JPH01267549A - Generating method for exposure data for mask rom integrated circuit - Google Patents

Abstract

PURPOSE:To shorten the time of exposure data generation by processing cell arrangement information on a ROM cell and registering it as a cell arrangement information conversion file, and generating bulk exposure data and registering it as a bulk exposure data file. CONSTITUTION:When a new kind of mask ROM integrated circuit is developed, the cell arrangement information conversion file 52 and bulk exposure data file 55 are generated and registered. Then when data to be written is supplied, an exposure device generates ROM pattern exposure data used to expose the pattern of a ROM part from the truth values of bits of write data and the cell information conversion file 52 and combines it with the bulk exposure data from the bulk exposure data file 55 to obtain exposure data on the whole mask ROM integrated circuit. Consequently, the processing when the write data is supplies is much easier than before and the processing time is shortened greatly.

Description

[Detailed Description of the Invention] [Summary] Regarding an exposure data creation method for a mask ROM integrated circuit that creates an exposure data file for exposing a mask ROM integrated circuit by data processing, an object is to shorten the exposure data creation time. The purpose is to manufacture a mask ROM integrated circuit using an exposure device in which only the pattern in the ROM part of a single product differs depending on the data to be written, and the pattern in the peripheral circuit part other than the pattern in the ROM part is the same. In an exposure data creation method for a mask ROM integrated circuit that creates exposure data, the cell layout information of a plurality of ROM cells constituting the ROM section is used in the exposure apparatus regardless of the value of the fill data. death,
σ is recorded as a cell layout information conversion file, and from the layout information of the pattern of the peripheral circuit section, bulk exposure data to be used for exposing the pattern of the peripheral circuit section is generated in advance in the exposure apparatus and registered as a bulk exposure data file. Then, when the write data is given, the exposure device generates ROM pattern exposure data to be used for exposing the pattern of the ROM section from the truth value of each bit of the write data and the gel information conversion file. , is configured to be combined with bulk exposure data from the bulk exposure data file to obtain exposure data for the entire mask ROM integrated circuit.

[Industrial application field]

The present invention relates to a method of creating exposure data for a mask ROM integrated circuit, and more particularly to a mask R method for creating an exposure data file for exposing a mask ROM integrated circuit through data processing.
The present invention relates to a method of creating exposure data for an OM integrated circuit.

The use of mask ROM integrated circuits is rapidly increasing due to improved performance, higher reliability, and lower prices.Also, with the rapid development of Japanese information processing, kanji patterns are appearing in printers, CRT displays, etc. The use of large-capacity mask ROM integrated circuits as memory is increasing.

Under these circumstances, there is a demand for shorter delivery times for mask ROM integrated circuit products.

[Conventional technology]

As shown in FIG. 3, the exposure pattern of a mask ROM integrated circuit consists of a main pattern 11 constituting the integrated circuit and a peripheral pattern 12 for positioning.

Arranged within the main pattern 11 are a ROM pattern 13 and other bulk patterns such as a decoder pattern 14, a sense amplifier pattern 15, and an input/output circuit pattern (not shown).

Cell Formation Layer To manufacture a mask ROM integrated circuit, a multilayer mask 16 is required as shown in FIG.

When the types of mask ROMs are different, the multilayer masks 16 are all different; however, in the same type of mask ROM, even if the data written to the mask ROM is different, only the mask 16Tl of the cell formation layer among the multilayer masks 16 is different; The same mask can be used.

In the ROM pattern 13 of FIG. 3, as shown in FIG.
A plurality of ROM lines 17 are arranged in a matrix, and word lines 18a and bit lines 18b are provided above them. The mask 16η of the cell forming layer connects each ROM cell 17 with a bit line 18 in a ROM pattern of 13 km.
Zell-shaped lj connecting b, window (f!11 beer hall)
This is a mask for forming 19 patterns. The ROM cell 17 having this cell forming window 19 stores, for example, the value My, and the ROM cell 17 not having one cell forming window stores the value v.
Ov will be memorized.

Of course, in the decoder 14, sense amplifier 15, etc., the mask of the cell formation layer 16Tl has a pattern of cell formation windows connecting the word line 18a, bit line 18b, and the decoder 14, sense amplifier 15, respectively. It is fixed for each type.

FIG. 6 shows a system flowchart of an example of a conventional method for creating exposure data for a mask ROM integrated circuit. This flowchart relates to the cell forming layer.

In the figure, in the manual data processing of job step 21, mask ROM1. The "include data file 22, which is data to be included in ``:m", is edited in accordance with the edit instruction information 23 inputted by the card, and a data denick is performed to generate a truth value data file 24 as shown in FIG. 7(A).

