JPH0434893Y2 - - Google Patents
Info
- Publication number
- JPH0434893Y2 JPH0434893Y2 JP1986108028U JP10802886U JPH0434893Y2 JP H0434893 Y2 JPH0434893 Y2 JP H0434893Y2 JP 1986108028 U JP1986108028 U JP 1986108028U JP 10802886 U JP10802886 U JP 10802886U JP H0434893 Y2 JPH0434893 Y2 JP H0434893Y2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- mixed gas
- pressure
- mixed
- control valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 claims description 96
- 239000011261 inert gas Substances 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 9
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 4
- 229910001882 dioxygen Inorganic materials 0.000 claims description 4
- 230000001105 regulatory effect Effects 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 10
- 239000001301 oxygen Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Description
【考案の詳細な説明】
〔産業上の利用分野〕
本考案は、酸化性の雰囲気ガスによつて被処理
品を熱処理する酸化雰囲気炉の雰囲気ガス製造装
置に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an atmosphere gas production device for an oxidizing atmosphere furnace that heat-treats a workpiece with an oxidizing atmosphere gas.
熱間熱水圧加圧装置（以下HIP装置と称する）
は、すでに超硬工具の緻密化処理に使用されて実
績を挙げているが、近年、セラミツクス、サーメ
ツトなど新素材の開発が進むにつれて、その適用
範囲が拡がりつつある。
Hot water pressure equipment (hereinafter referred to as HIP equipment)
has already been used successfully for the densification of cemented carbide tools, but in recent years, as the development of new materials such as ceramics and cermets has progressed, its scope of application has been expanding.
従来装置の一例であるHIP装置及びその加圧媒
体である例えばアルゴンガス（以下Arと称する）
のような雰囲気ガスを供給する装置を第２図によ
つて説明すると、２０はHIP装置で、円筒胴２０
ａ、上蓋２０ｂ及び下蓋２０ｃ、とこれらで構成
された加圧室２０ｅに収納される加熱炉２０ｄ等
の主要部材からなり、開閉弁１１、フイルタ１
３、逆止弁１４、冷却器２２及びガス配管１０を
介してArボンベ１ｂに連結されている。 HIP equipment, which is an example of conventional equipment, and its pressurized medium, such as argon gas (hereinafter referred to as Ar)
A device for supplying atmospheric gas as shown in FIG. 2 will be explained with reference to FIG.
a, an upper lid 20b, a lower lid 20c, and a heating furnace 20d housed in a pressurizing chamber 20e composed of these, and an on-off valve 11, a filter 1, etc.
3. It is connected to the Ar cylinder 1b via a check valve 14, a cooler 22, and a gas pipe 10.
冷却器２２の上流及び下流の雰囲気ガス配管１
０には増圧機２１が連結され、雰囲気ガス配管１
０の各要所には、圧力計１２、圧力支軸調節器１
８、放出弁１１ａが装設されている。圧力指示調
節器１８と増圧機２１とは電気的に連結されてい
る。 Atmospheric gas piping 1 upstream and downstream of the cooler 22
A pressure booster 21 is connected to the atmospheric gas pipe 1.
At each important point of 0, there is a pressure gauge 12, a pressure support shaft regulator 1
8. A discharge valve 11a is installed. The pressure indicating regulator 18 and the pressure intensifier 21 are electrically connected.
これらの逆止弁１４、増圧機２１、冷却器２
２、圧力計１２、圧力指示調節器１８、ガス配管
１０によつて増圧ユニツトＡが構成されている。 These check valve 14, pressure booster 21, cooler 2
2, a pressure gauge 12, a pressure indicating regulator 18, and a gas pipe 10 constitute a pressure increasing unit A.
また、HIP装置２０入口の雰囲気ガス配管１０
には、開閉弁１１を介して真空ポンプ２４が装設
されている。 In addition, the atmospheric gas pipe 10 at the inlet of the HIP device 20
A vacuum pump 24 is installed through an on-off valve 11.
