JPH0723553B2 - Method for plating three-dimensional network structure - Google Patents

Method for plating three-dimensional network structure

Info

Publication number
JPH0723553B2
JPH0723553B2 JP61235345A JP23534586A JPH0723553B2 JP H0723553 B2 JPH0723553 B2 JP H0723553B2 JP 61235345 A JP61235345 A JP 61235345A JP 23534586 A JP23534586 A JP 23534586A JP H0723553 B2 JPH0723553 B2 JP H0723553B2
Authority
JP
Japan
Prior art keywords
plating
network structure
dimensional network
tape
shaped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61235345A
Other languages
Japanese (ja)
Other versions
JPS6389697A (en
Inventor
雅昭 岩崎
光男 三浦
良信 樫内
徹也 西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP61235345A priority Critical patent/JPH0723553B2/en
Publication of JPS6389697A publication Critical patent/JPS6389697A/en
Publication of JPH0723553B2 publication Critical patent/JPH0723553B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Description

【発明の詳細な説明】 〈産業上の利用分野〉 この発明は無電解メッキまたはカーボン被覆等によって
導電性を付与した非導電性三次元網状構造体へのメッキ
方法に関するものである。
TECHNICAL FIELD The present invention relates to a method for plating a non-conductive three-dimensional network structure having conductivity by electroless plating or carbon coating.

〈従来の技術とその問題点〉 三次元網状構造体へのメッキは一般のプレート、ワイヤ
ーなどへのメッキと異なり、孔内へ均一に電着させる必
要があり、これが大きな問題である。
<Prior art and its problems> Unlike plating on general plates and wires, plating on a three-dimensional net-like structure requires uniform electrodeposition in the holes, which is a major problem.

これは三次元網状構造体の表層部と内層部とでは電流密
度のばらつきが起るためで、三次元網状構造体骨格表面
に施した導電処理層の比抵抗が大きければ大きいほど三
次元網状構造体内層部での電圧降下が大きくなり、その
ため三次元網状構造体表層部での電流密度が大となる。
即ち、三次元網状構造体表層部で電着金属イオンが多く
消費され、三次元網状構造体内層部では金属イオンの欠
乏状態が起ることになる。この現象は、導電処理層の影
響のみならず、一般に極間距離の相違からくる液抵抗の
差、またカソードと液との固液界面における分極現象に
より、特に三次元網状構造体内層部へ金属イオンがまわ
りにくくなることで生じるものである。
This is because the current density varies between the surface layer and the inner layer of the three-dimensional network structure.Therefore, the larger the specific resistance of the conductive layer applied to the surface of the three-dimensional network structure, the greater the three-dimensional network structure. The voltage drop in the body layer portion becomes large, and thus the current density in the surface layer portion of the three-dimensional network structure becomes large.
That is, a large amount of electrodeposited metal ions are consumed in the surface layer of the three-dimensional network structure, and a deficiency state of metal ions occurs in the layer of the three-dimensional network structure. This phenomenon is caused not only by the influence of the conductive treatment layer, but also by the difference in the liquid resistance, which generally comes from the difference in the distance between the electrodes, and the polarization phenomenon at the solid-liquid interface between the cathode and the liquid. This is caused by the difficulty of rotation of the ions.

三次元網状構造体へのメッキの場合、電流密度を上げて
いくと、三次元網状構造体表層部の電流密度が過大とな
り、分極が増加しすぎて三次元網状構造体内層部の金属
イオンの欠乏状態が起る。
In the case of plating on a three-dimensional network structure, if the current density is increased, the current density of the surface layer of the three-dimensional network structure becomes excessive, and the polarization increases too much, so that the metal ions in the inner layer of the three-dimensional network structure become Deficiency occurs.

こうしたことから非導電性三次元網状構造体へのメッキ
は一般のプレート、ワイヤーなどへのメッキで通常用い
られている電流密度の十分の一から百分の一程度の電流
密度しか用いることができない。
For this reason, the non-conductive three-dimensional network structure can be plated with only one tenth to one-hundredth of the current density normally used for plating general plates and wires. .

