JPH02106757A - Method for development processing of color filter - Google Patents

Method for development processing of color filter

Info

Publication number
JPH02106757A
JPH02106757A JP26009488A JP26009488A JPH02106757A JP H02106757 A JPH02106757 A JP H02106757A JP 26009488 A JP26009488 A JP 26009488A JP 26009488 A JP26009488 A JP 26009488A JP H02106757 A JPH02106757 A JP H02106757A
Authority
JP
Japan
Prior art keywords
transparent substrate
film
developer
substrate
peeling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26009488A
Other languages
Japanese (ja)
Inventor
Hirozo Takegawa
武川 博三
Shinichi Aso
阿曽 伸一
Takashi Inami
敬 井波
Ryutaro Akutagawa
竜太郎 芥川
Tokihiko Shimizu
清水 時彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP26009488A priority Critical patent/JPH02106757A/en
Publication of JPH02106757A publication Critical patent/JPH02106757A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To reduce the residue of nondeveloped pigment particles on unexposed areas without causing peeling of a pattern part by spraying pressurized water on a transparent substrate after immersing the substrate coated with a film into a developing solution. CONSTITUTION:The transparent substrate 1 coated with the film 2 is exposed to light through a prescribed photomask, immersed into the developing solution 3, and then, sprayed with the pressurized water. The immersion of the substrate 1 into the solution 3 promotes the dissolution reaction and starts peeling of the unexposed part of the film 2, and the spraying of the pressurized pure water 5 from a nozzle 4 promotes the peeling of the film 2 already peeled a little with water pressure, and at that time, application of water pressure is made uniform to the substrate 1 by rotating the substrate 1 fixed by vacuum suction, thus permitting the peeling of the film on the unexposed areas, and the residue of undeveloped pigment particles remaining there to be reduced without peeling the part of the pattern 6 on the substrate 1.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は液晶用カラーテレビ、CODカメラ等に用いら
れるカラーフィルタの製造における現像処理方法に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a developing method for manufacturing color filters used in liquid crystal color televisions, COD cameras, and the like.

従来の技術 従来、カラーフィルタの製造法として染色法が用いられ
てきたが、最近これに代わり顔料を感光性樹脂に混ぜた
着色感光性樹脂を用いる方法(以下、着色感光性樹脂法
という)が提案されている。
Conventional technology Traditionally, dyeing methods have been used to manufacture color filters, but recently a method using colored photosensitive resins in which pigments are mixed with photosensitive resins (hereinafter referred to as the colored photosensitive resin method) has recently been introduced. Proposed.

従来のネガ型感光性樹脂を使った着色感光性樹脂法での
現像処理方法は、着色感光性樹脂を透明基板にスピンナ
ー等で塗布し、乾燥させたのち、所望のパターンが描画
されたフォトマスクを当て、紫外線で露光してフォトマ
スクのパターンを前記透明基板上の感光性樹脂に焼き付
ける。ついで、この透明基板を被膜を現像液中に浸漬し
た後、純水に浸漬して水洗を行って未露光部の着色感光
性樹脂を除去してガラス基板上に所望のパターンを形成
していた。
The conventional development processing method using colored photosensitive resin using negative photosensitive resin is to apply colored photosensitive resin onto a transparent substrate with a spinner, dry it, and then apply it to a photomask with a desired pattern drawn on it. The pattern of the photomask is printed onto the photosensitive resin on the transparent substrate by exposing it to ultraviolet light. Next, the coating of this transparent substrate was immersed in a developer, and then immersed in pure water and rinsed to remove the colored photosensitive resin in the unexposed areas to form a desired pattern on the glass substrate. .

発明が解決しようとする課題 しかし上記の現像処理方法では、水洗後、透明基板上の
未露光部に顔料粒子残りが生じるという課題があった。
Problems to be Solved by the Invention However, the above-mentioned development processing method has a problem in that pigment particles remain in unexposed areas on the transparent substrate after washing with water.