被処理品が装填された加熱炉２０ｄを加圧室２
０ｅへ収納し、真空ポンプ２４によつて加圧室２
０ｅを略真空に吸引する。次に、Arボンベ１ｂ
から例えば100〜150Kgｆ／cm2のような高圧の雰囲
気ガスを雰囲気ガス配管１０へ供給し、フイルタ
１３で不純物を除去して増圧機２１によつて一次
増圧する。一次増圧によつて昇温した雰囲気ガス
を冷却器２２によつて冷却し、更に増圧機２１に
よつて例えば2000Kgｆ／cm2のような超高圧に二次
増圧してHIP装置へ供給する。圧力指示調節器１
８は、超高圧雰囲気ガスの圧力値を常に検出し、
予め設定された例えば2000Kgｆ／cm2のような圧力
値を保持するよう、増圧機２１の作動を調節す
る。被処理品の加熱加圧処理が完了すると、放出
弁１１ａによつて加圧室２０ｅの雰囲気ガスを大
気中に放出し、大気圧に減圧して上蓋２０ｂを外
し、加熱炉２０ｄを取り出す。 The heating furnace 20d loaded with the products to be processed is transferred to the pressurizing chamber 2.
0e and pressurized chamber 2 by vacuum pump 24.
Aspirate 0e to a near vacuum. Next, Ar cylinder 1b
A high-pressure atmospheric gas of, for example, 100 to 150 Kgf/cm 2 is supplied from the atmosphere to the atmospheric gas pipe 10 , impurities are removed by a filter 13 , and the pressure is primarily increased by a pressure intensifier 21 . The atmospheric gas whose temperature has been raised by the primary pressure increase is cooled by the cooler 22, and further pressure increased to an ultra-high pressure such as 2000 Kgf/cm 2 by the pressure intensifier 21, and then supplied to the HIP device. Pressure indicator regulator 1
8 constantly detects the pressure value of ultra-high pressure atmospheric gas,
The operation of the pressure booster 21 is adjusted so as to maintain a preset pressure value of, for example, 2000 Kgf/cm 2 . When the heating and pressurizing treatment of the workpiece is completed, the atmospheric gas in the pressurizing chamber 20e is released into the atmosphere by the release valve 11a, the pressure is reduced to atmospheric pressure, the upper cover 20b is removed, and the heating furnace 20d is taken out.
ところが、前記したようなAr等の不活性ガス
を雰囲気ガスとして、ZrO2、Al2O2、BaTiO3，
ZnO、MgO、Y2O3等の酸化物系セラミツクスの
被処理品を、例えば1600℃、2000Kgｆ／cm2のよう
な高温超高圧で処理すると、同被処理品がO2分
解を生じてその特性が劣化し、変質、変色、機械
的性質の低下等が生ずる。そこで、このような不
具合を防止するために、Ar等の不活性ガスに酸
素ガス（以下O2と称する）を、その被処理品の
種類によつて最適な体積比で混合した雰囲気ガス
を使用するO2HIP法が開発され、その雰囲気ガ
スを製造してHIP装置へ供給する装置の開発が急
がれていた。
However, when using an inert gas such as Ar as described above as an atmospheric gas, ZrO 2 , Al 2 O 2 , BaTiO 3 ,
When a treated product made of oxide ceramics such as ZnO, MgO, Y2O3 , etc. is treated at a high temperature and ultra - high pressure such as 1600℃ and 2000Kgf/ cm2 , the treated product causes O2 decomposition and its Properties deteriorate, resulting in deterioration, discoloration, deterioration of mechanical properties, etc. Therefore, in order to prevent such problems, we use an atmosphere gas that is a mixture of inert gas such as Ar and oxygen gas (hereinafter referred to as O 2 ) in the optimal volume ratio depending on the type of product to be processed. The O 2 HIP method was developed, and there was an urgent need to develop equipment to produce the atmospheric gas and supply it to the HIP equipment.
本考案は、上記要望にそう雰囲気ガス製造装置
を提供することを目的とし、酸化性の雰囲気ガス
によつて被処理品を熱処理する酸化雰囲気炉の雰
囲気ガス製造装置を提供することを目的とする。
The purpose of the present invention is to provide an atmosphere gas production device that satisfies the above-mentioned needs, and the purpose of the present invention is to provide an atmosphere gas production device for an oxidizing atmosphere furnace that heat-treats a workpiece with an oxidizing atmosphere gas. .
