CN112169541B - Tail gas processing apparatus is used in photoinitiator production - Google Patents

Tail gas processing apparatus is used in photoinitiator production Download PDF

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Publication number
CN112169541B
CN112169541B CN202011009269.8A CN202011009269A CN112169541B CN 112169541 B CN112169541 B CN 112169541B CN 202011009269 A CN202011009269 A CN 202011009269A CN 112169541 B CN112169541 B CN 112169541B
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cavity
communicated
pipe
partition plate
tail gas
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CN112169541A (en
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王凤华
程乾华
张仁燧
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Huaihua Hengyu New Material Co ltd
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Huaihua Hengyu New Material Co ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18—Absorbing units; Liquid distributors therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D50/00—Combinations of methods or devices for separating particles from gases or vapours
    • B01D50/60—Combinations of devices covered by groups B01D46/00 and B01D47/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/343—Heat recovery
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/38—Removing components of undefined structure
    • B01D53/40—Acidic components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Treating Waste Gases (AREA)

Abstract

The invention provides a tail gas treatment device for photoinitiator production, which comprises an absorption kettle, a heat dissipation assembly and a filtering and settling assembly, wherein the absorption kettle is provided with an accommodating space, three partition plates are arranged in the accommodating space at parallel intervals, the accommodating space is divided by the three partition plates to form a washing cavity, a heat exchange cavity, an atomization cavity and a drying cavity which are sequentially communicated, water is filled in the washing cavity and the heat exchange cavity, a tail gas inlet pipe extends into the bottom of the washing cavity, a tail gas outlet pipe is communicated with the drying cavity, the heat dissipation assembly comprises a heat dissipation assembly, a first water drainage pipe and a first introducing pipe are communicated, the first water drainage pipe is arranged at the bottom of the heat exchange cavity and is communicated with the heat exchange cavity, and the first introducing pipe is communicated with the washing cavity; the filtering and settling assembly comprises a second water discharge pipe and a second introducing pipe which are communicated, the second water discharge pipe is arranged at the bottom of the washing cavity and is communicated with the washing cavity, and the second introducing pipe is communicated with the heat exchange cavity. The tail gas treatment device for photoinitiator production provided by the invention has a good absorption effect.

Description

Tail gas processing apparatus is used in photoinitiator production
Technical Field
The invention relates to the technical field of photoinitiators, and particularly relates to a tail gas treatment device for photoinitiator production.
Background
Waste water, tail gas and waste residues are generated in the chemical production process, a large amount of manpower and material resources are needed for treating the byproducts, the working time is prolonged, the production cost is increased, and secondary pollution is caused to the environment, so that the problem of treating the three wastes to the maximum extent is mainly solved in the chemical production.
Due to the continuous production of the photoinitiator, a large amount of tail gas is generated in the production process, and if the tail gas is directly discharged, the environment is polluted and the health of workers is harmed, so that the absorption treatment of the tail gas is not slow.
Therefore, there is a need to provide a new tail gas treatment device for photoinitiator production to solve the above problems.
Disclosure of Invention
The invention aims to overcome the technical problems and provide a tail gas treatment device for photoinitiator production to treat tail gas.
In order to achieve the purpose, the invention provides a tail gas treatment device for photoinitiator production, which comprises an absorption kettle, a heat dissipation assembly and a filtering and settling assembly, wherein the absorption kettle is provided with an accommodating space, three partition plates are arranged in the accommodating space in parallel at intervals, the accommodating space is divided by the three partition plates to form a washing cavity, a heat exchange cavity, an atomization cavity and a drying cavity which are sequentially communicated, water is filled in the washing cavity and the heat exchange cavity, a tail gas inlet pipe extends into the bottom of the washing cavity, a tail gas outlet pipe is communicated with the drying cavity, the heat dissipation assembly comprises a first water drainage pipe and a first lead-in pipe, the first water drainage pipe is arranged at the bottom of the heat exchange cavity and is communicated with the heat exchange cavity, and the first lead-in pipe is communicated with the washing cavity; the filtering and settling assembly comprises a second water discharge pipe and a second introducing pipe which are communicated, the second water discharge pipe is arranged at the bottom of the washing cavity and communicated with the washing cavity, and the second introducing pipe is communicated with the heat exchange cavity.
