JPH01235335A - アライメントマークの位置検出装置 - Google Patents

アライメントマークの位置検出装置

Info

Publication number
JPH01235335A
JPH01235335A JP63063921A JP6392188A JPH01235335A JP H01235335 A JPH01235335 A JP H01235335A JP 63063921 A JP63063921 A JP 63063921A JP 6392188 A JP6392188 A JP 6392188A JP H01235335 A JPH01235335 A JP H01235335A
Authority
JP
Japan
Prior art keywords
image
alignment mark
linear sensor
detection
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63063921A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0347727B2 (enrdf_load_stackoverflow
Inventor
Tsutomu Miyatake
勤 宮武
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
Original Assignee
Sumitomo Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries Ltd filed Critical Sumitomo Heavy Industries Ltd
Priority to JP63063921A priority Critical patent/JPH01235335A/ja
Publication of JPH01235335A publication Critical patent/JPH01235335A/ja
Publication of JPH0347727B2 publication Critical patent/JPH0347727B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP63063921A 1988-03-16 1988-03-16 アライメントマークの位置検出装置 Granted JPH01235335A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63063921A JPH01235335A (ja) 1988-03-16 1988-03-16 アライメントマークの位置検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63063921A JPH01235335A (ja) 1988-03-16 1988-03-16 アライメントマークの位置検出装置

Publications (2)

Publication Number Publication Date
JPH01235335A true JPH01235335A (ja) 1989-09-20
JPH0347727B2 JPH0347727B2 (enrdf_load_stackoverflow) 1991-07-22

Family

ID=13243287

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63063921A Granted JPH01235335A (ja) 1988-03-16 1988-03-16 アライメントマークの位置検出装置

Country Status (1)

Country Link
JP (1) JPH01235335A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0347727B2 (enrdf_load_stackoverflow) 1991-07-22

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Legal Events

Date Code Title Description
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