すなわち、本考案は、不活性ガスと、酸素と不
活性ガスとの混合ガスを所定比率に混合する雰囲
気ガス製造装置において、前記混合ガスが不活性
ガスと上限混合比率の酸素ガスとからなる混合ガ
スであつて、同混合ガスが充填された混合ガス供
給源と、該混合ガスの供給路に配設された混合ガ
ス流量制御弁と、不活性ガス供給源と、該不活性
ガスの供給路に配設された不活性ガス流量制御弁
と、前記混合ガスの供給路と前記不活性ガスの供
給路とに連結されたガス混合装置と、該ガス混合
装置に装設された圧力調節手段と、前記ガス混合
装置の下流の雰囲気ガス供給路に配設されて前記
混合ガス流量制御弁と前記不活性ガス流量制御弁
とに連結されたガス混合比率制御装置とを具えて
なることを特徴とする雰囲気ガス製造装置であ
る。
That is, the present invention provides an atmospheric gas production device that mixes an inert gas and a mixed gas of oxygen and an inert gas at a predetermined ratio. A mixed gas supply source filled with the mixed gas, a mixed gas flow control valve disposed in the mixed gas supply path, an inert gas supply source, and the inert gas supply path. an inert gas flow control valve disposed in the inert gas flow rate control valve, a gas mixing device connected to the mixed gas supply path and the inert gas supply path, and a pressure regulating means installed in the gas mixing device; , comprising a gas mixture ratio control device disposed in an atmospheric gas supply path downstream of the gas mixing device and connected to the mixed gas flow rate control valve and the inert gas flow rate control valve. This is an atmospheric gas production device.
本考案において、上限酸素濃度の雰囲気ガスを
用いる場合は混合ガス供給源から焼成炉へ混合ガ
スを供給し、圧力調節手段によつて所定の圧力に
保持する。一方、上限よりも酸素濃度の低い雰囲
気ガスを用いる場合は、混合ガス供給源と不活性
ガス供給源とからガス混合装置へ各々のガスを供
給し、混合ガス比率制御装置によつて、酸素濃度
を検出し、予め指定された所定の酸素濃度になる
ように、混合ガス流量制御弁と不活性ガス流量制
御弁とを制御して所定の混合比率を保持し、圧力
調節手段によつて所定の圧力に保持する。 In the present invention, when an atmospheric gas having an upper limit oxygen concentration is used, the mixed gas is supplied from the mixed gas supply source to the firing furnace and maintained at a predetermined pressure by the pressure regulating means. On the other hand, when using an atmospheric gas with an oxygen concentration lower than the upper limit, each gas is supplied from the mixed gas supply source and the inert gas supply source to the gas mixing device, and the oxygen concentration is adjusted by the mixed gas ratio control device. is detected, the mixed gas flow control valve and the inert gas flow control valve are controlled to maintain a predetermined mixing ratio so that a predetermined oxygen concentration is achieved, and the pressure adjustment means is used to maintain a predetermined mixing ratio. Hold in pressure.
以下、本考案の実施例を第１図の配置図によつ
て説明するが従来装置と同一の部材には同一の符
号を付し、構成及び作用の重複説明を省略する。
Hereinafter, an embodiment of the present invention will be described with reference to the layout diagram of FIG. 1. The same members as those of the conventional device will be denoted by the same reference numerals, and redundant explanation of the structure and operation will be omitted.