Preferably, the partition plates comprise a first partition plate, a second partition plate and a third partition plate which are sequentially arranged in parallel at intervals, the heat exchange cavity is arranged between the first partition plate and the second partition plate, the atomization cavity is arranged between the second partition plate and the third partition plate, the bottom of the first partition plate is fixedly connected with the absorption kettle, a first gap is formed between the top of the first partition plate and the absorption kettle at an interval, and the first gap is communicated with the washing cavity and the heat exchange cavity; the bottom of the second partition plate is fixedly connected with the absorption kettle, a second gap is formed between the top of the second partition plate and the absorption kettle at intervals, and the second gap is communicated with the heat exchange cavity and the atomization cavity; the top of the third partition plate is fixedly connected with the absorption kettle, a third gap is formed between the bottom of the third partition plate and the absorption kettle at intervals, and the third gap is communicated with the atomizing cavity and the drying cavity.
Preferably, the first partition plate is made of a heat conduction material, the height of the first partition plate is lower than that of the second partition plate, the water level in the water washing cavity is the same as that of the first partition plate, and the water level in the heat exchange cavity is lower than that in the water washing cavity.
Preferably, be equipped with atomizing subassembly in the atomizing intracavity, atomizing subassembly include with two splint, the clamp that absorption cauldron fixed connection and parallel interval set up are located supersound piece between the splint and with the feed liquor pipe that the supersound piece is connected, the inside of supersound piece is equipped with the cavity, the relative both sides of supersound piece are equipped with first micropore and second micropore respectively, first micropore with the second micropore all with the cavity intercommunication, the feed liquor pipe with the cavity intercommunication, be used for to supply water in the cavity, the vibration of supersound piece atomizes water.
Preferably, the pore size of the second micropores is smaller than the pore size of the first micropores.
Preferably, the number of the atomization assemblies is two, and the second micropores of the two ultrasonic sheets are arranged oppositely.
Preferably, a plurality of drying layers are arranged in the drying cavity, the drying layers are sequentially spaced in parallel from top to bottom, and the drying agent in each drying layer is an alkaline drying agent.
Preferably, the radiating assembly further comprises a radiating pipe and a first pump body, the first drainage pipe, the radiating pipe, the first pump body and the first introducing pipe are sequentially communicated, and the radiating pipe is bent in a shape of a square circle.
Preferably, the pipe diameter of first drain pipe is greater than the pipe diameter of cooling tube, first drain pipe with connect through big end and small end between the cooling tube.
Preferably, the filtration and sedimentation assembly further comprises a filtration and sedimentation tank and a second pump body, and the second drain pipe, the filtration and sedimentation tank, the second pump body and the second inlet pipe are communicated in sequence.
Compared with the prior art, in the tail gas treatment device for photoinitiator production, provided by the invention, the absorption kettle, the heat dissipation assembly and the filtering and settling assembly are matched, and the tail gas is sequentially treated by the water washing cavity, the heat exchange cavity, the atomizing cavity and the drying cavity, so that the absorption and separation of harmful gases in the tail gas are realized, and a better separation effect is achieved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments are briefly introduced below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without inventive efforts, wherein:
FIG. 1 is a schematic structural diagram of a tail gas treatment device for photoinitiator production provided by the invention;
FIG. 2 is a schematic view of the structure of the absorption tank shown in FIG. 1;
fig. 3 is a schematic structural view of the ultrasonic sheet shown in fig. 1.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-3, the present invention provides a tail gas treatment apparatus 100 for photoinitiator production, including an absorption kettle 10, a heat dissipation assembly 20, and a filter settling assembly 30.
