JPH01319678A - プラズマ処理による膜改質方法 - Google Patents
プラズマ処理による膜改質方法Info
- Publication number
- JPH01319678A JPH01319678A JP15304788A JP15304788A JPH01319678A JP H01319678 A JPH01319678 A JP H01319678A JP 15304788 A JP15304788 A JP 15304788A JP 15304788 A JP15304788 A JP 15304788A JP H01319678 A JPH01319678 A JP H01319678A
- Authority
- JP
- Japan
- Prior art keywords
- plasma treatment
- pinholes
- density
- film
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009832 plasma treatment Methods 0.000 title claims abstract description 16
- 238000000034 method Methods 0.000 title claims description 8
- 238000002407 reforming Methods 0.000 title description 2
- 239000010408 film Substances 0.000 claims abstract description 22
- 239000010409 thin film Substances 0.000 claims abstract description 16
- 150000002500 ions Chemical class 0.000 claims abstract description 9
- 230000003247 decreasing effect Effects 0.000 abstract 2
- 239000007789 gas Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002887 superconductor Substances 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15304788A JPH01319678A (ja) | 1988-06-21 | 1988-06-21 | プラズマ処理による膜改質方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15304788A JPH01319678A (ja) | 1988-06-21 | 1988-06-21 | プラズマ処理による膜改質方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01319678A true JPH01319678A (ja) | 1989-12-25 |
| JPH0355551B2 JPH0355551B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-08-23 |
Family
ID=15553813
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15304788A Granted JPH01319678A (ja) | 1988-06-21 | 1988-06-21 | プラズマ処理による膜改質方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01319678A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140044860A (ko) * | 2011-06-17 | 2014-04-15 | 어플라이드 머티어리얼스, 인코포레이티드 | 핀홀-없는 유전체 박막 제조 |
-
1988
- 1988-06-21 JP JP15304788A patent/JPH01319678A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140044860A (ko) * | 2011-06-17 | 2014-04-15 | 어플라이드 머티어리얼스, 인코포레이티드 | 핀홀-없는 유전체 박막 제조 |
| JP2014524974A (ja) * | 2011-06-17 | 2014-09-25 | アプライド マテリアルズ インコーポレイテッド | ピンホールフリー誘電体薄膜製造 |
| US9593405B2 (en) | 2011-06-17 | 2017-03-14 | Applied Materials, Inc. | Pinhole-free dielectric thin film fabrication |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0355551B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-08-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |