JPH01239982A - Mounting of semiconductor laser - Google Patents
Mounting of semiconductor laserInfo
- Publication number
- JPH01239982A JPH01239982A JP6755088A JP6755088A JPH01239982A JP H01239982 A JPH01239982 A JP H01239982A JP 6755088 A JP6755088 A JP 6755088A JP 6755088 A JP6755088 A JP 6755088A JP H01239982 A JPH01239982 A JP H01239982A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- electrode
- die
- layer
- heat sink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 31
- 239000002184 metal Substances 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 18
- 239000013078 crystal Substances 0.000 claims abstract description 15
- 150000002739 metals Chemical class 0.000 claims abstract description 4
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 3
- 229910052737 gold Inorganic materials 0.000 claims abstract description 3
- 239000011651 chromium Substances 0.000 claims description 11
- 230000004927 fusion Effects 0.000 claims description 9
- 239000010931 gold Substances 0.000 claims description 6
- 238000010030 laminating Methods 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- JVPLOXQKFGYFMN-UHFFFAOYSA-N gold tin Chemical compound [Sn].[Au] JVPLOXQKFGYFMN-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 19
- 229910045601 alloy Inorganic materials 0.000 abstract description 11
- 239000000956 alloy Substances 0.000 abstract description 11
- 238000003466 welding Methods 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 3
- 238000001467 acupuncture Methods 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
ヒートシンクに融着金属を介して融着する半導体レーザ
の実装方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for mounting a semiconductor laser by fusing it to a heat sink via a fusing metal.
[従来の技術]
従来の半導体レーザの実装方法は第2図に示すように、
半導体レーザ結晶の(202)電極上iこ、(201)
のA uS n合金を形成し、AuSn合金を融着金属
として、半導体レーザ結晶をヒートシンクにグイポンド
していた。[Prior art] The conventional semiconductor laser mounting method is as shown in Figure 2.
On the (202) electrode of the semiconductor laser crystal, (201)
A semiconductor laser crystal was bonded to a heat sink using the AuSn alloy as a fusion metal.
しかし従来の技術では、融着金属を半導体レーザ結晶上
にパターン形成する際のリフトオフ工程の際、電極面と
AuSn合金の密着性が悪いため、融着金属パターンが
りフトオフ部分と共に半導体レーザ結晶の電極面からは
がれてしまったり、さらにダイボンド後も密着性が悪い
ため、その後のワイヤボンディング工程で半導体レーザ
結晶がヒートシンクからとれてしまうなどの問題点を有
し歩留りを下げていた。そこで本発明はそのような問題
点を解決するもので、その目的とするところは、半導体
レーザ結晶の電極面との密着性が良く、良好なグイポン
ドを行うことのできる半導体レーザの実装方法を提供す
るところにある。However, in the conventional technology, during the lift-off process when patterning the fusion metal on the semiconductor laser crystal, the adhesion between the electrode surface and the AuSn alloy is poor, so the fusion metal pattern and the lift-off part are removed from the electrode of the semiconductor laser crystal. There were problems such as peeling off from the surface and poor adhesion even after die bonding, resulting in the semiconductor laser crystal coming off from the heat sink during the subsequent wire bonding process, which lowered yield. SUMMARY OF THE INVENTION The present invention aims to solve such problems, and its purpose is to provide a method for mounting a semiconductor laser that has good adhesion to the electrode surface of a semiconductor laser crystal and can perform good gripping. It's there to do.
[課題を解決するための手段〕
上記課題を解決するために本発明の半導体レーザの実装
方法は、半導体レーザの重陽面上に融着金属として、ク
ロム、金、金錫合金をllllli次積層する工程と、
前記融着金属を介して半導体レーザをヒートシンクにダ
イボンドする工程を含むことを特徴とする。[Means for Solving the Problems] In order to solve the above problems, the semiconductor laser mounting method of the present invention involves laminating chromium, gold, and a gold-tin alloy as fusion metals on the double positive surface of the semiconductor laser. process and
The method is characterized in that it includes a step of die-bonding the semiconductor laser to the heat sink via the fusion metal.
[実 施 例1
第1図は本発明の半導体レーザの実装方法における半導
体レーザの斜視図である。(105)の半導体レーザ結
晶の(104)電極上にレジストパターンを通常のフォ
ト工程により形成し、Crを100A、1へUを500
人、AuSn合金を1μm、順次、+104)電極面に
蒸着する。蒸着後、(104)電極上以外のレジスト上
の蒸着膜をリフトオフ工程によって取り除き所望のパタ
ーンを有する(103)Cr層、(102)Au六、(
101)AuSn合金層からなる融着金属層を形成する
。[03)のCr層が(104)W eとの密着性を高
めるためリフトオフ工程で電極面から融着金属層がはが
れてしうことばない。[Example 1] FIG. 1 is a perspective view of a semiconductor laser in the semiconductor laser mounting method of the present invention. A resist pattern is formed on the (104) electrode of the (105) semiconductor laser crystal by a normal photo process, and Cr is 100A and U is 500A.
