JPH0198668A - Resin composition - Google Patents

Resin composition

Info

Publication number
JPH0198668A
JPH0198668A JP62257524A JP25752487A JPH0198668A JP H0198668 A JPH0198668 A JP H0198668A JP 62257524 A JP62257524 A JP 62257524A JP 25752487 A JP25752487 A JP 25752487A JP H0198668 A JPH0198668 A JP H0198668A
Authority
JP
Japan
Prior art keywords
resin composition
corrosion inhibitor
corrosion
electrode
inorganic powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62257524A
Other languages
Japanese (ja)
Inventor
Hideji Kuwajima
秀次 桑島
Naoki Nakano
中野 直記
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP62257524A priority Critical patent/JPH0198668A/en
Publication of JPH0198668A publication Critical patent/JPH0198668A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)

Abstract

PURPOSE:To obtain a resin composition which can give a cracking-resistant protective film useful for protecting electrodes, circuits, etc. formed on the surfaces of wiring boards, electronic components, etc., by adding a specified amount of an inorganic powder treated with a corrosion inhibitor to a resin composition. CONSTITUTION:A thermoplastic resin (A) such as an epoxy, polyimide, silicone, unsaturated polyester or phenolic resin is mixed with ordinary additives (B) such as a curing agent, a cure accelerator and a flexibilizer and 5-60wt.%, based on the total composition, corrosion inhibitor-treated inorganic powder (C) obtained by immersing a high-conductivity inorganic powder (a) comprising BN, AlN, Al2O3, MgO, diamond or the like, of a particle diameter of 0.1-20mu in a solution of a corrosion inhibitor (b) such as benzotriazole, benzimidazole, thiourea or triazine.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は配線板、電子部品等の表面に形成された電極9
回路等を保護するための樹脂組成物に関する。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to an electrode 9 formed on the surface of a wiring board, electronic component, etc.
This invention relates to a resin composition for protecting circuits and the like.

(従来の技術) 従来、配線板、電子部品等の表面には、電導性が良好で
あるという利点から、銅、銀等の金属を用いて電極9回
路等が形成されている。
(Prior Art) Conventionally, nine electrode circuits and the like have been formed on the surfaces of wiring boards, electronic components, etc. using metals such as copper and silver because of their good electrical conductivity.

これらの電極1回路等は1通常表面が露出した状態にな
っている。このため水分などKより電極。
The surface of each of these electrode circuits is usually exposed. Therefore, the electrode is more sensitive to water than K.

回路等が腐食するという欠点が生じる。This has the disadvantage that circuits etc. are corroded.

上記の欠点を解消するために樹脂組成物による保護皮膜
の形成が一般に行なわれている。
In order to eliminate the above-mentioned drawbacks, a protective film is generally formed using a resin composition.

これらの樹脂組成物としては、金属表面技術vo124
. Nap、 396〜401頁(1973)。
These resin compositions include metal surface technology vol.
.. Nap, pp. 396-401 (1973).

防食技術vol!27.1la12. 661〜670
頁(1978)、 コロージョンーエヌエイシーイ−(
corrosion−NACE) vo/38. Ma
l、  60〜62頁(1982)、コロージ日ンーエ
ヌエイシーイ−(corrosion−NACE ) 
vol!32. k8゜339〜341頁(1976)
等に示されるベンゾトリアゾール、ベンゾチアゾール等
のような含窒素、含硫黄化合物などの腐食防止剤を含有
した樹脂組成物が知られている。
Corrosion prevention technology vol! 27.1la12. 661-670
(1978), Corrosion NAC (
corrosion-NACE) vo/38. Ma
1, pp. 60-62 (1982), Corrosion-NACE
vol! 32. k8゜pages 339-341 (1976)
Resin compositions containing corrosion inhibitors such as nitrogen-containing and sulfur-containing compounds such as benzotriazole and benzothiazole are known.

