JPH0136977B2 - - Google Patents

Info

Publication number
JPH0136977B2
JPH0136977B2 JP58172799A JP17279983A JPH0136977B2 JP H0136977 B2 JPH0136977 B2 JP H0136977B2 JP 58172799 A JP58172799 A JP 58172799A JP 17279983 A JP17279983 A JP 17279983A JP H0136977 B2 JPH0136977 B2 JP H0136977B2
Authority
JP
Japan
Prior art keywords
cell
molecular beam
substrate
mbe
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58172799A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6063918A (ja
Inventor
Shunichi Murakami
Tetsuo Ishida
Sumio Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Canon Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Anelva Corp filed Critical Canon Anelva Corp
Priority to JP17279983A priority Critical patent/JPS6063918A/ja
Publication of JPS6063918A publication Critical patent/JPS6063918A/ja
Publication of JPH0136977B2 publication Critical patent/JPH0136977B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02538—Group 13/15 materials
    • H01L21/0254—Nitrides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP17279983A 1983-09-17 1983-09-17 分子線源用セル Granted JPS6063918A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17279983A JPS6063918A (ja) 1983-09-17 1983-09-17 分子線源用セル

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17279983A JPS6063918A (ja) 1983-09-17 1983-09-17 分子線源用セル

Publications (2)

Publication Number Publication Date
JPS6063918A JPS6063918A (ja) 1985-04-12
JPH0136977B2 true JPH0136977B2 (enrdf_load_stackoverflow) 1989-08-03

Family

ID=15948578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17279983A Granted JPS6063918A (ja) 1983-09-17 1983-09-17 分子線源用セル

Country Status (1)

Country Link
JP (1) JPS6063918A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4875565B2 (ja) * 2007-08-06 2012-02-15 長州産業株式会社 分子線源セルの坩堝用キャップ

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5752565U (enrdf_load_stackoverflow) * 1980-09-12 1982-03-26
JPS5795233U (enrdf_load_stackoverflow) * 1980-12-01 1982-06-11
US4608310A (en) * 1983-06-20 1986-08-26 Eastman Kodak Company Polycarbonate, latex compositions comprising such
JPS6027118A (ja) * 1983-07-25 1985-02-12 Mitsubishi Electric Corp 分子線膜成長装置

Also Published As

Publication number Publication date
JPS6063918A (ja) 1985-04-12

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