JPH01238148A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPH01238148A JPH01238148A JP63065431A JP6543188A JPH01238148A JP H01238148 A JPH01238148 A JP H01238148A JP 63065431 A JP63065431 A JP 63065431A JP 6543188 A JP6543188 A JP 6543188A JP H01238148 A JPH01238148 A JP H01238148A
- Authority
- JP
- Japan
- Prior art keywords
- chip
- bump
- dummy
- conductor
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 25
- 239000004020 conductor Substances 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 239000011347 resin Substances 0.000 claims abstract description 9
- 229920005989 resin Polymers 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 7
- 230000008646 thermal stress Effects 0.000 abstract description 5
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 229910000679 solder Inorganic materials 0.000 description 8
- 239000000463 material Substances 0.000 description 4
- 238000009413 insulation Methods 0.000 description 3
- 239000010953 base metal Substances 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 210000004709 eyebrow Anatomy 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/14—Structure, shape, material or disposition of the bump connectors prior to the connecting process of a plurality of bump connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/303—Surface mounted components, e.g. affixing before soldering, aligning means, spacing means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/341—Surface mounted components
- H05K3/3431—Leadless components
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ワイヤレスボンディング方式による半導体チ
ップの支持基板上への実装のために、半導体チップに形
成された回路素子部上には絶縁膜を介して配線導体およ
びバンプi&tiを設けた半導体装置に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention provides an insulating film on a circuit element portion formed on a semiconductor chip in order to mount a semiconductor chip on a support substrate using a wireless bonding method. The present invention relates to a semiconductor device in which a wiring conductor and bumps i and ti are provided.
バンプ電極を用いて半導体チップを支持基板上に実装す
るのにワイヤレスボンディング方式を用いた場合、安定
した支持を目的として第2図に示すようにチップ1の周
辺の図示しないパッドの上にバンプ電8i2を形成する
ことが一触的であることはよく知られている。When a wireless bonding method is used to mount a semiconductor chip on a support substrate using bump electrodes, bump electrodes are placed on pads (not shown) around the chip 1 as shown in Figure 2 for stable support. It is well known that forming 8i2 is catalytic.
しかし、チップ1の面積が大きくなるに伴い、バンプ電
極2の間の最大距離は大きくなり、半導体材料とセラミ
ックなどの支持基板材料との熱膨腸係数差から起こるし
一トサイクル時の熱応力のため、バンプ電極接続部の損
傷ないし破壊などの故障が起こり、半導体装置の信鯨性
が低下する欠点があった。この欠点を除(ために、本出
願人の出願に係る特願昭62−279676号明細書に
記載されているように、バンプ電極をチップの中心部に
隣接するバンプ電極間の間隔がほぼ等しくなるように配
置することが提案されている。However, as the area of the chip 1 increases, the maximum distance between the bump electrodes 2 increases, which is caused by the difference in thermal expansion coefficient between the semiconductor material and the supporting substrate material such as ceramic, and the thermal stress during one cycle. As a result, failures such as damage or destruction of the bump electrode connection portion occur, resulting in a disadvantage that the reliability of the semiconductor device is reduced. In order to eliminate this drawback, as described in Japanese Patent Application No. 62-279676 filed by the present applicant, bump electrodes are arranged so that the spacing between the bump electrodes adjacent to the center of the chip is approximately equal. It is proposed to arrange it so that
本発明の課題は、上記提案の半導体装置の信頼性をさら
に向上せしめることにある。An object of the present invention is to further improve the reliability of the semiconductor device proposed above.
上記の課題の解決のために、本発明は、半導体チップの
一面上の中心部に隣接するバンプ電極相互間の間隔をほ
ぼ等しくして配置されたバンプ電極を用いてワイヤレス
ボンディング方式により半導体チップ面上の導体と対向
する支持基板面上の導体が接続される半導体装置におい
て、半導体ナツプの周辺全域にわたって半導体チップ面
および支持1&板面の少なくとも一方の前記導体と接続
される導体の存在しない個所で対向面に接触し、樹脂に
よって被覆される複数のダミーバンプが設けられたもの
とする。In order to solve the above-mentioned problems, the present invention provides a semiconductor chip surface bonding method using a wireless bonding method using bump electrodes arranged at the center of one surface of a semiconductor chip with substantially equal spacing between adjacent bump electrodes. In a semiconductor device to which a conductor on the support substrate surface facing the upper conductor is connected, the conductor connected to the conductor is not present on at least one of the semiconductor chip surface and the support 1 & plate surface over the entire periphery of the semiconductor nap. It is assumed that a plurality of dummy bumps are provided that contact the opposing surface and are covered with resin.