図において、１ａはArに20％のO2が混入され
た混合ガス（以下20％O2混合ガスと称する）が
充填された混合ガスボンベで、開閉弁１１、フイ
ルタ１３、混合ガス流量制御弁１５ａ、逆止弁１
４、自動開閉弁１６及び混合ガス配管１０ａを介
してミキシングタンク４に連結されている。 In the figure, 1a is a mixed gas cylinder filled with a mixed gas of Ar mixed with 20% O2 (hereinafter referred to as 20% O2 mixed gas), which includes an on-off valve 11, a filter 13, and a mixed gas flow rate control valve 15a. , check valve 1
4. Connected to the mixing tank 4 via an automatic on-off valve 16 and a mixed gas pipe 10a.
１ｂはArボンベで、開閉弁１１、フイルタ１
３、Ar流量制御弁１５ｂ、逆止弁１４及びAr配
管１０ｂを介して、自動開閉弁１６入側の混合ガ
ス配管１０ａに連結されている。混合ガス配管１
０ａ、Ar配管１０ｂ及びミキシングタンク４に
は圧力計１２が装設されている。また、ミキシン
グタンク４には圧力指示調節器１８が装設され、
自動開閉弁１６に電気的に連結されている。 1b is an Ar cylinder, on-off valve 11, filter 1
3. It is connected to the mixed gas pipe 10a on the inlet side of the automatic on-off valve 16 via the Ar flow rate control valve 15b, the check valve 14, and the Ar pipe 10b. Mixed gas piping 1
0a, the Ar pipe 10b, and the mixing tank 4 are equipped with a pressure gauge 12. Further, the mixing tank 4 is equipped with a pressure indicating regulator 18,
It is electrically connected to the automatic on-off valve 16.
このミキシングタンク４はO2濃度検出器８、
開閉弁１１及び雰囲気ガス配管１０を介して増圧
ユニツトＡへ連結されている。１７はO2濃度指
示調節器で、混合ガス流量制御弁１５ａ、Ar流
量制御弁１５ｂ及びO2濃度検出器８に電気的に
連結されている。雰囲気ガス配管１０の酸素濃度
検出器８の下流には開放弁１１ｂが装設されてい
る。（図中※印は雰囲気ガス配管の連結を示す。）
HIP装置２０において例えばAr＝80％、O2＝
20％の雰囲気ガスを使用する場合は、混合ガスボ
ンベ１ａから100〜150Kgｆ／cm2の20％O2混合ガ
スを、フイルタ１３、開放された混合ガス流量制
御弁１５ａ、自動開閉弁１６、混合ガス配管１０
ａ、ミキシングタンク４、雰囲気ガス配管１０、
酸素濃度検出器８、開閉弁１１を経て増圧ユニツ
トＡへ供給する。このとき、圧力指示調節器１８
はミキシングタンク４内の圧力を検出し、その圧
力が100Kgｆ／cm2を超えていれば自動開閉弁１６
を開閉させて調節し、その圧力をほぼ100Kgｆ／
cm2に保持する。 This mixing tank 4 has an O 2 concentration detector 8,
It is connected to the pressure increasing unit A via an on-off valve 11 and an atmospheric gas pipe 10. Reference numeral 17 denotes an O 2 concentration indicating regulator, which is electrically connected to the mixed gas flow rate control valve 15a, the Ar flow rate control valve 15b, and the O 2 concentration detector 8. A release valve 11b is installed downstream of the oxygen concentration detector 8 in the atmospheric gas pipe 10. (The * mark in the figure indicates the connection of atmospheric gas piping.) In the HIP device 20, for example, Ar = 80%, O 2 =
When using 20% atmospheric gas, apply 20% O 2 mixed gas of 100 to 150 kgf/cm 2 from the mixed gas cylinder 1a to the filter 13, the opened mixed gas flow control valve 15a, the automatic on-off valve 16, and the mixed gas. Piping 10
a, mixing tank 4, atmospheric gas piping 10,
It is supplied to the pressure boosting unit A via the oxygen concentration detector 8 and the on-off valve 11. At this time, the pressure indication regulator 18
detects the pressure inside the mixing tank 4, and if the pressure exceeds 100Kgf/ cm2 , the automatic on-off valve 16 is activated.
Adjust the pressure by opening and closing and adjust the pressure to approximately 100Kgf/
Hold in cm 2 .
