JPH0165135U - - Google Patents

Info

Publication number
JPH0165135U
JPH0165135U JP16150487U JP16150487U JPH0165135U JP H0165135 U JPH0165135 U JP H0165135U JP 16150487 U JP16150487 U JP 16150487U JP 16150487 U JP16150487 U JP 16150487U JP H0165135 U JPH0165135 U JP H0165135U
Authority
JP
Japan
Prior art keywords
bonding pad
metal layer
internal
internal bonding
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16150487U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16150487U priority Critical patent/JPH0165135U/ja
Publication of JPH0165135U publication Critical patent/JPH0165135U/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/0212Auxiliary members for bonding areas, e.g. spacers
    • H01L2224/02122Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body
    • H01L2224/02163Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body on the bonding area
    • H01L2224/02165Reinforcing structures
    • H01L2224/02166Collar structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04042Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05556Shape in side view
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05556Shape in side view
    • H01L2224/05558Shape in side view conformal layer on a patterned surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4845Details of ball bonds
    • H01L2224/48451Shape
    • H01L2224/48453Shape of the interface with the bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の第1の実施例のボンデイング
パツドの断面図、第2図は第1図のボンデイング
パツドの平面図、第3図は第1図のボンデイング
パツドの組立後の断面図、第4図は第2の実施例
の断面図、第5図は従来のボンデイングパツドの
上面図、第6図はこの組立後の断面図である。 1……外部ボンデイングパツド部、2……内部
ボンデイングパツド部、3……カバー膜、4……
絶縁膜、5……引き出し線、6……シリコン基板
、7……カバー膜開口部、8……Auワイヤー、
9……Auボール、10……ボンデイングパツド
、11……封止樹脂、12……拡散層。
Fig. 1 is a sectional view of the bonding pad according to the first embodiment of the present invention, Fig. 2 is a plan view of the bonding pad of Fig. 1, and Fig. 3 is a cross-sectional view of the bonding pad of Fig. 1 after assembly. 4 is a sectional view of the second embodiment, FIG. 5 is a top view of a conventional bonding pad, and FIG. 6 is a sectional view of the conventional bonding pad after assembly. DESCRIPTION OF SYMBOLS 1...External bonding pad part, 2...Internal bonding pad part, 3...Cover film, 4...
Insulating film, 5... Leading wire, 6... Silicon substrate, 7... Cover film opening, 8... Au wire,
9... Au ball, 10... Bonding pad, 11... Sealing resin, 12... Diffusion layer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 金属層から成る内部ボンデイングパツド部と、
この内部ボンデイングパツド部を取り巻いて形成
した金属層から成る外部ボンデイングパツド部か
ら成る2重の構造を有し、かつ引き出し線とのコ
ンタクトを内部ボンデイングパツド部よりとつて
いることを特徴とする集積回路素子のボンデイン
グパツド。
an internal bonding pad portion made of a metal layer;
It has a double structure consisting of an external bonding pad made of a metal layer surrounding this internal bonding pad, and the contact with the lead wire is made from the internal bonding pad. Bonding pads for integrated circuit devices.
JP16150487U 1987-10-21 1987-10-21 Pending JPH0165135U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16150487U JPH0165135U (en) 1987-10-21 1987-10-21

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16150487U JPH0165135U (en) 1987-10-21 1987-10-21

Publications (1)

Publication Number Publication Date
JPH0165135U true JPH0165135U (en) 1989-04-26

Family

ID=31444496

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16150487U Pending JPH0165135U (en) 1987-10-21 1987-10-21

Country Status (1)

Country Link
JP (1) JPH0165135U (en)

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