JPH0133952B2 - - Google Patents
Info
- Publication number
- JPH0133952B2 JPH0133952B2 JP55046463A JP4646380A JPH0133952B2 JP H0133952 B2 JPH0133952 B2 JP H0133952B2 JP 55046463 A JP55046463 A JP 55046463A JP 4646380 A JP4646380 A JP 4646380A JP H0133952 B2 JPH0133952 B2 JP H0133952B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- conductivity type
- semiconductor
- crystal layer
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
- H01L21/76221—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO with a plurality of successive local oxidation steps
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Local Oxidation Of Silicon (AREA)
- Bipolar Transistors (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4646380A JPS56142650A (en) | 1980-04-09 | 1980-04-09 | Semiconductor device and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4646380A JPS56142650A (en) | 1980-04-09 | 1980-04-09 | Semiconductor device and manufacture thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56142650A JPS56142650A (en) | 1981-11-07 |
JPH0133952B2 true JPH0133952B2 (enrdf_load_stackoverflow) | 1989-07-17 |
Family
ID=12747853
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4646380A Granted JPS56142650A (en) | 1980-04-09 | 1980-04-09 | Semiconductor device and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56142650A (enrdf_load_stackoverflow) |
-
1980
- 1980-04-09 JP JP4646380A patent/JPS56142650A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS56142650A (en) | 1981-11-07 |
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