1 μm of AuSn alloy was sequentially deposited on the +104) electrode surface. After the vapor deposition, the vapor deposited film on the resist other than the (104) electrode is removed by a lift-off process to form a (103) Cr layer, (102) Au6, (102) Au6, (
101) Form a fused metal layer consisting of an AuSn alloy layer. Since the [03) Cr layer enhances the adhesion with the (104)We, the fused metal layer does not peel off from the electrode surface during the lift-off process.
次にこの融着金属層を介してヒートシンクに半導体レー
ザ結晶をダイポンドする。(103)のCr層と(10
1)のA u S n合金層との間の(102)Au層
は、(103)のCr層が(+01)AuSn合金層を
侵してヒートシンクとの密着性を弱めることを防ぎ、良
好なダイボンドが可能となる。Next, a semiconductor laser crystal is die-bonded to the heat sink via this fused metal layer. (103) Cr layer and (10
The (102) Au layer between the A u S n alloy layer in 1) prevents the (103) Cr layer from corroding the (+01) AuSn alloy layer and weakening the adhesion with the heat sink, resulting in good die bonding. becomes possible.
[発明の効果1
以上述べたように本発明によれば、融着金属として、半
導体レーザ結晶の電極上にCr層、Au層 AuSn合
金層を順次積層し、これを介してヒートシンクにダイボ
ンドすることにより、次のような効果を有する。リフト
オ)工程により融着金属パターンを形成する際に密着性
の悪さから生ずる融着金属の電極からのはかれか、密着
性の良いCr層を積層することにより、まったくなくな
り、リフトオフ工程の歩留りを大きく向上させる。また
Au層は、Cr層がAuSn合金層と合金化してA u
S nのヒートシンクへの密着性が悪化するのを防ぎ
、良好なダイボンドが可能となる。さらに融着金属の密
着性が向上した結果、ダイボンデインクの条件の自由度
が大きくとれるため、半導体レーザ結晶へストレスを与
えないように条件を設定できタイポンドによる不良の発
生が減少する。以上のような効果により、半導体レーザ
の実装工程における歩留りを大幅に向上させ、製造コス
トを下げることができる。[Effect of the invention 1] As described above, according to the present invention, a Cr layer, an Au layer, and an AuSn alloy layer are sequentially laminated on the electrode of a semiconductor laser crystal as a fusion metal, and die-bonded to a heat sink via this. This has the following effects. The peeling of the fused metal from the electrode due to poor adhesion when forming the fused metal pattern in the lift-off process is completely eliminated by laminating a Cr layer with good adhesion, which reduces the yield of the lift-off process. greatly improve. In addition, the Au layer is formed by alloying the Cr layer with the AuSn alloy layer.
This prevents the adhesion of Sn to the heat sink from deteriorating and enables good die bonding. Furthermore, as a result of the improved adhesion of the fusion metal, the degree of freedom in die bonding conditions can be increased, allowing the conditions to be set so as not to apply stress to the semiconductor laser crystal, thereby reducing the occurrence of defects due to tie pounds. Due to the above-described effects, the yield in the semiconductor laser mounting process can be greatly improved and manufacturing costs can be reduced.