次に、被処理品が異なり、例えばO2濃度が15
％の雰囲気ガスを使用する場合は、Arボンベ１
ｂからArをフイルタ１３、Ar流量制御弁１５
ｂ、逆止弁１４、Ar配管１０ｂを経て混合ガス
配管１０ａへ供給し、混合ガスボンベ１ａから供
給される20％O2混合ガスと合流して自動開閉弁
１６を経てミキシングタンク４へ供給する。この
とき、20％O2混合ガスが75％、Arが25％となる
よう、双方の流量制御弁１５ａ，１５ｂを調節
し、ミキシングタンク４によつて両者を混合し、
O2混合比が15％の雰囲気ガスを製造する。そし
て、この雰囲気ガスを雰囲気ガス配管１０へ供給
し、開閉弁１１を閉じて開放弁１１ｂを開き、雰
囲気ガスを大気中に放出しながらO2濃度検出器
８でO2濃度を検出し、予め15％のO2濃度が設定
されたO2濃度指示調節器１７を介して混合ガス
流量制御弁１５ａ及びAr流量制御弁１５ｂを自
動制御してO2濃度を微調節し、O2濃度が安定す
ると開閉弁１１を開いて開放弁１１ｂを閉じ、増
圧ユニツトＡへこの雰囲気ガスを供給する。圧力
指示調節器１８はミキシングタンク４内の圧力を
検出し、その圧力が100Kgｆ／cm2を超えると自動
開閉弁１６を開閉させて調節し、その圧力をほぼ
100Kgｆ／cm2に保持する。 Next, the products to be treated are different, for example, the O 2 concentration is 15
% atmosphere gas, use Ar cylinder 1
Ar from b to filter 13, Ar flow rate control valve 15
b. It is supplied to the mixed gas pipe 10a via the check valve 14 and the Ar pipe 10b, where it joins with the 20% O 2 mixed gas supplied from the mixed gas cylinder 1a, and is supplied to the mixing tank 4 via the automatic opening/closing valve 16. At this time, both flow control valves 15a and 15b are adjusted so that the 20% O 2 mixed gas is 75% and the Ar is 25%, and both are mixed by the mixing tank 4.
Produce an atmosphere gas with an O 2 mixing ratio of 15%. Then, this atmospheric gas is supplied to the atmospheric gas piping 10, the on-off valve 11 is closed and the release valve 11b is opened, and while the atmospheric gas is released into the atmosphere, the O 2 concentration is detected by the O 2 concentration detector 8, and the O 2 concentration is detected in advance. The O 2 concentration is finely adjusted by automatically controlling the mixed gas flow control valve 15a and the Ar flow control valve 15b via the O 2 concentration indicating regulator 17, which is set to an O 2 concentration of 15%, and the O 2 concentration is stabilized. Then, the on-off valve 11 is opened, the release valve 11b is closed, and the atmospheric gas is supplied to the pressure increase unit A. The pressure indicator regulator 18 detects the pressure inside the mixing tank 4, and when the pressure exceeds 100Kgf/cm 2 , it opens and closes the automatic on-off valve 16 to adjust the pressure to approximately the same level.
Maintain at 100Kgf/ cm2 .
本考案は、以上詳記した構成からなる雰囲気ガ
ス製造装置であり、そして、雰囲気ガスへの酸素
供給手段に、不活性ガスと上限混合比率の酸素ガ
スとから成る混合ガスを用いることにより、雰囲
気ガスの酸素濃度管理が容易になり、上限濃度を
超える酸素供給過剰が無くなるので安全であり、
被処理品の良好な焼成が可能である効果が生ず
る。
The present invention is an atmospheric gas production device having the configuration described in detail above, and by using a mixed gas consisting of an inert gas and an oxygen gas at an upper limit mixing ratio as a means for supplying oxygen to the atmospheric gas. It is safe because it makes it easier to manage the oxygen concentration of the gas and eliminates excess oxygen supply exceeding the upper limit concentration.
The effect is that the article to be processed can be fired in a good manner.
