JPH01282885A - Manufacture of printed wiring board - Google Patents
Manufacture of printed wiring boardInfo
- Publication number
- JPH01282885A JPH01282885A JP11149988A JP11149988A JPH01282885A JP H01282885 A JPH01282885 A JP H01282885A JP 11149988 A JP11149988 A JP 11149988A JP 11149988 A JP11149988 A JP 11149988A JP H01282885 A JPH01282885 A JP H01282885A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- wiring
- aluminum
- copper
- resist ink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 238000005530 etching Methods 0.000 claims abstract description 79
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 58
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 58
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 38
- 239000011888 foil Substances 0.000 claims abstract description 37
- 239000010949 copper Substances 0.000 claims abstract description 31
- 229910052802 copper Inorganic materials 0.000 claims abstract description 31
- 239000002131 composite material Substances 0.000 claims abstract description 16
- 239000003513 alkali Substances 0.000 claims description 17
- 239000002253 acid Substances 0.000 claims description 9
- 238000007650 screen-printing Methods 0.000 claims description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 239000000460 chlorine Substances 0.000 claims description 6
- 229910052801 chlorine Inorganic materials 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 18
- 238000000034 method Methods 0.000 abstract description 10
- 239000002904 solvent Substances 0.000 abstract description 9
- 239000011889 copper foil Substances 0.000 abstract description 7
- 239000007921 spray Substances 0.000 abstract description 6
- 239000003822 epoxy resin Substances 0.000 abstract description 4
- 229920000647 polyepoxide Polymers 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000853 adhesive Substances 0.000 abstract description 3
- 230000001070 adhesive effect Effects 0.000 abstract description 3
- -1 acryl Chemical group 0.000 abstract description 2
- 239000004411 aluminium Substances 0.000 abstract 3
- 239000005030 aluminium foil Substances 0.000 abstract 3
- 239000000976 ink Substances 0.000 description 52
- 238000007639 printing Methods 0.000 description 13
- 238000001035 drying Methods 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 238000005238 degreasing Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 150000002484 inorganic compounds Chemical class 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000013527 degreasing agent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- KTRGHLZBDIJZLQ-UHFFFAOYSA-N elatine Natural products CCN1CC2(CCC(OC)C34C2C(OC)C5(OCOC56CC(OC)C7CC3(O)C6C7OC)C14)OC(=O)c8ccccc8N9C(=O)CC(C)C9=O KTRGHLZBDIJZLQ-UHFFFAOYSA-N 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- XEMZLVDIUVCKGL-UHFFFAOYSA-N hydrogen peroxide;sulfuric acid Chemical compound OO.OS(O)(=O)=O XEMZLVDIUVCKGL-UHFFFAOYSA-N 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229920002601 oligoester Polymers 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、紫外線硬化型エツチングレジストを用いた、
アルミニウム配線及び銅配線の共存したプリント配線板
の製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention provides an ultraviolet curing type etching resist.
The present invention relates to a method of manufacturing a printed wiring board in which aluminum wiring and copper wiring coexist.
(従来の技術)
プリント配線板としては従来、銅配線を絶縁基板上に形
成したものが主流である。しかし最近は、電子部品の高
密度実装化に伴い、アルミニウム配線と銅配線が同一基
板上に形成されたプリント配線板が、半導体ベアーチッ
プのワイヤーボンディングによる接続と他の電子部品の
はんだ付が可能なため、注目されて製造されるようにな
った。(Prior Art) Conventionally, printed wiring boards in which copper wiring is formed on an insulating substrate have been mainstream. However, with the recent trend toward high-density packaging of electronic components, printed wiring boards with aluminum wiring and copper wiring formed on the same substrate are now capable of connecting semiconductor bare chips by wire bonding and soldering other electronic components. Therefore, it attracted attention and began to be manufactured.
しかし従来の銅配線を有するプリント配線板の製造方法
としては、銅張積層板上に熱乾燥型エツチングレジスト
をスクリーン印刷によシ形成し、銅のエツチングを行っ
た後、該エツチングレジストを除去する方法が従来嘔ら
れていた。しかしながら端近では、このエツチングレジ
ストに紫外線で硬化するエツチングレジストインクがプ
リント配線板の生産性を高いため導入されるケースが多
くなって来ている。However, the conventional manufacturing method for printed wiring boards with copper wiring involves forming a heat-drying etching resist on a copper-clad laminate by screen printing, etching the copper, and then removing the etching resist. The method used to be rejected. However, in recent years, etching resist ink, which is cured by ultraviolet rays, is increasingly being introduced into the etching resist because it increases the productivity of printed wiring boards.
