JPH02116733U - - Google Patents
Info
- Publication number
- JPH02116733U JPH02116733U JP2707789U JP2707789U JPH02116733U JP H02116733 U JPH02116733 U JP H02116733U JP 2707789 U JP2707789 U JP 2707789U JP 2707789 U JP2707789 U JP 2707789U JP H02116733 U JPH02116733 U JP H02116733U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- substrate
- electrode
- processing apparatus
- cooling pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000605 extraction Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims 2
- 239000002826 coolant Substances 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2707789U JPH02116733U (enExample) | 1989-03-07 | 1989-03-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2707789U JPH02116733U (enExample) | 1989-03-07 | 1989-03-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02116733U true JPH02116733U (enExample) | 1990-09-19 |
Family
ID=31249271
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2707789U Pending JPH02116733U (enExample) | 1989-03-07 | 1989-03-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02116733U (enExample) |
-
1989
- 1989-03-07 JP JP2707789U patent/JPH02116733U/ja active Pending
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