また、このような未露光部の顔料粒子の残りを少なくす
るため、現像時間を長くすると、過剰現像となり露光に
より形成したパターン部の剥離を生じるという課題があ
った。
Furthermore, if the development time is increased in order to reduce the amount of pigment particles remaining in such unexposed areas, there is a problem in that overdevelopment occurs, resulting in peeling of pattern areas formed by exposure.

本発明はかかる点に鑑み、」1記パターン部の剥離を生
じることなく、未露光部に顔料粒子の現像残りを少なく
できるカラーフィルタの現像処理方法を提供することを
目的とするものである。
In view of the above, an object of the present invention is to provide a color filter development method that can reduce the amount of pigment particles left undeveloped in unexposed areas without causing peeling of the pattern areas described in 1.

課題を解決するための手段 上記課題を解決ため、請求項1の発明は透明基板上に顔
料を分散させた感光性樹脂を塗布Φ乾燥して被膜を形成
し所定のフォトマスクを介して露光を行なったのち、現
像液中に被膜の付いた透明基板を所定時間浸漬後、前記
透明基板に加圧水を噴霧することを特徴とする請求項2
の発明は透明基板」1に顔料を分散させた感光性樹脂を
塗布・乾燥して被膜を形成し所定のフォトマスクを介し
て露光を行なったのち、現像液中で被膜の付いた透明基
板を揺動させるか、もしくは振動子を用いて現像液を振
盪させて現像処理を行うことを特徴とする請求項3の発
明は透明基板上に顔料を分散させた感光性樹脂を塗布・
乾燥して被膜を形成し所定のフ1 )マスクを介して露
光し、現像・水洗・加熱し、前記透明基板表面を擦過す
ることを!t、+1徴とする。尚感光性樹脂としてはア
クリロイド系ネガ型感光樹脂を用いると好適である。
Means for Solving the Problems In order to solve the above problems, the invention according to claim 1 involves applying a photosensitive resin in which pigments are dispersed on a transparent substrate and drying it to form a film, which is then exposed to light through a predetermined photomask. 2. After this step, the transparent substrate with the coated film is immersed in the developer solution for a predetermined period of time, and then pressurized water is sprayed onto the transparent substrate.
In the invention, a photosensitive resin in which pigments are dispersed is coated on a transparent substrate (1), dried to form a film, exposed through a prescribed photomask, and then the transparent substrate with the film is exposed in a developer. The invention of claim 3 is characterized in that the development process is carried out by shaking the developer by shaking or using a vibrator.
Dry to form a film, and 1) expose to light through a predetermined mask, develop, wash with water, heat, and rub the surface of the transparent substrate! t, +1 sign. As the photosensitive resin, it is preferable to use an acryloid negative type photosensitive resin.

作用 この技術的手段による作用は次のようである。action The effect of this technical means is as follows.

請求項1の発明では、透明基板上に顔料を分散させた感
光性樹脂を塗布・乾燥して被膜を形成に所定のフォトマ
スクを介して露光を行ったのち、被膜の付いた透明基板
を現像液に浸漬後、加圧水を噴霧させることにより、現
像反応により溶解を始めた未露光部の被膜は、水圧によ
り剥離を早められ、純水に浸漬するのみでは剥離されず
に残った未露光部の被膜も剥離され、現像残りがすくな
くなる。
In the invention of claim 1, a photosensitive resin in which pigments are dispersed is applied onto a transparent substrate, dried, and exposed to light through a predetermined photomask to form a film, and then the transparent substrate with the film is developed. By spraying pressurized water after immersion in the liquid, the coating on the unexposed areas that has started to dissolve due to the development reaction can be peeled off more quickly due to the water pressure, and the coating on the unexposed areas that remained without being peeled off by just immersion in pure water can be removed. The film is also peeled off, and there is little left over from development.

