JPH01316417A - Device for controlling dew point in atmospheric furnace - Google Patents

Device for controlling dew point in atmospheric furnace

Info

Publication number
JPH01316417A
JPH01316417A JP14912788A JP14912788A JPH01316417A JP H01316417 A JPH01316417 A JP H01316417A JP 14912788 A JP14912788 A JP 14912788A JP 14912788 A JP14912788 A JP 14912788A JP H01316417 A JPH01316417 A JP H01316417A
Authority
JP
Japan
Prior art keywords
dew point
furnace
gas
gas supply
dry gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14912788A
Other languages
Japanese (ja)
Inventor
Masaya Ito
正也 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Niterra Co Ltd
Original Assignee
NGK Spark Plug Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Spark Plug Co Ltd filed Critical NGK Spark Plug Co Ltd
Priority to JP14912788A priority Critical patent/JPH01316417A/en
Publication of JPH01316417A publication Critical patent/JPH01316417A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To precisely and freely control dew point in a furnace by arranging supplying devices for dry gas and wet gas, and a means for controlling the feeding volume for dry gas and wet gas based on difference between the setting dew point and the actual dew point in a ceramic sintering furnace. CONSTITUTION:In a hausing 11 of the heating furnace 1 for using to the ceramic sintering, etc., Mo-made electric resistant body 12 is inserted and electricity is conducted from the electric source 13 and heated to sinter the ceramic part in the furnace. In this case, the gas pressure in the furnace is held to 0.1 atm and the dew point is held to -40 deg.C. To this purpose, one end 21 of a dew point meter 2 is inserted in the furnace and the electric output 22 from the outer end is inputted to a control device 5 and compared with the setting dew point, and by controlling a flow meter 3 for the dry gas 6 or a flow meter 8 for the wet gas 7 having the gas supplying rate adjusting means 31, 41, the dry gas 6 or the wet gas 7 is supplied in the hausing 11 of the furnace from supplying hole 14 and adjusted so that the atmospheric gas in the hausing 11 becomes the setting dew point, to improve the product yield for the ceramic sintered material.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、雰囲気炉内の露点(飽和水蒸気圧温度)を制
御する装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a device for controlling the dew point (saturated water vapor pressure temperature) in an atmospheric furnace.

[従来の技術] セラミックの焼成、ステンレス鋼の光輝処理、焼結金属
の焼成などには、雰囲気をアルゴン、ヘリウムなどの不
活性ガス、アンモニア分解ガス、水素などの還元性ガス
、窒素などの非酸化性ガスを保持した連続炉が使用され
る。また従来より雰囲気炉内の露点を調整するため、炉
内に低露点の乾燥ガスを供給したり、炉内に入る被処理
物を予熱したりして、炉内の被処理物に結露ができ、製
品の品質が低下することを防止する方法が種々提案され
ている。これら従来の技術では、被処理物の製品の品質
の向上には炉内の温度制御に主眼が置かれ、露点調整と
しては炉内での被処理物への結露の防止のみが考慮され
ていた。
[Prior art] For firing ceramics, brightening stainless steel, firing sintered metals, etc., the atmosphere must be an inert gas such as argon or helium, ammonia decomposition gas, a reducing gas such as hydrogen, or a non-containing gas such as nitrogen. A continuous furnace containing oxidizing gas is used. Conventionally, in order to adjust the dew point inside the atmosphere furnace, drying gas with a low dew point is supplied into the furnace, and the workpieces entering the furnace are preheated to prevent dew condensation from forming on the workpieces inside the furnace. Various methods have been proposed to prevent product quality from deteriorating. In these conventional technologies, the main focus was on controlling the temperature inside the furnace in order to improve the quality of the product being processed, and the dew point adjustment was only concerned with preventing dew condensation on the processed material inside the furnace. .

[発明が解決しようとする課題] しかるに、この発明者は、雰囲気炉内での被処理物の処
理、特にセラミックの焼結には炉内の露点を精密かつ自
在に制御することが均質で歩留まりの高い製品に不可欠
であること、および炉内の露点は、少なからず外気の湿
度、温度に影響されることを見出した。
[Problems to be Solved by the Invention] However, the inventor believes that for processing objects to be processed in an atmosphere furnace, especially for sintering ceramics, it is necessary to accurately and freely control the dew point in the furnace to achieve uniform yield. It was found that the dew point inside the furnace is influenced to a large extent by the humidity and temperature of the outside air.