The absorption kettle 10 is of a horizontal tank structure, an accommodating space is formed in the absorption kettle, three partition plates 11 are arranged in the accommodating space in parallel at intervals, and the three partition plates 11 are sequentially arranged from left to right. The three partition plates 11 divide the accommodating space into a water washing cavity 12, a heat exchange cavity 13, an atomizing cavity 14 and a drying cavity 15 which are communicated in sequence. The washing cavity 12 and the heat exchange cavity 13 are filled with water, the tail gas inlet pipe 200 extends into the bottom of the washing cavity 12, and the tail gas outlet pipe 300 is communicated with the drying cavity 15. Tail gas enters the absorption kettle 10 from the tail gas inlet pipe 200 and is absorbed through the water washing cavity 12, the heat exchange cavity 13, the atomizing cavity 14 and the drying cavity 15 in sequence, the treated tail gas is discharged from the tail gas storage tank 300, and the discharged tail gas can enter a secondary treatment device for reprocessing or can be directly discharged into the atmosphere.
The partition plate 11 comprises a first partition plate 111, a second partition plate 112 and a third partition plate 113 which are sequentially arranged in parallel at intervals, wherein the heat exchange cavity 13 is arranged between the first partition plate 111 and the second partition plate 112; the atomizing chamber 14 is disposed between the second partition 112 and the third partition 113. The bottom of the first partition 111 is fixedly connected with the absorption kettle 10, a first gap 1110 is formed between the top of the first partition and the absorption kettle 10 at an interval, and the first gap 1110 is communicated with the water washing cavity 12 and the heat exchange cavity 13; the bottom 112 of the second partition plate is fixedly connected with the absorption kettle 10, a second gap 1120 is formed between the top of the second partition plate and the absorption kettle 10 at a spacing, and the second gap 1120 is communicated with the heat exchange cavity 13 and the atomization cavity 14; the top of the third partition 113 is fixedly connected with the absorption kettle 10, a third gap 1130 is formed between the bottom of the third partition and the absorption kettle 10 at an interval, and the third gap 1130 communicates the atomization cavity 14 and the drying cavity 15.
In the preparation and production process of the photoinitiator, harmful gas in tail gas is mainly hydrogen chloride, the hydrogen chloride is colorless and has irritant odor, and is very soluble in water, and 1 volume of water can dissolve about 500 volumes of hydrogen chloride at 0 ℃. The tail gas inlet pipe 200 is directly introduced into the bottom of the water washing cavity 12, so that hydrogen chloride can be fully dissolved in water, and in the tail gas, a very small amount of non-gaseous substances such as solid particles, gel particles and the like are contained, and the particle residues in the tail gas can be effectively removed by adopting a water washing mode; simultaneously, water in the washing chamber 12 can also absorb the heat that carries in the tail gas, because water has great specific heat capacity, risees the same temperature, and the heat that water absorbed is more, can effectively play the cooling effect to tail gas. It should be noted that, on the tail gas intake pipe 200, a check valve needs to be arranged, so as to avoid that the pressure in the tail gas intake pipe 200 is reduced after the hydrogen chloride is dissolved, thereby causing liquid backflow. The tail gas after being washed by the water washing chamber 12 enters the heat exchange chamber 13 from the first gap 1110.
The water level in the washing cavity 12 is the same as the height of the first partition 111, that is, the water level is flush with the top of the first partition 111; due to the introduction of gas, bubbles are generated in the water washing cavity 12, so that the liquid level in the water washing cavity 12 rises, overflows from the first partition plate 111 and enters the heat exchange cavity 13, and the water level in the heat exchange cavity 13 is lower than the water level in the water washing cavity 12.
