JPH01238148A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH01238148A
JPH01238148A JP63065431A JP6543188A JPH01238148A JP H01238148 A JPH01238148 A JP H01238148A JP 63065431 A JP63065431 A JP 63065431A JP 6543188 A JP6543188 A JP 6543188A JP H01238148 A JPH01238148 A JP H01238148A
Authority
JP
Japan
Prior art keywords
chip
bump
dummy
conductor
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63065431A
Other languages
Japanese (ja)
Inventor
Masato Nishizawa
正人 西澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP63065431A priority Critical patent/JPH01238148A/en
Publication of JPH01238148A publication Critical patent/JPH01238148A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/14Structure, shape, material or disposition of the bump connectors prior to the connecting process of a plurality of bump connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/303Surface mounted components, e.g. affixing before soldering, aligning means, spacing means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/341Surface mounted components
    • H05K3/3431Leadless components

Abstract

PURPOSE:To hold the parallelism of a chip with respect to a semiconductor substrate and to improve the connecting strength against a twist or the like by surrounding the periphery of a bump electrode disposed substantially at an equal interval at the center of the chip with a dummy bump wholly in contact with the chip and the substrate. CONSTITUTION:Bump electrodes 2 are so provided at the center of a chip 1 as to connect circuit elements in the chip to wiring conductors of a supporting board at positions occupying the vertexes of regular triangular shapes. Accordingly, the intervals between the adjacent electrodes 2 are substantially equal. Dummy bumps 3 are provided substantially at equal intervals at the peripheral edges of the chip 1 around the electrodes 2, and further surrounded by resin 4. Accordingly, the parallelism between the chip 1 by the bumps 3 and a circuit board 9 is reinforced to improve its strength against a distortion such as a twist, a thermal stress or the like.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ワイヤレスボンディング方式による半導体チ
ップの支持基板上への実装のために、半導体チップに形
成された回路素子部上には絶縁膜を介して配線導体およ
びバンプi&tiを設けた半導体装置に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention provides an insulating film on a circuit element portion formed on a semiconductor chip in order to mount a semiconductor chip on a support substrate using a wireless bonding method. The present invention relates to a semiconductor device in which a wiring conductor and bumps i and ti are provided.

〔従来の技術〕[Conventional technology]

バンプ電極を用いて半導体チップを支持基板上に実装す
るのにワイヤレスボンディング方式を用いた場合、安定
した支持を目的として第2図に示すようにチップ1の周
辺の図示しないパッドの上にバンプ電8i2を形成する
ことが一触的であることはよく知られている。
When a wireless bonding method is used to mount a semiconductor chip on a support substrate using bump electrodes, bump electrodes are placed on pads (not shown) around the chip 1 as shown in Figure 2 for stable support. It is well known that forming 8i2 is catalytic.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかし、チップ1の面積が大きくなるに伴い、バンプ電
極2の間の最大距離は大きくなり、半導体材料とセラミ
ックなどの支持基板材料との熱膨腸係数差から起こるし
一トサイクル時の熱応力のため、バンプ電極接続部の損
傷ないし破壊などの故障が起こり、半導体装置の信鯨性
が低下する欠点があった。この欠点を除(ために、本出
願人の出願に係る特願昭62−279676号明細書に
記載されているように、バンプ電極をチップの中心部に
隣接するバンプ電極間の間隔がほぼ等しくなるように配
置することが提案されている。
However, as the area of the chip 1 increases, the maximum distance between the bump electrodes 2 increases, which is caused by the difference in thermal expansion coefficient between the semiconductor material and the supporting substrate material such as ceramic, and the thermal stress during one cycle. As a result, failures such as damage or destruction of the bump electrode connection portion occur, resulting in a disadvantage that the reliability of the semiconductor device is reduced. In order to eliminate this drawback, as described in Japanese Patent Application No. 62-279676 filed by the present applicant, bump electrodes are arranged so that the spacing between the bump electrodes adjacent to the center of the chip is approximately equal. It is proposed to arrange it so that

本発明の課題は、上記提案の半導体装置の信頼性をさら
に向上せしめることにある。
An object of the present invention is to further improve the reliability of the semiconductor device proposed above.