また、これらの熱乾燥型及び紫外線硬化型エツチングレ
ジストは、従来溶剤除去タイプが主流であったが、近年
アルカリ除去タイプのインクがう/ニングコストが安い
ことや公害防止の観点から多く採用される様になってい
る。一方、アルミニウム配線と銅配線を有するプリント
配線板の製造工程としては、■レジスト形成、■アルミ
ニウムのエツチング、■銅のエツチング、■レジスト除
去、■レジスト形成、■アルミニウムのエツチング、■
レジスト除去がある。In addition, these heat-drying and ultraviolet curing type etching resists have traditionally been solvent-removable types, but in recent years alkali-removable inks have been increasingly adopted due to their low cleaning costs and pollution prevention. It looks like this. On the other hand, the manufacturing process for printed wiring boards with aluminum wiring and copper wiring includes: ■ resist formation, ■ aluminum etching, ■ copper etching, ■ resist removal, ■ resist formation, ■ aluminum etching, ■
There is resist removal.
ここで■のアルミニウムのエツチングには強アルカリを
用いるため、前述のアルカリ除去タイプのインクは用い
ることが出来ない。従って通常、溶剤除去タイプの加熱
乾燥型エツチングレジストインクが用いらnていた。Here, since a strong alkali is used for etching aluminum in (2), the above-mentioned alkali removal type ink cannot be used. Therefore, a solvent-removable heat-drying etching resist ink has usually been used.
しかしながら、従来この工程■と工程■のエツチングレ
ジストとして用いられてきた溶剤除去タイプの加熱乾燥
型エツチングレジストインク中には、溶剤が含まれてお
シ、印刷中にこのインク中の溶剤が蒸発し、スクリーン
版上のインク粘度が上昇して印刷配線幅が変化し、更に
著るしい場合には該インクが印刷中に乾燥してしまうた
め、スクリーンの目詰シによる転写不良やスクリーンの
異状な伸び等が発生し、印刷不良を生じる原因となって
いた。However, the solvent-removable heat-drying etching resist ink that has been conventionally used as the etching resist in steps ① and ② contains a solvent, and the solvent in this ink evaporates during printing. The viscosity of the ink on the screen plate increases and the printed wiring width changes, and in more severe cases, the ink dries during printing, resulting in poor transfer due to screen clogging and screen abnormalities. This causes elongation, etc., which causes printing defects.
このインク中の溶剤の蒸発を抑える必要から、インク中
の溶剤を高沸点溶剤で置換することが行なわれているが
、乾燥温度を高くシ、乾燥時間も長くする必要があシ、
生産性が低下する欠点があった。In order to suppress the evaporation of the solvent in the ink, the solvent in the ink is replaced with a high boiling point solvent, but this requires a high drying temperature and a long drying time.
There was a drawback that productivity decreased.
これらの諸欠点を解決する目的で紫外線硬化型エツチン
グレジストインクが開発されているが、いずれも銅エツ
チング用レジストインクであるため、アルカリ除去タイ
プが主流であシ、前述の工程■の耐アルカリ性を必要と
されるアルミニウムのエラチンブレジス)Kは使用でき
なかった。Ultraviolet curing type etching resist inks have been developed to solve these drawbacks, but since all of them are resist inks for copper etching, alkali-removable types are mainstream, and the alkali resistance of the above-mentioned process The required aluminum elatine brace) K could not be used.
この他にメツキ用の紫外線硬化型レジストインクも開発
されているが、耐薬品性を重視するため、硬化したイン
クは高度に架橋しておシ、塩化メチレンで除去すること
が出来ても、最も一般的に用いられている1 、 1
、1−トリクロロエタンでは除去することができない欠
点を有している。In addition, UV-curable resist inks for plating have also been developed, but because emphasis is placed on chemical resistance, the cured ink is highly cross-linked, and even if it can be removed with methylene chloride, it is Commonly used 1, 1
, has drawbacks that cannot be removed by 1-trichloroethane.
(発明が解決しようとする課題)
本発明はかかる加熱乾燥型エツチングレジストインクと
従来の紫外線硬化型インクの使用では成し得なかった、
アルミニウム配線及び銅配線を有するプリント配線板の
製造方法を提供するものである。(Problems to be Solved by the Invention) The present invention solves problems that could not be achieved by using such heat-dried etching resist ink and conventional ultraviolet curable ink.
A method of manufacturing a printed wiring board having aluminum wiring and copper wiring is provided.
本発明者らは前記の欠点に鑑み鋭意検討した結果、硬化
したレジストインキが耐酸性及び耐アルカリ性に優れか
つ、1.1.1−トリクロロエタンで除去し得る紫外線
硬化エツチングレジストインキを用いることにより、生
産性に優れ、不良発生も少ないアルミニウム配線及び銅
配線を有するプリント配線板の製造方法を発明するに至
った。The inventors of the present invention made extensive studies in view of the above drawbacks, and found that by using an ultraviolet curing etching resist ink, the cured resist ink has excellent acid resistance and alkali resistance and can be removed with 1.1.1-trichloroethane. We have invented a method for manufacturing printed wiring boards having aluminum wiring and copper wiring that has excellent productivity and fewer defects.
