JPH02106757A - Method for development processing of color filter - Google Patents

Abstract

PURPOSE:To reduce the residue of nondeveloped pigment particles on unexposed areas without causing peeling of a pattern part by spraying pressurized water on a transparent substrate after immersing the substrate coated with a film into a developing solution. CONSTITUTION:The transparent substrate 1 coated with the film 2 is exposed to light through a prescribed photomask, immersed into the developing solution 3, and then, sprayed with the pressurized water. The immersion of the substrate 1 into the solution 3 promotes the dissolution reaction and starts peeling of the unexposed part of the film 2, and the spraying of the pressurized pure water 5 from a nozzle 4 promotes the peeling of the film 2 already peeled a little with water pressure, and at that time, application of water pressure is made uniform to the substrate 1 by rotating the substrate 1 fixed by vacuum suction, thus permitting the peeling of the film on the unexposed areas, and the residue of undeveloped pigment particles remaining there to be reduced without peeling the part of the pattern 6 on the substrate 1.

Description

DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a developing method for manufacturing color filters used in liquid crystal color televisions, COD cameras, and the like.

Conventional technology Traditionally, dyeing methods have been used to manufacture color filters, but recently a method using colored photosensitive resins in which pigments are mixed with photosensitive resins (hereinafter referred to as the colored photosensitive resin method) has recently been introduced. Proposed.

The conventional development processing method using colored photosensitive resin using negative photosensitive resin is to apply colored photosensitive resin onto a transparent substrate with a spinner, dry it, and then apply it to a photomask with a desired pattern drawn on it. The pattern of the photomask is printed onto the photosensitive resin on the transparent substrate by exposing it to ultraviolet light. Next, the coating of this transparent substrate was immersed in a developer, and then immersed in pure water and rinsed to remove the colored photosensitive resin in the unexposed areas to form a desired pattern on the glass substrate. .

Problems to be Solved by the Invention However, the above-mentioned development processing method has a problem in that pigment particles remain in unexposed areas on the transparent substrate after washing with water.

Furthermore, if the development time is increased in order to reduce the amount of pigment particles remaining in such unexposed areas, there is a problem in that overdevelopment occurs, resulting in peeling of pattern areas formed by exposure.

In view of the above, an object of the present invention is to provide a color filter development method that can reduce the amount of pigment particles left undeveloped in unexposed areas without causing peeling of the pattern areas described in 1.

Means for Solving the Problems In order to solve the above problems, the invention according to claim 1 involves applying a photosensitive resin in which pigments are dispersed on a transparent substrate and drying it to form a film, which is then exposed to light through a predetermined photomask. 2. After this step, the transparent substrate with the coated film is immersed in the developer solution for a predetermined period of time, and then pressurized water is sprayed onto the transparent substrate.
In the invention, a photosensitive resin in which pigments are dispersed is coated on a transparent substrate (1), dried to form a film, exposed through a prescribed photomask, and then the transparent substrate with the film is exposed in a developer. The invention of claim 3 is characterized in that the development process is carried out by shaking the developer by shaking or using a vibrator.
Dry to form a film, and 1) expose to light through a predetermined mask, develop, wash with water, heat, and rub the surface of the transparent substrate! t, +1 sign. As the photosensitive resin, it is preferable to use an acryloid negative type photosensitive resin.

action The effect of this technical means is as follows.

In the invention of claim 1, a photosensitive resin in which pigments are dispersed is applied onto a transparent substrate, dried, and exposed to light through a predetermined photomask to form a film, and then the transparent substrate with the film is developed. By spraying pressurized water after immersion in the liquid, the coating on the unexposed areas that has started to dissolve due to the development reaction can be peeled off more quickly due to the water pressure, and the coating on the unexposed areas that remained without being peeled off by just immersion in pure water can be removed. The film is also peeled off, and there is little left over from development.

In the invention of claim 2, by vibrating the transparent substrate with the coating in the developer or shaking the developer using a vibrator, the concentration of the developer on the surface of the coating does not decrease over time. The development speed is kept approximately constant. Furthermore, since the developer and the transparent substrate are relatively fluid, shearing force acts on the coating, making it easier to peel off the pigment particles.

