JPH01503766A - Gas purification method and device - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed description of the invention] Gas pipes and equipment The present invention is based on gases as clearly indicated in the preamble of claim 1. The present invention relates to a method for removing and purifying solid, liquid and/or gaseous impurities. Also, this The invention implements the method according to the preamble of the main claim of the device invention. Regarding equipment.

The invention can be used, for example, in nuclear power plants, chemical industries or other industrial facilities. accidents resulting in the release of airborne pollutants dangerous to health; or as a passive emergency system that can be activated during interruptions in driving. specifically aimed at doing so.

However, this invention does not apply to normal operating conditions in a plant or manufacturing process, for example. It can also be applied in

This invention passes contaminated gas directly below the liquid level of a liquid tank, and while the gas is passing through the tank, It is based on the concept of purifying the gas. Such devices require special Can be kept permanently for automatic and rapid action without the need for sexualization It is especially suitable as a passive emergency system.

Filter the gas through a number of openings or nozzles below the surface of the liquid bath. Gas purification devices are well known.

However, such known purification devices or structures have low purification effectiveness. example For example, the bubbles passing through the liquid bath are so large that the contact between the liquid and the gas is harmful. may be done. Conversely, if a small bubble is ejected into a liquid, the bubble is It may remain in the open liquid for a long time, which can be handled with -i gas flow. This means that the purifier must be provided with an extremely large surface area so that it can Ru. Such purifiers can be very expensive and wasteful, especially for large gas flows. It's really big in size.

In West German Patent No. 228,733, an incoming gas stream is divided into several sub-streams. and this split flow is directed towards the impingement or impact surface in a fine jet. A purification system has been proposed. However, this system In the latter case, the efficiency is low, which is the disadvantage mentioned above. This is because the gas bubbles passing through the body are relatively large and are relatively unaffected. It is.

U.S. Patent No. 3,216,181 (see Section 4), U.S. Patent No. 3,520,113 ( (see Figure 7) and specification No. 4,182,617 (see Figure 2), Gas enters the liquid bath through multiple openings arranged at progressively increasing depths. Wet purification systems are taught that are introduced below the liquid level.

In use, as the gas flow rate and inlet pressure increase, the inlet gas flows into the liquid in the inlet conduit. The level is forced downward until the first outlet opening is exposed and the gas flows into the liquid. can flow upward through the When the gas flow rate and inlet pressure increase, the liquid level becomes ′ It is then gradually pushed downward, exposing more outflow openings and allowing the gas to flow there. can flow in the form of a partial gas stream. Thus, at least substantially All flow rates are available regardless of inlet pressure and total flow rate through the gas purification system. through the outflow opening used.

One drawback of known gas purification systems of this type is that the liquid level in the inlet conduit When pushed down the mouth, the gas is at a low energy level and pressure drop The point is that it is pushed out into the septic tank without being washed away. Therefore, the gas is relatively large. It flows out in the form of small bubbles and rises through the liquid, separating fine particles and gaseous contaminants. The degree of separation is relatively low. Therefore, known purification systems of this kind can be used, for example, in Attempts to separate highly toxic particles from contaminated gas streams in the event of a nuclear power plant accident As a passive emergency system, it cannot be said to be fully satisfactory.

The purpose of this invention is to eliminate the dark intimate contact between gas and purifying liquid, and the partial load and full load It provides high purification efficiency in both volume and volume, and also provides large capacity with a small device volume. The object of the present invention is to provide an improved gas purification method of the type described above.

Another object of the invention is to provide a gas purification device for carrying out this method. It is in.

These purposes mainly involve the features shown in the characteristic part of claim 1 of the claims. It is realized by the method according to this invention, and also the main claim of the device invention Apparatus for carrying out the method of the invention, having principally the characteristics set forth in the scope of the invention. This is achieved by an array of devices.

According to a particularly advantageous embodiment of the invention, the outflow nozzle has a suction opening into the surrounding liquid reservoir. It has the form of a venturi nozzle with a wall that provides a mouth. This is a separate purification Eliminates the need for a liquid introduction vibrator and allows for constant accumulation of liquid into the Venturi nozzle. Guaranteed extreme supply.