(課題を解決するための手段)
1、 アルミニウム/銅複合箔を積層したプリント配線
用基板のアルミニウム箔面上に
1)耐酸性でかつ耐アルカリ性の紫外線硬化型エツチン
グレジストインクをスクリーン印刷する工程
2)次いで該レジストインクを紫外線で硬化物とした後
、アルミニウム/銅複合箔をエツチングする工程
6)主成分として炭素原子2個を有する含塩素系有機溶
剤で前記エツチングレジストインク硬化物を除去し配線
パターンを形成する工程
4)前記工程1)〜6)で形成した配線パターン上の任
意の部分に耐アルカリ性の紫外線硬化型エツチングレゾ
ストインクをスクリーン印刷する工程5)次いで該レジ
ストインクを紫外線で硬化物とした後、強アルカリ性の
エツチング液で前記配線パターン上のアルミニウムie
選択エツチングする工程
6)更に主成分として炭素原子2個を有する含塩素有機
溶剤で前記エツチングレジストインク硬化物を除去する
工程
の少なくとも6工程を有することを特徴とするプリント
配線板の製造方法である。(Means for solving the problem) 1. Step 2 of screen printing 1) acid-resistant and alkali-resistant ultraviolet curable etching resist ink on the aluminum foil surface of a printed wiring board laminated with aluminum/copper composite foil. ) Next, the resist ink is cured with ultraviolet rays, and then the aluminum/copper composite foil is etched. Step of forming a pattern 4) Screen printing an alkali-resistant ultraviolet curable etching resist ink on any part of the wiring pattern formed in steps 1) to 6) Step 5) Next, curing the resist ink with ultraviolet rays. After cleaning, the aluminum ie on the wiring pattern is etched with a strong alkaline etching solution.
6) Selective etching step 6) A method for producing a printed wiring board, further comprising at least six steps of removing the cured product of the etching resist ink with a chlorine-containing organic solvent having two carbon atoms as a main component. .
次に本発明のプリント配線板の製造方法について更に詳
しく説明する。Next, the method for manufacturing a printed wiring board of the present invention will be explained in more detail.
本発明に言う、アルミニウム配線を形成させるにはアル
ミニウム/銅複合筒を積層したプリント配線用基板を用
いる。このアルミニウム/銅複合筒の例としてはアルミ
ニウム箔と銅箔のクラツド箔もしくはアルミニウム箔に
銅をメツキした箔、更にはアルミニウム箔と銅メツキ箔
の間に異種金属のメツキが施された箔がある。In order to form the aluminum wiring according to the present invention, a printed wiring board in which aluminum/copper composite tubes are laminated is used. Examples of this aluminum/copper composite tube include clad foil of aluminum foil and copper foil, foil plated with copper on aluminum foil, and foil with a different metal plated between the aluminum foil and copper plated foil. .
これらの複合箔を接合する基板材料としては、フェノー
ル樹脂、エポキシ樹脂、ポリイミド樹脂、ポリエステル
樹脂等の有機材料もしくは、これらの有機材料にガラス
繊維やフィラーを充てんした複合材料があり、必要に応
じて該複合箔に接着剤を用いて接合する。Substrate materials to which these composite foils are bonded include organic materials such as phenol resin, epoxy resin, polyimide resin, and polyester resin, or composite materials in which these organic materials are filled with glass fiber or filler. The composite foil is bonded using an adhesive.
更に基板材料としては、アルミニウム、鉄、ステンレス
等の金属材料があり、前述の複合箔をエポキシ系樹脂等
の接着剤を用いて絶縁を保って接合することにより、複
合箔を積層したプリント配線用基板を作ることができる
。Furthermore, substrate materials include metal materials such as aluminum, iron, and stainless steel, and by bonding the aforementioned composite foils using an adhesive such as epoxy resin while maintaining insulation, printed wiring with laminated composite foils can be created. You can make a board.
次に本発明で言う第1の工程は、耐酸性でかつ耐アルカ
リ性の紫外線硬化型エツチングレジストを先に記したプ
リント配線用基板のアルミニウム箔面上にスクリーン印
刷するものである。またアルミニウム箔面上は、スクリ
ーン印刷に先立って脱脂やパフ研摩等により表面処理し
た方がエツチングレジストとの密着信頼性を確保する上
で好ましい。脱脂方法は通常アルミニウム面上を脱脂す
る時に用いられる、アルカリ脱脂、酸脱脂、溶剤脱脂で
良い。Next, the first step in the present invention is to screen print an acid-resistant and alkali-resistant ultraviolet curing type etching resist onto the aluminum foil surface of the printed wiring board described above. Furthermore, it is preferable to perform a surface treatment on the aluminum foil surface by degreasing, puff polishing, etc. prior to screen printing in order to ensure reliability of adhesion with the etching resist. The degreasing method may be alkaline degreasing, acid degreasing, or solvent degreasing, which are usually used when degreasing aluminum surfaces.
この工程で用いられる耐酸性でかつ耐アルカリ性の紫外
線硬化型エツチングレジストインクは、■硬化したレジ
ストがアルミニウム箔のエツチングで用いられる強アル
カリ性のエツチング液に耐えること及び■該アルミニウ
ムエツチング後の強酸性の銅エツチング液に硬化したレ
ジストが耐えること、更には■このアルミニウムのエツ
チング液と銅のエツチング液に晒された後のレジストが
、工業的にもよく用いられておシ、毒性も少ない1.1
.1−トリクロロエタンにて除去できることが必要とな
る。The acid-resistant and alkali-resistant ultraviolet curable etching resist ink used in this process has two characteristics: (1) the cured resist can withstand the strong alkaline etching solution used in etching aluminum foil; The hardened resist can withstand copper etching liquid, and furthermore, the resist after being exposed to this aluminum etching liquid and copper etching liquid is often used industrially and has low toxicity.1.1
.. It is necessary to be able to remove it with 1-trichloroethane.