For this reason, in the developer? Since the development is completed in a shorter time than in the case of u ill, the coating on the unexposed areas is peeled off before the exposed areas are developed excessively.

In the third aspect of the invention, when the film is developed, washed with water, and heated, the film on the transparent substrate undergoes thermal polymerization and is completely cured. However, since the pattern portion exposed through the photomask also undergoes photopolymerization, the adhesive strength with the transparent substrate is stronger. When the film in this state is rubbed, only the unexposed parts of the film where the adhesive strength is relatively weak are removed.

Example Embodiments of the present invention will be described below with reference to the drawings.

Example 1 In FIG. 1, a coating 2 is a transparent substrate (e.g. glass) 1
Apply a black resist (trade name: Color Mosaic; manufactured by Fuji Hunt Electronics Technology Co., Ltd.) to a film thickness of approximately 1 μm using a spinner, and apply it using a hot plate.
Prevent at 00°C for 1 minute, then apply polyvinyl alcohol on top with a spinner, perform prebeta at 100°C for 11 minutes on a hot plate,
After that, a photomask was applied and exposed to ultraviolet light with an intensity of 100 mJ/cm2, and then heated at +00°C on a hot plate.
It was formed by heating for 1 minute. Developer solution 3 is 1
It is a wt % aqueous solution of soda carbonate. The transparent substrate 1 with the coating 2 is immersed in the developer 3 for 1.5 minutes (FIG. 1(a)).
After that, pure water 5 was sprayed from the nozzle 4 at a pressure of 0.6 kg/cm 2 (gauge pressure) for 2 minutes (FIG. 1(b)) to form a pattern 6.

Next, the operation of this embodiment will be explained.

By immersing the transparent substrate 1 with the coating 2 in the developer 3, a dissolution reaction proceeds and the coating in the unexposed areas is peeled off. Next, when pressurized pure water 5 is sprayed from the nozzle 4,
The coating in the unexposed area, which has begun to peel off, is promoted to ψj separation by water pressure. The range of water pressure at this time is 0.8k
When the pressure was higher than g/cm2, the pressure was too strong and a phenomenon occurred in which the pattern part was chipped. Further, when the weight was 0.4 kg/cm2 or less, there was a large amount of undeveloped material. Further, at this time, it is better to rotate the transparent substrate 1 while vacuum suctioning it and spray the pure water 5, since the water pressure is evenly applied to the coating 2.

Example 2 In FIG. 2, 1 is a transparent substrate, a coating 2 was formed in the same manner as in Example 1, and a developer 3 was also the same as in Example 1. In Fig. 2, 7 is a motor;
8 is a rotating plate, 9 is an arm, 10 is a pin, and 11 is a holder. When the motor 7 rotates, the rotary plate 8 also rotates, and the arm 9 reciprocates downward through the pin 10, and the holder 1
The transparent substrate 1 of the coating 2 (1) in 1 is shaken in the developer 3 to perform development. Thereafter, the transparent substrate 1 with the film 2 attached was immersed in pure water for 2 minutes, washed with water, and a pattern was formed.

Next, the operation of this embodiment will be explained.

By swinging the transparent substrate 1 with the coating 2 attached, the developer 3 is stirred, and the concentration of the developer near the coating 2 is kept almost constant even as development progresses, so that the development speed does not decrease.

Further, due to the flow of the developer 3, shearing force acts on the coating 2. Therefore, development is completed in a shorter time than when simply immersing in the developer 3.

Example 3 In FIG. 3, 1 is a transparent substrate, a coating 2 is formed in the same manner as in Example 1, and a developer 3 is also the same as in Example 1. 12 is a vibrator, 13 is an ultrasonic oscillator, and 14 is a holder.

Place the vibrator 1 in the developer 3 with the coating 2 facing the vibrator 12.
Development was performed by oscillating ultrasonic waves at an oscillation frequency of 30 kHz and shaking the developer.

Next, the operation of this embodiment will be explained.