半導体チップの実装のためにチップ中央部にほぼ等間隔
を保って配置されたバンプ電極の周囲を全域にわたって
チップおよび半導体基板に接触するダミーバンプで囲む
ことにより、チップと基板の平行度が保持され、ねじれ
等に対する接続強度が向上する。さらにダミーバンプを
樹脂の被覆により補強することにより接続強度が一層高
(なる。For mounting a semiconductor chip, bump electrodes arranged at approximately equal intervals in the center of the chip are surrounded by dummy bumps that contact the chip and the semiconductor substrate over the entire area, thereby maintaining parallelism between the chip and the substrate. The connection strength against twisting etc. is improved. Furthermore, the connection strength is further increased by reinforcing the dummy bumps with resin coating.
第1図は本発明の一実施例のバンプ電極の配置を示し、
バンプ電極2はチップ1の中央部にそれぞれ正三角形の
頂点を占める位置にチップ内の各回路素子と支持基板の
配線導体との接続のために設けられている。従って隣接
バンプ電極2間の間隔はほぼ等しい、これらのバンプ電
極2を取囲んで、チップ1の周縁部にダミーバンプ3が
ほぼ等間隔で設けられていて、さらに樹脂4によって包
囲されている。FIG. 1 shows the arrangement of bump electrodes in an embodiment of the present invention,
Bump electrodes 2 are provided at the center of the chip 1 at positions occupying the vertices of an equilateral triangle for connecting each circuit element within the chip to the wiring conductor of the support substrate. Therefore, the distances between adjacent bump electrodes 2 are approximately equal. Dummy bumps 3 are provided at approximately equal intervals on the periphery of the chip 1, surrounding these bump electrodes 2, and are further surrounded by resin 4.
第3図はチップ1の一部を拡大して示したもので、チッ
プ1のGM域11に酸化膜51の開口部で接触するMか
らなる第一配線導体61の上に低温CVD酸化物からな
る眉間絶縁11!52を介して第二配線導体62が形成
され、絶縁[52の開口部で第一配線導体61と接触し
ている。この第二配線導体62の上および眉間絶縁II
!52の上を窒化物からなるパソシベーンッン1tfi
8で覆い、フォトエツチングで第二配線導体62の上お
よびチップlの外周近くに開口部を設ける。さらにCr
、 Cu、 AuM4を積層して下地金属層7を形成後
、フォトエツチング加工でパターンニングし、はんだめ
っきで下地金属層7上にはんだを被着し、約350℃に
加熱して球軟化し、バンプ電極2およびそれよりやや径
の大きいダミーバンプ3を形成する。はんだの被着は、
約50−の厚さに真空蒸着することによってもよい。FIG. 3 is an enlarged view of a part of the chip 1, in which low-temperature CVD oxide is formed on the first wiring conductor 61 made of M, which contacts the GM region 11 of the chip 1 at the opening of the oxide film 51. A second wiring conductor 62 is formed through the glabellar insulation 11!52, and is in contact with the first wiring conductor 61 at the opening of the insulation [52]. Insulation II above and between the eyebrows of this second wiring conductor 62
! 52 is covered with a passivation layer made of nitride.
8 and photoetching to provide an opening on the second wiring conductor 62 and near the outer periphery of the chip l. Further Cr
, Cu, and AuM4 are laminated to form the base metal layer 7, patterned by photoetching, solder is deposited on the base metal layer 7 by solder plating, and the ball is softened by heating to about 350°C. A bump electrode 2 and a dummy bump 3 having a slightly larger diameter are formed. The solder adhesion is
It may also be vacuum deposited to a thickness of about 50 mm.
第4図(al、(blは本発明の一実施例の実装工程を
示し、第2図あるいは第3図に示したように半導体チッ
プlを下向きにして配線支持基板9の上に載せる (図
aL ごの際、ダミーバンプ3とバンプ電極2の高さの
差を補償する厚さの予備はんだ層lOを基Fi9の配線
上に被着しておく、このあと、はんだをリフローさせる
が、径の小さいバンプ電極3が先に融けて予備はんだ層
と接着し、その間径の大きいダミーバンプ3で一定に保
たれるチップ1.M板9間の距離だけの高さのはんだ柱
にバンプ電極2がなる。しばらく後にダミーバンプ3が
融けて基板9とチップ1の外周部が接着される。FIG. 4 (al, (bl) shows the mounting process of one embodiment of the present invention, in which the semiconductor chip l is placed facing downward on the wiring support substrate 9 as shown in FIG. 2 or 3. At the time of aL, a preliminary solder layer lO with a thickness that compensates for the difference in height between the dummy bump 3 and the bump electrode 2 is deposited on the wiring of the base Fi9.After this, the solder is reflowed, but the diameter is The small bump electrode 3 melts first and adheres to the preliminary solder layer, and the bump electrode 2 becomes a solder column with a height equal to the distance between the chip 1 and the M plate 9, which is kept constant by the dummy bump 3 with a large diameter. After a while, the dummy bumps 3 melt and the substrate 9 and the outer periphery of the chip 1 are bonded together.
