CN211864525U - Waste gas purification treatment device - Google Patents
Waste gas purification treatment device Download PDFInfo
- Publication number
- CN211864525U CN211864525U CN202020321177.2U CN202020321177U CN211864525U CN 211864525 U CN211864525 U CN 211864525U CN 202020321177 U CN202020321177 U CN 202020321177U CN 211864525 U CN211864525 U CN 211864525U
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- Prior art keywords
- chamber
- waste gas
- water
- washing
- fan
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- 239000002912 waste gas Substances 0.000 title claims abstract description 36
- 238000000746 purification Methods 0.000 title claims abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 52
- 238000005406 washing Methods 0.000 claims abstract description 40
- 239000007789 gas Substances 0.000 claims abstract description 17
- 239000007921 spray Substances 0.000 claims abstract description 15
- 239000000945 filler Substances 0.000 claims abstract description 7
- 238000002203 pretreatment Methods 0.000 claims abstract description 7
- 238000000889 atomisation Methods 0.000 claims abstract description 6
- 238000007599 discharging Methods 0.000 claims description 3
- 238000007781 pre-processing Methods 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 10
- 239000007788 liquid Substances 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 2
- 238000005507 spraying Methods 0.000 abstract description 2
- 239000002585 base Substances 0.000 description 8
- 238000004140 cleaning Methods 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000002407 reforming Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Images
Landscapes
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
Abstract
The utility model provides a waste gas purification treatment device, an air inlet is used for accessing waste gas to be treated, the air inlet is communicated with a pretreatment chamber, an atomization spray head is arranged in the pretreatment chamber, a washing chamber is arranged at one side of the pretreatment chamber far away from the air inlet, a filling material is arranged in the washing chamber, and an atomization spray head is also arranged above the washing chamber; the water tank is positioned below the pretreatment chamber and the washing chamber and is connected with the atomizing nozzle through a pipeline; the fan is located the one side of the clean room of keeping away from the pre-treatment chamber, the fan is connected with the blast pipe for the good waste gas of output processing, this patent application connects the air outlet at wafer process equipment, with waste gas through spraying of pre-treatment chamber, the filler of clean room adsorbs, the atomizing sprays, waste gas after spouting the woods takes out the power that the fog grain, thick liquid after through the fan and enters into the blast pipe and discharges after the defroster, simple structure, the treatment cost is lower, can get rid of most acid-base water-soluble gas in the tail gas.
Description
Technical Field
The utility model belongs to the exhaust-gas treatment field especially relates to an exhaust purification processing apparatus.
Background
ECS (exhaust Control System) and a waste gas Control device, wherein the working principle of the waste gas Control device is that waste gas firstly enters the device through 12 independent inlets, then is pretreated through a pretreatment chamber and finally enters a washing chamber, filler is filled in the washing chamber, and a washing liquid atomizing spray head is arranged above the filler, so that the filler has a large specific surface area, and the waste gas and the washing liquid adopt a counter-flow principle, thereby achieving the optimal waste gas washing efficiency.
At present, the domestic semiconductor industry is in a stage of high-speed development, wherein a wafer cleaning process runs through the whole production line, so that a large amount of cleaning agent waste gas is generated, and the waste gas after treatment can reach the national waste gas emission standard.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a waste gas purification treatment facility realizes the processing of wafer technology waste gas, realizes through following technical scheme: the method comprises the following steps: the device comprises an equipment frame, an air inlet arranged outside the equipment frame, a pretreatment chamber, a washing chamber, a water tank and a fan, wherein the pretreatment chamber, the washing chamber, the water tank and the fan are arranged inside the equipment frame; the water tank is positioned below the pretreatment chamber and the washing chamber and is connected with the atomizing nozzle through a pipeline; the fan is located the washing room and keeps away from one side of pre-treatment chamber, the fan is connected with the blast pipe for the good waste gas of output processing.
Preferably, the system further comprises a bypass exhaust system, the bypass exhaust system is arranged above the equipment frame and is connected with the pretreatment chamber, and the bypass exhaust system is further connected with a spare exhaust pipeline.
Preferably, the washing chambers are provided with two independent washing chambers which are separated by a partition plate, and a demister is arranged in one washing chamber far away from the pretreatment chamber and used for removing fog particles and water drops in the waste gas.