第1図は本発明の半導体レーザの実装方法における半導
体レーザの斜視図である。
第2図は従来の半導体レーザの実装方法における半導体
レーザの斜視図である。
(lO])・・・AuSn合金層
(102)・・・Au層
(103) ・・・Cr層
(104) ・・・電極
(1051・・・半導体レーザ結晶
以上
出廓人 セイコーエプソン株式会社
代理人 弁理士 最 上 務(Iti!1名)/ρi
AL4≦n参〇
/鍼 Al、IA
/ρ3 ひA
7坪 を埼FIG. 1 is a perspective view of a semiconductor laser in the semiconductor laser mounting method of the present invention. FIG. 2 is a perspective view of a semiconductor laser in a conventional semiconductor laser mounting method. (lO])...AuSn alloy layer (102)...Au layer (103)...Cr layer (104)...electrode (1051...Semiconductor laser crystal or above Supplier Agent of Seiko Epson Corporation Person Patent Attorney Mogami Tsutomu (Iti! 1 person) / ρi
AL4≦n 〇/Acupuncture Al, IA/ρ3 HiA 7 tsubo wo
Claims (1)
、金、金錫合金を順次積層する工程と、前記融着金属を
介して半導体レーザをヒートシンクにダイボンドする工
程を含むことを特徴とする半導体レーザの実装方法。A semiconductor laser comprising the steps of sequentially laminating chromium, gold, and gold-tin alloys as fusion metals on the electrode surface of a semiconductor laser crystal, and die-bonding the semiconductor laser to a heat sink via the fusion metals. How to implement.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6755088A JPH01239982A (en) | 1988-03-22 | 1988-03-22 | Mounting of semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6755088A JPH01239982A (en) | 1988-03-22 | 1988-03-22 | Mounting of semiconductor laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01239982A true JPH01239982A (en) | 1989-09-25 |
Family
ID=13348184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6755088A Pending JPH01239982A (en) | 1988-03-22 | 1988-03-22 | Mounting of semiconductor laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01239982A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999004423A1 (en) * | 1997-07-14 | 1999-01-28 | Infineon Technologies Ag | Method and device for producing a chip-substrate assembly |
EP1672790A2 (en) * | 2004-12-17 | 2006-06-21 | Seiko Epson Corporation | Surface acoustic wave device and method of manufacturing the same, ic card, and mobile electronic apparatus |
CN105880859A (en) * | 2016-04-19 | 2016-08-24 | 北京工业大学 | Heat sink with adjustable AuSn alloy compositions |
-
1988
- 1988-03-22 JP JP6755088A patent/JPH01239982A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999004423A1 (en) * | 1997-07-14 | 1999-01-28 | Infineon Technologies Ag | Method and device for producing a chip-substrate assembly |
GB2343551B (en) * | 1997-07-14 | 2002-10-30 | Infineon Technologies Ag | Method and product for producing a chip-substrate connection |
US7442582B2 (en) | 1997-07-14 | 2008-10-28 | Infineon Technologies Ag | Method for producing a chip-substrate connection |
EP1672790A2 (en) * | 2004-12-17 | 2006-06-21 | Seiko Epson Corporation | Surface acoustic wave device and method of manufacturing the same, ic card, and mobile electronic apparatus |
EP1672790A3 (en) * | 2004-12-17 | 2006-08-23 | Seiko Epson Corporation | Surface acoustic wave device and method of manufacturing the same, ic card, and mobile electronic apparatus |
US7459829B2 (en) | 2004-12-17 | 2008-12-02 | Seiko Epson Corporation | Surface acoustic wave device and method of manufacturing the same, IC card, and mobile electronic apparatus |
CN105880859A (en) * | 2016-04-19 | 2016-08-24 | 北京工业大学 | Heat sink with adjustable AuSn alloy compositions |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA2099049A1 (en) | Permanent Metallic Bonding Method | |
EP0253691B1 (en) | Silicon die bonding process | |
EP0542475B1 (en) | Bonding method using solder composed of multiple alternating gold and tin layers | |
JPH04326534A (en) | Chip bonding method of semiconductor device | |
JPH01239982A (en) | Mounting of semiconductor laser | |
US3585711A (en) | Gold-silicon bonding process | |
EP1333958A1 (en) | Method of joining surfaces | |
US3249408A (en) | Flux free bonded article | |
JPH09232690A (en) | Semiconductor device | |
JP3687161B2 (en) | Joining method of ceramic structures | |
EP0186585B1 (en) | Die bonding process | |
JPS62234352A (en) | Forming method for solder bump electrode | |
JP2013080863A (en) | Semiconductor element with connection material and method for manufacturing the same | |
CN211490318U (en) | Parallel seam welding alloy cover plate for integrated circuit packaging | |
JPH02128486A (en) | Joining layer of semiconductor laser element heat releasing body submount | |
JPS59169694A (en) | Solder and joining method thereof | |
KR100572151B1 (en) | Bonding method of a semiconductor chip using sn-in solder system | |
JPH0760836B2 (en) | Brazing material | |
JPH02183538A (en) | Semiconductor device | |
JPH03283631A (en) | Aluminum electrode of semiconductor device | |
JP2567442B2 (en) | Semiconductor device and manufacturing method thereof | |
JPS5952031B2 (en) | Cold welding method | |
KR100503411B1 (en) | Method for fabricating Au-Sn based solder layer and solder bump | |
JP2848373B2 (en) | Semiconductor device | |
JPH06286148A (en) | Bonding method for ink jet printing head |