(発明が解決しようとする問題点) 上記に示す樹脂組成物を用いれば、電極9回路等の腐食
、電食などは改善される。しかし腐食防止剤が親水性の
場合、腐食防止剤を樹脂組成物中に均一に分散させるこ
とは困難である。またこれらの樹脂組成物の熱伝導率は
、金属、酸化アルミニウム、窒化アルミニウム、窒化ホ
ウ素等に比較して1710〜1/1,000低く 0.
1〜0.3 W/m−K(0,09〜0.2 ’IKc
al/ h−m−℃)であり、さらに線膨張係数は金属
に比較して2〜3倍高く5〜10XIO−17”e位で
ある。
(Problems to be Solved by the Invention) If the resin composition shown above is used, corrosion, electrolytic corrosion, etc. of the nine electrode circuits etc. can be improved. However, when the corrosion inhibitor is hydrophilic, it is difficult to uniformly disperse the corrosion inhibitor in the resin composition. Furthermore, the thermal conductivity of these resin compositions is 1710 to 1/1,000 lower than that of metals, aluminum oxide, aluminum nitride, boron nitride, etc.
1~0.3 W/m-K (0,09~0.2'IKc
al/hm-°C), and the coefficient of linear expansion is 2 to 3 times higher than that of metals, on the order of 5 to 10XIO-17"e.

このように従来の樹脂組成物は、熱伝導率が低く、i膨
張係数が大きいため、電極2回路等を被覆した場合、熱
衝撃試験において、被覆した樹脂組成物にクラックが発
生するなどの欠点がある。
As described above, conventional resin compositions have low thermal conductivity and large i-expansion coefficients, so when covering two electrode circuits, etc., there are drawbacks such as cracks occurring in the coated resin composition in a thermal shock test. There is.

本発明は上記の欠点のない樹脂組成物を提供することを
目的とするものである。
The object of the present invention is to provide a resin composition that does not have the above-mentioned drawbacks.

(問題点を解決するための手段) 本発明は全組成物中に腐食防止剤処理した無機粉を5〜
60′M量チ含有してなる樹脂組成物に関する。
(Means for Solving the Problems) The present invention includes 5 to 50% of inorganic powder treated with a corrosion inhibitor in the entire composition.
The present invention relates to a resin composition containing 60'M amount.

本発明において、腐食防止剤としては特に制限はないが
、ベンゾトリアゾール、ナフトールトリアゾール、トル
トライアゾール、2−メルカプトキサゾールチオール、
メチルベンゾチアゾール。
In the present invention, the corrosion inhibitor is not particularly limited, but includes benzotriazole, naphtholtriazole, tolutriazole, 2-mercaptoxazolethiol,
Methylbenzothiazole.

メルカプトチアゾリン、ジチオカルバミン酸、チオ尿素
、チオアセトアミド、チオセミカルバジド。
Mercaptothiazoline, dithiocarbamic acid, thiourea, thioacetamide, thiosemicarbazide.

チオフェノール、p−チオクレゾール、チオベンゾイン
酸、トルイジン、インダゾール、インドール、2−ピコ
リン、26−ルチジン、m−アニシジン、p−フェネチ
ジン、ニトロフェニルヒドラジン、ニトロソフェノール
、λ4−ジニトロフェニルヒドラジン、トリアジン、ジ
アミノトリアジン、トリヒドロヤシトリアジン、3−ア
ミノ−1゜2.4−)リアジン、6−アザ−2−チオチ
ミン等が用いられる。
Thiophenol, p-thiocresol, thiobenzoic acid, toluidine, indazole, indole, 2-picoline, 26-lutidine, m-anisidine, p-phenetidine, nitrophenylhydrazine, nitrosophenol, λ4-dinitrophenylhydrazine, triazine, diamino Triazine, trihydroactriazine, 3-amino-1°2.4-)riazine, 6-aza-2-thiothymine, etc. are used.

