JPH01255296A - Manufacture of multilayer interconnection substrate - Google Patents

Manufacture of multilayer interconnection substrate

Info

Publication number
JPH01255296A
JPH01255296A JP8341488A JP8341488A JPH01255296A JP H01255296 A JPH01255296 A JP H01255296A JP 8341488 A JP8341488 A JP 8341488A JP 8341488 A JP8341488 A JP 8341488A JP H01255296 A JPH01255296 A JP H01255296A
Authority
JP
Japan
Prior art keywords
resin
inner layer
copper foil
base material
layer material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8341488A
Other languages
Japanese (ja)
Inventor
Yoshinori Urakuchi
浦口 良範
Shoji Kurisu
栗栖 昭治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP8341488A priority Critical patent/JPH01255296A/en
Publication of JPH01255296A publication Critical patent/JPH01255296A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/385Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by conversion of the surface of the metal, e.g. by oxidation, whether or not followed by reaction or removal of the converted layer

Abstract

PURPOSE:To improve oxidation resistance, solder heat resistance of an inner layer copper foil and the adhesive properties of the inner layer copper foil by treating the foil with a mixture solution of potassium persulfate and sodium hydroxide at a specific temperature for a specific period of time, and then laminating it integrally with an outer layer material through a resin-impregnated base material. CONSTITUTION:A both-side copper-lined glass cloth material base epoxy resin inner layer material having approx. 1mm of thickness having a copper foil is treated with mixture solution of potassium persulfate and sodium hydroxide at 50-56 deg.C of treating temperature for 140-240sec. The inner layer material and an outer layer material are laminated integrally through a resin impregnated base material. As the resin of the base material, phenol resin, cresol resin, epoxy resin, unsaturated polyester resin, etc., is employed, and the thickness is preferably 0.01-1mm.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は電気機器、計算機器、通信機器等に用いられる
多層配線基板の製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a multilayer wiring board used in electrical equipment, computing equipment, communication equipment, etc.

〔従来の技術〕[Conventional technology]

従来、電気機器等に用いられる多l−配&lth基板の
内j−銅箔は亜塩′5酸す) IIウムや過硫酸力11
ウムで酸化処理後、樹脂含浸基材を介して外1−材と積
層一体化することによって得られている。
Conventionally, the copper foil used in multilayer & lth substrates used in electrical equipment, etc. is made of nitrous chloride (II) and persulfuric acid (11).
After being oxidized with aluminum, the material is laminated and integrated with the outer material via a resin-impregnated base material.

〔発明か解決しようとする問題点〕[Problem that the invention attempts to solve]

従来の技術で述べたように多層配線基板の内層銅箔を吐
塩素酸ナトIIウムで処理すると銅箔の耐酸性、接着性
が低下し、内層銅箔を過信酸カリウムで処理すると銅箔
の半田耐熱性、接着性が低下すると論う問題があった。
As described in the conventional technology, when the inner layer copper foil of a multilayer wiring board is treated with sodium chlorate, the acid resistance and adhesion of the copper foil decrease, and when the inner layer copper foil is treated with potassium superoxide, the copper foil deteriorates. There was a problem that solder heat resistance and adhesiveness deteriorated.

本発明は従来の技術における上述の問題点に鑑みてなさ
れたもので、その目的とするところは、内層銅箔の′#
酸性、接着性、半田耐熱性が向上した多層配線基板の與
遣方法を提供することにある。
The present invention has been made in view of the above-mentioned problems in the prior art, and its purpose is to
An object of the present invention is to provide a method for providing a multilayer wiring board with improved acidity, adhesiveness, and soldering heat resistance.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は内層銅箔を過硫酸力+1つムと水酸化ナトリウ
ムとの混合溶液で処理温度50〜56℃、処理時間14
0〜240秒間で処理後、樹脂含浸基材を介して外層材
と積層一体化することを%徴とする多層配線基板の製造
方法のため上記目的を達成することができたもので、以
下本発明の詳細な説明する。
In the present invention, the inner layer copper foil is treated with a mixed solution of persulfuric acid + 1 mm and sodium hydroxide at a temperature of 50 to 56°C and a treatment time of 14
This method of manufacturing a multilayer wiring board is characterized by laminating and integrating the outer layer material through the resin-impregnated base material after processing for 0 to 240 seconds. Detailed description of the invention.

不発明は過硫酸力11ウムと水酸化ナトリウムとの混合
溶液を特定の処理温度、処理時間でもって処理するもの
で、規定の範囲外では処理語が粗面化しなか−たり、粗
大になり1尚ざるので耐酸性、接着性、半田耐熱性を向
上させることかできな−。
The invention involves treating a mixed solution of 11 um persulfate and sodium hydroxide at a specific treatment temperature and treatment time, and if it is outside the specified range, the treated surface may not become rough or may become coarse. However, it is not possible to improve acid resistance, adhesion, and soldering heat resistance.