本発明の目的は、炉内の露点を精密かつ自在に制御でき
る雰囲気炉の露点制御装置の提供にある。
An object of the present invention is to provide a dew point control device for an atmospheric furnace that can precisely and freely control the dew point inside the furnace.

1課題を解決するための手段] 上記目的を達成するため、本発明は、雰囲気炉内に乾燥
ガスを供給する乾燥ガス供給手段と、該乾燥ガスの供給
量:A整手段と、前記雰囲気炉内に所定の露点の湿りガ
スを供給する湿りガス供給手段と、該湿りガスの供給量
調整手段と、前記雰囲気炉内の露点を検出するための露
点計と、雰囲気炉内の露点設定手段と、前記露点計およ
び露点設定手段からの出力を入力とし、前記乾燥ガスの
供給量調整手段および湿りガスの供給量調整f=段を作
動させる制御手段とを備え、前記制御手段は、前記露点
計により検出された雰囲気炉内の露点と前記露点設定手
段で設定した湿度とに差があるときは、該第をなくすよ
う前記乾燥ガスの供給量調整手段または湿りガスの供給
量調整手段を制御する構成を採用した。
1. Means for Solving the Problems] In order to achieve the above object, the present invention provides a drying gas supply means for supplying drying gas into an atmospheric furnace, a means for regulating the supply amount of the drying gas, and the atmospheric furnace. a humid gas supply means for supplying humid gas at a predetermined dew point into the atmosphere furnace; a means for adjusting the supply amount of the humid gas; a dew point meter for detecting the dew point in the atmospheric furnace; and a dew point setting means in the atmospheric furnace. , a control means that receives outputs from the dew point meter and the dew point setting means and operates the dry gas supply amount adjustment means and the wet gas supply amount adjustment stage f=, the control means is configured to control the dew point meter. If there is a difference between the dew point in the atmospheric furnace detected by the dew point and the humidity set by the dew point setting means, the dry gas supply amount adjusting means or the moist gas supply amount adjusting means is controlled so as to eliminate the difference. The configuration was adopted.

[作用および発明の効果] 本発明の雰囲気炉の露点制御装置は、次の作用および効
果を生じる。
[Actions and Effects of the Invention] The dew point control device for an atmospheric furnace of the present invention produces the following actions and effects.

■雰囲気炉は、露点の低い乾燥ガスと露点の高い湿りガ
スとの供給流量とを有し、予め設定された露点と測定し
た露点計との差をなくすようにそれらの各調整手段が制
御手段により、制御されている。このため、雰囲気炉内
の露点は、簡単な構成で精密かつ自在に制御できる。ま
た従来技術では困難であった露点を0℃以下のある設定
値に定常的に保持することも容易である。
■The atmosphere furnace has supply flow rates of dry gas with a low dew point and wet gas with a high dew point, and each of these adjustment means is controlled by a control means so as to eliminate the difference between the preset dew point and the measured dew point meter. is controlled by. Therefore, the dew point in the atmosphere furnace can be precisely and freely controlled with a simple configuration. Furthermore, it is easy to constantly maintain the dew point at a certain set value below 0° C., which was difficult with the prior art.

■雰囲気炉内の露点を設定露点に制御できるため、炉外
の湿度や温度に影響され難い。
■Since the dew point inside the atmospheric furnace can be controlled to the set dew point, it is less affected by the humidity and temperature outside the furnace.

[実施例1 つぎに本発明を第1図および第5図に示す第1実施例に
基づき説明する。
[Embodiment 1] Next, the present invention will be explained based on a first embodiment shown in FIGS. 1 and 5.

本発明の雰囲気炉の露点制御装HNは、炉本体1の内部
の所定位置に装着されている電気出力22付の露点計2
と、流量計3.4と、制御手段5と、乾燥ガス供給手段
6と、湿りガス供給手段7とからなる。
The atmospheric furnace dew point control device HN of the present invention includes a dew point meter 2 with an electric output 22 mounted at a predetermined position inside the furnace body 1.
, a flow meter 3.4, a control means 5, a dry gas supply means 6, and a wet gas supply means 7.