〔課題を解決するための手段〕[Means to solve the problem]

上記の課題の解決のために、本発明は、半導体チップの
一面上の中心部に隣接するバンプ電極相互間の間隔をほ
ぼ等しくして配置されたバンプ電極を用いてワイヤレス
ボンディング方式により半導体チップ面上の導体と対向
する支持基板面上の導体が接続される半導体装置におい
て、半導体ナツプの周辺全域にわたって半導体チップ面
および支持1&板面の少なくとも一方の前記導体と接続
される導体の存在しない個所で対向面に接触し、樹脂に
よって被覆される複数のダミーバンプが設けられたもの
とする。
In order to solve the above-mentioned problems, the present invention provides a semiconductor chip surface bonding method using a wireless bonding method using bump electrodes arranged at the center of one surface of a semiconductor chip with substantially equal spacing between adjacent bump electrodes. In a semiconductor device to which a conductor on the support substrate surface facing the upper conductor is connected, the conductor connected to the conductor is not present on at least one of the semiconductor chip surface and the support 1 & plate surface over the entire periphery of the semiconductor nap. It is assumed that a plurality of dummy bumps are provided that contact the opposing surface and are covered with resin.

〔作用〕[Effect]

半導体チップの実装のためにチップ中央部にほぼ等間隔
を保って配置されたバンプ電極の周囲を全域にわたって
チップおよび半導体基板に接触するダミーバンプで囲む
ことにより、チップと基板の平行度が保持され、ねじれ
等に対する接続強度が向上する。さらにダミーバンプを
樹脂の被覆により補強することにより接続強度が一層高
(なる。
For mounting a semiconductor chip, bump electrodes arranged at approximately equal intervals in the center of the chip are surrounded by dummy bumps that contact the chip and the semiconductor substrate over the entire area, thereby maintaining parallelism between the chip and the substrate. The connection strength against twisting etc. is improved. Furthermore, the connection strength is further increased by reinforcing the dummy bumps with resin coating.

〔実施例〕〔Example〕

第1図は本発明の一実施例のバンプ電極の配置を示し、
バンプ電極2はチップ1の中央部にそれぞれ正三角形の
頂点を占める位置にチップ内の各回路素子と支持基板の
配線導体との接続のために設けられている。従って隣接
バンプ電極2間の間隔はほぼ等しい、これらのバンプ電
極2を取囲んで、チップ1の周縁部にダミーバンプ3が
ほぼ等間隔で設けられていて、さらに樹脂4によって包
囲されている。
FIG. 1 shows the arrangement of bump electrodes in an embodiment of the present invention,
Bump electrodes 2 are provided at the center of the chip 1 at positions occupying the vertices of an equilateral triangle for connecting each circuit element within the chip to the wiring conductor of the support substrate. Therefore, the distances between adjacent bump electrodes 2 are approximately equal. Dummy bumps 3 are provided at approximately equal intervals on the periphery of the chip 1, surrounding these bump electrodes 2, and are further surrounded by resin 4.

第3図はチップ1の一部を拡大して示したもので、チッ
プ1のGM域11に酸化膜51の開口部で接触するMか
らなる第一配線導体61の上に低温CVD酸化物からな
る眉間絶縁11!52を介して第二配線導体62が形成
され、絶縁[52の開口部で第一配線導体61と接触し
ている。この第二配線導体62の上および眉間絶縁II
!52の上を窒化物からなるパソシベーンッン1tfi
8で覆い、フォトエツチングで第二配線導体62の上お
よびチップlの外周近くに開口部を設ける。さらにCr
、 Cu、 AuM4を積層して下地金属層7を形成後
、フォトエツチング加工でパターンニングし、はんだめ
っきで下地金属層7上にはんだを被着し、約350℃に
加熱して球軟化し、バンプ電極2およびそれよりやや径
の大きいダミーバンプ3を形成する。はんだの被着は、
約50−の厚さに真空蒸着することによってもよい。
FIG. 3 is an enlarged view of a part of the chip 1, in which low-temperature CVD oxide is formed on the first wiring conductor 61 made of M, which contacts the GM region 11 of the chip 1 at the opening of the oxide film 51. A second wiring conductor 62 is formed through the glabellar insulation 11!52, and is in contact with the first wiring conductor 61 at the opening of the insulation [52]. Insulation II above and between the eyebrows of this second wiring conductor 62
! 52 is covered with a passivation layer made of nitride.
8 and photoetching to provide an opening on the second wiring conductor 62 and near the outer periphery of the chip l. Further Cr
, Cu, and AuM4 are laminated to form the base metal layer 7, patterned by photoetching, solder is deposited on the base metal layer 7 by solder plating, and the ball is softened by heating to about 350°C. A bump electrode 2 and a dummy bump 3 having a slightly larger diameter are formed. The solder adhesion is
It may also be vacuum deposited to a thickness of about 50 mm.