この用途に用いることのできる紫外線硬化型エツチング
レジストインクの例としては、■単官能のオリゴエステ
ルアクリレート(例えば○H
等がある。ここでnは、通常1〜6であるが特に限定す
るものではない。またベンゼン核にアルキル置換基を有
するものも使用できる。)及び■1゜1.1−1!Jク
ロロエタンに可溶でかつ、耐酸性及び耐アルカリ性のオ
リゴマーもしくはポリマー、(例えばメチルメタクリレ
ートオリゴマー、アルキッド樹脂、スチレンとアクリル
酸エステルとの共重合体等)及び■タルク等の無機フィ
ラー、更には■光増感剤の4成分を少なくとも主成分と
するものがある。Examples of ultraviolet curable etching resist inks that can be used for this purpose include monofunctional oligoester acrylates (for example, ○H), where n is usually 1 to 6, but is not particularly limited. (Also, those having an alkyl substituent on the benzene nucleus can also be used.) and ■1゜1.1-1! Oligomers or polymers that are soluble in J chloroethane and are resistant to acid and alkali (for example, methyl methacrylate oligomers, alkyd resins, copolymers of styrene and acrylic esters, etc.); ■ Inorganic fillers such as talc; and ■ Some products contain at least four photosensitizer components as main components.
次に本発明で言う第2の工程は、該レゾスト1゛ンクを
紫外線で硬化し、その後、強アルカリ性のエツチング液
で該アルミニウム箔を配線パターン状にエツチングし、
さらに該レジストを除去することなく、更に銅のみをエ
ツチングする選択エツチング剤で該アルミニウム配線以
外の銅箔をエツチングする工程である。Next, the second step in the present invention is to cure the resist 1 ink with ultraviolet rays, and then to etch the aluminum foil into a wiring pattern using a strong alkaline etching solution.
Furthermore, this is a step of etching the copper foil other than the aluminum wiring using a selective etching agent that etches only the copper without removing the resist.
本工程の紫外線硬化は、高圧水銀灯、超音圧水銀灯、メ
タルノ・ライドランプ等の紫外線ランプを装備した市販
の紫外線照射炉で行なえる。またランプの選定は、紫外
線硬化型エツチングインクに含まれる光増感剤の吸収波
長によって行なう。The ultraviolet curing in this step can be performed in a commercially available ultraviolet irradiation furnace equipped with an ultraviolet lamp such as a high-pressure mercury lamp, an ultrasonic mercury lamp, or a metalno-ride lamp. Further, the lamp is selected depending on the absorption wavelength of the photosensitizer contained in the ultraviolet curing type etching ink.
また本工程のアルミニウム箔のエツチングは、苛性ソー
ダ、苛性カリ等の無機の強アルカリ性化合物の水溶液に
各fi添加剤を入れたものが用いられ、その特徴はアル
ミニウム箔をエツチングし、銅はエツチングしない選択
エツチング剤にある。In addition, for the etching of aluminum foil in this process, an aqueous solution of inorganic strong alkaline compounds such as caustic soda and caustic potash containing various fi additives is used.The feature is selective etching that etches the aluminum foil but not copper. It's in the drug.
この強アルカリ性の無機化合物の濃度は、5〜60重量
%が用いられる。またこのエツチング液は、液の粘度を
低下させエツチング時スプレーをし易くするt味とエツ
チングスピードを上げる意味から、通常40°〜70℃
に加熱して用いられる。この強アルカリ性の無機化合物
の濃度が5重t%未満であると加熱してもエツチングス
ピードが遅く、また60重址チを超えると加熱しても液
が高粘度になシ均一なスプレーがし難くなる。The concentration of this strongly alkaline inorganic compound used is 5 to 60% by weight. In addition, this etching solution is usually heated at 40° to 70°C to reduce the viscosity of the solution and make it easier to spray during etching, as well as to increase the etching speed.
It is used after being heated. If the concentration of this strongly alkaline inorganic compound is less than 5% by weight, the etching speed will be slow even when heated, and if it exceeds 60% by weight, the liquid will not have a high viscosity even when heated, making it difficult to spray uniformly. It becomes difficult.
次に本工程に用いるアルミニウム箔をエツチングせず、
銅箔のみを選択的にエツチングする選択エツチング剤に
は、硫酸−過酸化水素系エツチング剤、もしくは過硫酸
アンモニウムや過硫酸ソーダ等の過1峨酸塩の水溶液が
用いられる。Next, the aluminum foil used in this process is not etched,
As a selective etching agent for selectively etching only the copper foil, a sulfuric acid-hydrogen peroxide type etching agent or an aqueous solution of performate such as ammonium persulfate or sodium persulfate is used.
