JPH02106757A - Method for development processing of color filter - Google Patents

Method for development processing of color filter

Info

Publication number
JPH02106757A
JPH02106757A JP26009488A JP26009488A JPH02106757A JP H02106757 A JPH02106757 A JP H02106757A JP 26009488 A JP26009488 A JP 26009488A JP 26009488 A JP26009488 A JP 26009488A JP H02106757 A JPH02106757 A JP H02106757A
Authority
JP
Japan
Prior art keywords
substrate
film
peeling
water
promotes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26009488A
Other languages
Japanese (ja)
Inventor
Hirozo Takegawa
Shinichi Aso
Takashi Inami
Ryutaro Akutagawa
Tokihiko Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP26009488A priority Critical patent/JPH02106757A/en
Publication of JPH02106757A publication Critical patent/JPH02106757A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To reduce the residue of nondeveloped pigment particles on unexposed areas without causing peeling of a pattern part by spraying pressurized water on a transparent substrate after immersing the substrate coated with a film into a developing solution.
CONSTITUTION: The transparent substrate 1 coated with the film 2 is exposed to light through a prescribed photomask, immersed into the developing solution 3, and then, sprayed with the pressurized water. The immersion of the substrate 1 into the solution 3 promotes the dissolution reaction and starts peeling of the unexposed part of the film 2, and the spraying of the pressurized pure water 5 from a nozzle 4 promotes the peeling of the film 2 already peeled a little with water pressure, and at that time, application of water pressure is made uniform to the substrate 1 by rotating the substrate 1 fixed by vacuum suction, thus permitting the peeling of the film on the unexposed areas, and the residue of undeveloped pigment particles remaining there to be reduced without peeling the part of the pattern 6 on the substrate 1.
COPYRIGHT: (C)1990,JPO&Japio
JP26009488A 1988-10-14 1988-10-14 Method for development processing of color filter Pending JPH02106757A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26009488A JPH02106757A (en) 1988-10-14 1988-10-14 Method for development processing of color filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26009488A JPH02106757A (en) 1988-10-14 1988-10-14 Method for development processing of color filter

Publications (1)

Publication Number Publication Date
JPH02106757A true JPH02106757A (en) 1990-04-18

Family

ID=17343215

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26009488A Pending JPH02106757A (en) 1988-10-14 1988-10-14 Method for development processing of color filter

Country Status (1)

Country Link
JP (1) JPH02106757A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0420051U (en) * 1990-06-11 1992-02-19

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5848056A (en) * 1981-09-17 1983-03-19 Konishiroku Photo Ind Co Ltd Method and device for developing of image forming material
JPS58102937A (en) * 1981-11-27 1983-06-18 Hoechst Ag Processor for photosensitive material exposed under a original
JPS59155A (en) * 1982-05-25 1984-01-05 Fuotomeka Sa Method and apparatus for developing all types of plates having photopolymerizing photosensitive layer
JPS5974559A (en) * 1982-10-20 1984-04-27 Yoshimatsu Shokai:Kk Method and apparatus for etching liquid vortex type synthetic resin printing plate
JPS5922447B2 (en) * 1975-11-18 1984-05-26 Tokyo Denryoku Kk
JPS60178449A (en) * 1984-02-27 1985-09-12 Canon Electronics Inc Method for developing resist
JPS6238457A (en) * 1985-08-14 1987-02-19 Asahi Chem Ind Co Ltd Method for developing resist
JPS62195194A (en) * 1986-02-21 1987-08-27 Hitachi Ltd Development apparatus
JPS62280751A (en) * 1986-05-30 1987-12-05 Hitachi Condenser Co Ltd Developing method for printed wiring board
JPS62293796A (en) * 1986-06-13 1987-12-21 Hitachi Condenser Method and apparatus for developing printed wiring board
JPS63163357A (en) * 1986-12-25 1988-07-06 Toray Ind Inc Method for developing waterless lithographic printing plate

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5922447B2 (en) * 1975-11-18 1984-05-26 Tokyo Denryoku Kk
JPS5848056A (en) * 1981-09-17 1983-03-19 Konishiroku Photo Ind Co Ltd Method and device for developing of image forming material
JPS58102937A (en) * 1981-11-27 1983-06-18 Hoechst Ag Processor for photosensitive material exposed under a original
JPS59155A (en) * 1982-05-25 1984-01-05 Fuotomeka Sa Method and apparatus for developing all types of plates having photopolymerizing photosensitive layer
JPS5974559A (en) * 1982-10-20 1984-04-27 Yoshimatsu Shokai:Kk Method and apparatus for etching liquid vortex type synthetic resin printing plate
JPS60178449A (en) * 1984-02-27 1985-09-12 Canon Electronics Inc Method for developing resist
JPS6238457A (en) * 1985-08-14 1987-02-19 Asahi Chem Ind Co Ltd Method for developing resist
JPS62195194A (en) * 1986-02-21 1987-08-27 Hitachi Ltd Development apparatus
JPS62280751A (en) * 1986-05-30 1987-12-05 Hitachi Condenser Co Ltd Developing method for printed wiring board
JPS62293796A (en) * 1986-06-13 1987-12-21 Hitachi Condenser Method and apparatus for developing printed wiring board
JPS63163357A (en) * 1986-12-25 1988-07-06 Toray Ind Inc Method for developing waterless lithographic printing plate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0420051U (en) * 1990-06-11 1992-02-19

Similar Documents

Publication Publication Date Title
JPH02106757A (en) Method for development processing of color filter
JPH02118662A (en) Developing processing method
JPS57136646A (en) Positive type photoresist developing method
JPH03146954A (en) Resist pattern forming method
JPH0284656A (en) Pattern forming method
JPS635530A (en) Dry etching
JPH0498260A (en) Image forming method
JPH0214569A (en) Manufacture of color sensor
JPS63143819A (en) Manufacture of semiconductor device
JPH02125263A (en) Pattern forming method
JPS5546460A (en) Manufacturing method of color image receiving tube
JPH0241329A (en) Production of thin film for pellicle
JPS63288020A (en) Formation of electrode
JPH0430969A (en) Manufacture of mask for blast engraving
JPH01302354A (en) Developing method
JPH03190216A (en) Exposure of resist
JPH036014A (en) Resist coating substrate having exposed region; method and apparatus for its manufacture
JPS60173713A (en) Surface leveling method of substrate with thin film pattern
JPH03251464A (en) Formation of glaze having paratial projection
JPS56166391A (en) Production of length rule provided with black scale on golden surface
JPS6273744A (en) Forming method for metal wiring pattern
JPH02108056A (en) Production of semiconductor device
JPH01293635A (en) Formation of resist pattern for plating bump
JPH0441685A (en) Method for etching stainless steel coated with hard ceramic film
JPS62114225A (en) Resist developing device