JPH02303194A - Manufacture of multilayer wiring board - Google Patents
Manufacture of multilayer wiring boardInfo
- Publication number
- JPH02303194A JPH02303194A JP12521389A JP12521389A JPH02303194A JP H02303194 A JPH02303194 A JP H02303194A JP 12521389 A JP12521389 A JP 12521389A JP 12521389 A JP12521389 A JP 12521389A JP H02303194 A JPH02303194 A JP H02303194A
- Authority
- JP
- Japan
- Prior art keywords
- copper foil
- layer copper
- inner layer
- potassium persulfate
- sodium hydroxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 36
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 34
- 239000011889 copper foil Substances 0.000 claims abstract description 34
- 239000000463 material Substances 0.000 claims abstract description 17
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 4
- 230000032683 aging Effects 0.000 claims description 3
- 229920005989 resin Polymers 0.000 abstract description 8
- 239000011347 resin Substances 0.000 abstract description 8
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 abstract description 3
- 239000000203 mixture Substances 0.000 abstract description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 abstract description 3
- 235000011152 sodium sulphate Nutrition 0.000 abstract description 3
- 239000007788 liquid Substances 0.000 abstract 3
- 239000000243 solution Substances 0.000 description 10
- 238000010030 laminating Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- UKLNMMHNWFDKNT-UHFFFAOYSA-M sodium chlorite Chemical compound [Na+].[O-]Cl=O UKLNMMHNWFDKNT-UHFFFAOYSA-M 0.000 description 2
- 229960002218 sodium chlorite Drugs 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は電気機器、計算機器、通信機器等に用いられる
多層配線基板の製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a multilayer wiring board used in electrical equipment, computing equipment, communication equipment, etc.
従来、電気機器等に用いられる多層配線基板の内層銅箔
は亜塩素酸ナトリウムや過硫酸カリウムで酸化処理後、
樹脂含浸基材を介して外層材と積層一体化することによ
って得られている。しかし内層銅箔を亜塩素酸ナトリウ
ムで処理すると銅箔の耐酸性、接着性が低下し、内層銅
箔を過硫酸カリウムで処理すると銅箔の半田耐熱性、接
着性が低下する。このため特願昭63−83414で開
示されたように過硫酸カリウムと水酸化ナトリウムとの
混合溶液で処理し内層銅箔の耐酸性、接着性、半田耐熱
性を向上させることが行なわれてAる。しかし過硫酸カ
リウムと水酸化ナトリウムとの混合溶液で内層銅箔を処
理すると、初期におりては色ムラ、密着性不良等が発生
する問題があった。Conventionally, the inner layer copper foil of multilayer wiring boards used in electrical equipment, etc. has been oxidized with sodium chlorite or potassium persulfate,
It is obtained by laminating and integrating an outer layer material through a resin-impregnated base material. However, if the inner layer copper foil is treated with sodium chlorite, the acid resistance and adhesiveness of the copper foil will decrease, and if the inner layer copper foil is treated with potassium persulfate, the soldering heat resistance and adhesiveness of the copper foil will decrease. For this reason, as disclosed in Japanese Patent Application No. 63-83414, it has been attempted to treat the inner layer copper foil with a mixed solution of potassium persulfate and sodium hydroxide to improve the acid resistance, adhesion, and soldering heat resistance of the inner layer copper foil. Ru. However, when the inner layer copper foil is treated with a mixed solution of potassium persulfate and sodium hydroxide, problems such as color unevenness and poor adhesion occur in the initial stage.
従来の技術で述べたように内層銀箔を過硫酸カリウムと
水酸化ナトリウムとの混合溶液で処理すると初期におり
て不良率の発生が大になる。本発明は従来の技術におけ
る上述の問題点に鑑みてなされたもので、その目的とす
るところは、色ムラ、密着性バラツキのな論内層寮箔を
得ることによって内層銅箔の色ムラ、密着性バラツキの
な込多層配線基板の製造方法を提供することにある。As described in the prior art section, if the inner layer silver foil is treated with a mixed solution of potassium persulfate and sodium hydroxide, the failure rate will increase at an early stage. The present invention has been made in view of the above-mentioned problems in the conventional technology, and its purpose is to prevent color unevenness and adhesion of the inner layer copper foil by obtaining an inner layer copper foil that is free from color unevenness and adhesion. It is an object of the present invention to provide a method for manufacturing a smooth multilayer wiring board with uniformity in properties.
c問題点を解決するための手段〕
本発明は過硫酸カリウム、水酸化ナトIJウムを主成分
とする内層銅箔処理液を40〜65℃で10〜60分間
熟成してから内層銅箔を処理後、樹脂含浸基材を介して
外層材と積層一体化することを特徴とする多層配線基板
の製造方法のため、内層銅箔処理液の不安定時期をなく
することができたもので、以下本発明の詳細な説明する
。Means for Solving Problems] The present invention is based on aging an inner layer copper foil treatment solution containing potassium persulfate and sodium hydroxide as main components at 40 to 65°C for 10 to 60 minutes, and then removing the inner layer copper foil. After the treatment, the multilayer wiring board manufacturing method is characterized by laminating and integrating with the outer layer material via the resin-impregnated base material, which eliminates the unstable period of the inner layer copper foil treatment solution. The present invention will be explained in detail below.