In the ROM pattern generation process of job step 25, the truth value data file 24 and the cell arrangement information 26 regarding the ROM pattern 13 as shown in FIG. A ROM pattern as shown in FIG. 7(C) corresponding to the write data is generated from the X coordinate, .pi. is the rotation angle, and .pi. is the address in the memory. Further, the decoder pattern 14, sense amplifier pattern 15, etc. are generated from the bulk information film 27 regarding the decoder pattern 14, sense amplifier pattern 15, etc., and a first intermediate file 28 of exposure data is generated.

In this exposure data first intermediate file 28, the ROM pattern has been developed in layers, but other bulks have a hierarchical structure, so in job step 29 these layers are developed, and the exposure data in the second intermediate file is expanded. File 30 is obtained.

After that, the exposure data second intermediate file 30 is divided into vJ1 subfields for electron beam exposure, and the scanning order of the electron beam within the subfields is determined, and the exposure data file is supplied to the electron beam exposure apparatus. Generate 32.

[Problem to be solved by the invention]

If the mask ROM integrated circuits are of the same type, the patterns of other layers other than the cell formation layer are the same, and even in the cell formation layer, the patterns obtained from bulk information are the same, but only the ROM pattern of the cell formation layer. are different.

However, conventionally, even when creating exposure data for mask ROMs of the same type, all patterns of the cell forming layer are generated in each job step 25. For this purpose, in job step 25, conversion of cell placement information from Ebisudic code to binary code, expansion of layers for each pattern, multiplication of reticle magnification, shifting of proximity effect correction, etc., removal of multiple exposure parts, Various complex processes such as field division, subfield division, and determination of scan order must be performed.

Therefore, the conventional method has the problem that it takes a lot of time to create exposure data, which limits short delivery times for products.

The present invention has been made in view of the above points, and an object of the present invention is to provide a method for creating exposure data for a mask ROM integrated circuit that reduces the time required to create exposure data.

[y! Means to solve the problem]

The exposure data creation method for a mask ROM integrated circuit of the present invention is such that for a single product type, only the pattern (13) of the ROM part varies depending on the data to be inserted, and the patterns of the peripheral circuit part other than the pattern (13) of the ROM part In a method for creating exposure data for a mask ROM integrated circuit, which creates exposure data for manufacturing a mask ROM integrated circuit (10) having the same (14° 15) using an exposure apparatus, Cell placement information (
50) is processed in advance into a form used by the exposure device regardless of the value of the 9-inclusive data, and recorded in θ as a cell placement information conversion file (52). Bulk exposure data used for exposing the patterns (14, 15) of the circuit section is generated in advance and registered as a bulk exposure data file (55) (54).
, When the data to be written is given, the ROM used for exposure of the pattern (13) in the ROM section by the exposure device is determined from the true immediate value of each bit of the data to be written and the cell information conversion file (52).
Generate M pattern exposure data and combine it with bulk exposure data from the bulk exposure data file (55) to obtain exposure data for the entire mask ROM integrated circuit (10) (6
0).

[Effect]

In the method of the present invention, when developing a new type of mask ROM integrated circuit, a cell placement information conversion file (52
) and bulk exposure data file (55) are generated and registered, and when write data is given, ROM pattern exposure data is easily generated using the cell placement information file (52), and then The bulk exposure data of the bulk exposure data file (55) is combined to obtain exposure data for the entire mask ROM integrated circuit.

Therefore, the processing when store data is given becomes much easier than before, and the processing time is greatly reduced.

〔Example〕

FIG. 2 shows a block diagram of a system for implementing the method of the present invention.

In the figure, 40 is a CPU, and 41.42 is a storage device. Programs for each job step shown in FIG. 1 are stored in the storage device 41, and are sequentially read and executed by the CPU 40.

The storage device 42 stores each file shown in FIG. Further, the card reader 43 reads the input card and outputs the CP.
Supply to U40.

FIG. 1 shows a system flowchart of one embodiment of the method of the present invention. This flowchart relates to the cell forming layer, and in the method of the present invention, exposure data creation is divided into three parts.

In FIG. 1A, cell placement information 50 input by a card is first converted from Ebisudic code to binary code in a cell placement information translation process of job step 51. After this, in job step 51, the pattern is developed hierarchically, the reticle magnification is multiplied by the reticle magnification for each cell pattern, that is, each cell forming window pattern, and the shift (pattern correction) such as proximity effect correction is performed. The field is divided, the scanning order of cell patterns in each divided subfield is determined, and a cell placement information conversion file 52 is generated.

This cell placement information conversion file 52 has the placement position on the chip and the address in the memory for each cell pattern, and is shown in FIG. This is the exposure data of the ROM pattern 13 as shown.

In FIG. 1B, the bulk information file 53 stores bulk information regarding the decoder 14, sense amplifier 15, etc., excluding the ROM pattern 13 in the main pattern 11.

This bulk information file 53 is subjected to bulk exposure data creation processing in job step 54.