さらに本発明に言う第6の工程は、第2の工程を終えた
エツチングレジスト付の基板を、主成分が炭素原子2個
を有する含塩素系有機溶剤で洗浄し、該レジストインク
を除去することにある。ここで炭素原子2個を有する含
塩素系有機溶剤とは1.1.1−トリクロロエタン、ト
リクロロエチレン、テトラクロロエチレン等であシ、毒
性の点から1.1.1−トリクロロエタンが好ましい。Further, the sixth step according to the present invention is to wash the substrate with the etching resist after the second step with a chlorine-containing organic solvent having two carbon atoms as a main component to remove the resist ink. It is in. Here, the chlorine-containing organic solvent having two carbon atoms includes 1.1.1-trichloroethane, trichloroethylene, tetrachloroethylene, etc., and 1.1.1-trichloroethane is preferable from the viewpoint of toxicity.
本発明における第4の工程は、工程1〜6で形成した配
線パターン上に少なくとも耐アルカリ性を有する紫外線
硬化型エツチングレジストインクをスクリーン印刷する
工程である。ここで使用する紫外線硬化型エツチングレ
ジストインクは、工程■で用いた耐酸性・耐アルカリ性
の紫外線硬化型エツチングレジストインクをそのまま用
いることができるし、また耐アルカリ性タイプの紫外線
硬化型エツチングレジストインクであってもよい。The fourth step in the present invention is a step of screen printing an ultraviolet curable etching resist ink having at least alkali resistance on the wiring pattern formed in steps 1 to 6. The UV-curable etching resist ink used here can be the same as the acid- and alkali-resistant UV-curable etching resist ink used in step (1), or it can be an alkali-resistant UV-curable etching resist ink. You can.
本発明における第5の工程は、該レジストインクを紫外
線硬化後、第2の工程で用いた強アルカリ性のアルミニ
ウムエツチング液で該配線パターンのアルミニウム箔を
必要に応じてパターン状に選択エツチングすることであ
る。この工程を経ることにより銅箔がパターン状に形成
され、半田付部分に用いることができる銅配線部が形成
される。In the fifth step of the present invention, after the resist ink is cured with ultraviolet rays, the aluminum foil of the wiring pattern is selectively etched in a pattern as necessary using the strong alkaline aluminum etching liquid used in the second step. be. Through this process, the copper foil is formed into a pattern, and a copper wiring portion that can be used as a soldering portion is formed.
更に本発明における第6の工程は、主成分として炭素原
子2個を有する含塩素系有機溶剤で該エツチングレジス
トインクを除去するものであシ、本発明の第6の王権と
同じレジスト除去工程である。Furthermore, the sixth step in the present invention is to remove the etching resist ink with a chlorine-containing organic solvent having two carbon atoms as a main component, and is the same resist removal step as in the sixth right of the present invention. be.
本発明におけるプリント配線板は、後加工としてはんだ
レジスト形成、ブレス打抜等の機械加工が通常行なわれ
る。The printed wiring board in the present invention is usually subjected to mechanical processing such as solder resist formation and press punching as post-processing.
(実施例) 次に本発明の詳細な説明する。(Example) Next, the present invention will be explained in detail.
実施例1
第1図に示す大きさが200X200朋、厚さ1.01
11のアルミニウム板1上に80μmの厚みを有するエ
ポキシ系樹脂絶縁層2を介して、40μmのアルミニウ
ム箔4と10μmの銅箔3の複合箔をアルミニウム箔4
の面を上にして接合した基板200枚を使用した。Example 1 The size shown in Fig. 1 is 200 x 200 mm, and the thickness is 1.01 mm.
A composite foil of 40 μm aluminum foil 4 and 10 μm copper foil 3 is placed on aluminum plate 1 of 11 through an 80 μm thick epoxy resin insulating layer 2.
200 substrates were used, which were bonded with their sides facing up.
まず基板の裏面のアルミニウムがエツチング液に侵かさ
れない様に粘着剤付フィルム5で保護した(第1図)。First, the aluminum on the back side of the substrate was protected with an adhesive film 5 to prevent it from being attacked by the etching solution (FIG. 1).
アルカリ脱脂剤でアルミニウム箔4面を脱脂後、耐酸性
かつ耐アルカリ性のアクリル系紫外線硬化型エツチング
レジストインク6を用いて自動印刷機で200枚の連続
印刷を行った(第2図)。尚この印刷に用いたスクリー
ン版は、600メツシユのポリエステル製スクリーンで
あり、使用パターンは、最小線幅50μmで5014)
)ずつ太くなった、線幅・線間隔が同じ4本のL字状配
線を200×200jljtOサイズに10行10列配
置したもの(最大線幅は600μm)である。After degreasing four sides of the aluminum foil with an alkaline degreaser, 200 sheets were continuously printed using an automatic printing machine using an acid-resistant and alkali-resistant acrylic ultraviolet curing etching resist ink 6 (FIG. 2). The screen plate used for this printing was a 600 mesh polyester screen, and the pattern used was 5014 with a minimum line width of 50 μm).