炉本体1は、この実施例では半密閉されたバッチ型炉で
、ステンレス製のハウジング11で形成され、内部にモ
リブデン製の電気抵抗体12を配設し、通電手段13に
よって通電がなされ、1000℃前後に加熱が行われる
とともに雰囲気供給口14から雰囲気ガスを流通させて
いる。ここで炉本体1.内のガス圧は0.1気圧、露点
は一40℃に保つ(露点設定手段)ことを口器としてい
る。
In this embodiment, the furnace body 1 is a semi-sealed batch type furnace, which is formed of a stainless steel housing 11, has an electric resistor 12 made of molybdenum disposed therein, is energized by an energizing means 13, and is energized at 1000 m Heating is performed to around 0.degree. C., and atmospheric gas is passed through the atmosphere supply port 14. Here, the furnace body 1. The gas pressure inside the mouthpiece is 0.1 atm and the dew point is maintained at -40°C (dew point setting means).

露点計2は、露点を測定するために一端21が炉本体1
内に配置され、他端は電気出力22が取り出され、前記
制御手段5に入力される。またこの露点計2は一70℃
〜60℃の測定範囲を有している。
The dew point meter 2 has one end 21 connected to the furnace body 1 in order to measure the dew point.
The electrical output 22 is taken out from the other end and input to the control means 5. Also, this dew point meter 2 is -70℃
It has a measurement range of ~60°C.

流量計3.4は、0.1m’/hrの精度を有し、各ガ
スのマスフローコントロール手段31.41を備えたメ
ータである。流量計3.4の一端には、それぞれ乾燥ガ
ス供給手段6および湿りガス供給手段7が接続されてい
る。流量d3.4の他端は、接続された後、炉本体1内
の雰囲気供給口14に連通している。
The flow meter 3.4 has an accuracy of 0.1 m'/hr and is equipped with mass flow control means 31.41 for each gas. A dry gas supply means 6 and a wet gas supply means 7 are connected to one end of the flowmeter 3.4, respectively. The other end of the flow rate d3.4 is connected to the atmosphere supply port 14 in the furnace body 1 after being connected.

制御手段5は、前記露点計2の他端からの電気出力22
を受け、PID制御により前記流量計3.4のマスフロ
ーコントロールを行い、乾燥ガスと、湿りガスとの流量
の制御を行っている。乾燥ガス供給手段6は、露点が一
65℃の純度99.99%以上の水素ガスが封入されて
いる高圧水素ガスボンベである。
The control means 5 controls the electrical output 22 from the other end of the dew point meter 2.
Based on this, mass flow control of the flowmeter 3.4 is performed by PID control, and the flow rates of dry gas and wet gas are controlled. The dry gas supply means 6 is a high-pressure hydrogen gas cylinder filled with hydrogen gas having a dew point of 165° C. and a purity of 99.99% or more.

湿りガス供給手段7は、純度99.99%以上の水素ガ
スを加湿により、露点を35℃にした水素ガスが封入さ
れている高圧水素ガスボンベである。
The moist gas supply means 7 is a high-pressure hydrogen gas cylinder filled with hydrogen gas having a dew point of 35° C. by humidifying hydrogen gas with a purity of 99.99% or more.

本発明の雰囲気炉の露点制御装ff1Nは、炉の露点制
御を次の方法で行っている。
The atmospheric furnace dew point control device ff1N of the present invention controls the dew point of the furnace in the following manner.

■炉本体1の電気抵抗体12を通電手段13で昇温しな
がら、前記乾燥ガス供給手段6により1m’/hr導入
して1000℃に保持させ、露点を一44℃に安定させ
る。
(2) While heating the electric resistor 12 of the furnace body 1 with the current supply means 13, the drying gas supply means 6 introduces 1 m'/hr to maintain the temperature at 1000°C, and stabilize the dew point at -44°C.

■湿りガス供給手段7、流量計4、制御手段5を作動さ
せ、PID制御を行う。
(2) Operate the wet gas supply means 7, flow meter 4, and control means 5 to perform PID control.

この実施例では、PID制御を開始して7分後に露点は
一40℃で安定し、その後23分間の露点の変化は±2
℃以内に押さえられる。(比較のため前述の■を行わず
、そのまま乾燥ガスのみを流し続けると第4図破線に示
すように、露点は下がり続け30分後には一48°Cに
なる。)つぎに本発明の第2実施例を第1図および第6
図とともに説明する。
In this example, the dew point stabilized at -40°C 7 minutes after starting PID control, and the change in dew point for the next 23 minutes was ±2.
Can be kept within ℃. (For comparison, if the above-mentioned step (2) is not carried out and only the drying gas is continued to flow, the dew point continues to fall and reaches -48°C after 30 minutes, as shown by the broken line in Figure 4.) The two examples are shown in Figures 1 and 6.
This will be explained with figures.