第１図は本考案の一実施例である雰囲気ガス製
造装置の概略配置図であり、第２図は従来装置の
一例を示す概略配置図である。
１ａ……混合ガスボンベ、１ｂ……Arボンベ、
４……ミキシングタンク、８……O2濃度検出器、
１０……ガス配管、１０ａ……混合ガス配管、１
０ｂ……Ar配管、１１……開閉弁、１１ａ……
放出弁、１１ｂ……開放弁、１２……圧力計、１
３……フイルタ、１４……逆止弁、１５ａ……混
合ガス流量制御弁、１５ｂ……Ar流量制御弁、
１６……自動開閉弁、１７……O2濃度指示調節
器、１８……圧力指示調節器、２０……HIP装
置、２０ａ……円筒胴、２０ｂ……上蓋、２０ｃ
……下蓋、２０ｄ……加熱炉、２０ｅ……加圧
室、２１……増圧機、２２……冷却器、２４……
真空ポンプ、Ａ……増圧ユニツト。
FIG. 1 is a schematic layout diagram of an atmospheric gas production device which is an embodiment of the present invention, and FIG. 2 is a schematic layout diagram showing an example of a conventional device. 1a...Mixed gas cylinder, 1b...Ar cylinder,
4...Mixing tank, 8... O2 concentration detector,
10...Gas piping, 10a...Mixed gas piping, 1
0b...Ar piping, 11...Opening/closing valve, 11a...
Release valve, 11b...Release valve, 12...Pressure gauge, 1
3...Filter, 14...Check valve, 15a...Mixed gas flow rate control valve, 15b...Ar flow rate control valve,
16...Automatic opening/closing valve, 17... O2 concentration indicating regulator, 18...Pressure indicating regulator, 20...HIP device, 20a...Cylindrical body, 20b...Top lid, 20c
... Lower lid, 20d ... Heating furnace, 20e ... Pressure chamber, 21 ... Pressure booster, 22 ... Cooler, 24 ...
Vacuum pump, A...pressure booster unit.
Claims (1)
ガスを所定比率に混合する雰囲気ガス製造装置に
おいて、前記混合ガスが不活性ガスと上限混合比
率の酸素ガスとからなる混合ガスであつて、同混
合ガスが充填された混合ガス供給源と、該混合ガ
スの供給路に配設された混合ガス流量制御弁と、
不活性ガス供給源と、該不活性ガスの供給路に配
設された不活性ガス流量制御弁と、前記混合ガス
の供給路と前記不活性ガスの供給路とに連結され
たガス混合装置と、該ガス混合装置に装設された
圧力調節手段と、前記ガス混合装置の下流の雰囲
気ガス供給路に配設されて前記混合ガス流量制御
弁と前記不活性ガス流量制御弁とに連結されたガ
ス混合比率制御装置とを具えてなることを特徴と
する雰囲気ガス製造装置。 In an atmospheric gas production device that mixes an inert gas and a mixed gas of oxygen gas and inert gas at a predetermined ratio, the mixed gas is a mixed gas consisting of an inert gas and an upper limit mixing ratio of oxygen gas, a mixed gas supply source filled with the mixed gas; a mixed gas flow rate control valve disposed in the mixed gas supply path;
an inert gas supply source, an inert gas flow control valve disposed in the inert gas supply path, and a gas mixing device connected to the mixed gas supply path and the inert gas supply path; , a pressure regulating means installed in the gas mixing device, and a pressure regulating means provided in an atmospheric gas supply path downstream of the gas mixing device and connected to the mixed gas flow rate control valve and the inert gas flow rate control valve. An atmospheric gas production device characterized by comprising a gas mixture ratio control device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986108028U JPH0434893Y2 (en) | 1986-07-16 | 1986-07-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986108028U JPH0434893Y2 (en) | 1986-07-16 | 1986-07-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6316834U JPS6316834U (en) | 1988-02-04 |
| JPH0434893Y2 true JPH0434893Y2 (en) | 1992-08-19 |
Family
ID=30984845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986108028U Expired JPH0434893Y2 (en) | 1986-07-16 | 1986-07-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0434893Y2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5743828B2 (en) * | 1975-10-29 | 1982-09-17 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6344099Y2 (en) * | 1980-08-26 | 1988-11-16 |
-
1986
- 1986-07-16 JP JP1986108028U patent/JPH0434893Y2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5743828B2 (en) * | 1975-10-29 | 1982-09-17 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6316834U (en) | 1988-02-04 |
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