When carrying out the method of this invention and using the apparatus of this invention, the amount of total waste flow rate is High purification efficiency is consistently achieved regardless of the Contaminated gas is below the liquid level. is passed through a first inflow orifice located at progressively increasing depths and then through an outflow orifice located at a height above the corresponding inflow orifice. However, the contaminant gas is It is always passed through the outlet nozzle with a correspondingly significant pressure drop. thus, The gas passing through the last exit orifice utilized also experiences a slight pressure drop; Therefore, it is efficiently purified.

The invention will now be explained in detail with reference to non-limiting exemplary embodiments thereof and the drawings. Ru. Here, the drawings are schematic diagrams and partial views.

FIG. 1 is a schematic vertical cross-sectional view of a gas purification device according to the present invention; Figure 2 shows a portion of the gas purification device of Figure 1 equipped with a venturi nozzle. FIG. 3 is a plan view of the distribution section, FIG. 3 is a side view of the distribution section shown in FIG. 2, and FIG. ．． Figure 3 shows components of another embodiment of the dispensing section shown in Figure 3; FIG. 5 shows two adjacent vents with mutually different inlet depths. A detailed cutaway view of the Turi nozzle, FIG. 6 shows the structure of the Venturi nozzle according to the present invention. Enlarged view showing the components; FIG. 7 is a diagram showing the pressure ratio inside a Venturi nozzle surrounded by liquid; FIG. 8 shows another example having a diffuser placed in front of, or upstream of, the Venturi nozzle. There are figures showing examples.

The drawing shows very diagrammatically a gas purification device according to the invention. Shown in Figure 1 As shown in FIG. It comprises a container, preferably a pressure vessel 1, having a cover 13 with a a distributor 14 for distributing contaminated gases and an outlet 16 for purified gases; It is equipped with The distributor is divided into several parts, in the embodiment shown, from the inlet Six such devices with a radially and horizontally extending dispensing main vibe 18 It has sections. The vibrator 18 has a downwardly extending connecting bar connected thereto. Each connecting vibe 23 has two substantially horizontal portions extending diagonally downward. It has a distributed vibe or side vibe 26. Side Vibe 26 is that freedom At the end there is provided a vibe section 2o extending downward and vertically and having a free opening 22. It is.

Any condensate that forms can flow out through the opening 22, leaving the cleaning or cleaning liquid can rise through the opening into the distributor 14 as the gas flow decreases. distribution vibe 2 6 has an inflow opening 64 facing the distribution vibe 26 in a substantially constant spacing relationship. A plurality of vertical upright venturi nozzles 28 are arranged. Each venturino The nozzle 28 has a cleaning liquid suction opening 29 in its lower part and a purification liquid suction opening 29 in the other part. It has a gas outflow opening 31. The configuration of the Venturi nozzle is explained in detail below. I will clarify.

As shown in the first section, the distributor ] 4 is inserted into the liquid tank 32 and below the liquid level 34 of the tank. It is designed to be lowered to a predetermined depth. Outflow opening of venturi nozzle 28 31 are all at the same level, preferably at least 0.5+n from the tank liquid level, Preferably, they are placed at a distance of 2 m. However, in other embodiments In some cases, it may be advantageous to arrange the outflow opening above the liquid level of the liquid reservoir. place In some cases, the outflow opening may be located close to the cover 13 of the container 1, so that the liquid level 34 is It may be advantageous to locate the outlet 16 in close proximity to the outlet. Venturinos If the venturi nozzle 28 terminates above the liquid level 34, the contaminant gas is directed to each venturi nozzle 2. The inflow opening 64 for passing through the outflow opening 31 or below the liquid level 34 is approximately 1- or placed below it. This height difference allows the contaminating gas to Upon entering the downwardly disposed inlet opening 64, each Venturi nozzle provides satisfactory cleaning. You can always get the same effect. Contaminants or impurities are sucked out via the suction opening 29. This liquid is removed by the gas while passing through the venturi pipe. is entrained in the form of droplets. The liquid droplets with contaminants are then partially As a liquid film on the inner surface of the outflow pipe 49 of the re-nozzle 28 and also in part, the outflow opening 3 1 and the tank liquid level 34, it is extracted from the gas. droplets while passing through the liquid When extracting, a predetermined minimum height difference is required to achieve satisfactory separation. Ru. Further extraction or separation may occur above the liquid level 34 and/or in the downstream section described below. It can be done with a pallet.

