JPH01188693A - Electroplating method - Google Patents
Electroplating methodInfo
- Publication number
- JPH01188693A JPH01188693A JP1190788A JP1190788A JPH01188693A JP H01188693 A JPH01188693 A JP H01188693A JP 1190788 A JP1190788 A JP 1190788A JP 1190788 A JP1190788 A JP 1190788A JP H01188693 A JPH01188693 A JP H01188693A
- Authority
- JP
- Japan
- Prior art keywords
- plated
- plating
- thickness
- objects
- bodies
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009713 electroplating Methods 0.000 title claims abstract description 7
- 238000000034 method Methods 0.000 title claims description 10
- 238000007747 plating Methods 0.000 abstract description 37
- 238000004140 cleaning Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は電解方法により平面へメッキを行う作業に於い
てメッキされた金属膜厚を均一にする方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for making the thickness of a plated metal film uniform in the work of plating a flat surface by an electrolytic method.
従来より金属表面への加工方法として電解方法によるメ
ッキが実用に供されて来ており、メッキ槽の中に被メッ
キ体がひとつずつつるされてメッキ作業がなされている
。BACKGROUND ART Conventionally, electrolytic plating has been put into practical use as a processing method for metal surfaces, and the plating work is performed by suspending objects to be plated one by one in a plating bath.
上述した従来のメッキ方法では被メッキ体が個々にメッ
キ槽の中につり下げられてメッキがされる為に、平面に
メッキを行う場合に平面の周辺部と中央部では被着した
メッキの厚さに大きな違いがあった。In the conventional plating method described above, the objects to be plated are individually suspended in a plating tank and plated, so when plating a flat surface, the thickness of the deposited plating is small at the periphery and center of the flat surface. There was a big difference.
第2図は従来から実施されて来た電解メッキ法に於ける
メッキ槽内でのメッキ電極と平面状の被メッキ体との位
置関係を示している。メッキ液、メッキ槽、メッキ電極
と被メッキ体とは第2図(B)に示す状態にある。メッ
キ槽1の中にメッキ液2が入っており、その液面下にな
るようにメッキ電極3、平面上の被メッキ体4がセット
される。FIG. 2 shows the positional relationship between a plating electrode and a flat object to be plated in a plating tank in a conventional electrolytic plating method. The plating solution, plating tank, plating electrode, and object to be plated are in the state shown in FIG. 2(B). A plating solution 2 is contained in a plating bath 1, and a plating electrode 3 and a flat object to be plated 4 are set below the liquid level.
メッキ電極3、被メッキ体4は電源コード5a。The plating electrode 3 and the object to be plated 4 are connected to a power cord 5a.
5bにより電源と結ばれている。第2図(A)に示すよ
うにメッキ電極3或いは被メッキ体4と電極コードは作
業上の簡便さの為に電源コードの先端に固定されたクリ
ップ状の治具により電気的な接続がなされている。通常
第2図(B)の状態にセットされる以前にメッキ液の組
成管理が為され適正な状態であることが確認されており
又被メッキ体4もそのメッキ披着面が良好なメッキが実
現出来るよう適切な洗浄工程を通っているのが普通であ
る。次に第2図(B)で示す状態にセットし適切な電流
値にてメッキ作業が目標とするメッキ中の厚さまで到達
したと予測されるまで続けられしかる後メッキ後の洗浄
が行われてメッキ作業が完了する。第2図(A)及び(
B)で示したメッキ作業に於けるメッキの厚さの一例を
示す。グラフは被メッキ体3の第2図(A)で示したA
−A’に沿って示しである。通常のメッキ作業に於いて
メッキ厚さのバラつきは被メッキ体の形状によっても影
響される為バラつきの程度については常にある幅が必要
なものとされて来た。It is connected to the power supply by 5b. As shown in Fig. 2 (A), the plating electrode 3 or the object to be plated 4 and the electrode cord are electrically connected by a clip-shaped jig fixed to the tip of the power cord for ease of operation. ing. Usually, the composition of the plating solution is controlled and it is confirmed that it is in an appropriate state before it is set to the state shown in Figure 2 (B), and the plated surface of the object 4 to be plated is well plated. Usually, it goes through an appropriate cleaning process to achieve this. Next, the conditions shown in Figure 2 (B) are set, and the plating operation is continued at an appropriate current value until it is estimated that the target plating thickness has been reached, and then post-plating cleaning is performed. Plating work is completed. Figure 2 (A) and (
An example of the thickness of plating in the plating work shown in B) is shown. The graph is A shown in Fig. 2 (A) of the object to be plated 3.
