JPH02102722U - - Google Patents
Info
- Publication number
- JPH02102722U JPH02102722U JP1053489U JP1053489U JPH02102722U JP H02102722 U JPH02102722 U JP H02102722U JP 1053489 U JP1053489 U JP 1053489U JP 1053489 U JP1053489 U JP 1053489U JP H02102722 U JPH02102722 U JP H02102722U
- Authority
- JP
- Japan
- Prior art keywords
- frequency electrode
- flat high
- electrode
- substrate support
- plasma cvd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1053489U JPH02102722U (en:Method) | 1989-01-31 | 1989-01-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1053489U JPH02102722U (en:Method) | 1989-01-31 | 1989-01-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02102722U true JPH02102722U (en:Method) | 1990-08-15 |
Family
ID=31218281
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1053489U Pending JPH02102722U (en:Method) | 1989-01-31 | 1989-01-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02102722U (en:Method) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005158982A (ja) * | 2003-11-26 | 2005-06-16 | Kaneka Corp | Ｃｖｄ装置 |
-
1989
- 1989-01-31 JP JP1053489U patent/JPH02102722U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005158982A (ja) * | 2003-11-26 | 2005-06-16 | Kaneka Corp | Ｃｖｄ装置 |