circle during the initial stage of release through the gas purifier without any @impact load. To ensure smooth starting conditions, each section is placed in a high position and close to other nodes. Two elevated shorts with venturi nozzles 28' discharging above the nozzle. It is equipped with a side pipe 26'. However, the side via 26' extends downwardly. The pipe section 20' extends to the same height as the other pipe sections 20. The distributor has progressively deeper openings 64 to the venturi device 28. The number of active separators increases continuously with increasing gas flow. is configured to add

A gas space 35 communicating with the outlet 16 is arranged above the liquid level 34 of the liquid tank. There is. This space 35 is an area where the tank volume increases due to the generation of bubbles in the tank during gas passage. and increase in tank volume due to condensate when the contaminated gas is hot and humid. It is dimensioned to absorb the load. Outlet 16 allows liquid remaining in the gas to Communication with the atmosphere through a separator device for separating droplets or atomized droplets are doing. This separator device can be used, for example, in a cyclone or filled with gravel and stones. An appropriate type of room is fine. Additionally, the separator device is a known separator. It may also be a combination of data devices.

The gas purification device is operated as follows. Under no-load conditions, the cleaning liquid It enters through the opening 29.31 of the tube nozzle 28 and the lower opening 22 and is separated. 4 and the internal liquid level 46 in the inflow pipe 12 are at the same height as the external liquid level 34. It has become so. Here, the scum purifying device has an auto-seal function. Ga If there is a turbulence in plant operation where gas is released, the pressure increases and the internal fluid Surface 46 is pushed down and eventually reaches the highest inflow opening of venturi nozzle 28. It reaches below the threshold portion 65 adjacent to 64.

The gas then exits through these venturi nozzles and during its passage through the inlet opening 29 Then, finely atomized liquid droplets are aspirated. Solid, liquid and gaseous pollution Matter is absorbed by liquid droplets that are drawn into the gas stream by suction.

When gas passes between the opening 3 of the venturi nozzle and the tank liquid level 34, In the second separation stage, the gas is further purified by the wash bottle effect, where it , the liquid droplets carrying contaminant 2 dust particles and gaseous impurities are captured by the cleaning liquid. You can receive it. The droplets are already in the pipe 49 in the form of a film on the inner surface of the pipe. It has been extracted as much as possible. Although not shown, the third purification stage includes the aforementioned downstream separation. This is done with a rotator device.

Gas contaminants can be removed by rapidly depleting ions dissolved in the liquid through chemical reactions. It has a substance to ensure that it reacts with the ion, that is, it has a component to ensure that it reacts with the ion. This can be significantly accelerated by using a cleaning solution that (chemical amplification), for example, the extraction of acidic gas components is carried out by washing in which alkaline components have been dissolved. Can be facilitated with liquid. To absorb iodine gas, mix sodium 100sulfate into the cleaning solution. It becomes easier by doing this.

The various sections may have radial partition walls arranged between them. These take the form of radial partition walls 61 to which the ends of the side pipes 26 are attached. . This adds further stability to the 'PA construction. Optionally, such partitions The wall 6] may be hollow and open downward and toward the distribution vibrator 26. stomach. This then functions as a lower inlet opening 22 for the cleaning liquid.

FIG. 4 shows that the distribution pipe, i.e. the side pipe 126, has no intermediate vertical connection pipe 23. shows another embodiment of the invention extending directly from the main pipe 18.

FIG. 8 shows yet another embodiment, in which the main vibrator 18 is tilted. A plurality of upwardly facing vertical pipes each having a substantially horizontal dispensing vibrator 26 extending downwardly and extending substantially horizontally I have an up pipe 24. Venturi nozzle 28 is placed on distribution pipe 26 has been done. Above the outlet opening 31 of the Venturi nozzle 28, a diffuser or A spreader device 30 is arranged. When the spilled debris hits the diffuser, the gas The gas is crushed into small bubbles to facilitate separation of contaminants from the gas as it passes through the liquid bath. let it go up In this embodiment, the contaminated gas exits through the venturi nozzle 28. The internal liquid level 46 of the main vibe 18 is located at the lower opening of the riser pipe 24 so that It is necessary that it be below the threshold edge 65 of 64.