無機粉と七ては;特に制限はないが、熱伝導率の高い粉
を用いることが好ましく9例えばダイヤモンド粉、BN
粉、 A/N粉、 A/*Os粉、 MgO粉等、その
粒径は0.1〜20μm程度のものを用いることが好ま
しい。
The inorganic powder is not particularly limited, but it is preferable to use a powder with high thermal conductivity.9 For example, diamond powder, BN
It is preferable to use powder, A/N powder, A/*Os powder, MgO powder, etc., with a particle size of about 0.1 to 20 μm.

樹脂としては、特に制限はないが9例えばエポキシ樹脂
、ポリイミド樹脂、シリコーン樹脂、不飽和ポリエステ
ル樹脂、フェノール樹脂等の熱硬化性樹脂が、その硬化
剤、硬化促進剤、可とう仕付与剤などと共に用いられ、
また上記の他に飽和ポリエステル樹脂組成物などの熱可
塑性樹脂組成物を用いても差し支えはない。
There are no particular restrictions on the resin, but examples include thermosetting resins such as epoxy resins, polyimide resins, silicone resins, unsaturated polyester resins, and phenolic resins, together with their curing agents, curing accelerators, flexibility agents, etc. used,
In addition to the above, thermoplastic resin compositions such as saturated polyester resin compositions may also be used.

無機粉を腐食防止剤処理する方法については。For information on how to treat inorganic powders with corrosion inhibitors.

特に制限はないが9例えば無機粉を腐食防止剤溶液に浸
漬するととKより得られる。
Although there are no particular limitations, K can be obtained, for example, by immersing inorganic powder in a corrosion inhibitor solution.

腐食防止剤処理した無機粉は、全組成物中に5〜60重
量−含有することが必要とされ、5重量−未満であると
電極1回路等の腐食、電食などの改善効果が少なく、ま
た60電tチを越えると樹脂組成物の接着力が弱・くな
るという欠点が生じる。
It is necessary that the inorganic powder treated with a corrosion inhibitor be contained in the total composition in an amount of 5 to 60% by weight, and if it is less than 5% by weight, the effect of improving corrosion of the electrode circuit, etc., electrolytic corrosion, etc. will be small; Moreover, if the adhesive strength exceeds 60 volts, the adhesive strength of the resin composition becomes weak.

(実施例) 以下本発明の詳細な説明する。(Example) The present invention will be explained in detail below.

実施例1 粒径が1μm以下の微粉を主成分とするAI!N粉(徳
山曹達株制、Fグレード)を44−ジニトロフェニルヒ
ドラジン(和光紬薬製。試薬)ノ5多水溶液に浸漬し、
ついで乾燥して腐食防止処理A/N粉とした。
Example 1 AI whose main component is fine powder with a particle size of 1 μm or less! N powder (Tokuyama Soda Co., Ltd., F grade) was immersed in 44-dinitrophenylhydrazine (Wako Tsumugi Pharmaceutical Co., Ltd., reagent) No. 5 multi-aqueous solution,
It was then dried to obtain corrosion-inhibited A/N powder.

次にエポキシ樹脂組成物100重量部に対して腐食防止
処理AI!N粉20粉量0重量部して樹脂組成物とした
Next, 100 parts by weight of the epoxy resin composition was treated with corrosion prevention treatment AI! A resin composition was prepared by adding 20 parts by weight of N powder to 0 parts by weight.

なおエポキシ樹脂組成物は、酸無水物硬化剤としてメチ
ルテトラヒドロ無水フタル酸(日立化成工業製、商品名
HN−2200)6(1−1を部に2エチル4メチルイ
ミダゾール0.5 M置部を溶解。
The epoxy resin composition was prepared using methyltetrahydrophthalic anhydride (manufactured by Hitachi Chemical Co., Ltd., trade name HN-2200) as an acid anhydride curing agent. Dissolution.