本構成は前記第1実施例と同一である。This configuration is the same as the first embodiment.

本実施例では、炉の露点制御を次の方法で行っている。In this embodiment, the dew point of the furnace is controlled by the following method.

■炉内を1150℃に保持させ、24時間乾燥ガス供給
手段6のみ作動させ、露点を一54℃前後にする。
(2) Maintain the inside of the furnace at 1150°C, operate only the drying gas supply means 6 for 24 hours, and bring the dew point to around -54°C.

■湿りガス供給手段7、流量計4、制御手段5を作動さ
せ、PID制御を行う、ここで乾燥ガス、湿りガスの合
計供給量を1m3/hrとし、炉内の温度を1000℃
に保持する。
■ Operate the wet gas supply means 7, flow meter 4, and control means 5 to perform PID control. Here, the total supply amount of dry gas and wet gas is 1 m3/hr, and the temperature inside the furnace is 1000°C.
to hold.

本実施例では、PID制御を開始して7分後には露点は
一40°Cで安定する。
In this embodiment, the dew point stabilizes at -40°C 7 minutes after starting PID control.

つぎに本発明の第3実施例を第1図、第7図および第8
図とともに説明する。
Next, a third embodiment of the present invention is shown in FIGS. 1, 7, and 8.
This will be explained with figures.

本構成は前記第1実施例と同一である。This configuration is the same as the first embodiment.

本実施例では、炉の露点制御を次の方法で行っている。In this embodiment, the dew point of the furnace is controlled by the following method.

第8図に示ずように、炉を昇温し、炉内温度が800℃
に到達した時点からPID制御を行い、炉内温度は10
00℃で保持させる。
As shown in Figure 8, the temperature of the furnace was raised to 800℃.
PID control is performed from the moment the furnace temperature reaches 10
Hold at 00°C.

本実施例では、制御開始9分後に露点は、設定値である
一40℃に到達し、その後20分間における変化は±2
℃以内におさまった。
In this example, the dew point reaches the set value of -40°C 9 minutes after the start of control, and the change over the next 20 minutes is ±2.
It was within ℃.

つぎに本発明の第4実施例を第2図および第9図に基づ
き説明する。
Next, a fourth embodiment of the present invention will be described based on FIGS. 2 and 9.

本発明の雰囲気炉の露点制御装置Gは、炉本体1の内部
の所定位置に装着されている電気出力22付の露点計2
と、電磁弁3A、4Aと、制御手段5と、乾燥ガス供給
手段6と、湿りガス供給手段7とからなる。
The dew point control device G for an atmospheric furnace of the present invention includes a dew point meter 2 with an electric output 22 mounted at a predetermined position inside the furnace body 1.
, solenoid valves 3A, 4A, control means 5, dry gas supply means 6, and wet gas supply means 7.

電磁弁3A、4Aは通電により開閉がなされる電磁式の
弁である。
The solenoid valves 3A and 4A are electromagnetic valves that are opened and closed by energization.

制御手段5Aは、前記露点計2からの電気出力を受けて
、PID制御がなされ、前記電磁弁3A、4Aへの0N
10FFコントロ一ル信号を出す。
The control means 5A receives the electric output from the dew point meter 2, performs PID control, and outputs 0N to the solenoid valves 3A and 4A.
10FF control signal is output.

本実施例では、炉を昇温し、炉内温度が800℃に到達
した時点から乾燥ガスと湿りガスとを交互に流すON1
0 F F制御を行い、また、炉内温度は1000℃で
保持させている。
In this example, the temperature of the furnace is raised, and from the time when the temperature inside the furnace reaches 800°C, the ON1 is used to alternately flow dry gas and wet gas.
0 F F control is performed, and the temperature inside the furnace is maintained at 1000°C.

制御開始10分後には設定値である一40℃に到達し、
その後20分間における変化は一り0℃±3℃以内にお
さまった。電磁弁3A、4Aを使用しているのでバッチ
型炉においては、第1実施例〜第3実施例に比ベコスI
・が安くできる。
10 minutes after the start of control, the set value of -40℃ is reached,
After that, all changes during the next 20 minutes were within 0°C±3°C. Since solenoid valves 3A and 4A are used, the batch type furnace has a lower cost I compared to the first to third embodiments.
・Can be done cheaply.