なお、ダミーバンプ3の接着性をよくするため、予めダ
ミーバンプ接触部のMi9あるいはチップlに導体層を
独立して設け、予備はんだ層を設けてもよい。例えば、
バンプ電極2の直径が50賜。In order to improve the adhesion of the dummy bumps 3, a conductive layer may be provided independently on the Mi9 or the chip 1 at the dummy bump contact portion in advance, and a preliminary solder layer may be provided. for example,
The diameter of bump electrode 2 is 50 mm.
ダミーバンプ3のInが62nとすれば、体積について
はダミーバンプはバンプ電極の2倍となり、リフロー時
間も加える熱漬を一定とすればほぼ2倍となるので上述
のようにバンプ電極3は細長い柱状となり、断面に比し
て高さが長いので、チップlと基板9との熱膨張係数差
による応力が分散し、接続部の撰傷ないし破壊が起こる
ことがない。If the In of the dummy bump 3 is 62N, the volume of the dummy bump will be twice that of the bump electrode, and if the heat soaking including the reflow time is constant, the volume will be approximately twice that, so the bump electrode 3 will have an elongated columnar shape as described above. Since the height is long compared to the cross section, the stress due to the difference in thermal expansion coefficient between the chip 1 and the substrate 9 is dispersed, and the connecting portion is not damaged or destroyed.
さらに、第4口出)に示すようにダミーバンプ、3にエ
ポキシ4JA脂などの樹脂4を被覆し、て固定すること
によりダミーバンプ3によるチップlと配線基(反9の
平行保持は補強され、ねじれ、熱応力等の歪に対する強
度が向上する。Furthermore, by covering the dummy bumps 3 with a resin 4 such as epoxy 4JA resin and fixing them as shown in the 4th outlet), the parallel holding of the chip 1 and the wiring board (anti-9) by the dummy bumps 3 is reinforced and twisted. , the strength against distortions such as thermal stress is improved.
本発明によれば、゛P−導体材料と実装支持基板材料と
の熱膨張係数の差による熱応力を小さくするためチップ
中央にバンプmlをほぼ等間隔にして配置した場合、電
極の設けられないチップ周辺部に全周にわたってダミー
バンプを設けることにより、チップと実装基板の固着が
中央部ばかりでなく周辺部でも行われて両者の平行保持
が確実にでき、さらにダミーバンプを樹脂で被覆するこ
とにより、熱応力の負荷の大きい周辺部の接続強度がよ
り強くなるので、実装の信鯨性の向上への寄与は大きい
、またチップに形成したダミーバンプの径をバンプを極
より大きくすることにより、バンプ電極はチップと基板
間で引きのばされた柱状にすることも可能で、バンプ電
極内の応力の分散を図ることができ、信頼性の一層の向
上が可能になる。According to the present invention, in order to reduce thermal stress due to the difference in thermal expansion coefficient between the P-conductor material and the mounting support substrate material, if the bumps ml are arranged at approximately equal intervals in the center of the chip, no electrodes are provided. By providing dummy bumps around the entire circumference of the chip, the chip and mounting board are fixed not only in the center but also in the periphery, ensuring that they are held parallel to each other.Furthermore, by covering the dummy bumps with resin, The connection strength in the periphery, which is subject to a large thermal stress load, becomes stronger, making a large contribution to improving the reliability of mounting.Also, by making the diameter of the dummy bump formed on the chip larger than the diameter of the bump, the bump electrode It is also possible to form a columnar shape stretched between the chip and the substrate, which makes it possible to disperse stress within the bump electrode and further improve reliability.
