JPH0122856B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a vacuum processing apparatus for plasma-treating plastic molded products, such as vinyl chloride resin films, in a vacuum state. Refers to electric wires, etc.

In this type of vacuum processing equipment, it is necessary to adjust the distance between the positive and negative electrodes depending on the material and thickness of the workpiece or the type of gas introduced into the vacuum processing chamber, but conventional vacuum processing equipment In this case, it was not possible to adjust the distance between the two electrodes.

Note that related devices of this type include, for example, Japanese Patent Application Laid-Open No. 54-95672.

The present inventors have discovered that when treating an object, for example, in plasma surface treatment, the distance between the positive electrode and the negative electrode has a large effect on the treatment effect and processing speed. In other words, although the processing effect varies depending on the applied voltage, processing time, gas pressure, etc., adjusting the distance between the positive electrode and the negative electrode is particularly effective for improving the processing effect depending on the purpose. I found it.

The above object is to provide a vacuum processing apparatus that includes a negative electrode and a rod-shaped positive electrode opposite to the negative electrode in a vacuum processing chamber, and processes the surface of the workpiece by feeding the workpiece between the two electrodes. a first portion in which a rod-shaped positive electrode faces the negative electrode in parallel;
A bending second part connected to this, and this second part.
This is achieved by including a fixing device that is connected to the third section and is parallel to the first section, and rotatably supports the third section on the side plate.

By configuring the positive electrode in a crank shape as described above, when the third portion is rotated, the first portion also rotates, and by rotating, the third portion is rotated. It revolves around the axis.
Due to this revolving action, the first portion approaches or separates from the cathode, allowing fine spacing adjustment.

The feature of the present invention is that the positive electrode itself is
It has a crank structure that allows the distance between both electrodes to be adjusted.

An embodiment of the present invention will be described below with reference to the drawings.

1 and 2, 1 is a vacuum processing chamber in which a flexible workpiece F, such as a plastic film, for example, a vinyl chloride resin film, is subjected to continuous plasma treatment in a vacuum state; 2 is a vacuum processing chamber 1;
A plurality of preliminary vacuum chambers 3 are arranged on the front side of the vacuum processing chamber 1, and a plurality of preliminary vacuum chambers 3 are arranged on the rear side of the vacuum processing chamber 1 ^. It is evacuated through an exhaust pipe 5 to maintain a vacuum pressure of approximately Torr. The inside of the preliminary vacuum chambers 2 and 3 is maintained at a vacuum pressure slightly higher than the vacuum pressure inside the vacuum processing chamber 1 by a vacuum pump 6 connected thereto, and gradually reduced from atmospheric pressure through an exhaust pipe 7. and evacuated.

The workpiece F to be processed is sent from the unwinding device 8 through the preliminary vacuum chamber 2 on the front side to the vacuum processing chamber 1, where it is subjected to plasma treatment, and then further passed through the preliminary vacuum chamber 3 on the rear side to the winding device. It is wound up at 9. 10 is a driving motor, and this driving motor 10 is connected to a line shaft 11 and continuously variable transmissions 12, 13, 1.
4, 15 to the vacuum processing chamber 1, preliminary vacuum chamber 2,
3. The driving force is transmitted to the winding device 9, and the rotational speed of each drive system of the vacuum processing chamber 1, the preliminary vacuum chambers 2, 3, and the winding device 9 is controlled by the continuously variable transmission 12, 13, 1.
4 and 15 as appropriate.

FIG. 3 shows an outline of the vacuum processing chamber 1. The vacuum processing chamber 1 includes a drum-shaped cathode 16, and at least one cathode arranged on the outer circumferential side of the cathode 16 so that the distance between the cathode and the cathode can be adjusted. It consists of one positive electrode 17 with a crank structure and at least one guide roller 18 that guides the workpiece F, and these negative electrodes 16, positive electrodes 17, and guide rollers 1
8 is cantilever-supported by one side plate 19, and the other side plate 20 serves as an opening/closing door.

FIG. 4 shows the side plate 19 of the crank-shaped anode 17.
The positive electrode 17 is attached to the side plate 19 with bolts 24 via an insulating bush 22 and a tapered holder 23. The insulating bushing 22 provides insulation between the positive electrode 17 and the side plate 19. A taper bush 25 having a tapered outer surface that fits with the tapered inner surface is attached to the tapered inner surface of the taper holder 23, and this tapered bush 25 is shown in FIGS. 5 and 6.
As shown in the figure, a slit 27 is formed in the radial direction in order to fix the positive electrode 17 by tightening the pressure bolt 26 in the axial direction. Also,
The taper bushes 25a and 25b may have a half-split structure as shown in FIGS. 7 and 8.