混合したものと、水添ビスフェノールA型エポキシ樹脂
(旭電化製、商品名BP−4080,エポキシ当量23
5〜255.平均エポキシ当[245)301量物と、
ビスフェノールA型エポキシ樹脂(シェル化学展、商品
名エピコー) 834.エポキシ当量225〜280.
平均エポキシ当量250)70重量部とを均一に混合し
たものを用いた。
The mixture and hydrogenated bisphenol A type epoxy resin (manufactured by Asahi Denka, trade name BP-4080, epoxy equivalent: 23
5-255. Average epoxy weight per [245) 301,
Bisphenol A type epoxy resin (Shell Chemical Exhibition, trade name Epicor) 834. Epoxy equivalent: 225-280.
A uniform mixture of 70 parts by weight (average epoxy equivalent: 250) was used.

一方1寸法が5oxso印、厚さがIMで片面に厚さ3
5μmの銅箔を張抄付けたガラス不織布コンポジット積
層板(新神戸電機製、商品名E−668)の鋼箔面に1
通常公知の方法でエツチング処理゛を行ない、相対向す
る電極間距離0.2mm。
On the other hand, one dimension is marked 5oxso, the thickness is IM, and the thickness is 3 on one side.
1 on the steel foil side of a glass nonwoven composite laminate (manufactured by Shin-Kobe Denki, product name E-668) covered with 5 μm copper foil.
Etching treatment was performed using a commonly known method, and the distance between opposing electrodes was 0.2 mm.

電極の長さ30a+m及び電極の幅0.5 cmで電極
数20対からなるくシ屋電極を作成した。この後くし型
電極上に上記で得た樹脂組成物をスクリーン印刷法によ
り、30μmの厚さに印刷した後。
A kusiya electrode was prepared having an electrode length of 30 a+m and an electrode width of 0.5 cm and consisting of 20 pairs of electrodes. After that, the resin composition obtained above was printed on the comb-shaped electrode to a thickness of 30 μm by a screen printing method.

140℃で40分間硬化させて保護皮膜とした。It was cured at 140° C. for 40 minutes to form a protective film.

次に保護皮膜を形成したくし型電極K100Vのバイア
ス電圧を印加し、65℃、90俤相対湿度(RH)の雰
囲気中に100時間放置した。初期の絶縁抵抗は4 X
 10”Ωであり、100時間後に2X10”Ωに低下
したがほとんど大差なく、またぐし型電極の腐食及びく
し型電極間を倍率40倍の顕微鏡で観察しても電食によ
る銅の樹枝状結晶はみられなかった。
Next, a bias voltage of K100V was applied to the comb-shaped electrode on which the protective film was formed, and the sample was left in an atmosphere of 65° C. and 90° relative humidity (RH) for 100 hours. The initial insulation resistance is 4
The resistance was 10"Ω, and after 100 hours, it decreased to 2X10"Ω, but there was almost no significant difference. Even when the interdigitated electrodes were corroded and the space between the interdigitated electrodes was observed with a microscope at 40x magnification, copper dendrites due to electrolytic corrosion were observed. was not seen.

さらに150℃、5分〜−65℃、5分の液相式熱衝撃
試験(フロリナート中)を100サイクル行なったが保
護皮膜にクラックは発生しなかった。
Further, 100 cycles of a liquid phase thermal shock test (in Fluorinert) from 150°C for 5 minutes to -65°C for 5 minutes were conducted, but no cracks were observed in the protective film.

比較例1 実施例1と同様のエポキシ樹脂組成物100重量部に対
して腐食防止剤処理を施さない実施例1と同様のArN
粉を20ML量部添加して樹脂組成物とした。以下実施
例1と同様の方法でくし型電極に保護皮膜を形成した。
Comparative Example 1 100 parts by weight of the same epoxy resin composition as in Example 1 was treated with ArN as in Example 1 without corrosion inhibitor treatment.
A resin composition was prepared by adding 20 mL of the powder. Thereafter, a protective film was formed on the comb-shaped electrode in the same manner as in Example 1.

次に実施例1と同様にくし型電極に100vのバイアス
電圧を印加し、65℃、90SRHの雰囲気中K100
時間放置した。初期の絶縁抵抗は5X10”であったが
、100時間後K 5 X 10’まで低下し、くシ型
電極の一部に腐食がみられ。
Next, as in Example 1, a bias voltage of 100 V was applied to the interdigitated electrodes, and K100 was applied in an atmosphere of 65° C. and 90 SRH.
I left it for a while. The initial insulation resistance was 5 x 10'', but it decreased to K 5 x 10' after 100 hours, and corrosion was observed in a part of the comb-shaped electrode.