従来、このような三次元網状構造体へのメッキの困難性
を考え、メッキ方法として第2図に示すように、導電性
を有するテープ状の三次元網状構造体11を予備メッキ槽
12中にその一面を陰極給電ロール13に密着せしめながら
浸漬して他面の表面に薄くメッキすることにより導電性
を増した後、本メッキ槽14で予定の電着量までメッキす
ることが行なわれているが、この方法では予備メッキで
のテープ状三次元網状構造体の両面即ちA面、B面に対
するメッキ電着量が不均一なため、本メッキを終えた最
終のメッキ三次元網状構造体製品においてもA面、B面
のメッキ電着量が不均一となるのである。
Conventionally, considering the difficulty of plating on such a three-dimensional network structure, as a plating method, a tape-shaped three-dimensional network structure 11 having conductivity is preliminarily plated as shown in FIG.
After increasing the conductivity by dipping while one surface is closely attached to the cathode power supply roll 13 in 12 and thinly plating on the surface of the other surface, plating is performed in the main plating tank 14 to the planned electrodeposition amount. However, in this method, since the plating electrodeposition amount on both surfaces of the tape-shaped three-dimensional network structure in the pre-plating, that is, A surface and B surface is uneven, the final plated three-dimensional network structure after the main plating is finished. Even in body products, the amount of electrodeposition of plating on surfaces A and B is non-uniform.

即ち、メッキによる金属の電着量がA面には多く、B面
には少ないという不均一の結果、 A面とB面に強度差が生じ、折り曲げたり、加熱冷却し
たりすると、B面に割れが生じたり、そりが生じるとい
う欠点があった。
That is, as a result of the non-uniformity that the amount of electrodeposited metal by plating is large on the A side and small on the B side, there is a strength difference between the A side and the B side, and when bending or heating / cooling, the B side is There are drawbacks such as cracking and warping.

〈問題を解決するための手段〉 この発明は三次元網状構造体へのメッキにおける上記従
来法の欠点を解消すべく検討の結果なされたものであ
る。
<Means for Solving the Problem> The present invention has been made as a result of studies to solve the drawbacks of the above-mentioned conventional method in plating on a three-dimensional network structure.

即ち、この発明の三次元網状構造体のメッキ方法は、導
電性を有するテープ状の三次元網状構造体に連続的に電
気メッキを行なう方法において、メッキ浴中で回転しつ
つある陰極給電ロールの表面と該テープ状三次元網状構
造体の一方の面とを密着させながら移動することにより
三次元網状構造体への給電を行なうに際し、前記陰極給
電ロールを複数個有し、少なくともその一つはテープ状
三次元網状構造体の一方の面に密着して全メッキ量の半
分を電気メッキする第1段メッキを行ない、別の陰極給
電ロールのうちの少なくとも一つは該テープ状三次元網
状構造体の他方の面に密着するようにして残りの半分の
メッキ量を電気メッキする第2段メッキを行なうことを
特徴とするものである。
That is, the method for plating a three-dimensional network structure of the present invention is a method for continuously electroplating a tape-shaped three-dimensional network structure having conductivity, in which the cathode power supply roll rotating in the plating bath is used. When supplying power to the three-dimensional network structure by moving while closely contacting the surface and one surface of the tape-shaped three-dimensional network structure, a plurality of the cathode power supply rolls are provided, at least one of which is provided. The tape-shaped three-dimensional net-like structure is formed by first-stage plating in which one side of the tape-like three-dimensional net-like structure is adhered and half of the total plating amount is electroplated. It is characterized in that the second-stage plating is performed in which the remaining half of the plating amount is electroplated so as to be in close contact with the other surface of the body.

〈作用〉 この発明をより詳しく第1図に基づいて説明すると、こ
の発明は従来法による予備メッキ槽を第1メッキ槽1、
第2メッキ槽2と2ケ設置し、第1メッキ槽1では導電
性を有するテープ状三次元網状構造体3の一方の面即ち
A面を外側とし、B面を内側にして、これを第1メッキ
槽1中の陰極給電ロール4に密着させてA面に予定の重
量の約半分のメッキを行なわせ、次いで第2メッキ槽2
では第1メッキ槽1におけるとは逆に、テープ状三次元
網状構造体3のB面を外側、A面を内側として第2メッ
キ槽中の陰極給電ロール5に密着させてB面に残りの重
量分をメッキするものである。
<Operation> The present invention will be described in more detail with reference to FIG. 1. In the present invention, the preliminary plating tank according to the conventional method is the first plating tank 1,
The second plating tank 2 and the second plating tank 2 are installed. In the first plating tank 1, one surface of the tape-shaped three-dimensional network structure 3 having conductivity, that is, the A surface is the outside and the B surface is the inside. 1) The cathode power supply roll 4 in the plating tank 1 is brought into close contact with the surface A to plate about half of the planned weight, and then the second plating tank 2
Contrary to the case in the first plating tank 1, the tape-shaped three-dimensional network structure 3 is adhered to the cathode feeding roll 5 in the second plating tank with the surface B as the outside and the surface A as the inside, and the remaining surface on the surface B remains. The weight is plated.