The first partition plate 111 is made of a heat conducting material, and can conduct heat in the water washing cavity 12 to the heat exchange cavity 13 to realize heat exchange; meanwhile, through the overflow process, high-temperature water overflows into the heat exchange cavity 13, and heat can be conducted to the heat exchange cavity 13. The height of the first partition 111 is lower than that of the second partition 112, so that the second partition 112 can have a good blocking effect, and splash can be prevented from splashing into the atomizing chamber 14 in the overflow process. The exhaust gas further enters the atomization chamber 14 through the second gap 1120.
An atomization assembly 141 is arranged in the atomization cavity 14, and the atomization assembly 141 includes two clamping plates 1411 fixedly connected with the absorption kettle 10 and arranged in parallel at intervals, an ultrasonic sheet 1412 clamped between the clamping plates 1411, and a liquid inlet pipe 1413 connected with the ultrasonic sheet 1412.
The inside of the ultrasonic sheet 1412 is provided with a cavity 1414, two opposite sides of the ultrasonic sheet 1412 are respectively provided with a first micropore 1415 and a second micropore 1416, the first micropore 1415 and the second micropore 1416 are both communicated with the cavity 1414, the pore diameter of the second micropore 1416 is smaller than that of the first micropore 1415, the liquid inlet pipe 1413 is communicated with the cavity 1414 and is used for supplying water into the cavity 1414, and the ultrasonic sheet 1412 vibrates to atomize the water.
The number of the atomizing assemblies 141 is two, and the second micropores 1416 of the two ultrasonic sheets are arranged opposite to each other. The direction of the airflow is: the ultrasonic plate enters from the first micropore of the left ultrasonic plate, and the second micropore is discharged; then enters the second micropores of the right ultrasonic sheet and is discharged from the first micropores, and because the pore diameter of the second micropores is smaller than that of the first micropores, the air flow speed in the second micropores is higher, so that the water mist can be promoted to be rapidly discharged from the second micropores of the left ultrasonic sheet.
The ultrasonic sheets 1412 are communicated with an external power supply, the ultrasonic sheets 1412 vibrate at high frequency after being electrified to atomize water to form foggy water mist, the foggy water mist is suspended in the atomizing cavity 14, the first micropores 1415 of the two ultrasonic sheets 1412 are arranged just opposite to each other, so that the water mist content between the two ultrasonic sheets 1412 is high, a compact atomizing area is formed, partial hydrogen chloride gas which is not completely absorbed can still escape from the tail gas after being washed by the washing cavity 12, the tail gas enters the atomizing area from the first micropores of the ultrasonic sheet on the left side, and the small liquid of the hydrogen chloride solution is formed through secondary absorption of the water mist, is separated from the tail gas, is continuously conveyed forwards along with the air flow, and enters the drying cavity 15 through the first micropores and the third gaps 1130 of the ultrasonic sheets on the right side.
It can be understood that the water in the atomizing cavity 14 is in a fog shape, so that the contact area between the water and the tail gas is increased, and the absorption efficiency is greatly improved; the second gap 1120 is located at the top of the absorption kettle 10, and the third gap 1130 is located at the bottom of the absorption kettle 10, so that the formation path of the tail gas is extended, the circulation time of the tail gas in the atomization cavity 14 is increased, and the absorption efficiency can also be improved.
By reasonably adjusting the flow rate of water in the liquid inlet pipe 1413 and the vibration frequency of the ultrasonic sheet 1412, water conveyed by the liquid inlet pipe 1413 can be completely atomized to form water mist, so that the water is prevented from being gathered in the cavity 1414 and affecting the vibration of the ultrasonic sheet 1412. Preferably, the water outlet of the liquid inlet pipe 1413 abuts against the ultrasonic sheet 1412, so that a good atomization effect can be ensured.
Radiator unit 20 is including the first calandria 21, cooling tube 22, the first pump body 23 and the first inlet tube 24 that communicate in proper order, first calandria 21 set up in heat transfer chamber 13 bottom and with heat transfer chamber 13 intercommunication, first inlet tube 21 with washing chamber 12 intercommunication, the pipe diameter of first calandria 21 is greater than cooling tube 22's pipe diameter, first calandria 21 with connect through reducer 25 between the cooling tube 22, cooling tube 22 is the bending of returning the shape.