本発明に胴込る内層銅箔処理液は、過硫酸カリウム、水
酸化ナトリウムを主成分とするもので、好ましくは下記
組成であることが望ましい。The inner layer copper foil treatment solution used in the present invention contains potassium persulfate and sodium hydroxide as main components, and preferably has the following composition.
過硫酸カリウム 10〜30 f/1水酸化
ナトリウム 40〜80 f/1硫酸ナトリウ
ム 1〜60ダ/l上記内層銅箔処理液は
配合後、直ちに用いることなく40〜65℃で10〜6
0分間熟成してから用いることが必要である。即ち40
℃未満、10分間未満では酸化剤の活動が不安定で内層
銅箔に色ムラ、密着性不良を与え、65℃をこえ、60
分間をこえると酸化剤の自然分解が大きく、内層銅箔処
理液を有効に活用することができなくなる。熟成手段と
しては自然放置もよ込が好ましくは内層銅箔処理液を循
環することが望ましく、更に 過しつつ循環することが
好ましいことである。樹脂含浸基材の樹脂としてはフェ
ノール樹脂、クレゾール樹脂、エポキシ樹脂、不飽和ポ
リエステル樹脂、メラミン樹脂、ポリイミド樹脂、ポリ
フェニレンオキサイド樹脂、弗化樹脂等の合成樹脂を用
い、該樹脂をガラス、アスベスト等の無機繊維やポリエ
ステル、ポリアミド、ポリビニルアルコール、ポリウレ
タン、ポリイミド等の有機合成繊維や、木綿等の天然繊
維の織布、不織布、マ、ソト、ネ−,ト、寒冷紗、紙等
の基材に乾燥後の樹脂量が40〜60重量係(以下単に
憾と記す)になるように含浸、乾燥してなる厚み0.O
f〜IHの樹脂含浸基材で所要枚数を介在させるもので
ある。外層材としては銅箔、アルミニウム箔、ニッケル
箔等のような金属箔や片面金属張積層板を用Aるもので
ある。積層一体化手段につめてはプレス、ロール、ダブ
ルベルト等のような積層手段であればよく、特に限定す
るものではな−。Potassium persulfate 10-30 f/1 Sodium hydroxide 40-80 f/1 Sodium sulfate 1-60 da/l The above inner layer copper foil treatment solution is heated at 40-65°C for 10-6 days without using immediately after blending.
It is necessary to use it after aging for 0 minutes. That is 40
℃ for less than 10 minutes, the activity of the oxidizing agent is unstable, causing color unevenness and poor adhesion to the inner layer copper foil;
If the time exceeds 1 minute, the natural decomposition of the oxidizing agent will be large, and the inner layer copper foil treatment solution will not be able to be used effectively. As a ripening means, it is preferable to leave the inner layer copper foil treatment solution naturally or to let it soak in. It is also preferable to circulate the inner layer copper foil treatment solution while allowing it to cool. As the resin for the resin-impregnated base material, synthetic resins such as phenol resin, cresol resin, epoxy resin, unsaturated polyester resin, melamine resin, polyimide resin, polyphenylene oxide resin, and fluorinated resin are used. After drying, it can be applied to base materials such as inorganic fibers, organic synthetic fibers such as polyester, polyamide, polyvinyl alcohol, polyurethane, and polyimide, as well as natural fibers such as cotton, woven fabrics, nonwoven fabrics, magenta, sotho, net, gauze, paper, etc. It is impregnated and dried so that the resin amount is 40 to 60% by weight (hereinafter simply referred to as "regret"), and the resulting product has a thickness of 0. O
A required number of resin-impregnated base materials of f to IH are interposed. As the outer layer material, metal foil such as copper foil, aluminum foil, nickel foil, etc., or a single-sided metal-clad laminate is used. The laminating and integrating means may be any laminating means such as a press, a roll, a double belt, etc., and is not particularly limited.
以下本発明を実施例にもとづいて説明する。The present invention will be explained below based on examples.
実施例
厚さQ、035flの銅箔を有する厚さIMの両f銅張
ガラス布基材エポキシ樹脂内層材を、下記組成の内層銅
°箔処理液を配合後、50℃で30分間、Zoo //
分 で循環して熟成した内層銅箔処理液で190秒間処
理した。Example A copper-clad glass cloth base epoxy resin inner layer material having a thickness Q and a thickness IM having a copper foil of 0.35fl was mixed with an inner layer copper foil treatment solution having the following composition, and then Zoo-treated at 50°C for 30 minutes. ///
The inner layer copper foil treatment solution was circulated and aged for 190 seconds.