またぐし型電極間を倍率40倍の顕微鏡で観察したとこ
ろ、電食による鋼の樹枝状結晶がみられた。
When the space between the comb-shaped electrodes was observed using a microscope with a magnification of 40 times, steel dendrites due to electrolytic corrosion were observed.

さらに150℃、5分〜−65℃、5分の液相式熱衝撃
試験(フロリナート中)を100サイクル行なつ九とこ
ろ、配線肩部の保護皮膜にクラックが多数発生した。
Furthermore, when a liquid phase thermal shock test (in Fluorinert) was conducted for 100 cycles from 150° C. for 5 minutes to −65° C. for 5 minutes, many cracks occurred in the protective film on the wiring shoulders.

実施例2 平均粒径が1.1μmのアルミナ粉(アルミナ純度99
.54以上)をメルカプトベンゾチアゾール(和光純薬
製、試薬)のlOSアセトン溶液に浸漬し、ついで乾燥
して腐食防止剤処理アルミナ粉1とした。また上記と同
様のアルミナ粉をインダゾール(和光純薬製、試薬)5
チ水溶液(70℃)K浸漬し、ついで乾燥して腐食防止
剤処理アルミナ粉2とした。
Example 2 Alumina powder with an average particle size of 1.1 μm (alumina purity 99
.. 54 or more) was immersed in an lOS acetone solution of mercaptobenzothiazole (manufactured by Wako Pure Chemical Industries, Ltd., reagent) and then dried to obtain corrosion inhibitor-treated alumina powder 1. In addition, the same alumina powder as above was added to Indazole (manufactured by Wako Pure Chemical Industries, Ltd., reagent) 5
The powder was immersed in an aqueous solution (70°C) of K, and then dried to obtain corrosion inhibitor-treated alumina powder 2.

次にエポキシ樹脂組成物100重量部に対して腐食防止
処理アルミナ粉1を40重量部及び腐食防止処理アルミ
ナ粉2を40重量部添加して樹脂組成物とした。
Next, 40 parts by weight of corrosion-inhibited alumina powder 1 and 40 parts by weight of corrosion-inhibited alumina powder 2 were added to 100 parts by weight of the epoxy resin composition to obtain a resin composition.

なお、エポキシ樹脂組成物は、平均エポキシ当量220
のO−クレゾールノボラックエポキシ樹脂80道量部と
平均エポキシ当量475のビスフェノールAエポキシ樹
脂20重量部とを均一に混合したものに、OH尚畳量1
06フェノールノボラック樹脂20.5重量部及びトリ
エチルアミン0.5重量部を添加し、加温、混合して作
製したものを用いた。
The epoxy resin composition has an average epoxy equivalent of 220
To a uniform mixture of 80 parts by weight of O-cresol novolac epoxy resin and 20 parts by weight of bisphenol A epoxy resin having an average epoxy equivalent of 475, 1 part by weight of O-cresol novolak epoxy resin was added.
A mixture prepared by adding 20.5 parts by weight of 06 phenol novolac resin and 0.5 parts by weight of triethylamine, heating and mixing was used.