請求項2の発明では、現像液中で被膜のついた透明基板
を振動させる、あるいは振動子を用いて現像液を振盪さ
せることにより、被膜表面の現像液濃度は時間とともに
低下することがなく、現像速度は略一定に保たれる。ま
た現像液と透明基板は相対的に流動しているため、被膜
にはせん断力が働き顔料粒子を剥離しやすくしている。
In the invention of claim 2, by vibrating the transparent substrate with the coating in the developer or shaking the developer using a vibrator, the concentration of the developer on the surface of the coating does not decrease over time. The development speed is kept approximately constant. Furthermore, since the developer and the transparent substrate are relatively fluid, shearing force acts on the coating, making it easier to peel off the pigment particles.

このため、現像液に?u illする場合に比べ短時間
で現像が完了するため、露光部が過剰に現像されるまえ
に、未露光部の被膜が剥離される。
For this reason, in the developer? Since the development is completed in a shorter time than in the case of u ill, the coating on the unexposed areas is peeled off before the exposed areas are developed excessively.

請求項3の発明では、現像Φ水洗・加熱すると、透明基
板上の被膜は熱重合をおこし全体的に硬化する。しかし
、フォトマスクを介して露光されたパターン部は、光重
合もおこしているため、透明基板との接着強度はより強
固である。この状態の被膜を擦過すると相対的に接着強
度の弱い未露光部の被膜のみ剥ガ1する。
In the third aspect of the invention, when the film is developed, washed with water, and heated, the film on the transparent substrate undergoes thermal polymerization and is completely cured. However, since the pattern portion exposed through the photomask also undergoes photopolymerization, the adhesive strength with the transparent substrate is stronger. When the film in this state is rubbed, only the unexposed parts of the film where the adhesive strength is relatively weak are removed.

実施例 以下、本発明の実施例を図面を用いて説明する。Example Embodiments of the present invention will be described below with reference to the drawings.

実施例1 第1図において、被膜2は透明基板(例えばガラス)1
に黒色レジスト(商品名カラーモザイクに;富士ハント
エレクトロニクステクノロジー社製)をスピンナーで約
1μmの膜厚になるように塗布し、ホットプレートで1
00°C,1分間のプリベータを行い、さらにその上に
、ポリビニールアルコールをスピンナーで塗布し、ホッ
トプレートで100°C11分間のプリベータを行い、
その後フォトマスクを当て100mJ/cm2の紫外線
強度で露光、したのち、ホットプレートで+00°C,
1分間加熱を行い形成したものである。現像液3は、1
重量%炭酸ソーダ水溶液である。被膜2の付いた透明基
板1を現像液3に1.5分間浸漬(第1図(a))t、
た後、ノズル4より0.6kg/cm2(ゲージ圧)の
圧力で純水5を2分間噴霧しく第1図(b))、パター
ン6を形成した。
Example 1 In FIG. 1, a coating 2 is a transparent substrate (e.g. glass) 1
Apply a black resist (trade name: Color Mosaic; manufactured by Fuji Hunt Electronics Technology Co., Ltd.) to a film thickness of approximately 1 μm using a spinner, and apply it using a hot plate.
Prevent at 00°C for 1 minute, then apply polyvinyl alcohol on top with a spinner, perform prebeta at 100°C for 11 minutes on a hot plate,
After that, a photomask was applied and exposed to ultraviolet light with an intensity of 100 mJ/cm2, and then heated at +00°C on a hot plate.
It was formed by heating for 1 minute. Developer solution 3 is 1
It is a wt % aqueous solution of soda carbonate. The transparent substrate 1 with the coating 2 is immersed in the developer 3 for 1.5 minutes (FIG. 1(a)).
After that, pure water 5 was sprayed from the nozzle 4 at a pressure of 0.6 kg/cm 2 (gauge pressure) for 2 minutes (FIG. 1(b)) to form a pattern 6.

次に、この実施例における作用を説明する。Next, the operation of this embodiment will be explained.