過硫蛋カリウム 201/1水酸化ナトリ
ウム 60 f/1硫酸ナトリウム
101/1次に内層材の上下に樹脂含有fi45
’1の厚さ0.1鱈のエポキシ樹脂含浸ガラス布基材
を夫々2枚づつ介して厚さ0.0359RmO銅箔を配
設した積層体を成形圧力40 Kq/d、 160℃
で90分間加熱加圧成形して4層回路配線基板を得た。Potassium persulfate 201/1 Sodium hydroxide 60 f/1 Sodium sulfate
101/1 Next, fi45 containing resin on the top and bottom of the inner layer material
A laminate in which 0.0359 RmO copper foil was placed between two epoxy resin-impregnated glass cloth substrates each having a thickness of 0.1 mm was molded at a pressure of 40 Kq/d and at 160°C.
A four-layer circuit wiring board was obtained by heat-pressing molding for 90 minutes.
比較例
実施例と同じ内層銅箔処理液を配合後、直ちに実施例と
同じ内層材を処理した以外は実施例と同様に処理して4
層回路配線基板を得た。Comparative Example After blending the same inner layer copper foil treatment solution as in the example, the same inner layer material as in the example was immediately treated.
A layered circuit wiring board was obtained.
実施例及び比較例の4層回路配線基板の性能は第1表の
ようである。Table 1 shows the performance of the four-layer circuit wiring boards of Examples and Comparative Examples.
本発明は上述した如く構成されている。特許請求の範囲
第1項、に記載した構成を有する多層配線基板の製造方
法においては、内層銅箔の色ムラ、密着性が向上する効
果を有している。The present invention is constructed as described above. The method for manufacturing a multilayer wiring board having the structure described in claim 1 has the effect of improving color unevenness and adhesion of the inner layer copper foil.
Claims (1)
る内層銅箔処理液を40〜65℃で10〜60分間熟成
してから内層銅箔を処理後、樹脂含浸基材を介して外層
材と積層一体化することを特徴とする多層配線基板の製
造方法。(1) After aging the inner layer copper foil treatment solution containing potassium persulfate and sodium hydroxide as main components at 40 to 65°C for 10 to 60 minutes, and then treating the inner layer copper foil, pass it through the resin-impregnated base material to the outer layer material. 1. A method for manufacturing a multilayer wiring board, characterized in that it is laminated and integrated with a multilayer wiring board.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12521389A JPH02303194A (en) | 1989-05-18 | 1989-05-18 | Manufacture of multilayer wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12521389A JPH02303194A (en) | 1989-05-18 | 1989-05-18 | Manufacture of multilayer wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02303194A true JPH02303194A (en) | 1990-12-17 |
Family
ID=14904675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12521389A Pending JPH02303194A (en) | 1989-05-18 | 1989-05-18 | Manufacture of multilayer wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02303194A (en) |
-
1989
- 1989-05-18 JP JP12521389A patent/JPH02303194A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2004349654A (en) | Copper foil with insulator layer, its manufacturing method, and multilayer printed circuit board using it | |
JPH02303194A (en) | Manufacture of multilayer wiring board | |
JPH0244797A (en) | Manufacture of multilayer interconnection board | |
JPH0244798A (en) | Manufacture of multilayer interconnection board | |
JPH0244799A (en) | Manufacture of multilayer interconnection board | |
JPS6340669B2 (en) | ||
JPH03129796A (en) | Manufacture of printed circuit board | |
JPH01255296A (en) | Manufacture of multilayer interconnection substrate | |
JPH01318286A (en) | Manufacture of multilayer wiring board | |
JPH0336315B2 (en) | ||
JPH01255298A (en) | Manufacture of multilayer interconnection substrate | |
JPH02303191A (en) | Manufacture of printed wiring board | |
JPH02277294A (en) | Manufacture of printed wiring board | |
JPH02215191A (en) | Manufacture of multilayer wiring board | |
JP2661123B2 (en) | Low permittivity laminates based on composite twisted woven fabric | |
JPH0464434A (en) | Thermosetting resin laminated sheet | |
JPH02303187A (en) | Manufacture of printed wiring board | |
JPH02277292A (en) | Manufacture of printed circuit board | |
JPH02187332A (en) | Manufacture of laminated sheet | |
JPH02303190A (en) | Manufacture of printed wiring board | |
JPH02277293A (en) | Manufacture of printed wiring board | |
JPH04223113A (en) | Manufacture of laminated sheet | |
JPH02215193A (en) | Manufacture of multilayer wiring board | |
JPH02250393A (en) | Manufacture of printed board | |
JPH01244855A (en) | Manufacture of electric laminate |