The vibrator 12 creates compressional waves in the developer 3 by oscillation,
Bubbles are generated when the pressure is reduced, but when the pressure is increased, the bubbles contract or burst, creating a pressure wave that travels through the developer 3, and the coating 2
, and the pigment particles with weak adhesive strength in the unexposed areas are peeled off. At this time, the oscillation frequency of vibrations F-1 and F-2 is set to 35 k
The pattern part peeled off when the frequency was higher than Hz, but at 25kHz
There was a lot of undeveloped image below.

Embodiment 4 In FIG. 4, ``■'' is a transparent substrate, and pattern 6 was formed by performing the same development process as in the conventional example. That is, a black resist (trade name: Color Mosaic ■; manufactured by Fuji Hunt Electronics Technology Co., Ltd.) was applied with a spinner to a film thickness of approximately 1 μm, pre-baked at 100°C for 1 minute on a hot plate, and then Apply polyvinyl alcohol using a spinner, pre-bake on a hot plate at 100°C for 1 minute,
After that, a photomask was applied and exposed to ultraviolet light with an intensity of 100 mJ/cm2, and then heated to 100°C on a hot plate at 11°C.
After heating for 1 minute, immersing in a developer of 1% by weight sodium carbonate aqueous solution for 1.5 minutes, and washing off the developer with pure water,
It was heated in an oven at 200°C for 115 minutes.

15 is a brush (made of nylon) and a motor (not shown)
It is connected directly to and rotates. Reference numeral 16 is a fixing base for fixing the transparent substrate 1, 17 is a nozzle, 18 is pure water, and 19 is a control box that stores a motor and the like. The number of rotations of the brush 15 is 200
rl)m, and pure water 18 was sprayed at a flow rate of 22/min.

Next, the operation of this embodiment will be explained.

The brush 15 rotates and, while spraying pure water 18 from the nozzle 17, scrapes the surface of the transparent substrate 1 to peel off the pigment particles in the unexposed area. The pure water 18 serves to lubricate the brush 15 and the transparent substrate 1. Here, since the exposed portion undergoes a photopolymerization reaction and is further subjected to a thermal polymerization reaction, the adhesive strength is strong and will not be peeled off even if rubbed with the brush 15. However, if the rubbing is performed in the developer before the thermal polymerization reaction occurs, the exposed areas will also peel off, so it is necessary to perform the rubbing after the heating step.

Effects of the Invention As described in 1-1, according to the present invention, the pattern portion on the transparent substrate does not peel off during the development process of the color filter, and the amount of undeveloped pigment particles in the unexposed area can be reduced. This makes it possible to produce color filters without color turbidity, which is extremely useful in industry.

[Brief explanation of the drawing]

1 to 4 are diagrams of a developing apparatus for explaining an embodiment of the method for developing color filters of the present invention, and FIG. To? y
Figure 2 is a cross-sectional view showing the state in which the transparent substrate has been exposed to light in the developer. A cross-sectional view showing the state in which the attached glass substrate is developed while being shaken, and Figure 3 shows the exposure 1 while applying ultrasonic vibration to the developing solution.
・Fist: φ transparent substrate, 2: film, 3: developer, 12: vibrator. Name of agent: Patent attorney Shigetaka Awano Haka1 person I1

Claims (3)

[Claims] (1) After coating and drying a photosensitive resin with pigments dispersed on a transparent substrate to form a film and exposing it to light through a designated photomask, place the transparent substrate with the film on it in a developer solution. A method for developing a color filter, comprising spraying pressurized water onto the transparent substrate after immersion for a period of time. (2) A photosensitive resin in which pigments are dispersed is applied onto a transparent substrate, dried to form a film, and exposed through a predetermined photomask.The transparent substrate with the film attached is then shaken in a developer. 1. A method for developing a color filter, characterized in that development is carried out by moving the developer or by shaking the developer using a vibrator. (3) Apply a photosensitive resin with pigments dispersed on a transparent substrate, dry it to form a film, expose it to light through a predetermined photomask, develop it, wash it with water, heat it, and then rub the surface of the transparent substrate. A color filter development processing method characterized by the following.