JPH02116734U - - Google Patents
Info
- Publication number
- JPH02116734U JPH02116734U JP2592789U JP2592789U JPH02116734U JP H02116734 U JPH02116734 U JP H02116734U JP 2592789 U JP2592789 U JP 2592789U JP 2592789 U JP2592789 U JP 2592789U JP H02116734 U JPH02116734 U JP H02116734U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- deposited
- inclined surface
- holding mechanism
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 11
- 238000001947 vapour-phase growth Methods 0.000 claims description 5
- 238000005229 chemical vapour deposition Methods 0.000 claims 3
- 210000000078 claw Anatomy 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2592789U JPH02116734U (OSRAM) | 1989-03-06 | 1989-03-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2592789U JPH02116734U (OSRAM) | 1989-03-06 | 1989-03-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02116734U true JPH02116734U (OSRAM) | 1990-09-19 |
Family
ID=31247092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2592789U Pending JPH02116734U (OSRAM) | 1989-03-06 | 1989-03-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02116734U (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8826854B2 (en) | 2009-01-09 | 2014-09-09 | Shin-Etsu Chemical Co., Ltd. | Direct-current plasma CVD apparatus and method for producing diamond using the same |
-
1989
- 1989-03-06 JP JP2592789U patent/JPH02116734U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8826854B2 (en) | 2009-01-09 | 2014-09-09 | Shin-Etsu Chemical Co., Ltd. | Direct-current plasma CVD apparatus and method for producing diamond using the same |
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