第4図(al、(blは本発明の一実施例の実装工程を
示し、第2図あるいは第3図に示したように半導体チッ
プlを下向きにして配線支持基板9の上に載せる (図
aL ごの際、ダミーバンプ3とバンプ電極2の高さの
差を補償する厚さの予備はんだ層lOを基Fi9の配線
上に被着しておく、このあと、はんだをリフローさせる
が、径の小さいバンプ電極3が先に融けて予備はんだ層
と接着し、その間径の大きいダミーバンプ3で一定に保
たれるチップ1.M板9間の距離だけの高さのはんだ柱
にバンプ電極2がなる。しばらく後にダミーバンプ3が
融けて基板9とチップ1の外周部が接着される。
FIG. 4 (al, (bl) shows the mounting process of one embodiment of the present invention, in which the semiconductor chip l is placed facing downward on the wiring support substrate 9 as shown in FIG. 2 or 3. At the time of aL, a preliminary solder layer lO with a thickness that compensates for the difference in height between the dummy bump 3 and the bump electrode 2 is deposited on the wiring of the base Fi9.After this, the solder is reflowed, but the diameter is The small bump electrode 3 melts first and adheres to the preliminary solder layer, and the bump electrode 2 becomes a solder column with a height equal to the distance between the chip 1 and the M plate 9, which is kept constant by the dummy bump 3 with a large diameter. After a while, the dummy bumps 3 melt and the substrate 9 and the outer periphery of the chip 1 are bonded together.

なお、ダミーバンプ3の接着性をよくするため、予めダ
ミーバンプ接触部のMi9あるいはチップlに導体層を
独立して設け、予備はんだ層を設けてもよい。例えば、
バンプ電極2の直径が50賜。
In order to improve the adhesion of the dummy bumps 3, a conductive layer may be provided independently on the Mi9 or the chip 1 at the dummy bump contact portion in advance, and a preliminary solder layer may be provided. for example,
The diameter of bump electrode 2 is 50 mm.

ダミーバンプ3のInが62nとすれば、体積について
はダミーバンプはバンプ電極の2倍となり、リフロー時
間も加える熱漬を一定とすればほぼ2倍となるので上述
のようにバンプ電極3は細長い柱状となり、断面に比し
て高さが長いので、チップlと基板9との熱膨張係数差
による応力が分散し、接続部の撰傷ないし破壊が起こる
ことがない。
If the In of the dummy bump 3 is 62N, the volume of the dummy bump will be twice that of the bump electrode, and if the heat soaking including the reflow time is constant, the volume will be approximately twice that, so the bump electrode 3 will have an elongated columnar shape as described above. Since the height is long compared to the cross section, the stress due to the difference in thermal expansion coefficient between the chip 1 and the substrate 9 is dispersed, and the connecting portion is not damaged or destroyed.

