JPH0140515B2 - - Google Patents

Info

Publication number
JPH0140515B2
JPH0140515B2 JP55110095A JP11009580A JPH0140515B2 JP H0140515 B2 JPH0140515 B2 JP H0140515B2 JP 55110095 A JP55110095 A JP 55110095A JP 11009580 A JP11009580 A JP 11009580A JP H0140515 B2 JPH0140515 B2 JP H0140515B2
Authority
JP
Japan
Prior art keywords
layer
thickness
resistor
hybrid integrated
resistance value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55110095A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5735364A (en
Inventor
Shinji Yoshida
Giichi Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11009580A priority Critical patent/JPS5735364A/ja
Publication of JPS5735364A publication Critical patent/JPS5735364A/ja
Publication of JPH0140515B2 publication Critical patent/JPH0140515B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/80—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors
    • H10D86/85—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors characterised by only passive components

Landscapes

  • Parts Printed On Printed Circuit Boards (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
JP11009580A 1980-08-11 1980-08-11 Thin film hybrid integrated circuit Granted JPS5735364A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11009580A JPS5735364A (en) 1980-08-11 1980-08-11 Thin film hybrid integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11009580A JPS5735364A (en) 1980-08-11 1980-08-11 Thin film hybrid integrated circuit

Publications (2)

Publication Number Publication Date
JPS5735364A JPS5735364A (en) 1982-02-25
JPH0140515B2 true JPH0140515B2 (enrdf_load_stackoverflow) 1989-08-29

Family

ID=14526896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11009580A Granted JPS5735364A (en) 1980-08-11 1980-08-11 Thin film hybrid integrated circuit

Country Status (1)

Country Link
JP (1) JPS5735364A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02324A (ja) * 1987-12-18 1990-01-05 Mitsui Mining & Smelting Co Ltd 導電膜回路およびその製造方法
JPH05109925A (ja) * 1991-10-18 1993-04-30 Kyocera Corp 薄膜配線基板

Also Published As

Publication number Publication date
JPS5735364A (en) 1982-02-25

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