JPH0165132U - - Google Patents
Info
- Publication number
- JPH0165132U JPH0165132U JP1987159875U JP15987587U JPH0165132U JP H0165132 U JPH0165132 U JP H0165132U JP 1987159875 U JP1987159875 U JP 1987159875U JP 15987587 U JP15987587 U JP 15987587U JP H0165132 U JPH0165132 U JP H0165132U
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- electrodes
- plasma
- discharge
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005684 electric field Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987159875U JPH0165132U (ru) | 1987-10-21 | 1987-10-21 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987159875U JPH0165132U (ru) | 1987-10-21 | 1987-10-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0165132U true JPH0165132U (ru) | 1989-04-26 |
Family
ID=31441459
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1987159875U Pending JPH0165132U (ru) | 1987-10-21 | 1987-10-21 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0165132U (ru) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013149722A (ja) * | 2012-01-18 | 2013-08-01 | Tokyo Electron Ltd | 基板処理装置 |
-
1987
- 1987-10-21 JP JP1987159875U patent/JPH0165132U/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013149722A (ja) * | 2012-01-18 | 2013-08-01 | Tokyo Electron Ltd | 基板処理装置 |
KR20190104436A (ko) * | 2012-01-18 | 2019-09-09 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 방법 |
US10651012B2 (en) | 2012-01-18 | 2020-05-12 | Tokyo Electron Limited | Substrate processing method |
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