Here, patterns are developed hierarchically, multiplied by the reticle magnification for each pattern, shifts such as proximity effect correction are performed, multiple exposure parts between adjacent patterns are removed, and field division and subfield division are performed. A bulk exposure data file 5 for exposing the bulk of the decoder 14, sense amplifier 15, etc. by determining the scan order of patterns in each divided subfield.
Generate 5.

The cell placement information translation process and bulk exposure data creation process shown in FIGS.
The cell placement information file 52 is executed only at the beginning of developing one type of OM integrated circuit, and is obtained thereby.
The bulk exposure data file 55 is registered and stored in a library.

In FIG. 1(C), a write data file 56 stores data that the user writes into the mask ROM. The editing instruction information 57 input to the card indicates that the write data file 56 has a configuration of, for example, 4 files of 8 bits per word and 1 Mbit each, and the type of mask ROM to be manufactured is, for example, 1 file of 4 Mbits with 32 bits per word. In addition, the information instructing the editing of the case, the type name of the mask ROM to be manufactured, and the mask ROM1. :W Consists of information such as a user number to identify the data to be imported.

In the input data processing of job step 58, the write data file 56 is edited according to the edit instruction information 57, and a data check is performed using the error detection code added to the write data to generate five truth value data files.

These five truth value data files contain, for each bit of write data, an address in the memory, and a truth value of 717 or Y Q 1 (for example, v
lv indicates that there is a cell formation window), and the product name and user number are also added.

In the ROM pattern generation process of job step 60, the truth value data file 5-9 is read, the cell placement information conversion file 52 and the bulk exposure data file 55 registered in the library are read, and the truth value data file 59 and the bulk exposure data file 55 are read. The cell distribution information file 52 is matched with the address in the memory, and ROM pattern exposure data is generated by taking into account information on the presence or absence of a cell formation window for each cell pattern. Along with this, a pattern that displays the product name and user number is added to the bulk exposure data, and then merged with the exposure data of the ROM pattern to generate an exposure data file 61 for exposing the entire main pattern 11 with an electron beam exposure device. do.

Already developed types of masks 1 In OM, the input data processing [58
and ROM pattern generation processing are executed.

Executing all the processes shown in Figure 1 (A), (B), and (C) requires the same processing time as before, but it takes a relatively long time for mask ROMs of already developed types. Since there is no need to execute job steps 51 to 54, the time to execute the job in FIG. 1(C) is shorter than the conventional 115
It is shortened to ~1/10.

〔Effect of the invention〕

As described above, according to the exposure data creation method for a mask ROM integrated circuit of the present invention, the processing time required to create exposure data is significantly shortened compared to the conventional method, and product delivery times can be shortened. It is extremely useful in practice.

[Brief explanation of the drawing]

FIG. 1 is a system flowchart of an embodiment of the method of the present invention, FIG. 2 is a system configuration diagram for realizing the method of the present invention, FIG. 3 is a diagram for explaining a mask ROM integrated circuit, and FIG. 4 is a diagram for explaining a mask ROM integrated circuit. A diagram for explaining a multilayer mask, Figure 5 is R
FIG. 6 is a diagram for explaining an OM cell, FIG. 6 is a system flowchart of a conventional method, and FIG. 7 is a diagram for explaining a part of the process in FIG. 6. In the figure, 50 is cell placement information, 51 is cell placement information translation processing, and 52 is cell placement F! I information conversion file, 53 is bulk information file? 54 is a bulk exposure data creation process, 55 is a bulk exposure data file, 56 is a write data file, 58 is input data processing, 59 is a truth value data file, and 60 is a ROM pattern generation process. Figure 2 square? Figure 7 s 3 diagram for multiple squares 2 Mouflo Ordinance W-) Figure 6

Claims (1)

[Claims] In a single product, only the pattern (13) of the ROM part differs depending on the data to be written, and the patterns (14, 15) of the peripheral circuit part other than the pattern (13) of the ROM part are the same. In a method for creating exposure data for a mask ROM integrated circuit, which creates exposure data for manufacturing a mask ROM integrated circuit (10) using an exposure apparatus, cell arrangement information (50) of a plurality of ROM cells constituting the ROM section is written. Regardless of the data value, it is pre-processed into the form used by the exposure equipment, and the cell arrangement information conversion file (52
) (51), and the exposure apparatus registers the pattern (14) of the peripheral circuit section based on the layout information of the pattern of the peripheral circuit section.
, 15) is generated in advance and registered as a bulk exposure data file (55) (54), and when the data to be written is given, the truth of each bit of the data to be written is ROM pattern exposure data to be used for exposing the pattern (13) of the ROM section in the exposure device is generated from the value and the cell information conversion file (52), and the ROM pattern exposure data is generated from the bulk exposure data file (55). A method for creating exposure data for a mask ROM integrated circuit, characterized in that exposure data for the entire mask ROM integrated circuit (10) is obtained (60).