さらに、第4口出)に示すようにダミーバンプ、3にエ
ポキシ4JA脂などの樹脂4を被覆し、て固定すること
によりダミーバンプ3によるチップlと配線基(反9の
平行保持は補強され、ねじれ、熱応力等の歪に対する強
度が向上する。
Furthermore, by covering the dummy bumps 3 with a resin 4 such as epoxy 4JA resin and fixing them as shown in the 4th outlet), the parallel holding of the chip 1 and the wiring board (anti-9) by the dummy bumps 3 is reinforced and twisted. , the strength against distortions such as thermal stress is improved.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、゛P−導体材料と実装支持基板材料と
の熱膨張係数の差による熱応力を小さくするためチップ
中央にバンプmlをほぼ等間隔にして配置した場合、電
極の設けられないチップ周辺部に全周にわたってダミー
バンプを設けることにより、チップと実装基板の固着が
中央部ばかりでなく周辺部でも行われて両者の平行保持
が確実にでき、さらにダミーバンプを樹脂で被覆するこ
とにより、熱応力の負荷の大きい周辺部の接続強度がよ
り強くなるので、実装の信鯨性の向上への寄与は大きい
、またチップに形成したダミーバンプの径をバンプを極
より大きくすることにより、バンプ電極はチップと基板
間で引きのばされた柱状にすることも可能で、バンプ電
極内の応力の分散を図ることができ、信頼性の一層の向
上が可能になる。
According to the present invention, in order to reduce thermal stress due to the difference in thermal expansion coefficient between the P-conductor material and the mounting support substrate material, if the bumps ml are arranged at approximately equal intervals in the center of the chip, no electrodes are provided. By providing dummy bumps around the entire circumference of the chip, the chip and mounting board are fixed not only in the center but also in the periphery, ensuring that they are held parallel to each other.Furthermore, by covering the dummy bumps with resin, The connection strength in the periphery, which is subject to a large thermal stress load, becomes stronger, making a large contribution to improving the reliability of mounting.Also, by making the diameter of the dummy bump formed on the chip larger than the diameter of the bump, the bump electrode It is also possible to form a columnar shape stretched between the chip and the substrate, which makes it possible to disperse stress within the bump electrode and further improve reliability.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の半導体チップの平面図、第
2図は従来の半導体チップの平面図、第3図は本発明の
一実施例の実装前の半導体チップの要部断面図、第4図
(al、(blは本発明の一実施例の実装工程を順に示
す断面図である。 l二手導体チップ、2:バンプ電極、3:ダミーバンプ
、4:樹脂、9:配線基板。 代理人弁理士 山 口  厳・ ′) 2バ2τ(啄 s1図 ′    7 112図
FIG. 1 is a plan view of a semiconductor chip according to an embodiment of the present invention, FIG. 2 is a plan view of a conventional semiconductor chip, and FIG. 3 is a sectional view of essential parts of a semiconductor chip according to an embodiment of the present invention before mounting. , FIG. 4 (al, (bl) are sectional views sequentially showing the mounting process of an embodiment of the present invention. l Two-handed conductor chip, 2: bump electrode, 3: dummy bump, 4: resin, 9: wiring board. Representative Patent Attorney Gen. Yamaguchi ') 2ba 2τ (takus1 figure' 7 112 figure

Claims (1)

【特許請求の範囲】[Claims] 1)半導体チップの一面上の中心部に隣接するバンプ電
極相互間の間隔をほぼ等しくして配置されたバンプ電極
を用いてワイヤレスボンディング方式により半導体チッ
プ面上の導体と対向する支持基板面上の導体が接続され
るものにおいて、半導体チップ周辺の全域にわたって半
導体チップ面および支持基板面の少なくとも一方の前記
導体に接続される導体の存在しない個所で対向面に接触
し、樹脂によって被覆される複数のダミーバンプが設け
られたことを特徴とする半導体装置。
1) Bump electrodes adjacent to the center of one surface of the semiconductor chip are arranged with approximately equal spacing between the bump electrodes, and the conductor on the surface of the semiconductor chip is bonded to the surface of the support substrate opposite to the surface of the support substrate using a wireless bonding method. In a device to which a conductor is connected, a plurality of surfaces covered with resin contact the opposing surface at a location where there is no conductor connected to the conductor on at least one of the semiconductor chip surface and the support substrate surface over the entire periphery of the semiconductor chip. A semiconductor device characterized by being provided with dummy bumps.
JP63065431A 1988-03-18 1988-03-18 Semiconductor device Pending JPH01238148A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63065431A JPH01238148A (en) 1988-03-18 1988-03-18 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63065431A JPH01238148A (en) 1988-03-18 1988-03-18 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH01238148A true JPH01238148A (en) 1989-09-22

Family

ID=13286906

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63065431A Pending JPH01238148A (en) 1988-03-18 1988-03-18 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH01238148A (en)

Cited By (27)