現像液3に被膜2の付いた透明基板1を浸漬することに
より、溶解反応が進行し未露光部の被膜の剥離かはしま
る。次に加圧された純水5をノズル4より噴霧すると、
剥離をはじめた未露光部の被膜は、水圧によりψj離が
促進される。このときの水圧の範囲であるが、0.8k
g/cm2以上では、圧力が強すぎパターン部が欠ける
という現象がおきた。また、0.4kg/cm2以下で
は、現像残りが多かった。また、このとき透明基板1を
真空吸着しながら回転させて、純水5を噴霧する方が被
膜2に対し水圧が均等に加わるので良い。
By immersing the transparent substrate 1 with the coating 2 in the developer 3, a dissolution reaction proceeds and the coating in the unexposed areas is peeled off. Next, when pressurized pure water 5 is sprayed from the nozzle 4,
The coating in the unexposed area, which has begun to peel off, is promoted to ψj separation by water pressure. The range of water pressure at this time is 0.8k
When the pressure was higher than g/cm2, the pressure was too strong and a phenomenon occurred in which the pattern part was chipped. Further, when the weight was 0.4 kg/cm2 or less, there was a large amount of undeveloped material. Further, at this time, it is better to rotate the transparent substrate 1 while vacuum suctioning it and spray the pure water 5, since the water pressure is evenly applied to the coating 2.

実施例2 第2図において、1は透明基板であり、被膜2は実施例
1と同様にして形成したもの、また、現像液3も実施例
1と同様のものである。第2図において、7はモータ、
8は回転板、9はアーム、10はピン、11は保持具で
ある。モータ7が回転すると、回転板8も回転し、ピン
10を介し、アーム9が」1下に往復運動し、保持具1
1の中の被膜2の(1いた透明基板1は、現像液3中で
揺動され現像が行われる。保持具11の往復運動サイク
ルは1 c/sとし、現像液3中で1分間揺動を行った
。そのあと、被膜2の付いた透明基板1を純水に2分間
浸漬して、水洗をし、パターン形成を行った。
Example 2 In FIG. 2, 1 is a transparent substrate, a coating 2 was formed in the same manner as in Example 1, and a developer 3 was also the same as in Example 1. In Fig. 2, 7 is a motor;
8 is a rotating plate, 9 is an arm, 10 is a pin, and 11 is a holder. When the motor 7 rotates, the rotary plate 8 also rotates, and the arm 9 reciprocates downward through the pin 10, and the holder 1
The transparent substrate 1 of the coating 2 (1) in 1 is shaken in the developer 3 to perform development. Thereafter, the transparent substrate 1 with the film 2 attached was immersed in pure water for 2 minutes, washed with water, and a pattern was formed.

次に、この実施例における作用を説明する。Next, the operation of this embodiment will be explained.

被膜2の付いた透明基板1を揺動することにより、現像
液3は撹拌され被膜2近傍の現像液濃度は、現像が進ん
でもほぼ一定に保たれ、現像速度が落ちることはない。
By swinging the transparent substrate 1 with the coating 2 attached, the developer 3 is stirred, and the concentration of the developer near the coating 2 is kept almost constant even as development progresses, so that the development speed does not decrease.

また、現像液3の流動により、被膜2にはせん断力が働
く。従って単に現像液3に浸漬する場合に比べ短時間で
現像が完了する。
Further, due to the flow of the developer 3, shearing force acts on the coating 2. Therefore, development is completed in a shorter time than when simply immersing in the developer 3.

実施例3 第3図において、1は透明基板であり、被膜2は実施例
1と同様にして形成したもの、また、現像液3も実施例
1と同様のものである。12は振動子、13は超音波発
振器、14は保持具である。
Example 3 In FIG. 3, 1 is a transparent substrate, a coating 2 is formed in the same manner as in Example 1, and a developer 3 is also the same as in Example 1. 12 is a vibrator, 13 is an ultrasonic oscillator, and 14 is a holder.

現像液3中に、被膜2を振動子12側に向け、振動子1
2の発振周波数を30kHzで超音波を発振させ現像液
を振盪させて現像を行った。
Place the vibrator 1 in the developer 3 with the coating 2 facing the vibrator 12.
Development was performed by oscillating ultrasonic waves at an oscillation frequency of 30 kHz and shaking the developer.

次に、この実施例における作用を説明する。Next, the operation of this embodiment will be explained.