一方寸法が300X300+maで厚さが0.2 am
の銅板を打抜き加工で、電極間ピッチ4mm、電極長さ
20aoi及び電極幅1mmで電極数12対からなるく
し型電極を作成した。この後金型内に第1図に示すよう
にくし型電極1を電極間距離2をlamsラップする部
分の電極長さ(ラップ長さ)3を15mmK対向させて
載置し、ついで130℃に加温した該樹脂組成物を17
0℃の金型内に注入して電極間を充填すると共に電極の
周囲を被覆して厚さ5an、寸法が60X30mmの直
方体形状の成形物を得た。
On the other hand, the dimensions are 300x300+ma and the thickness is 0.2 am
A comb-shaped electrode consisting of 12 pairs of electrodes with an inter-electrode pitch of 4 mm, an electrode length of 20 aoi, and an electrode width of 1 mm was produced by punching a copper plate. After that, as shown in Fig. 1, the comb-shaped electrodes 1 are placed in a mold so that the electrode length (wrap length) 3 of the part where the inter-electrode distance 2 is wrapped by lams is 15 mmK, and then heated to 130°C. The heated resin composition was heated to 17
The mixture was injected into a mold at 0° C. to fill the spaces between the electrodes and coat the electrodes to obtain a rectangular parallelepiped-shaped molded product with a thickness of 5 ann and dimensions of 60×30 mm.

なお成形物は、170℃、5分で金型から脱歴し、16
5℃で3時間硬化させた。
The molded product was deasphalted from the mold in 5 minutes at 170°C, and
It was cured for 3 hours at 5°C.

成形し九〈シ型電極に500vのバイアス電圧を印加し
、65℃、90SRHの雰囲気中に300時間放置した
。初期の絶縁抵抗は4X1014Ωであり、300時間
後に3X10”Ωまで低下したが、くシ型電極の腐食は
なく、くシ型電極間を倍率40倍の顕微鏡で観察しても
電食による銅の樹枝状結晶はみられなかった。
A bias voltage of 500 V was applied to the shaped electrode, and the product was left in an atmosphere of 65° C. and 90 SRH for 300 hours. The initial insulation resistance was 4 x 1014 Ω, which decreased to 3 x 10” Ω after 300 hours, but there was no corrosion of the comb-shaped electrodes, and even when observing the area between the comb-shaped electrodes with a microscope at 40x magnification, no copper due to electrolytic corrosion was observed. No dendrites were observed.

比較例2 実施例2と同様のエポキシ樹脂組成物100重量部に対
して腐食防止剤処理を施さない実施例1と同様のアルミ
ナ粉を80重量部添加して樹脂組成物とした。以下実施
例2と同様の方法で電極間に樹脂組成物を充填すると共
に電極の周囲を樹脂組成物で被覆して直方体形状の成形
物を得た。硬化条件は実施例2と同様の方法で行なった
Comparative Example 2 To 100 parts by weight of the same epoxy resin composition as in Example 2, 80 parts by weight of the same alumina powder as in Example 1, which was not treated with a corrosion inhibitor, was added to prepare a resin composition. Thereafter, in the same manner as in Example 2, a resin composition was filled between the electrodes and the periphery of the electrodes was covered with the resin composition to obtain a rectangular parallelepiped-shaped molded product. The curing conditions were the same as in Example 2.

成形したくし型電極に500Vのバイアス電圧を印加し
、65℃、90チRHの雰囲気に300時間放置した。
A bias voltage of 500 V was applied to the formed comb-shaped electrode, and the electrode was left in an atmosphere of 65° C. and 90° RH for 300 hours.

初期の絶縁抵抗は3 X 1014であツ&カ、 30
0時間後に1.5X1G”tで低下シ。
The initial insulation resistance is 3 x 1014, 30
After 0 hours, it decreased to 1.5×1G”t.

くし型電極の一部に腐食が与られ、またくし型電極間を
倍率40倍の顕微鏡で観察したところ電食による銅の樹
枝状結晶がみられた。
A portion of the comb-shaped electrodes was corroded, and when the space between the comb-shaped electrodes was observed under a microscope with a magnification of 40 times, copper dendrites due to electrolytic corrosion were observed.

(発明の効果) 本発明になる樹脂組成物は、配線板、電子部品等の表面
に形成されている電極9回路等の腐食。
(Effects of the Invention) The resin composition of the present invention prevents corrosion of nine electrode circuits formed on the surfaces of wiring boards, electronic components, etc.