), four L-shaped wirings with the same line width and line spacing are arranged in 10 rows and 10 columns in a size of 200 x 200jljtO (maximum line width is 600 μm).
インクの粘度上昇は200枚印刷後で約10%であった
。The viscosity increase of the ink was about 10% after printing 200 sheets.
印刷した基板は即4.Om /順のコンベアスピードを
有し、80W5燈の高圧水銀灯を装備した紫外線照射装
置へ投入し、硬化した。印刷からレジスト硬化までに要
した時間は40分であった。The printed board is immediately 4. The material was cured by being placed in an ultraviolet irradiation device having a conveyor speed of 0.0 m/m and equipped with an 80W 5-light high-pressure mercury lamp. The time required from printing to curing of the resist was 40 minutes.
レジストを硬化した基板を顕微鏡で検査した結果、パタ
ーンの解像性は大変良く、150μmの線が解像できて
いた。またスクリーンの目詰り等の不良は皆無であった
。設計@250μmの線幅を50枚目ごとに測定した、
ところ270μm±15μmの範囲内に入っており、安
定した印刷が出来ていた。When the substrate on which the resist had been cured was examined under a microscope, it was found that the resolution of the pattern was very good, with lines of 150 μm being able to be resolved. Furthermore, there were no defects such as clogging of the screen. The line width of the design @ 250 μm was measured every 50th sheet.
However, it was within the range of 270 μm±15 μm, and stable printing was possible.
次に紫外線硬化したエツチングレゾスト付6基板に、苛
性ソーダ20重量%他を含む強アルカリ性の水溶液を6
0°Cで2分間スプレーし、複合箔のアルミニウム箔4
をパターン状にエツチングしアルミニウム配線8を得た
(第6図)。その後、基板を水洗乾燥し、次に鋼の選択
エツチング剤である硫酸を20容量チ及びパーマエッチ
(荏原電産(株)商品名、過酸化水素を50容量チ含有
する)を10容t%混合したエツチング液で54°C1
分間スプレーエツチングし銅配線7を得、その後水洗乾
燥した(第4図)。Next, a strong alkaline aqueous solution containing 20% by weight of caustic soda was applied to the ultraviolet-cured etching resin substrate.
Spray for 2 minutes at 0°C and remove the composite foil aluminum foil 4.
was etched into a pattern to obtain aluminum wiring 8 (FIG. 6). Thereafter, the substrate was washed with water and dried, and then 20 volumes of sulfuric acid, which is a selective etching agent for steel, and 10 volumes t% of Perma-Etch (trade name of Ebara Electric Corporation, containing 50 volumes of hydrogen peroxide) were added. Mixed etching solution at 54°C1
The copper wiring 7 was obtained by spray etching for a minute, and then washed with water and dried (FIG. 4).
その後、本発明の第6の工程である、1,1゜1−トリ
クロロエタンを室温でスプレーして、該エツチングレジ
スト6を剥離した(第5図)。得られたアルミニウム配
線8の配線幅250μmの配線の顕微鏡検査では、エツ
チング中の有害なレジスト剥れの跡はなく、また配線上
のレジストの残存もなかった。Thereafter, in the sixth step of the present invention, 1,1°1-trichloroethane was sprayed at room temperature to peel off the etching resist 6 (FIG. 5). A microscopic examination of the resulting aluminum wiring 8 with a wiring width of 250 μm revealed no traces of harmful resist peeling during etching, and no resist remaining on the wiring.
次に第4の工程として、出来上ったアルミニウム配線8
上に同じスクリーン版、同じ配線パターン、同じ紫外線
硬化型エツチングレゾストインク6を用いて該配線パタ
ーンが部分的に直交する様にエツチングレジストインク
6を200枚の基板に連続印刷した(第6図)。Next, as the fourth step, the completed aluminum wiring 8
Using the same screen plate, the same wiring pattern, and the same ultraviolet curing type etching resist ink 6, the etching resist ink 6 was continuously printed on 200 substrates so that the wiring patterns were partially perpendicular to each other (Fig. 6). ).
印刷した基板は、即、紫外線硬化装置を通し、レゾスト
インク6を硬化させた。硬化したレジストインク6は、
顕微鏡で検査した結果、40μmの厚みを有するアルミ
ニウム配線8に直交した部分のレゾストインク6には有
害な断線やにじみがなかった。The printed substrate was immediately passed through an ultraviolet curing device to cure the resist ink 6. The cured resist ink 6 is
As a result of microscopic examination, there was no harmful disconnection or bleeding in the part of the resist ink 6 perpendicular to the aluminum wiring 8 having a thickness of 40 μm.
次に紫外線硬化したエツチングレジスト6付基板を苛性
ソーダ20重量%他分含む強アルカリ性の水溶液を60
°Cで2分間スプレーし、複合箔のアルミニウム配線8
をパターン状にエツチングした(第7図)。その後基板
を水洗乾燥し、1,1゜1−トリクロロエタンを室温で
スプレーして、該エツチングレジスト6を剥離した(第
8図)。Next, the ultraviolet-cured etching resist 6 substrate was coated with a strong alkaline aqueous solution containing 20% by weight of caustic soda.