つぎに本発明の第5実施例を第3図および第10図に基
づき説明する。
Next, a fifth embodiment of the present invention will be described based on FIGS. 3 and 10.

本発明の雰囲気炉の露点制御装置l(は、炉本体1の内
部の所定位置に装着されている電気出力22付の露点計
2と、制御手段5と、乾燥ガス供給手段6と、湿りガス
供給手段7と、三方バルブ8とからなる。
The dew point control device l (for an atmospheric furnace of the present invention) includes a dew point meter 2 with an electric output 22 mounted at a predetermined position inside the furnace body 1, a control means 5, a dry gas supply means 6, and a moist gas It consists of a supply means 7 and a three-way valve 8.

三方バルブ8は、電磁式で前記制御手段5により開度の
調整がなされる。
The three-way valve 8 is electromagnetic and its opening degree is adjusted by the control means 5.

本実施例では、炉の露点制御を次の方法で行っている。In this embodiment, the dew point of the furnace is controlled by the following method.

炉を昇温し、炉内温度が800℃に到達した時点からP
ID制御を行い、炉内温度は1000℃で保持させる。
When the furnace temperature reaches 800℃, P
ID control is performed to maintain the furnace temperature at 1000°C.

制御開始6分後には設定値である一40℃に到達し、そ
の後24分間における変化は13℃以内におさまった。
Six minutes after the start of control, the set value of -40°C was reached, and the change over the next 24 minutes was within 13°C.

なお、第1実施例〜第5実施例までは、晴天時、気温2
5℃、湿度55%の環境条件(クリーニング終了時)で
行った。
In addition, in the first to fifth embodiments, when the weather is clear, the temperature is 2.
The cleaning was carried out under the environmental conditions of 5° C. and 55% humidity (at the end of cleaning).

つぎに本発明の第6実施例を第4図に基づき説明する。Next, a sixth embodiment of the present invention will be described based on FIG. 4.

本発明の雰囲気炉の露点制御装置しは、炉本体IAの内
部の所定位置に装着されている電気出力22付の露点計
2と、流量計3B、4Bと、制御手段5と、乾燥ガス供
給手段6と、湿りガス供給手段7と、キャリヤガス供給
手段9とからなる。
The dew point control device for an atmospheric furnace of the present invention includes a dew point meter 2 with an electric output 22 mounted at a predetermined position inside the furnace main body IA, flowmeters 3B and 4B, a control means 5, and a dry gas supply. It consists of a means 6, a humid gas supply means 7, and a carrier gas supply means 9.

炉本体IAは、連続雰囲気炉で、加熱部10と、冷却部
25と、駆動部35とからなる。
The furnace body IA is a continuous atmosphere furnace and includes a heating section 10, a cooling section 25, and a driving section 35.

加熱部10はステンレス製のマツフルケース11A内に
電気抵抗体12をコイル状に配設し、内部にメツシュベ
ルト15を掛は渡し、中央上面には雰囲気供給口14が
、加熱部10の入口16、出口17にはキャリヤガス供
給口18.19がそれぞれ形成されている。なお炉内圧
力は大気圧で露点の目標値は一35℃に設定されている
The heating section 10 has an electric resistor 12 arranged in a coil shape inside a pine full case 11A made of stainless steel, a mesh belt 15 is wrapped around the inside, an atmosphere supply port 14 is provided on the upper center surface, and an inlet 16 of the heating section 10 is provided. , and the outlet 17 are formed with carrier gas supply ports 18 and 19, respectively. Note that the pressure inside the furnace is atmospheric pressure, and the target value of the dew point is set at -35°C.

冷却部25は、導入[]26および導出口27から冷却
水を供給し加熱部出口17を冷却している。
The cooling section 25 cools the heating section outlet 17 by supplying cooling water from an inlet [ ] 26 and an outlet 27 .

駆動部35は、ベルト駆動ドラム36.37をベルト駆
動装置38によりステンレス製の全長301■1のメツ
シュベルト15を毎秒10 c mで駆動している。
The driving unit 35 drives the mesh belt 15 made of stainless steel and having a total length of 301 mm by means of a belt driving device 38 and a belt driving drum 36, 37 at a speed of 10 cm per second.

乾燥ガス供給手段6および湿りガス供給手段7は、合計
10m’/hr(精度0.5m’/hrの流量計を使用
)のガスを供給している。
The dry gas supply means 6 and the wet gas supply means 7 supply gas at a total rate of 10 m'/hr (using a flow meter with an accuracy of 0.5 m'/hr).