In such embodiments, all nozzles of the same risepipe operate at substantially the same time. Starts operation. The rise pipes 24 of different main vibes 18 are connected to one and the same Rise in pipe rings Not all pipe rings start operating at the same time. The rising re-pipe rings 24 of different main vibes 18 are different from each other so that It is better to place it at a higher height.

A sixth preferred embodiment of a venturi nozzle for a gas purification device according to the present invention is described below. The Venturi nozzle shown in the figure includes an inflow section 4], a tapered compression section 43, and a cylindrical shaft. A funnel 45, a conical enlarged diameter portion 47, and a cover 51 are provided below the cover. A oriented outflow opening 31 is provided. The Venturi nozzle has a screw at its lower end. The nozzle is connected to the upright connecting vibrator 5 on each side vibrator 26. It is designed to be attached to 5. There is a slot between the compression part 43 and the throat 45. An annular groove 57 having a sharp edge 59 facing the groove 45 is arranged. suction opening 29 is designed to discharge into the stream 57, and the liquid flowing into the stream flows into the surrounding area. may be distributed circumferentially.

It is appropriate that the shaft 57 has an axial length of 2 to 4I, and the compression part 43 has a length of 2 to 4I. The facing groove edge 63 has a radius 0.5 to 11111 larger than the radius of the groove edge 59. have The tangent to the wall of the compression section adjacent to the groove edge 63 runs along the outside of the groove edge 59. pass. When the gas passes through the venturi nozzle, liquid is drawn into the stream 57, Upstream of or adjacent to the acute peak 59, it is broken up in the form of fine droplets. gas These liquid droplets trap contaminants inside the throat 45, conical enlargement 47 and It is captured while passing through the upper part 49. Therefore, this device is a self-suction type. It is a venturi separator.

In this invention, at least 0.5 kg, preferably Usually 2-3 kg of liquid, e.g. water, is sucked through the suction opening 29 and The liquid is sent into the water nozzle 30. Therefore, the suction opening 29 and the armature 57 are The dimensions are such that the desired amount of liquid is aspirated at a pressure drop of . each The minimum pressure drop across the Venturi nozzle is between the corresponding lower opening 64 and the outlet opening 3. 1 or the liquid level 34, whichever is lower.

In order to achieve satisfactory purification of the gas, a distance of 1 m or more is required in most cases. A pressure drop in the water column is required to overcome. A pressure drop of about 1.5 m is preferred.

In the illustrated embodiment, the throat has a diameter of 10 m+n and the upper portion 49 It has a diameter of 26 days. To achieve a high degree of purification, the throat diameter should be approximately 30 boxes. It is known that this should not be exceeded.

Figure 7 is a schematic diagram showing the Venturi nozzle and the dependence of pressure on liquid depth. It is a diagram. In this relationship, straight line A represents the hydrostatic pressure of the liquid, and non-straight line B represents the gas flow. It represents the pressure at different parts of the tract. At the converging part 43 of the venturi nozzle The pressure drop fundamentally determines the magnitude of gas flow through the venturi. be attracted The amount of liquid depends, inter alia, on the pressure drop in the venturi downstream of the suction opening 29. As can be seen in Figure 0, when liquid is to be aspirated, the dispensing opening 64 and the suction opening The pressure drop in the gas passage between the port 29 and the hydrostatic pressure drop (height) of the liquid It must also be well beyond the suction opening 29 in the gas passage. The pressure drop must be less than the corresponding hydrostatic pressure drop (height h2) of the liquid reservoir. Increased length of vibe 4 if the venturi is not replaced, not from 3 or above 9 provides more liquid to gas volume, shorter vibes provide less liquid From experience, it has been found that the vibrator 49 has a suction opening 29 that provides Preferably, it has a length equal to or greater than the height of the distribution opening 64, which is located above the distribution opening 64. I know.

The invention is not limited to the embodiments shown, but has been described with reference to the drawings. The scope of the invention is limited by the following claims. can be combined in an appropriate manner within the In addition, venturi structure, venturi device or venturi The term venturi nozzle (28) is used in its broadest sense, i.e. The inflow opening 64 and the outflow opening 31 have means for providing upstream and downstream of the It should be interpreted in the sense of forming a flow path or a gas path between.

