JPH0136710B2 - - Google Patents
Info
- Publication number
- JPH0136710B2 JPH0136710B2 JP57201292A JP20129282A JPH0136710B2 JP H0136710 B2 JPH0136710 B2 JP H0136710B2 JP 57201292 A JP57201292 A JP 57201292A JP 20129282 A JP20129282 A JP 20129282A JP H0136710 B2 JPH0136710 B2 JP H0136710B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- silicon
- layer
- oxide film
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57201292A JPS5989458A (ja) | 1982-11-15 | 1982-11-15 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57201292A JPS5989458A (ja) | 1982-11-15 | 1982-11-15 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5989458A JPS5989458A (ja) | 1984-05-23 |
JPH0136710B2 true JPH0136710B2 (en:Method) | 1989-08-02 |
Family
ID=16438557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57201292A Granted JPS5989458A (ja) | 1982-11-15 | 1982-11-15 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5989458A (en:Method) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0611053B2 (ja) * | 1984-12-20 | 1994-02-09 | 三菱電機株式会社 | 半導体装置の製造方法 |
JPH0611055B2 (ja) * | 1985-11-13 | 1994-02-09 | 三菱電機株式会社 | 半導体装置の製造方法 |
US4933295A (en) * | 1987-05-08 | 1990-06-12 | Raytheon Company | Method of forming a bipolar transistor having closely spaced device regions |
US5064773A (en) * | 1988-12-27 | 1991-11-12 | Raytheon Company | Method of forming bipolar transistor having closely spaced device regions |
-
1982
- 1982-11-15 JP JP57201292A patent/JPS5989458A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5989458A (ja) | 1984-05-23 |
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