流量計3B、4Bは、0.5m’/hrの精度を有し、
各ガスのマスフローコントロール手段31.41を備え
たメータである。流量計3B、4Bの一端には、それぞ
れ乾燥ガス供給手段6および湿りガス供給手段7が接続
されている。流量計3B、4Bの他端は、接続された後
炉本体IAの雰囲気供給口14に連通している。
Flowmeters 3B and 4B have an accuracy of 0.5 m'/hr,
The meter is equipped with mass flow control means 31, 41 for each gas. A dry gas supply means 6 and a wet gas supply means 7 are connected to one ends of the flowmeters 3B and 4B, respectively. The other ends of the flowmeters 3B and 4B communicate with the atmosphere supply port 14 of the connected after-furnace main body IA.

キャリヤガス供給手段9は、露点が一70℃を存する窒
素ガスを、前記キャリヤガス供給口18および19に各
12m’ /hr供給している。
The carrier gas supply means 9 supplies nitrogen gas having a dew point of 170 DEG C. to the carrier gas supply ports 18 and 19 at a rate of 12 m'/hr.

本実施例では、炉の露点制御を次の方法で行っている。In this embodiment, the dew point of the furnace is controlled by the following method.

■炉内の温度を1150℃に保ち、メツシュベルト15
を回しなから乾燥ガス供給手段6と、キャリヤガス供給
手段9により炉内を4日間クリーニングを行い、その後
、炉内の温度を1050℃に下げ、露点を設定値以下(
本実施例では一45℃)にする。
■Keep the temperature inside the furnace at 1150℃ and mesh belt 15
The inside of the furnace is cleaned for four days using the drying gas supply means 6 and the carrier gas supply means 9 without turning the switch, and then the temperature inside the furnace is lowered to 1050°C and the dew point is lower than the set value (
In this example, the temperature is -45°C.

■炉内温度を1050℃に保持するとともに、湿りガス
供給手段7、流量計3B、4B、制御手段5を作動させ
、PID制御を行う。
(2) While maintaining the furnace temperature at 1050° C., the wet gas supply means 7, flowmeters 3B and 4B, and control means 5 are operated to perform PID control.

本実施例では、晴天、気温22℃、湿度58%の条件(
クリーニング終了時)で行い、制御開始20分後には設
定値である一35℃に到達し、その後10時間における
変化は±3℃以内におさまった。
In this example, the conditions of clear skies, temperature of 22°C, and humidity of 58% (
20 minutes after the start of control, the set value of -35°C was reached, and the change over the next 10 hours was within ±3°C.

つぎに本発明の第7実施例を第4図とともに説明する。Next, a seventh embodiment of the present invention will be described with reference to FIG.

本構成および炉の露点制御は、前記第6実施例と同一で
ある。
This configuration and furnace dew point control are the same as in the sixth embodiment.

本実施例では、雨天、気温20℃、湿度89%の条件(
クリーニング終了時)で行い、最初の露点は一39℃で
あったが、制御開始15分後には設定値である一35℃
に到達し、その後10時間における変化は±3℃以内で
あった。
In this example, the conditions of rainy weather, temperature of 20°C, and humidity of 89% (
At the end of cleaning), the initial dew point was -39℃, but 15 minutes after the start of control, it returned to the set value of -35℃.
was reached, and the change over the subsequent 10 hours was within ±3°C.

本発明は上記実施例以外に次の実施態様を含む。The present invention includes the following embodiments in addition to the above embodiments.

a、第1実施例〜第4実施例において、乾燥ガスを常に
、フローさせておき、湿りガス流斌(弁の開開による0
N10FFによる制御も含む)を制御する装置であって
も良い。
a. In the first to fourth embodiments, the dry gas is always allowed to flow, and the wet gas flow (by opening and opening of the valve)
(including control by N10FF).