1? 72 7B 31 2R’ 18 ;)?　2B' Translation of written amendment submitted Article 184-8 of the Patent Law) March 17, 1986

Claims (1)

[Claims] 1. Gas is passed below the liquid level (34) of the tank (32) containing the cleaning or purifying liquid. , passing the gas upwardly through the vessel in one or more, preferably several sub-streams. to remove gas or gas from solid, liquid and/or gaseous contaminants. In a method for purifying a gas mixture, a venturi device disposed within a liquid reservoir (32) passing the contaminated gas through the venturi device (28), increasing the velocity of the gas through the venturi device. suction of liquid from the liquid reservoir into the flowing gas as a result of the pressure reduction that occurs as the A gas purification method characterized by: 2. The liquid drawn into the Venturi device completely surrounds the gas substream, preferably to enclose and/or to direct the contaminated gas vertically, following division into sub-streams. The gas purifier according to claim 1, characterized in that the gas purifier is caused to flow in a direction or substantially vertically upward. method. At least 1 kg, preferably 2-3 kg of liquid per 3.1 m3 of contaminated gas. Claims characterized in that they are drawn into a venturi device and mixed with a gas. The gas purification method according to item 1 or 2. 4. The distance between the liquid level (34) and the location where the liquid is mixed with the gas (suction opening 29) The last part of the distance, preferably less than half of that distance, is covered by gas passing through the liquid in the form of bubbles. and/or the gas is raised through the inflow orifice (64). The inflow orifice is characterized by a liquid tank (32 ), and more vents can be isolated if the inlet pressure increases. at different depths below the liquid level (34) so that the liquid device (28) is activated; , the outlet orifice (31) of the corresponding Venturi device (28) or the liquid level of the liquid reservoir. (34) below, preferably at a predetermined depth of 1 m or more. The gas purification method according to item 1, 2 or 3. 5. Gas purification for carrying out the method according to any one of claims 1 to 4. a container (32) partially filled with a tank (32) of cleaning or purification liquid; 1) and a plurality of orifices (64) cooperating with the outlet nozzle (28). An inlet (12) for contaminated gas and a flow for clean gas connected to a distribution device (14). In the gas purification device comprising an outlet (16), the liquid level of the liquid tank (32) A suction located below (34) and open toward the liquid reservoir (32) Gas purification device characterized by a venturi device (2S) provided with an opening (29) Place. 6. A suction opening (29) connects the throat (45) and/or the venturi device (28). or in the converging part (43) of said device, preferably at the throat of said device (28). (45) and/or each Venturi device (28) , preferably arranged symmetrically in a plane extending perpendicular to the axis of symmetry of the venturi device. It is characterized by having a plurality of suction openings (29), each of which has a plurality of suction openings (29). The liquid is discharged into an annular groove (57) provided in the inner wall of the tunnel device (28). The annular groove (57) is preferably bounded downstream by a sharp edge (59). Claim 5: wherein the diameter of the sharp edge is smaller than the upstream edge (63) The gas purification device described in . 7. A venturi device (28) is located at the downstream end of the pad having an outflow opening 31. a vertical distance from the outflow opening (31) to the suction opening (29). Separately, the suction opening (29) and the corresponding inlet orifice (64) of the dispensing device (14) and/or the venturi device (28) is A corresponding outflow orifice (31) or liquid reservoir that can be isolated by a reservoir (32) located at least 1 m, preferably 1.5 m below the liquid level. Claim 5 or 6, characterized in that is the gas purification device according to item 6. 8. The pipe (49) disposed at the downstream end is axially covered with a cover (51). The outlet orifice (31) is arranged in the cylindrical surface of the pipe (49) and Claim 4, characterized in that the tap (49) is arranged vertically or substantially vertically. The gas purification device according to item 7. 9. The throat (45) of each venturi device (28) is 30 mm, preferably 15 mm. mm, and the length of the throat must be 1 to 7 times the diameter. The gas purification device according to any one of claims 5 to 8, characterized by: 10. The outlet orifice (31) is located below the liquid level (34) of the tank (32) and/or is arranged above, any one of claims 1 to 9. The gas purification device described in .