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AU653610B2 (en) * 1991-07-10 1994-10-06 Sumitomo Electric Industries, Ltd. Semiconductor device
WO1996003020A1 (en) * 1994-07-19 1996-02-01 Olin Corporation Integrally bumped electronic package components
US5637925A (en) * 1988-02-05 1997-06-10 Raychem Ltd Uses of uniaxially electrically conductive articles
US5700715A (en) * 1994-06-14 1997-12-23 Lsi Logic Corporation Process for mounting a semiconductor device to a circuit substrate
US6097097A (en) * 1996-08-20 2000-08-01 Fujitsu Limited Semiconductor device face-down bonded with pillars
EP1029346A1 (en) * 1997-08-22 2000-08-23 Vertical Circuits, Inc. Vertical interconnect process for silicon segments with thermally conductive epoxy preform
EP1167068A1 (en) * 1999-10-08 2002-01-02 Dai Nippon Printing Co., Ltd. Non-contact data carrier and ic chip
US6462420B2 (en) * 1999-02-12 2002-10-08 Rohm Co., Ltd. Semiconductor chip and semiconductor device having a chip-on-chip structure
KR20030026206A (en) * 2001-09-25 2003-03-31 미쓰비시덴키 가부시키가이샤 Semiconductor device
KR20030058703A (en) * 2001-12-31 2003-07-07 엘지전자 주식회사 structure of bear chip connection with printed circuit board
JP2004104102A (en) * 2002-08-21 2004-04-02 Seiko Epson Corp Semiconductor device and its manufacturing method, circuit substrate and electronic apparatus
WO2003079439A3 (en) * 2002-03-19 2004-05-21 Koninkl Philips Electronics Nv Chip stack with intermediate cavity
US6750552B1 (en) * 2002-12-18 2004-06-15 Netlogic Microsystems, Inc. Integrated circuit package with solder bumps
US6946732B2 (en) * 2000-06-08 2005-09-20 Micron Technology, Inc. Stabilizers for flip-chip type semiconductor devices and semiconductor device components and assemblies including the same
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US8101459B2 (en) 2001-08-24 2012-01-24 Micron Technology, Inc. Methods for assembling semiconductor devices in stacked arrangements by positioning spacers therebetween
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US6960830B2 (en) * 2002-10-31 2005-11-01 Rohm Co., Ltd. Semiconductor integrated circuit device with dummy bumps
US6750552B1 (en) * 2002-12-18 2004-06-15 Netlogic Microsystems, Inc. Integrated circuit package with solder bumps
US6943060B1 (en) * 2002-12-18 2005-09-13 Netlogic Microsystems, Inc. Method for fabricating integrated circuit package with solder bumps
US7360874B2 (en) 2003-06-30 2008-04-22 Brother Kogyo Kabushiki Kaisha Ink-jet printer, ink-jet head and method of manufacturing the ink-jet head
US8474138B2 (en) 2003-06-30 2013-07-02 Brother Kogyo Kabushiki Kaisha Method of manufacturing the ink-jet head
JP2006165209A (en) * 2004-12-07 2006-06-22 Matsushita Electric Ind Co Ltd Semiconductor device and its manufacturing process
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JP2007251053A (en) * 2006-03-17 2007-09-27 Fujitsu Ltd Mounting structure of semiconductor device and method of manufacturing mounting structure
JP2008258380A (en) * 2007-04-04 2008-10-23 Shinko Electric Ind Co Ltd Semiconductor device and wiring substrate used therein
JP2009016557A (en) * 2007-07-04 2009-01-22 Fujikura Ltd Semiconductor device
WO2011104779A1 (en) * 2010-02-23 2011-09-01 パナソニック株式会社 Semiconductor integrated circuit device
CN102956590A (en) * 2011-08-17 2013-03-06 台湾积体电路制造股份有限公司 Dummy flip chip bumps for reducing stress
US8912649B2 (en) 2011-08-17 2014-12-16 Taiwan Semiconductor Manufacturing Company, Ltd. Dummy flip chip bumps for reducing stress
US9287234B2 (en) 2011-08-17 2016-03-15 Taiwan Semiconductor Manufacturing Company, Ltd. Dummy flip chip bumps for reducing stress
US9711477B2 (en) 2011-08-17 2017-07-18 Taiwan Semiconductor Manufacturing Company, Ltd. Dummy flip chip bumps for reducing stress
US10290600B2 (en) 2011-08-17 2019-05-14 Taiwan Semiconductor Manufacturing Company, Ltd. Dummy flip chip bumps for reducing stress
US10734347B2 (en) 2011-08-17 2020-08-04 Taiwan Semiconductor Manufacturing Company, Ltd. Dummy flip chip bumps for reducing stress
JP2013214557A (en) * 2012-03-30 2013-10-17 Olympus Corp Electrode forming body, wiring board, and semiconductor device
JP2014132635A (en) * 2012-12-05 2014-07-17 Murata Mfg Co Ltd Electronic component with bump and manufacturing method of electronic component with bump
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