The water washing cavity 12 conducts heat to the heat exchange cavity 13 through the first partition plate 111, the water temperature in the heat exchange cavity 13 is increased, water in the heat exchange cavity 13 is discharged through the heat dissipation assembly 20, heat can be taken out and spread to the outside, the water temperature in the heat exchange cavity 13 can be kept at a low level all the time, and continuous heat exchange is achieved. The pipe diameter of the heat dissipation pipe 22 is reduced, so that the speed of water flow in the heat dissipation pipe can be increased, the heat dissipation efficiency is accelerated, and meanwhile, the heat dissipation pipe 22 is of a bent structure in a shape of a Chinese character hui, so that the heat dissipation area is increased, and the heat dissipation efficiency can also be accelerated. The first pump body 23 is used for providing power to drive water flow to move.
The filtering and settling assembly 30 comprises a second drain pipe 31, a filtering and settling tank 32, a second pump body 33 and a second inlet pipe 34 which are sequentially communicated, the second drain pipe 31 is arranged at the bottom of the water washing cavity 12 and communicated with the water washing cavity 12, and the second inlet pipe 31 is communicated with the heat exchange cavity 13. The filtering and settling assembly 30 is used for pumping out the water in the water washing chamber 12 and delivering the water to the filtering and settling tank 32 for filtering and settling so as to separate the particulate matters in the water washing chamber 12 and prevent the particulate matters from settling in the water washing chamber 12. The filtering sedimentation tank 32 may be of a conventional structure in the art, and the present invention is not limited thereto. Further, an alkaline additive may be added to the filter settling tank 32 to react with the hydrogen chloride solution to neutralize acidity. The second pump body 33 provides driving force to pump the upper layer clean water in the filtering sedimentation tank into the water washing cavity 12 again.
The water washing cavity 12, the heat exchange cavity 13, the heat dissipation assembly 20 and the filtering and settling assembly 30 are matched with each other, so that the water is recycled, and heat and solid particle substances can be discharged.
The drying chamber 15 is internally provided with a plurality of drying layers 151, the drying layers 151 are sequentially arranged in parallel from top to bottom at intervals, the drying layers 151 are used for absorbing vaporous hydrogen chloride solution and water mist, discharged gas is dry gas, and preferably, the drying agent in the drying layers 151 can be selected as an alkaline drying agent.
In the present embodiment, only the absorption process of hydrogen chloride is described in detail, and other exhaust gases with low content and water solubility in the exhaust gas can be absorbed and removed by the apparatus for treating the exhaust gas for initiator production provided in the present embodiment. Furthermore, water in the water washing cavity, the heat exchange cavity and the liquid inlet pipe is replaced by other solutions, and the water washing cavity, the heat exchange cavity and the liquid inlet pipe can be used for absorbing other waste gas insoluble in water in a chemical reaction mode.
Compared with the prior art, in the tail gas treatment device for photoinitiator production, provided by the invention, the absorption kettle, the heat dissipation assembly and the filtering and settling assembly are matched, and the tail gas is sequentially treated by the water washing cavity, the heat exchange cavity, the atomizing cavity and the drying cavity, so that the absorption and separation of harmful gases in the tail gas are realized, and a better separation effect is achieved.
While the foregoing is directed to embodiments of the present invention, it will be understood by those skilled in the art that various changes may be made without departing from the spirit and scope of the invention.