このようなメッキ方法によると、(A)メッキによる金
属の電着量が厚み中心に対して対称となり、A面側、B
面側ともに同等の強度を有することから、 (1) A面とB面の強度差がなくなり、折り曲げによる
割れが発生しなくなる。
According to such a plating method, the electrodeposition amount of the metal by (A) plating is symmetrical with respect to the thickness center,
Since the surface sides have the same strength, (1) there is no difference in strength between the A surface and the B surface, and cracks due to bending do not occur.

(2) 加熱、冷却時の内部応力によるそりあるいは割れ
が発生しなくなる。
(2) Warping or cracking due to internal stress during heating and cooling does not occur.

(B)ドラムメッキでの外周側メッキによる金属付着量
が内周側より多いが、A面は第1ドラムで、B面は第2
ドラムで、夫々外周となり、それぞれ電着量が多く、機
械的強度も大となることから、A面、B面ともに内部よ
りも強度が大となり、表面傷がつきにつくくなるという
効果を有するのである。
(B) The amount of metal adhered by the outer peripheral plating in the drum plating is larger than that in the inner peripheral side, but the A side is the first drum and the B side is the second drum.
Since the drums have outer circumferences, respectively, and the amount of electrodeposition is large and the mechanical strength is large, the strength of both the A side and the B side is larger than that of the inside, and there is an effect that surface scratches are likely to occur. Of.

かくして均一にメッキを施したテープ状三次元網状構造
体の厚み方向のメッキ電着量分布は第3図に示す通りで
あり、第2メッキ後にはA、B両面にほぼ均一なメッキ
厚が得られ、第4図に示す従来法では予備メッキ後のメ
ッキ厚の不均一がそのまま本メッキ後の製品においても
あらわれているのに比べてすぐれた効果を奏する金属三
次元網状構造体が得られることが認められた。
Thus, the distribution of the plating electrodeposition amount in the thickness direction of the tape-shaped three-dimensional network structure uniformly plated is as shown in FIG. 3, and after the second plating, a substantially uniform plating thickness is obtained on both sides of A and B. In the conventional method shown in FIG. 4, a metal three-dimensional net-like structure having an excellent effect can be obtained as compared with the unevenness of the plating thickness after the pre-plating as it appears even in the product after the main plating. Was recognized.

【図面の簡単な説明】[Brief description of drawings]

第1図はこの発明の方法を実施する工程説明図、第2図
は従来法の説明図、第3図はこの発明の方法によるメッ
キ電着量分布をあらわす線図、第4図は従来法によるメ
ッキ電着量分布を示す線図である。 1……第1メッキ槽、2……第2メッキ槽 3……テープ状三次元網状構造体、4、5……陰極給電
ロール
FIG. 1 is a process explanatory diagram for carrying out the method of the present invention, FIG. 2 is an explanatory diagram of a conventional method, FIG. 3 is a diagram showing a plating electrodeposition distribution by the method of the present invention, and FIG. 4 is a conventional method. 5 is a diagram showing a distribution of plating electrodeposition amount according to FIG. 1 ... 1st plating tank, 2 ... 2nd plating tank 3 ... Tape-shaped three-dimensional net-like structure 4, 5 ... Cathode power supply roll

───────────────────────────────────────────────────── フロントページの続き (72)発明者 西 徹也 富山県新湊市奈呉之江10−2 住友電気工 業株式会社富山電子材料工場内 (56)参考文献 特公 昭60−30753(JP,B2) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tetsuya Nishi 10-2, Nagure Noe, Shinminato City, Toyama Prefecture, Sumitomo Electric Industries, Ltd., Toyama Electronic Materials Factory (56) References JP 60-30753 (JP, B2) )