第1図は本発明の一実施例の半導体チップの平面図、第
2図は従来の半導体チップの平面図、第3図は本発明の
一実施例の実装前の半導体チップの要部断面図、第4図
(al、(blは本発明の一実施例の実装工程を順に示
す断面図である。
l二手導体チップ、2:バンプ電極、3:ダミーバンプ
、4:樹脂、9:配線基板。
代理人弁理士 山 口 厳・ ′)
2バ2τ(啄
s1図
′ 7
112図FIG. 1 is a plan view of a semiconductor chip according to an embodiment of the present invention, FIG. 2 is a plan view of a conventional semiconductor chip, and FIG. 3 is a sectional view of essential parts of a semiconductor chip according to an embodiment of the present invention before mounting. , FIG. 4 (al, (bl) are sectional views sequentially showing the mounting process of an embodiment of the present invention. l Two-handed conductor chip, 2: bump electrode, 3: dummy bump, 4: resin, 9: wiring board. Representative Patent Attorney Gen. Yamaguchi ') 2ba 2τ (takus1 figure' 7 112 figure
Claims (1)
極相互間の間隔をほぼ等しくして配置されたバンプ電極
を用いてワイヤレスボンディング方式により半導体チッ
プ面上の導体と対向する支持基板面上の導体が接続され
るものにおいて、半導体チップ周辺の全域にわたって半
導体チップ面および支持基板面の少なくとも一方の前記
導体に接続される導体の存在しない個所で対向面に接触
し、樹脂によって被覆される複数のダミーバンプが設け
られたことを特徴とする半導体装置。1) Bump electrodes adjacent to the center of one surface of the semiconductor chip are arranged with approximately equal spacing between the bump electrodes, and the conductor on the surface of the semiconductor chip is bonded to the surface of the support substrate opposite to the surface of the support substrate using a wireless bonding method. In a device to which a conductor is connected, a plurality of surfaces covered with resin contact the opposing surface at a location where there is no conductor connected to the conductor on at least one of the semiconductor chip surface and the support substrate surface over the entire periphery of the semiconductor chip. A semiconductor device characterized by being provided with dummy bumps.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63065431A JPH01238148A (en) | 1988-03-18 | 1988-03-18 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63065431A JPH01238148A (en) | 1988-03-18 | 1988-03-18 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01238148A true JPH01238148A (en) | 1989-09-22 |
Family
ID=13286906
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63065431A Pending JPH01238148A (en) | 1988-03-18 | 1988-03-18 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01238148A (en) |
Cited By (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU653610B2 (en) * | 1991-07-10 | 1994-10-06 | Sumitomo Electric Industries, Ltd. | Semiconductor device |
WO1996003020A1 (en) * | 1994-07-19 | 1996-02-01 | Olin Corporation | Integrally bumped electronic package components |
US5637925A (en) * | 1988-02-05 | 1997-06-10 | Raychem Ltd | Uses of uniaxially electrically conductive articles |
US5700715A (en) * | 1994-06-14 | 1997-12-23 | Lsi Logic Corporation | Process for mounting a semiconductor device to a circuit substrate |
US6097097A (en) * | 1996-08-20 | 2000-08-01 | Fujitsu Limited | Semiconductor device face-down bonded with pillars |
EP1029346A1 (en) * | 1997-08-22 | 2000-08-23 | Vertical Circuits, Inc. | Vertical interconnect process for silicon segments with thermally conductive epoxy preform |
EP1167068A1 (en) * | 1999-10-08 | 2002-01-02 | Dai Nippon Printing Co., Ltd. | Non-contact data carrier and ic chip |
US6462420B2 (en) * | 1999-02-12 | 2002-10-08 | Rohm Co., Ltd. | Semiconductor chip and semiconductor device having a chip-on-chip structure |
KR20030026206A (en) * | 2001-09-25 | 2003-03-31 | 미쓰비시덴키 가부시키가이샤 | Semiconductor device |
KR20030058703A (en) * | 2001-12-31 | 2003-07-07 | 엘지전자 주식회사 | structure of bear chip connection with printed circuit board |
JP2004104102A (en) * | 2002-08-21 | 2004-04-02 | Seiko Epson Corp | Semiconductor device and its manufacturing method, circuit substrate and electronic apparatus |
WO2003079439A3 (en) * | 2002-03-19 | 2004-05-21 | Koninkl Philips Electronics Nv | Chip stack with intermediate cavity |
US6750552B1 (en) * | 2002-12-18 | 2004-06-15 | Netlogic Microsystems, Inc. | Integrated circuit package with solder bumps |
US6946732B2 (en) * | 2000-06-08 | 2005-09-20 | Micron Technology, Inc. | Stabilizers for flip-chip type semiconductor devices and semiconductor device components and assemblies including the same |
US6960830B2 (en) * | 2002-10-31 | 2005-11-01 | Rohm Co., Ltd. | Semiconductor integrated circuit device with dummy bumps |
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-
1988
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