Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co LtdfiledCriticalTokyo Shibaura Electric Co Ltd
Priority to JP57224159ApriorityCriticalpatent/JPS59114740A/ja
Publication of JPS59114740ApublicationCriticalpatent/JPS59114740A/ja
Publication of JPH0136663B2publicationCriticalpatent/JPH0136663B2/ja
H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
H01J37/02—Details
H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
Landscapes
Chemical & Material Sciences
(AREA)
Analytical Chemistry
(AREA)
Electron Beam Exposure
(AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure
(AREA)
Electron beam apparatus, a device manufacturing method using the same apparatus, a pattern evaluation method, a device manufacturing method using the same method, and a resist pattern or processed wafer evaluation method
Electron gun and electron-beam optical systems and methods including detecting and adjusting transverse beam-intensity profile, and device manufacturing methods including same