樹脂含浸基材の樹脂としてはフェノール樹脂、クレゾー
ル樹脂、エポキシ樹脂、不飽和ポリニスデル樹脂、メラ
ミン樹脂、ポリイミド樹脂、ポリフェニレンオキサイド
樹脂、弗化硝脂亭の合成樹脂を用b%該(ν(脂をガラ
ス、アスベスト等の無機繊維やポリエステル、ボ11ア
ミド、ボ;1ビニルアルコール、ボ11ウレタン、ポリ
イミド等の有“機合成繊維や、木綿等の天然繊維の織布
、不織布、マット、ネーjト、寒冷紗、紙等の基材に乾
燥後の樹脂普が40〜60重赦%(以下旭に憾と記す)
になるように含な、乾燥してなる厚み0.01〜1 m
mの樹脂含浸基材で所要枚数を介在させるものである。
As the resin for the resin-impregnated base material, phenolic resin, cresol resin, epoxy resin, unsaturated polynisder resin, melamine resin, polyimide resin, polyphenylene oxide resin, and synthetic resin of fluorinated nitrate resin are used. Woven fabrics, non-woven fabrics, mats, and nets made of inorganic fibers such as glass and asbestos, organic synthetic fibers such as polyester, polyester, vinyl alcohol, polyurethane, polyimide, and natural fibers such as cotton. , 40-60% resin after drying on base materials such as cheesecloth and paper (hereinafter referred to as "Asahi")
The dry thickness is 0.01 to 1 m.
The required number of resin-impregnated base materials of m are interposed.

外;−材としては銅箔、アルミニウム箔、ニクケル箔等
のような金属箔や片面金属張積層板を用するものである
。積層−法化手段についてはプレス、ロール、ダブルベ
ルト等のような積層手段であればよく、特に限定するも
のではなhoなお処理液の濃度につ−ては特に限定する
ものではなAが液の循環口を3001!/分以上とし、
揺動回数を第1回目40−50回/分 、第2回目20
−30回/分にすることが好ましbo 以下本発明を実施例にもとづhて説明する。
As the material, a metal foil such as copper foil, aluminum foil, Nikkel foil, or a single-sided metal-clad laminate is used. The lamination method may be any lamination means such as a press, roll, double belt, etc., and there are no particular limitations on the concentration of the processing solution. 3001 circulation ports! /minute or more,
The number of oscillations was 40-50 times/min for the first time, 20 times for the second time.
-30 times/min is preferable.The present invention will be explained below based on Examples.

実施例 厚さ0.035 vxの銅箔を有する厚さ1絹の両面銅
張ガラス布基材エポキシ樹脂内層材を、下記組放の処理
液で53 ”Cにおいて190秒間処理した。
EXAMPLE A 1-silk double-sided copper-clad glass cloth substrate epoxy resin inner layer material with a copper foil having a thickness of 0.035 vx was treated with the following treatment solution at 53''C for 190 seconds.

過硫酸力11ウム      xsl/1水酸化ナトリ
ウム     301/1次に内層材の上下に樹脂含有
普45係の厚さ0.1mlのエポキシ樹脂含浸ガラス布
基材を夫々2枚づつ介して厚さ(1,035mmの銅箔
を配設した積層体を成形圧力40に9/d、x6o℃で
90分間加熱加圧成形して4油回路配線基板を得た。
Persulfate power 11um A 4-oil circuit wiring board was obtained by heat-pressing molding a laminate on which a 1,035 mm copper foil was placed at a molding pressure of 9/d at a molding pressure of 40° C. for 90 minutes at x6° C.

比較例1 実施例の処理液を亜塩素酸ナト11ウム2of/1に変
えた以外は実施例と同様に処理して4油回路配線基板を
得tこ。
Comparative Example 1 A 4-oil circuit wiring board was obtained in the same manner as in the example except that the treatment liquid in the example was changed to 2 of 1 1/1 sodium chlorite.

比較例2 実施例の処理液を過硫酸カリウム15 f/lに変えた
以外は実施例と同様に処理して4油回路配線基板を得た
Comparative Example 2 A 4-oil circuit wiring board was obtained in the same manner as in the example except that the treatment liquid in the example was changed to 15 f/l of potassium persulfate.

実施例及び比較例1と2の4油回路配線基板の性窪は第
1表のようである。
The characteristics of the four-oil circuit wiring boards of Examples and Comparative Examples 1 and 2 are as shown in Table 1.

〔発明の効果〕〔Effect of the invention〕

本発明は上述した如く構成されてbる。特許請求の範囲
第1項に記載した構成を有する多層配線基板の製造方法
におhでは、内層銅箔の耐酸性、半田耐熱性、内層銅箔
の接着性が著るしく向上する効果を有してbる。
The present invention is constructed as described above. The method for manufacturing a multilayer wiring board having the structure described in claim 1 has the effect of significantly improving the acid resistance of the inner layer copper foil, the soldering heat resistance, and the adhesiveness of the inner layer copper foil. Do it.

Claims (1)

【特許請求の範囲】[Claims] (1)内層銅箔を過硫酸カリウムと水酸ナトリウムとの
混合溶液で処理温度50〜56℃、処理時間140〜2
40秒間で処理後、樹脂含浸基材を介して外層材と積層
一体化することを特徴とする多層配線基板の製造方法。
(1) Inner layer copper foil is treated with a mixed solution of potassium persulfate and sodium hydroxide at a temperature of 50 to 56°C and a treatment time of 140 to 2
A method for producing a multilayer wiring board, which comprises processing for 40 seconds and then laminating and integrating with an outer layer material via a resin-impregnated base material.
JP8341488A 1988-04-05 1988-04-05 Manufacture of multilayer interconnection substrate Pending JPH01255296A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8341488A JPH01255296A (en) 1988-04-05 1988-04-05 Manufacture of multilayer interconnection substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8341488A JPH01255296A (en) 1988-04-05 1988-04-05 Manufacture of multilayer interconnection substrate

Publications (1)

Publication Number Publication Date
JPH01255296A true JPH01255296A (en) 1989-10-12

Family

ID=13801777

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8341488A Pending JPH01255296A (en) 1988-04-05 1988-04-05 Manufacture of multilayer interconnection substrate

Country Status (1)

Country Link
JP (1) JPH01255296A (en)

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