b、流通させる雰囲気ガスは、所望の熱処理の用途に応
じ、−酸化炭素(CO) 、二酸化炭素(C02)、ア
ンモニア(NHl)、酸素(02)、アルゴン(Ar)
、各種塩化性ガスなど適時使用しても良い。
b. The atmospheric gases to be circulated may include carbon oxide (CO), carbon dioxide (CO2), ammonia (NHl), oxygen (02), argon (Ar), depending on the desired heat treatment application.
, various chlorinated gases, etc. may be used as appropriate.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の雰囲気炉の露点制御装置の第1実施例
〜第3実施例の概略的構成図を示す。 第2図は本発明の雰囲気炉の露点制御装置の第4実施例
の概略的構成図を示す。 第3図は本発明の雰囲気炉の露点制御装置の第5実施例
の概略的構成図を示す。 第4図は本発明の雰囲気炉の露点制御装置の第6実施例
および第7実施例の概略的構成図を示す。 第5図はその第1実施例の露点の制御状態を示すグラフ
である。 第6図は第2実施例の露点の制御状態を示すグラフであ
る。 第7図はその第3実施例の露点の制御状態を示すグラフ
である。 第8図はその第3実施例の炉内の温度と時間経過を示す
グラフである。 第9図はその第4実施例の露点の制御状態を示すグラフ
である。 第10図はその第5実施例の露点の制御状態を示すグラ
フである。 図中 N、G、に、L・・・雰囲気炉の露点制御装置 
1・・・炉本体(雰囲気炉) 2・・・露点計 5・・
・制御手段 6・・・乾燥ガス供給手段 7・・・湿り
ガス供給手段 22・・・電気出力(露点計からの出力
)31.41・・・マスフローコントロール手段(供給
量調整手段)
FIG. 1 shows a schematic diagram of the first to third embodiments of a dew point control device for an atmospheric furnace according to the present invention. FIG. 2 shows a schematic configuration diagram of a fourth embodiment of the dew point control device for an atmospheric furnace of the present invention. FIG. 3 shows a schematic configuration diagram of a fifth embodiment of the dew point control device for an atmospheric furnace of the present invention. FIG. 4 shows a schematic diagram of the sixth and seventh embodiments of the dew point control device for an atmospheric furnace of the present invention. FIG. 5 is a graph showing the dew point control state of the first embodiment. FIG. 6 is a graph showing the dew point control state of the second embodiment. FIG. 7 is a graph showing the dew point control state of the third embodiment. FIG. 8 is a graph showing the temperature inside the furnace and the passage of time in the third embodiment. FIG. 9 is a graph showing the dew point control state of the fourth embodiment. FIG. 10 is a graph showing the dew point control state of the fifth embodiment. In the diagram: N, G, N, L... Dew point control device for atmospheric furnace
1... Furnace body (atmosphere furnace) 2... Dew point meter 5...
- Control means 6...Dry gas supply means 7...Moist gas supply means 22...Electric output (output from the dew point meter) 31.41...Mass flow control means (supply amount adjustment means)

Claims (1)

【特許請求の範囲】[Claims] 1)雰囲気炉内に乾燥ガスを供給する乾燥ガス供給手段
と、該乾燥ガスの供給量調整手段と、前記雰囲気炉内に
所定の露点の湿りガスを供給する湿りガス供給手段と、
該湿りガスの供給量調整手段と、前記雰囲気炉内の露点
を検出するための露点計と、雰囲気炉内の露点設定手段
と、前記露点計および露点設定手段からの出力を入力と
し、前記乾燥ガスの供給量調整手段および湿りガスの供
給量調整手段を作動させる制御手段とを備え、前記制御
手段は、前記露点計により検出された雰囲気炉内の露点
と前記露点設定手段で設定した湿度とに差があるときは
、該差をなくすよう前記乾燥ガスの供給量調整手段また
は湿りガスの供給量調整手段を制御する雰囲気炉の露点
制御装置。
1) a dry gas supply means for supplying dry gas into the atmospheric furnace; a means for adjusting the supply amount of the dry gas; a moist gas supply means for supplying moist gas at a predetermined dew point into the atmospheric furnace;
A supply amount adjusting means for the moist gas, a dew point meter for detecting the dew point in the atmospheric furnace, a dew point setting means in the atmospheric furnace, and outputs from the dew point meter and the dew point setting means are input, and the drying A control means for operating a gas supply amount adjustment means and a humid gas supply amount adjustment means, the control means being configured to adjust the dew point in the atmospheric furnace detected by the dew point meter and the humidity set by the dew point setting means. A dew point control device for an atmospheric furnace that controls the dry gas supply amount adjusting means or the wet gas supply amount adjusting means so as to eliminate the difference when there is a difference.
JP14912788A 1988-06-16 1988-06-16 Device for controlling dew point in atmospheric furnace Pending JPH01316417A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14912788A JPH01316417A (en) 1988-06-16 1988-06-16 Device for controlling dew point in atmospheric furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14912788A JPH01316417A (en) 1988-06-16 1988-06-16 Device for controlling dew point in atmospheric furnace