Preferably, the demister is arranged above the atomizing spray head, and the height of the demister is lower than that of the fan.
Preferably, a filter screen is arranged between the lower part of the pretreatment chamber and the washing chamber and the water tank, and the water sprayed by the atomizing spray head circulates into the water tank.
Preferably, the water tank is also connected with a water inlet pipe and a water outlet pipe, and the water body in the water tank can enter and exit through the water inlet pipe and the water outlet pipe.
Preferably, the water discharge pipe is also provided with a water pump for providing power for water discharge.
The utility model has the advantages that: the air outlet of the wafer process equipment is connected, waste gas is sprayed through the pretreatment chamber, and is adsorbed and atomized by the filler of the washing chamber, and the waste gas after being sprayed through the forest enters the exhaust pipe through the power of the fan after being taken out of fog particles and slurry through the demister to be discharged; the acid-base exhaust load of the power side is reduced, and the investment of exhaust equipment of the power side is saved; acid-base-containing waste gas at the equipment end is reduced, the waste gas treatment capacity at the power side is reduced, the method is simple and easy to meet, the treatment cost is low, and most of acid-base water-soluble gas in tail gas can be removed, such as; HF, HNO3, NH3, HCL, IPA, etc.
Drawings
FIG. 1 is a schematic structural diagram of the present patent application;
FIG. 2 is a simplified schematic diagram of the present patent application;
1. an air inlet; 2. a pretreatment chamber; 3. a washing chamber; 4. a water tank; 5. a bypass exhaust system; 6. a fan; 7. a demister; 8. a drain pipe; 9. a water inlet pipe; 10. a water pump; 11. an equipment frame.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings.
In the wafer process cleaning process, mostly, acid-base liquid medicine is used for wafer cleaning treatment, so a large amount of acid-base gas is generated, and the acid-base gas can reach the emission standard after being treated, and water is used for treating waste gas in the patent application, which is shown in fig. 1 and 2 and comprises the following steps: the device comprises an equipment frame, an air inlet arranged outside the equipment frame, a pretreatment chamber, a washing chamber, a water tank and a fan, wherein the pretreatment chamber, the washing chamber, the water tank and the fan are arranged inside the equipment frame;
the washing chamber is arranged on one side of the pretreatment chamber, which is far away from the air inlet, the washing chamber is the core step of waste gas treatment, the filling material is arranged in the washing chamber and is used for adsorbing and treating waste gas, and an atomization spray head is also arranged above the washing chamber;
the water tank is positioned below the pretreatment chamber and the washing chamber and is connected with the atomizing nozzle through a pipeline; the fan is located the washing room and keeps away from one side of pre-treatment chamber, and the fan provides wind-force, for waste gas circulation flow provides power, the fan is connected with the blast pipe for the good waste gas of output processing.
Preferably, the system further comprises a bypass exhaust system or a bypass air discharge system, the bypass exhaust system is arranged above the equipment frame, the bypass exhaust system is connected with the pretreatment chamber and the standby exhaust pipeline, the equipment is closed during normal operation, and the equipment is opened only when the equipment cannot normally operate, so that gas cannot be discharged in time when the equipment fails.
This patent application is provided with a plurality of air intakes, and quantity wafer process equipment's air outlet quantity phase-match, if adopt this patent application matching that has 12 air intakes to have 12 wafer process equipment of cavity, in the actual production, also can be applied to the equipment of different quantity cavities through reforming transform the pipeline equally.
Preferably, the washing chamber is provided with two solitary, and the washing chamber that keeps away from the pre-treatment chamber is inside still to be provided with the defroster, and the function of defroster is to getting off the fog grain, the thick liquid drop entrapment that the waste gas smugglied secretly at the spraying absorption in-process, prevents to cause the corruption jam after getting into the fan pipeline, influences wind-force and fan life.
Preferably, the demister is arranged above the atomizing spray head, and the height of the demister is lower than that of the fan.
Preferably, a filter screen is arranged between the lower part of the pretreatment chamber and the washing chamber and the water tank, and the water sprayed by the atomizing spray head circulates into the water tank.
Preferably, the water tank is further connected with a water inlet pipe and a water outlet pipe, the water inlet pipe is connected with the plant to provide sufficient water required for absorbing the waste gas, and the water outlet pipe is used for discharging the waste water after absorbing the waste gas to the plant for treatment.