電食などによる欠点を解消することができ、iたクラッ
クも生ぜず保護皮膜として極めて好適な樹脂組成物であ
る。
It is a resin composition that can eliminate defects caused by electrolytic corrosion, etc., does not cause cracks, and is extremely suitable as a protective film.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、金型内にくし型電極を対向させて載置した状
態を示す平面図である。 符号の説明 1・・・くし型電極    2・・・電極間距離3・・
・ラップする部分の電極長さ 代理人 弁理士 若 林 邦 彦 第1図
FIG. 1 is a plan view showing a state in which interdigitated electrodes are placed facing each other in a mold. Explanation of symbols 1...Comb-shaped electrode 2...Distance between electrodes 3...
・Electrode length of the wrapped part Patent attorney Kunihiko Wakabayashi Figure 1

Claims (1)

【特許請求の範囲】[Claims] 1、全組成物中に腐食防止剤処理した無機粉を5〜60
重量%含有してなる樹脂組成物。
1. 5 to 60% of inorganic powder treated with corrosion inhibitor in the entire composition
A resin composition containing % by weight.
JP62257524A 1987-10-13 1987-10-13 Resin composition Pending JPH0198668A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62257524A JPH0198668A (en) 1987-10-13 1987-10-13 Resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62257524A JPH0198668A (en) 1987-10-13 1987-10-13 Resin composition

Publications (1)

Publication Number Publication Date
JPH0198668A true JPH0198668A (en) 1989-04-17

Family

ID=17307492

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62257524A Pending JPH0198668A (en) 1987-10-13 1987-10-13 Resin composition

Country Status (1)

Country Link
JP (1) JPH0198668A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH026551A (en) * 1988-06-24 1990-01-10 Mitsui Toatsu Chem Inc Phenol resin molding material
JPH0693213A (en) * 1992-09-09 1994-04-05 Tetsuzo Tomioka Rust preventing coating and copper-based glazing coating
KR20040050252A (en) * 2002-12-09 2004-06-16 주식회사 그랜드세라 anti-corrosion coating composition, method of preparing and coating the same
CN102074433A (en) * 2010-11-29 2011-05-25 广西贺州市桂东电子科技有限责任公司 Method for corroding ultrathin electrode foil of high-pressure energy-saving lamp
WO2019013343A1 (en) * 2017-07-14 2019-01-17 富士フイルム株式会社 Surface-modified inorganic nitride, composition, thermally conductive material, device provided with thermally conductive layer

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH026551A (en) * 1988-06-24 1990-01-10 Mitsui Toatsu Chem Inc Phenol resin molding material
JPH0693213A (en) * 1992-09-09 1994-04-05 Tetsuzo Tomioka Rust preventing coating and copper-based glazing coating
KR20040050252A (en) * 2002-12-09 2004-06-16 주식회사 그랜드세라 anti-corrosion coating composition, method of preparing and coating the same
CN102074433A (en) * 2010-11-29 2011-05-25 广西贺州市桂东电子科技有限责任公司 Method for corroding ultrathin electrode foil of high-pressure energy-saving lamp
WO2019013343A1 (en) * 2017-07-14 2019-01-17 富士フイルム株式会社 Surface-modified inorganic nitride, composition, thermally conductive material, device provided with thermally conductive layer
KR20200014813A (en) * 2017-07-14 2020-02-11 후지필름 가부시키가이샤 Surface Modified Inorganic Nitride, Composition, Thermally Conductive Material, Thermally Conductive Device
CN110799454A (en) * 2017-07-14 2020-02-14 富士胶片株式会社 Surface-modified inorganic nitride, composition, heat-conducting material and device with heat-conducting layer
JPWO2019013343A1 (en) * 2017-07-14 2020-04-16 富士フイルム株式会社 Surface modified inorganic nitride, composition, heat conductive material, device with heat conductive layer
CN110799454B (en) * 2017-07-14 2022-12-30 富士胶片株式会社 Surface-modified inorganic nitride, composition, heat-conducting material and device with heat-conducting layer
US11945717B2 (en) 2017-07-14 2024-04-02 Fujifilm Corporation Surface-modified inorganic nitride, composition, thermally conductive material, and device with thermally conductive layer

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