Returning to the foregoing, as shown in FIG. 4, a pipe 21 is inserted into the anode 17 to supply a medium such as water to keep the temperature of the anode 17 constant. Water supplied from the outside flows between the outer periphery of the pipe 21 and the inner periphery of the anode 17 and is discharged to the outside again, thereby cooling the anode 17. In addition, the pipe 21 is shown in FIG.
If the support member 28 is used to hold the positive electrode 17 at its axial center as shown in Figure 0, the pipe 2
The flow of water between the outer periphery of the positive electrode 17 and the positive electrode 17 is further improved, and the positive electrode 17 is uniformly cooled.

In the above configuration, in order to perform optimal plasma treatment on the workpiece F, the distance between the drum-shaped negative electrode 16 and the crank-shaped anode 17 must be set to the workpiece F.
It is necessary to adjust according to the characteristics of

To adjust this electrode spacing, use the pressing bolt 26
By loosening the anode 17 and the taper bush 25, the fixation between the anode 17 and the taper bush 25 is released. In this state, the anode 17
When rotated, since the anode 17 has a crank shape, it can be set at the optimum position as shown by the two-dot chain line in the figure. After setting the position of the positive electrode 17, when the taper bushing 25 is pushed in the axial direction by tightening the pressing bolt 26, since the taper bushing 25 has a slit 27 formed therein,
The axial pressing force of the taper bush 25 against the taper holder 23 can be converted into a radial pressing force, so that the positive electrode 17 can be reliably fixed to the taper bush 25.

As explained above, according to the present invention, it is possible to perform an optimal surface treatment even when the material and thickness of the workpiece, the type of gas introduced into the vacuum processing chamber, the pressure, etc. differ. The distance between the electrode and the negative electrode can be easily adjusted, resulting in the effect that the preparation time for surface treatment work can be shortened.

[Brief explanation of drawings]

Fig. 1 is a schematic vertical sectional view of a continuous vacuum processing apparatus incorporating the apparatus of the present invention, Fig. 2 is a schematic plan view of Fig. 1, Fig. 3 is a side sectional view of the apparatus of the present invention, and Fig. 4 is a main Figures 5 and 6 are diagrams for explaining the mounting state of the crank-shaped positive electrode in the invention device, and Figures 5 and 6 are diagrams for explaining the taper bush that fixes the crank-shaped positive electrode. Figure 5 is a plan view; The figure is a cross-sectional view taken along the line 6-6 in FIG. 5, and FIGS. 7 and 8 are views showing other embodiments of the taper bushing. FIG. Line sectional views, FIGS. 9 and 10 are views showing other embodiments of the medium supply pipe for adjusting the temperature of the anode, FIG. 9 is a longitudinal sectional view thereof, and FIG. Figure 10-10
FIG. 1... Vacuum processing chamber, 2, 3... Preliminary vacuum chamber, 1
6...Cathode electrode, 17...Positive electrode, 21...Pipe, 22...Insulating bushing, 23...Taper holder, 25...Taper bush.

Claims (1)

[Scope of Claims] 1. A vacuum processing apparatus that includes a negative electrode and a rod-shaped positive electrode facing the negative electrode in a vacuum processing chamber, and processes the surface of a workpiece by feeding the workpiece between both electrodes. In the method, the rod-shaped positive electrode has a first part parallel to and facing the negative electrode, a bent second part connected to this, and a bent second part connected to this second part and parallel to the first part. and a fixing device rotatably supporting the third portion on a side plate, the positive electrode being rotated to set a predetermined distance between the positive electrode and the negative electrode. A vacuum processing apparatus characterized in that the positive electrode is then fixed by the fixing device. 2. The vacuum processing apparatus according to claim 1, wherein the fixing device supports the positive electrode with a taper push. 3. A pipe for supplying a medium for regulating the temperature of the anode is inserted into the anode, and the medium is caused to flow between the outer periphery of the pipe and the inner surface of the anode. The vacuum processing apparatus according to any one of Item 1 and Item 2.