振動子12は、発振により現像液3中に疎密波を作り、
減圧時に気泡を発生するが、増圧時に気泡が収縮、ある
いは破裂し、圧力波となり現像液3中を伝わり、被膜2
に達し、未露光部の接着強度の弱い顔料粒子を剥離させ
る。このとき、振動F−1,2の発振周波数を35 k
Hz以上にするとパターン部は剥離したが、25kHz
以下では現像残りが多かった。
The vibrator 12 creates compressional waves in the developer 3 by oscillation,
Bubbles are generated when the pressure is reduced, but when the pressure is increased, the bubbles contract or burst, creating a pressure wave that travels through the developer 3, and the coating 2
, and the pigment particles with weak adhesive strength in the unexposed areas are peeled off. At this time, the oscillation frequency of vibrations F-1 and F-2 is set to 35 k
The pattern part peeled off when the frequency was higher than Hz, but at 25kHz
There was a lot of undeveloped image below.

実施例4 第4図において、■は透明基板であり、パターン6は従
来例と同様の現像処理を施し形成したものである。即ち
、黒色レジスト(商品名カラーモザイク■〈;富士ハン
トエレクトロニクステクノロジー社製)をスピンナーで
約1μmの膜厚になるように塗布し、ホットプレートで
100℃、1分間のプリベータを行い、さらにその上に
、ポリビニールアルコールをスピンナーて塗布し、ホッ
トプレートで100°C,1分間のプリベークを行い、
その後フAトマスクを当て100mJ/cm2の紫外線
強度で露光したのち、ホットプレートで100°C11
分間加熱を行い、1重量%炭酸ソーダ水溶液の現像液に
1.5分間浸漬し、純水で現像液を洗いながしたあと、
オーブンで200°C115分間加熱したものである。
Embodiment 4 In FIG. 4, ``■'' is a transparent substrate, and pattern 6 was formed by performing the same development process as in the conventional example. That is, a black resist (trade name: Color Mosaic ■; manufactured by Fuji Hunt Electronics Technology Co., Ltd.) was applied with a spinner to a film thickness of approximately 1 μm, pre-baked at 100°C for 1 minute on a hot plate, and then Apply polyvinyl alcohol using a spinner, pre-bake on a hot plate at 100°C for 1 minute,
After that, a photomask was applied and exposed to ultraviolet light with an intensity of 100 mJ/cm2, and then heated to 100°C on a hot plate at 11°C.
After heating for 1 minute, immersing in a developer of 1% by weight sodium carbonate aqueous solution for 1.5 minutes, and washing off the developer with pure water,
It was heated in an oven at 200°C for 115 minutes.

15はブラシ(ナイロン製)でありモータ(図示せず)
に直結させ回転する。16は透明基板1を固定する固定
台、17はノズル、18は純水、19はモータ等を格納
しである制御箱である。ブラシ15の回転数は、200
rl)mとし、純水18はを22 /minの流量で噴
霧した。
15 is a brush (made of nylon) and a motor (not shown)
It is connected directly to and rotates. Reference numeral 16 is a fixing base for fixing the transparent substrate 1, 17 is a nozzle, 18 is pure water, and 19 is a control box that stores a motor and the like. The number of rotations of the brush 15 is 200
rl)m, and pure water 18 was sprayed at a flow rate of 22/min.

次に、この実施例における作用を説明する。Next, the operation of this embodiment will be explained.

ブラシ15が回転し、ノズル17より純水18を噴霧し
ながら、透明基板1表面を擦過することにより未露光部
の顔料粒子を剥離させる。純水18はブラシ15と透明
基板1の潤滑の役割を果たす。ここで、露光部は光重合
反応をおこしている上に、更に熱重合反応が加えられる
ため、接着強度は強く、ブラシ15により擦過しても剥
離されることはない。ただし、熱重合反応を起こす前の
現像液中で擦過を行うと、露光部も剥離するため、加熱
工程後に行うことが必要である。
The brush 15 rotates and, while spraying pure water 18 from the nozzle 17, scrapes the surface of the transparent substrate 1 to peel off the pigment particles in the unexposed area. The pure water 18 serves to lubricate the brush 15 and the transparent substrate 1. Here, since the exposed portion undergoes a photopolymerization reaction and is further subjected to a thermal polymerization reaction, the adhesive strength is strong and will not be peeled off even if rubbed with the brush 15. However, if the rubbing is performed in the developer before the thermal polymerization reaction occurs, the exposed areas will also peel off, so it is necessary to perform the rubbing after the heating step.