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】導電性を有するテープ状の三次元網状構造
体に連続的に電気メッキを行なう方法において、メッキ
浴中で回転しつつある陰極給電ロールの表面と該テープ
状三次元網状構造体の一方の面とを密着させながら移動
することにより三次元網状構造体への給電を行なうに際
し、前記陰極給電ロールを複数個有し、少なくともその
一つはテープ状三次元網状構造体の一方の面に密着して
全メッキ量の半分を電気メッキする第1段メッキを行な
い、別の陰極給電ロールのうちの少なくとも一つは該テ
ープ状三次元網状構造体の他方の面に密着するようにし
て残りの半分のメッキ量を電気メッキする第2段メッキ
を行なうことを特徴とする表裏メッキ量が均一な三次元
網状構造体のメッキ方法。
1. A method for continuously electroplating a tape-shaped three-dimensional network structure having electrical conductivity, the surface of a cathode feeding roll rotating in a plating bath, and the tape-shaped three-dimensional network structure. When feeding power to the three-dimensional network structure by moving while closely contacting with one surface of the three-dimensional network structure, a plurality of cathode power supply rolls are provided, at least one of which is one of the tape-shaped three-dimensional network structure. First-stage plating is performed, in which the tape-like three-dimensional net-like structure is in close contact with the other surface of the tape-like three-dimensional network structure by performing the first-stage plating in which one half of the total plating amount is electroplated. And a second stage plating in which the remaining half of the plating amount is electroplated.
JP61235345A 1986-10-02 1986-10-02 Method for plating three-dimensional network structure Expired - Lifetime JPH0723553B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61235345A JPH0723553B2 (en) 1986-10-02 1986-10-02 Method for plating three-dimensional network structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61235345A JPH0723553B2 (en) 1986-10-02 1986-10-02 Method for plating three-dimensional network structure

Publications (2)

Publication Number Publication Date
JPS6389697A JPS6389697A (en) 1988-04-20
JPH0723553B2 true JPH0723553B2 (en) 1995-03-15

Family

ID=16984715

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61235345A Expired - Lifetime JPH0723553B2 (en) 1986-10-02 1986-10-02 Method for plating three-dimensional network structure

Country Status (1)

Country Link
JP (1) JPH0723553B2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07116635B2 (en) * 1989-10-16 1995-12-13 片山特殊工業株式会社 Method for producing porous metal body for battery electrode plate and porous metal body for battery electrode plate produced by the method
JPH076076B2 (en) * 1989-10-16 1995-01-25 片山特殊工業株式会社 Method for producing porous metal body and porous metal body produced by the method
JPH076077B2 (en) * 1989-10-16 1995-01-25 片山特殊工業株式会社 Method for producing porous metal body and porous metal body produced by the method
DE19908920A1 (en) * 1999-03-02 2000-09-07 Buna Sow Leuna Olefinverb Gmbh Process for the production of electrically conductive films based on starch esters
LU90640B1 (en) * 2000-09-18 2002-05-23 Circuit Foil Luxembourg Trading Sarl Method for electroplating a strip of foam
US8110076B2 (en) * 2006-04-20 2012-02-07 Inco Limited Apparatus and foam electroplating process
JP2012007233A (en) * 2010-04-22 2012-01-12 Sumitomo Electric Ind Ltd Method for manufacturing aluminum structure and the aluminum structure
KR20130069539A (en) 2010-05-12 2013-06-26 스미토모덴키고교가부시키가이샤 Method of manufacturing aluminum structure, and aluminum structure
JP2015137373A (en) * 2014-01-21 2015-07-30 住友電気工業株式会社 Method and apparatus for producing aluminum film

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53128544A (en) * 1977-04-15 1978-11-09 Sumitomo Electric Ind Ltd Continuous method of preventing corrosion of metallic porous structure
US4326931A (en) * 1978-10-12 1982-04-27 Sumitomo Electric Industries, Ltd. Process for continuous production of porous metal
JPS6030753A (en) * 1983-07-27 1985-02-16 ゲンテン株式会社 Leakage repairing method of flat roof

Also Published As

Publication number Publication date
JPS6389697A (en) 1988-04-20

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