JPH02104963U - - Google Patents

Info

Publication number
JPH02104963U
JPH02104963U JP1198989U JP1198989U JPH02104963U JP H02104963 U JPH02104963 U JP H02104963U JP 1198989 U JP1198989 U JP 1198989U JP 1198989 U JP1198989 U JP 1198989U JP H02104963 U JPH02104963 U JP H02104963U
Authority
JP
Japan
Prior art keywords
polishing
wafer
liquid supply
utility
registration request
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1198989U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1198989U priority Critical patent/JPH02104963U/ja
Publication of JPH02104963U publication Critical patent/JPH02104963U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例を示す部分断面図、
第2図は第1図のポリシングプレートの平面図、
第3図は本考案の実施例2におけるポリシングプ
レートを示す半断面図、第4図は従来の半導体ウ
エハポリシング装置を示す側面図、第5図は第4
図のポリシングプレートの平面図である。 1……Si単結晶ウエハ、2……チヤツクテー
ブル、3……スピンドル、4……ポリシングプレ
ート、5……ポリシングパツト、6……供給路、
7……ポリシユ液供給口、8……V溝。
FIG. 1 is a partial sectional view showing an embodiment of the present invention;
Figure 2 is a plan view of the polishing plate in Figure 1;
FIG. 3 is a half-sectional view showing a polishing plate in Example 2 of the present invention, FIG. 4 is a side view showing a conventional semiconductor wafer polishing apparatus, and FIG.
FIG. 3 is a plan view of the polishing plate shown in the figure. DESCRIPTION OF SYMBOLS 1... Si single crystal wafer, 2... Chack table, 3... Spindle, 4... Polishing plate, 5... Polishing pad, 6... Supply path,
7...Polish liquid supply port, 8...V groove.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 複数のチヤツクテーブルに装着した各ウエハを
ポリシユする半導体ウエハポリシング装置におい
て、ポリシングプレートに複数のポリシユ液供給
口をウエハ径範囲内に散在させて設けたことを特
徴とする半導体ウエハポリシング装置。
A semiconductor wafer polishing apparatus for polishing each wafer mounted on a plurality of chuck tables, characterized in that a polishing plate is provided with a plurality of polishing liquid supply ports scattered within a wafer diameter range.
JP1198989U 1989-02-03 1989-02-03 Pending JPH02104963U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1198989U JPH02104963U (en) 1989-02-03 1989-02-03

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1198989U JPH02104963U (en) 1989-02-03 1989-02-03

Publications (1)

Publication Number Publication Date
JPH02104963U true JPH02104963U (en) 1990-08-21

Family

ID=31221029

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1198989U Pending JPH02104963U (en) 1989-02-03 1989-02-03

Country Status (1)

Country Link
JP (1) JPH02104963U (en)

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