発明の効果 以1−1述べてきたように本発明によれば、カラーフィ
ルタの現像処理時における透明基板上パターン部の剥離
を生じることがなく、未露光部の顔料粒子の現像残りを
少なくできて、色の濁りのないカラーフィルタの製造が
でき、工業」二極めて有用である。
Effects of the Invention As described in 1-1, according to the present invention, the pattern portion on the transparent substrate does not peel off during the development process of the color filter, and the amount of undeveloped pigment particles in the unexposed area can be reduced. This makes it possible to produce color filters without color turbidity, which is extremely useful in industry.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図〜第4図は本発明カラーフィルタの現像処理方法
の実施例を説明するための現像装置図であって、第1図
(a)は露光後の被膜の付いた透明基板を現像液に?y
faした状態を示す断面図、同図(b)は現像液から取
り出した透明基板に圧力水を噴霧して現像処理する状態
を示す断面図、第2図は現像液中で露光後の被膜の付い
たガラス基板を揺動させながら現像処理する状態を示す
断面図、第3図は現像液を超音波振動を与えつつ露光1
・拳・φ透明基板、2・・・・被膜、3・弗・・現像液
、12・・・番振動子。 代理人の氏名 弁理士 粟野重孝 はか1名I1
1 to 4 are diagrams of a developing apparatus for explaining an embodiment of the method for developing color filters of the present invention, and FIG. To? y
Figure 2 is a cross-sectional view showing the state in which the transparent substrate has been exposed to light in the developer. A cross-sectional view showing the state in which the attached glass substrate is developed while being shaken, and Figure 3 shows the exposure 1 while applying ultrasonic vibration to the developing solution.
・Fist: φ transparent substrate, 2: film, 3: developer, 12: vibrator. Name of agent: Patent attorney Shigetaka Awano Haka1 person I1

Claims (3)

【特許請求の範囲】[Claims] (1)透明基板上に顔料を分散させた感光性樹脂を塗布
・乾燥して被膜を形成し所定のフォトマスクを介して露
光を行なったのち、現像液中に被膜の付いた透明基板を
所定時間浸漬後、前記透明基板に加圧水を噴霧すること
を特徴とするカラーフィルタの現像処理方法。
(1) After coating and drying a photosensitive resin with pigments dispersed on a transparent substrate to form a film and exposing it to light through a designated photomask, place the transparent substrate with the film on it in a developer solution. A method for developing a color filter, comprising spraying pressurized water onto the transparent substrate after immersion for a period of time.
(2)透明基板上に顔料を分散させた感光性樹脂を塗布
、乾燥して被膜を形成し所定のフォトマスクを介して露
光を行なったのち、現像液中で被膜の付いた透明基板を
揺動させるか、もしくは振動子を用いて現像液を振盪さ
せて現像を行うことを特徴とするカラーフィルタの現像
処理方法。
(2) A photosensitive resin in which pigments are dispersed is applied onto a transparent substrate, dried to form a film, and exposed through a predetermined photomask.The transparent substrate with the film attached is then shaken in a developer. 1. A method for developing a color filter, characterized in that development is carried out by moving the developer or by shaking the developer using a vibrator.
(3)透明基板上に顔料を分散させた感光性樹脂を塗布
、乾燥して被膜を形成し所定のフォトマスクを介して露
光し、現像・水洗・加熱したのち、前記透明基板表面を
擦過することを特徴とするカラーフィルタの現像処理方
法。
(3) Apply a photosensitive resin with pigments dispersed on a transparent substrate, dry it to form a film, expose it to light through a predetermined photomask, develop it, wash it with water, heat it, and then rub the surface of the transparent substrate. A color filter development processing method characterized by the following.
JP26009488A 1988-10-14 1988-10-14 Method for development processing of color filter Pending JPH02106757A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26009488A JPH02106757A (en) 1988-10-14 1988-10-14 Method for development processing of color filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26009488A JPH02106757A (en) 1988-10-14 1988-10-14 Method for development processing of color filter