Preferably, the water discharge pipe is also provided with a water pump for providing power for water discharge.
Preferably, the equipment frame is made of carbon steel and is used for supporting the whole device.
The application provides stable air volume for the wafer cleaning equipment, effectively prevents an exhaust pipeline of the equipment from being blocked, and improves the continuous operation time of the equipment; the acid-base exhaust load of the power side is reduced, and the investment of exhaust equipment of the power side is saved; acid and alkali containing waste gas at the equipment end is reduced, and the waste gas treatment capacity at the power side is reduced.
The conditions of the application are simple and easy to meet, the treatment cost is low, and most of acid-base water-soluble gas in the tail gas can be removed, such as; HF, HNO3, NH3, HCL, IPA, etc.
It should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of describing the present invention and simplifying the description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and thus should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
Finally, it should be noted that: the above embodiments are only used for illustrating but not limiting the technical solutions of the present invention, and although the present invention is described in detail with reference to the above embodiments, those of ordinary skill in the art should understand that: modifications and equivalents may be made thereto without departing from the spirit and scope of the invention, and the appended claims are intended to cover such modifications and equivalents as fall within the spirit and scope of the invention.
Claims (7)
1. An exhaust gas purification treatment device comprising: the equipment frame sets up at the outside air intake of equipment frame, sets up at inside pre-processing chamber, washing room, basin and the fan of equipment frame, its characterized in that: the device comprises a pretreatment chamber, an air inlet, a washing chamber, a filler and an atomization spray head, wherein the air inlet is used for accessing waste gas to be treated, the air inlet is communicated with the pretreatment chamber, the atomization spray head is arranged in the pretreatment chamber, the washing chamber is arranged on one side of the pretreatment chamber, which is far away from the air inlet, the filler is arranged in the washing chamber, and the atomization spray head is also arranged above the washing chamber; the water tank is positioned below the pretreatment chamber and the washing chamber and is connected with the atomizing nozzle through a pipeline; the fan is located the washing room and keeps away from one side of pre-treatment chamber, the fan is connected with the blast pipe for the good waste gas of output processing.
2. An exhaust gas purification treatment apparatus according to claim 1, characterized in that: the device further comprises a bypass exhaust system, wherein the bypass exhaust system is arranged above the device frame and is connected with the pretreatment chamber and the standby exhaust pipeline.
3. An exhaust gas purification treatment apparatus according to claim 1, characterized in that: the washing chamber is provided with two independent, and the washing chamber that keeps away from the pre-treatment chamber is inside still to be provided with the defroster for remove fog grain, drop of water in the waste gas.
4. An exhaust gas purification treatment apparatus according to claim 3, characterized in that: the demister is arranged above the atomizing spray head, and the height of the demister is lower than that of the fan.
5. An exhaust gas purification treatment apparatus according to claim 1, characterized in that: and a filter screen is arranged between the lower part of the pretreatment chamber and the washing chamber and the water tank, and the atomized spray heads spray water to circulate into the water tank.
6. An exhaust gas purification treatment apparatus according to claim 1, characterized in that: the water tank is also connected with a water inlet pipe and a water outlet pipe, and the water in the water tank can enter and exit through the water inlet pipe and the water outlet pipe.
7. An exhaust gas purification treatment apparatus according to claim 6, characterized in that: the water discharging pipe is also provided with a water pump for providing power for water discharging.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020321177.2U CN211864525U (en) | 2020-03-16 | 2020-03-16 | Waste gas purification treatment device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020321177.2U CN211864525U (en) | 2020-03-16 | 2020-03-16 | Waste gas purification treatment device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211864525U true CN211864525U (en) | 2020-11-06 |
Family
ID=73258064
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020321177.2U Active CN211864525U (en) | 2020-03-16 | 2020-03-16 | Waste gas purification treatment device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN211864525U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113617204A (en) * | 2021-09-01 | 2021-11-09 | 东营益美得化工有限公司 | Methyl isobutyl ketone tail gas absorber |
-
2020
- 2020-03-16 CN CN202020321177.2U patent/CN211864525U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113617204A (en) * | 2021-09-01 | 2021-11-09 | 东营益美得化工有限公司 | Methyl isobutyl ketone tail gas absorber |
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