Spray for 2 minutes at °C and composite foil aluminum wiring 8
was etched into a pattern (Figure 7). Thereafter, the substrate was washed with water and dried, and 1,1°1-trichloroethane was sprayed at room temperature to peel off the etching resist 6 (FIG. 8).
最終的に得られたアルミニウム配線8と銅配線γからな
る混合配線の配線幅250μmの配線の顕微鏡検査では
、エツチング中の有害なレジスト剥れはなく、また配線
上のレジストの残存もなかった。A microscopic examination of the finally obtained mixed wiring consisting of the aluminum wiring 8 and the copper wiring γ with a wiring width of 250 μm revealed that there was no harmful peeling of the resist during etching, and no resist remained on the wiring.
比較例1
実施例1と同じ基板を用い、第1の工程として熱乾燥型
レジストインクで強アルカリ耐性のあるMR−500(
アサヒ化研社裂)を使用して、スクリーン印刷を実施例
1と同様200枚連続して行ったところ、10枚目まで
の印刷にシいてはインクの出が悪かった。更に50〜1
00枚目では良好な印刷が出来たものの、100枚目以
降ではインクのかすれが出始めた。印刷後のインクの粘
度上昇は約200%であった。Comparative Example 1 Using the same substrate as in Example 1, the first step was to use a heat-drying resist ink with strong alkali-resistant MR-500 (
When screen printing was performed on 200 sheets consecutively in the same manner as in Example 1 using Asahi Kakensha Rifu), ink flow was poor after printing up to the 10th sheet. Another 50-1
Good printing was achieved on the 00th page, but after the 100th page, the ink began to fade. The increase in ink viscosity after printing was about 200%.
次に110℃で10分間、送風乾燥機で乾燥の後、印刷
した配線を顕微鏡で検査したところ、良好に印刷できた
基板でも解像できた配線幅は最小200μmであり、そ
の他の基板ではインクのかすれが多く、悪い基板では断
線した配線もW7られた。Next, after drying in a blower dryer at 110°C for 10 minutes, the printed wiring was inspected under a microscope. Even on a well-printed board, the minimum wiring width that could be resolved was 200 μm. There were many scratches, and even broken wiring on a bad board was marked W7.
印刷から乾燥までに要した時間は60分であったが、実
際のプリント配線板の製造においてはインクのかすれが
生じると製品にならないため、−担印刷をストップし、
版を溶剤で拭くため、作業時間は大幅に増え、生産性が
低下することになる。。The time required from printing to drying was 60 minutes, but in actual manufacturing of printed wiring boards, if the ink fades, the product cannot be produced, so we stopped printing and
Wiping the plate with a solvent significantly increases work time and reduces productivity. .
尚、実施例1と同条件でアルミニウムエツチングと銅の
エツチングをしi、1.i−トリクロコエタンでレジス
トを除去した後の検査ではエツチング時の異常なレジス
トの剥れは見出せなかった。Note that aluminum etching and copper etching were performed under the same conditions as in Example 1. Inspection after removing the resist with i-tricrocoethane did not reveal any abnormal resist peeling during etching.
次に実施例1の第4の工程と同じことを紫外線硬化型エ
ツチングレジストインクを加熱乾燥型レジストインクM
R−500(アサヒ化研社製)に変えて行った。その結
果、第1の工程と同様インクの粘度上昇がみられ、印刷
したレジストインクによる配線パターンにも部分的なか
すれが見られた。その後第5の工程として実施例1と同
様にアルミニウム箔をエツチングし、更に1,1.1−
トリクロロエタンでレジストを除去した。レジストがか
すれた部分はアルミニウム箔がエツチングされ、不良基
板となった。Next, in the same manner as in the fourth step of Example 1, ultraviolet curing type etching resist ink was added to heat drying type resist ink M.
R-500 (manufactured by Asahi Kaken Co., Ltd.) was used instead. As a result, as in the first step, an increase in the viscosity of the ink was observed, and partial blurring was observed in the wiring pattern formed by the printed resist ink. Thereafter, as a fifth step, the aluminum foil was etched in the same manner as in Example 1, and further 1,1.1-
The resist was removed with trichloroethane. The aluminum foil was etched in the areas where the resist was faded, resulting in a defective board.
(発明の効果)
以上のとおり本発明は、硬化嘆が耐酸性及び耐アルカリ
性と特殊な溶剤への溶解性を有する紫外線硬化型エツチ
ングレジストインクを用いた、アルミニウム配線及び銅
配線を有するプリント配線板の製造方法であり、生産性
及び信頼性の両方が高い特徴を有するものである。(Effects of the Invention) As described above, the present invention provides a printed wiring board having aluminum wiring and copper wiring using an ultraviolet curable etching resist ink that has acid resistance, alkali resistance, and solubility in special solvents. This is a manufacturing method that is characterized by both high productivity and reliability.