Publications (1)

Publication Number Publication Date
JPH02106757A true JPH02106757A (en) 1990-04-18

Family

ID=17343215

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26009488A Pending JPH02106757A (en) 1988-10-14 1988-10-14 Method for development processing of color filter

Country Status (1)

Country Link
JP (1) JPH02106757A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0420051U (en) * 1990-06-11 1992-02-19

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5848056A (en) * 1981-09-17 1983-03-19 Konishiroku Photo Ind Co Ltd Method and device for developing of image forming material
JPS58102937A (en) * 1981-11-27 1983-06-18 ヘキスト・アクチエンゲゼルシヤフト Processor for photosensitive material exposed under a original
JPS59155A (en) * 1982-05-25 1984-01-05 フオトメカ・ソシエテ・アノニム Method and apparatus for developing all types of plates having photopolymerizing photosensitive layer
JPS5974559A (en) * 1982-10-20 1984-04-27 Yoshimatsu Shokai:Kk Method and apparatus for etching liquid vortex type synthetic resin printing plate
JPS5922447B2 (en) * 1975-11-18 1984-05-26 東京電力株式会社 Hogokeiden Sochi
JPS60178449A (en) * 1984-02-27 1985-09-12 Canon Electronics Inc Method for developing resist
JPS6238457A (en) * 1985-08-14 1987-02-19 Asahi Chem Ind Co Ltd Method for developing resist
JPS62195194A (en) * 1986-02-21 1987-08-27 株式会社日立製作所 Development apparatus
JPS62280751A (en) * 1986-05-30 1987-12-05 Hitachi Condenser Co Ltd Developing method for printed wiring board
JPS62293796A (en) * 1986-06-13 1987-12-21 日立エーアイシー株式会社 Method and apparatus for developing printed wiring board
JPS63163357A (en) * 1986-12-25 1988-07-06 Toray Ind Inc Method for developing waterless lithographic printing plate

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5922447B2 (en) * 1975-11-18 1984-05-26 東京電力株式会社 Hogokeiden Sochi
JPS5848056A (en) * 1981-09-17 1983-03-19 Konishiroku Photo Ind Co Ltd Method and device for developing of image forming material
JPS58102937A (en) * 1981-11-27 1983-06-18 ヘキスト・アクチエンゲゼルシヤフト Processor for photosensitive material exposed under a original
JPS59155A (en) * 1982-05-25 1984-01-05 フオトメカ・ソシエテ・アノニム Method and apparatus for developing all types of plates having photopolymerizing photosensitive layer
JPS5974559A (en) * 1982-10-20 1984-04-27 Yoshimatsu Shokai:Kk Method and apparatus for etching liquid vortex type synthetic resin printing plate
JPS60178449A (en) * 1984-02-27 1985-09-12 Canon Electronics Inc Method for developing resist
JPS6238457A (en) * 1985-08-14 1987-02-19 Asahi Chem Ind Co Ltd Method for developing resist
JPS62195194A (en) * 1986-02-21 1987-08-27 株式会社日立製作所 Development apparatus
JPS62280751A (en) * 1986-05-30 1987-12-05 Hitachi Condenser Co Ltd Developing method for printed wiring board
JPS62293796A (en) * 1986-06-13 1987-12-21 日立エーアイシー株式会社 Method and apparatus for developing printed wiring board
JPS63163357A (en) * 1986-12-25 1988-07-06 Toray Ind Inc Method for developing waterless lithographic printing plate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0420051U (en) * 1990-06-11 1992-02-19

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