ja) | 半導体装置 | |
JPH01304785A (ja) | 半導体集積回路 | |
JPS58123756A (ja) | ガリウム砒素集積回路 | |
JPS62257767A (ja) | Mos電界効果トランジスタおよび半導体装置 | |
JPS60127763A (ja) | 電界効果型トランジスタ | |
JPH0372636A (ja) | ヘテロ接合電界効果トランジスタ | |
JPH0337748B2 (de) | ||
JP2002217376A (ja) | 半導体装置及びその製造方法 |