Publications (1)

Publication Number Publication Date
JPH01316417A true JPH01316417A (en) 1989-12-21

Family

ID=15468318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14912788A Pending JPH01316417A (en) 1988-06-16 1988-06-16 Device for controlling dew point in atmospheric furnace

Country Status (1)

Country Link
JP (1) JPH01316417A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002372262A (en) * 2001-06-15 2002-12-26 Sanki Eng Co Ltd Gas supply system and test system
JP2004001906A (en) * 2002-05-30 2004-01-08 Tokyo Electron Ltd Substrate conveying device and substrate processing device
JP2009036505A (en) * 2007-07-12 2009-02-19 Ngk Insulators Ltd Dew point control device of atmospheric gas
JP2010223561A (en) * 2009-03-25 2010-10-07 Ngk Insulators Ltd Method of controlling dew point for baking furnace

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918170A (en) * 1982-07-23 1984-01-30 株式会社東芝 Ceramic manufacturing device
JPS59200719A (en) * 1983-04-27 1984-11-14 Sumitomo Metal Ind Ltd Method for conditioning moisture in gas
JPS60255919A (en) * 1984-05-30 1985-12-17 Nisshin Steel Co Ltd Method for preventing nitriding in annealing stainless steel
JPH01263216A (en) * 1988-04-14 1989-10-19 Kawasaki Steel Corp Device for supplying humidification in atmospheric gas

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918170A (en) * 1982-07-23 1984-01-30 株式会社東芝 Ceramic manufacturing device
JPS59200719A (en) * 1983-04-27 1984-11-14 Sumitomo Metal Ind Ltd Method for conditioning moisture in gas
JPS60255919A (en) * 1984-05-30 1985-12-17 Nisshin Steel Co Ltd Method for preventing nitriding in annealing stainless steel
JPH01263216A (en) * 1988-04-14 1989-10-19 Kawasaki Steel Corp Device for supplying humidification in atmospheric gas

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002372262A (en) * 2001-06-15 2002-12-26 Sanki Eng Co Ltd Gas supply system and test system
JP4618936B2 (en) * 2001-06-15 2011-01-26 三機工業株式会社 Gas supply device and inspection system
JP2004001906A (en) * 2002-05-30 2004-01-08 Tokyo Electron Ltd Substrate conveying device and substrate processing device
JP2009036505A (en) * 2007-07-12 2009-02-19 Ngk Insulators Ltd Dew point control device of atmospheric gas
JP2010223561A (en) * 2009-03-25 2010-10-07 Ngk Insulators Ltd Method of controlling dew point for baking furnace

Similar Documents

Publication Publication Date Title
EP0902464A3 (en) Semiconductor wafer temperature measurement and control thereof using gas temperature measurement
JPH03159986A (en) Process for controlling oxygen concentration in single crystal and apparatus therefor
GB2041411A (en) Manufacturing a low-oxygen copper wire
JPH01316417A (en) Device for controlling dew point in atmospheric furnace
CA1096612A (en) Method of setting and controlling desired redox potentials in gases
JP3307697B2 (en) Batch type firing furnace
JP3955464B2 (en) Glass base material heating method and furnace
KR102626851B1 (en) Method and apparatus for producing ternary cathode materials
JPH09138074A (en) Heat treatment furnace
JPH10274484A (en) Burning apparatus for ceramic and burning method thereof
JP3254747B2 (en) Vertical heat treatment furnace and heat treatment method
KR20020092837A (en) A carburization treatment method
CN109612269A (en) For oxygen content autocontrol method in the kiln of lithium battery material sintering
JPS63162820A (en) Atmosphere control method for heat treatment furnace
JPH04110034A (en) Method and device for heat treatment
JPH0338639Y2 (en)
JP2002071276A (en) Tunnel type continuous moisture-containing gas atmosphere burning furnace
JPH04127432A (en) Normal-pressure cvd apparatus
JPH0395448A (en) Gas supplying apparatus of thermal analyzer
JPS62250103A (en) Method for operating degreasing and sintering furnace
JPH0320412A (en) Method for finish-annealing grain-oriented silicon steel sheet
SU881594A1 (en) Electron paramagnetic resonance spectrometer thermostatting device
Wang et al. Precision Control of Carbon Potential
JPH0434893Y2 (en)
JPH04337630A (en) Furnace for heat-processing semiconductor wafer