JPH0211975B2 - - Google Patents

Info

Publication number
JPH0211975B2
JPH0211975B2 JP56163417A JP16341781A JPH0211975B2 JP H0211975 B2 JPH0211975 B2 JP H0211975B2 JP 56163417 A JP56163417 A JP 56163417A JP 16341781 A JP16341781 A JP 16341781A JP H0211975 B2 JPH0211975 B2 JP H0211975B2
Authority
JP
Japan
Prior art keywords
electron beam
plasma
plasma electron
cathode
power source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56163417A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5866242A (ja
Inventor
Teru Kanbe
Kanji Yoshida
Michio Nagase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vacuum Metallurgical Co Ltd
Original Assignee
Vacuum Metallurgical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vacuum Metallurgical Co Ltd filed Critical Vacuum Metallurgical Co Ltd
Priority to JP56163417A priority Critical patent/JPS5866242A/ja
Publication of JPS5866242A publication Critical patent/JPS5866242A/ja
Publication of JPH0211975B2 publication Critical patent/JPH0211975B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/077—Electron guns using discharge in gases or vapours as electron sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Electron Sources, Ion Sources (AREA)
JP56163417A 1981-10-15 1981-10-15 移動式プラズマ電子ビ−ム発生装置 Granted JPS5866242A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56163417A JPS5866242A (ja) 1981-10-15 1981-10-15 移動式プラズマ電子ビ−ム発生装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56163417A JPS5866242A (ja) 1981-10-15 1981-10-15 移動式プラズマ電子ビ−ム発生装置

Publications (2)

Publication Number Publication Date
JPS5866242A JPS5866242A (ja) 1983-04-20
JPH0211975B2 true JPH0211975B2 (enExample) 1990-03-16

Family

ID=15773496

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56163417A Granted JPS5866242A (ja) 1981-10-15 1981-10-15 移動式プラズマ電子ビ−ム発生装置

Country Status (1)

Country Link
JP (1) JPS5866242A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7800083B2 (en) * 2007-11-06 2010-09-21 Axcelis Technologies, Inc. Plasma electron flood for ion beam implanter
JP7785549B2 (ja) * 2022-01-19 2025-12-15 住友重機械工業株式会社 イオン源

Also Published As

Publication number Publication date
JPS5866242A (ja) 1983-04-20

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