第1図〜第8図は、実施例1におけるプリント配線板の
製造工程を説明するための模式図であ択第1〜第5図は
部分拡大した断面図、第6〜第8図は部分拡大した平面
図でおる。
符号 1.アルミニウム板
2、絶縁層
3、銅箔
4、アルミニウム箔
5、保護フィルム
6、エツチングレジストインク
7、銅配線
8、アルミニウム配線
特許出願人 電気化学工業株式会社Figures 1 to 8 are schematic diagrams for explaining the manufacturing process of the printed wiring board in Example 1. Figures 1 to 5 are partially enlarged sectional views, and Figures 6 to 8 are partial views. This is an enlarged plan view. Code 1. Aluminum plate 2, insulating layer 3, copper foil 4, aluminum foil 5, protective film 6, etching resist ink 7, copper wiring 8, aluminum wiring patent applicant Denki Kagaku Kogyo Co., Ltd.
Claims (2)
基板のアルミニウム箔面上に 1)耐酸性でかつ耐アルカリ性の紫外線硬化型エッチン
グレジストインクをスクリーン印刷する工程 2)次いで該レジストインクを紫外線で硬化物とした後
、アルミニウム/銅複合箔をエッチングする工程 3)主成分として炭素原子2個を有する含塩素系有機溶
剤で前記エッチングレジストインク硬化物を除去し配線
パターンを形成する工程 4)前記工程1)〜3)で形成した配線パターン上の任
意の部分に耐アルカリ性の紫外線硬化型エッチングレジ
ストインクをスクリーン印刷する工程 5)次いで該レジストインクを紫外線で硬化物とした後
、強アルカリ性のエッチング液で前記配線パターン上の
アルミニウム箔を選択エッチングする工程 6)更に主成分として炭素原子2個を有する含塩素有機
溶剤で前記エッチングレジストインク硬化物を除去する
工程 の少なくとも6工程を有することを特徴とするプリント
配線板の製造方法。1. 1) Screen printing an acid-resistant and alkali-resistant ultraviolet curable etching resist ink on the aluminum foil surface of a printed wiring board laminated with aluminum/copper composite foil. 2) Next, the resist ink is cured with ultraviolet rays. After that, a step of etching the aluminum/copper composite foil 3) A step of removing the cured product of the etching resist ink with a chlorine-containing organic solvent having two carbon atoms as a main component to form a wiring pattern 4) The step of the step 1) Step 5) of screen printing an alkali-resistant ultraviolet curable etching resist ink on any part of the wiring pattern formed in steps 3) to 5) Then, after curing the resist ink with ultraviolet rays, A print characterized by comprising at least six steps of selectively etching the aluminum foil on the wiring pattern; and (6) further removing the cured product of the etching resist ink with a chlorine-containing organic solvent having two carbon atoms as a main component. Method of manufacturing wiring boards.
に絶縁層を介して積層されていることを特徴とする特許
請求の範囲第1項記載のプリント配線板の製造方法。2. 2. The method of manufacturing a printed wiring board according to claim 1, wherein the printed wiring board is laminated on at least one principal surface of a metal plate with an insulating layer interposed therebetween.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63111499A JPH0634440B2 (en) | 1988-05-10 | 1988-05-10 | Method for manufacturing printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63111499A JPH0634440B2 (en) | 1988-05-10 | 1988-05-10 | Method for manufacturing printed wiring board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01282885A true JPH01282885A (en) | 1989-11-14 |
JPH0634440B2 JPH0634440B2 (en) | 1994-05-02 |
Family
ID=14562844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63111499A Expired - Fee Related JPH0634440B2 (en) | 1988-05-10 | 1988-05-10 | Method for manufacturing printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0634440B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009088364A (en) * | 2007-10-02 | 2009-04-23 | Toyo Aluminium Kk | Circuit constitution body and manufacturing method thereof |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54122878A (en) * | 1978-02-21 | 1979-09-22 | Western Electric Co | Method of forming pattern on substrate |
JPS5530840A (en) * | 1978-08-28 | 1980-03-04 | Tokyo Shibaura Electric Co | Method of manufacturing printed circuit board |
JPS61276394A (en) * | 1985-05-31 | 1986-12-06 | 東洋紡績株式会社 | Manufacture of printed circuit board |
JPS61284991A (en) * | 1985-06-11 | 1986-12-15 | 電気化学工業株式会社 | Circuit formation for aluminum/copper composite lined board |
-
1988
- 1988-05-10 JP JP63111499A patent/JPH0634440B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54122878A (en) * | 1978-02-21 | 1979-09-22 | Western Electric Co | Method of forming pattern on substrate |
JPS5530840A (en) * | 1978-08-28 | 1980-03-04 | Tokyo Shibaura Electric Co | Method of manufacturing printed circuit board |
JPS61276394A (en) * | 1985-05-31 | 1986-12-06 | 東洋紡績株式会社 | Manufacture of printed circuit board |
JPS61284991A (en) * | 1985-06-11 | 1986-12-15 | 電気化学工業株式会社 | Circuit formation for aluminum/copper composite lined board |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009088364A (en) * | 2007-10-02 | 2009-04-23 | Toyo Aluminium Kk | Circuit constitution body and manufacturing method thereof |
Also Published As
Publication number | Publication date |
---|---|
JPH0634440B2 (en) | 1994-05-02 |
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