Claims (10)

1. A tail gas treatment device for photoinitiator production is characterized by comprising an absorption kettle, a heat dissipation assembly and a filtering and settling assembly, wherein the absorption kettle is provided with an accommodating space, three partition plates are arranged in the accommodating space in parallel at intervals and divide the accommodating space into a washing cavity, a heat exchange cavity, an atomization cavity and a drying cavity which are sequentially communicated, water is filled in the washing cavity and the heat exchange cavity, a tail gas inlet pipe extends into the bottom of the washing cavity, a tail gas outlet pipe is communicated with the drying cavity, the heat dissipation assembly comprises a first water drainage pipe and a first introducing pipe which are communicated, the first water drainage pipe is arranged at the bottom of the heat exchange cavity and is communicated with the heat exchange cavity, and the first introducing pipe is communicated with the washing cavity; the filter settlement assembly comprises a second drain pipe and a second inlet pipe which are communicated, the second drain pipe is arranged at the bottom of the washing cavity and communicated with the washing cavity, the second inlet pipe is communicated with the heat exchange cavity, the partition plate comprises a first partition plate, a second partition plate and a third partition plate which are sequentially arranged at parallel intervals, the first partition plate is made of heat conduction materials, the water level in the washing cavity is the same as the height of the first partition plate, and the water level in the heat exchange cavity is lower than the water level in the washing cavity.
2. The tail gas treatment device for photoinitiator production according to claim 1, wherein the heat exchange cavity is arranged between the first partition plate and the second partition plate, the atomization cavity is arranged between the second partition plate and the third partition plate, the bottom of the first partition plate is fixedly connected with the absorption kettle, the top of the first partition plate is spaced from the absorption kettle to form a first gap, and the first gap is communicated with the water washing cavity and the heat exchange cavity; the bottom of the second partition plate is fixedly connected with the absorption kettle, a second gap is formed between the top of the second partition plate and the absorption kettle at intervals, and the second gap is communicated with the heat exchange cavity and the atomization cavity; the top of the third partition plate is fixedly connected with the absorption kettle, a third gap is formed between the bottom of the third partition plate and the absorption kettle at intervals, and the third gap is communicated with the atomization cavity and the drying cavity.
3. The apparatus for treating off-gas in photoinitiator production according to claim 2, wherein the first partition plate has a height lower than that of the second partition plate.
4. The tail gas treatment device for photoinitiator production according to claim 1, wherein an atomization assembly is arranged in the atomization cavity, the atomization assembly comprises two clamping plates fixedly connected with the absorption kettle and arranged in parallel at intervals, an ultrasonic sheet clamped between the clamping plates, and a liquid inlet pipe connected with the ultrasonic sheet, a cavity is arranged in the ultrasonic sheet, a first micropore and a second micropore are respectively arranged on two opposite sides of the ultrasonic sheet, the first micropore and the second micropore are both communicated with the cavity, the liquid inlet pipe is communicated with the cavity and used for supplying water into the cavity, and the ultrasonic sheet vibrates to atomize water.
5. The apparatus of claim 4, wherein the second micropores have a smaller pore size than the first micropores.
6. The tail gas treatment device for photoinitiator production according to claim 5, wherein the number of the atomization assemblies is two, and the second micropores of the two ultrasonic sheets are arranged opposite to each other.
7. The tail gas treatment device for photoinitiator production according to claim 1, wherein a plurality of drying layers are arranged in the drying cavity, the drying layers are sequentially spaced in parallel from top to bottom, and the drying agent in the drying layers is an alkaline drying agent.
8. The apparatus of claim 1, wherein the heat dissipation assembly further comprises a heat dissipation pipe and a first pump body, the first drainage pipe, the heat dissipation pipe, the first pump body and the first inlet pipe are sequentially connected, and the heat dissipation pipe is bent in a shape of a square.
9. The apparatus as claimed in claim 8, wherein the first drain pipe has a pipe diameter larger than that of the heat pipe, and the first drain pipe and the heat pipe are connected by a reducer.
10. The tail gas treatment device for photoinitiator production according to claim 1, wherein the filtration and sedimentation assembly further comprises a filtration and sedimentation tank and a second pump body, and the second drain pipe, the filtration and sedimentation tank, the second pump body and the second inlet pipe are sequentially communicated.
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Denomination of invention: A kind of tail gas treatment device for photoinitiator production

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