- Shown along A'. In normal plating work, variations in plating thickness are also affected by the shape of the object to be plated, so it has always been thought that a certain range of variation is required.
上述した従来のメッキ方法は平面状の被メッキ体をひと
つずつメッキするのに対し、本発明は多数の被メッキ体
をひとつの被着体としてメッキするという相違点を有す
る。While the conventional plating method described above plates planar objects one by one, the present invention has a difference in that a large number of objects to be plated are plated as one adherend.
本発明の特徴は多数の被メッキ体をひとつの被メッキ体
として扱うことによりメッキされた被着膜厚の均一性を
得ることにある。A feature of the present invention is that by treating a large number of objects to be plated as one object to be plated, uniformity of the thickness of the plated film can be obtained.
次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第1図は本発明の一実施例を示す斜視図であり、第2図
で示した従来例の(A)に相当する状態のうち被メッキ
体側のみを示したものである。第1図(A)に於いて被
メッキ体4a、4b、4cは互いに近接した状態でメッ
キ液2の内に保持され、それぞれ電源コード5b+、5
b2,5b3により電源に結ばれており、ひとつの被メ
ッキ体の如く作業がなされる。第1図(A)の実施例で
は被メッキ体3つを同時にひとつの被メッキ体の如く扱
ったがさらに多数の被メッキ体を同様に扱うことも可能
である。FIG. 1 is a perspective view showing an embodiment of the present invention, showing only the side of the object to be plated in a state corresponding to (A) of the conventional example shown in FIG. In FIG. 1(A), objects to be plated 4a, 4b, and 4c are held in plating solution 2 in close proximity to each other, and power cords 5b+ and 5 are connected to each other, respectively.
It is connected to the power source through b2 and 5b3, and is worked on as if it were one object to be plated. In the embodiment shown in FIG. 1(A), three objects to be plated are treated as one object to be plated at the same time, but it is also possible to treat a larger number of objects to be plated in the same manner.
第1図(B)は本発明の実施例2を示す斜視図である。FIG. 1(B) is a perspective view showing a second embodiment of the present invention.
従来例の第2図(A)に相当することは第一の実施例と
同じであるが、この実施例では被メッキ体4a、4cと
被メッキ体4bの大きさは違っており被メッキ体4a、
4cは後に廃棄されて実際の被メッキ体として扱われる
のは1bのみでありこれのメッキ厚のバラできについて
は極めて小さなものが得られる。What corresponds to FIG. 2(A) of the conventional example is the same as the first embodiment, but in this embodiment, the sizes of the objects to be plated 4a, 4c and the object to be plated 4b are different, and the objects to be plated are different in size. 4a,
4c is later discarded and only 1b is treated as an actual object to be plated, and the variation in plating thickness of this is extremely small.
以上説明したように本発明は平面状の被メッキ体へのメ
ッキ作業において複数の被メッキ体をひとつの被メッキ
体の如く保持した状態で行うことによりメッキされた厚
さのバラつきを小さなものとする効果がある。As explained above, the present invention minimizes variations in the plated thickness by holding a plurality of objects to be plated as if they were one object during plating work on a flat object to be plated. It has the effect of
第1図(A)、 (B)は本発明による平面へのメッキ
方法を示す斜視図であり、第2図は従来例によるメッキ
方法を示す図及びメッキされた膜の厚さを示す図である
。
■はメッキ槽、2はメッキ液、3はメッキ電極、4は被
メッキ体、5a、5bは電源コードである。
−代理人 弁理士 内 原 晋1A and 1B are perspective views showing a method of plating a flat surface according to the present invention, and FIG. 2 is a diagram showing a plating method according to a conventional example and a diagram showing the thickness of a plated film. be. 2 is a plating tank, 2 is a plating solution, 3 is a plating electrode, 4 is a body to be plated, and 5a and 5b are power cords. −Representative Patent Attorney Susumu Uchihara
Claims (1)
とつの平面となるよう近接して保持した状態で電解メッ
キを行うことを特徴とする電解メッキ方法。An electrolytic plating method characterized by performing electrolytic plating on an object to be plated which has a plurality of planes while being held close to each other so that each plane becomes one plane.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1190788A JPH01188693A (en) | 1988-01-21 | 1988-01-21 | Electroplating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1190788A JPH01188693A (en) | 1988-01-21 | 1988-01-21 | Electroplating method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01188693A true JPH01188693A (en) | 1989-07-27 |
Family
ID=11790794
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1190788A Pending JPH01188693A (en) | 1988-01-21 | 1988-01-21 | Electroplating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01188693A (en) |
-
1988
- 1988-01-21 JP JP1190788A patent/JPH01188693A/en active Pending
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