JPH01186648A - Gate array integrated circuit - Google Patents
Gate array integrated circuitInfo
- Publication number
- JPH01186648A JPH01186648A JP608288A JP608288A JPH01186648A JP H01186648 A JPH01186648 A JP H01186648A JP 608288 A JP608288 A JP 608288A JP 608288 A JP608288 A JP 608288A JP H01186648 A JPH01186648 A JP H01186648A
- Authority
- JP
- Japan
- Prior art keywords
- chip
- integrated circuit
- gate array
- location
- cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003014 reinforcing effect Effects 0.000 abstract description 7
- 238000010586 diagram Methods 0.000 abstract description 6
- 230000002159 abnormal effect Effects 0.000 abstract description 5
- 230000005856 abnormality Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
Landscapes
- Design And Manufacture Of Integrated Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】
玖亙欠1
本発明はゲートアレイ集積回路に関し、特に複数のセル
を有するゲートアレイ集積回路に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a gate array integrated circuit, and more particularly to a gate array integrated circuit having a plurality of cells.
従来技術
従来この種のゲートアレイ集積回路においては、顕微鏡
等を用いて検査を行い、チップ上の異常な箇所を見つけ
ていた。その従来のゲートアレイ集積回路を第2図を用
いて説明する0図は従来のゲートアレイ集積回路のチッ
プ1を示す概略図であり、2は入出力パッド、3は内部
セルアレイ列、4はグランド強化配線パターンである。Prior Art Conventionally, this type of gate array integrated circuit has been inspected using a microscope or the like to find abnormal locations on the chip. The conventional gate array integrated circuit will be explained using FIG. 2. FIG. 0 is a schematic diagram showing a chip 1 of the conventional gate array integrated circuit, 2 is an input/output pad, 3 is an internal cell array column, and 4 is a ground. This is a reinforced wiring pattern.
このようなチップ1上で異常な箇所を発見した場合にお
いて、その箇所の位置を知るためにはセルアレイの端か
ら数えるか、入出力バットからの相対的な位置によりセ
ルや配線パターンの位置を表現する等の手段しかなかっ
た。そのため、モニタ図等との照合を行う際、図面上の
同一箇所を探すのが非常に困難であるという欠点があっ
た。When such an abnormal location is found on chip 1, the location of the location can be determined by counting from the edge of the cell array, or by expressing the location of the cell or wiring pattern by the relative location from the input/output bat. There was no other way but to do so. Therefore, when comparing with monitor drawings, etc., there is a drawback that it is very difficult to find the same location on the drawing.
1肌立旦工
本発明の目的は、チップ上で異常な箇所を発見した際に
、図面上の同一箇所を容易に探すことができるゲートア
レイ集積回路を提供することである。1. SUMMARY OF THE INVENTION An object of the present invention is to provide a gate array integrated circuit in which when an abnormal location is found on a chip, the same location on a drawing can be easily searched for.
魚ユレリ1広
本発明のゲートアレイ集積回路は、複数のセルを有する
ゲートアレイ集積回路であって、少なくとも前記セルの
位置を示す位置表示パターンを有することを特徴とする
。A gate array integrated circuit according to the present invention is a gate array integrated circuit having a plurality of cells, and is characterized in that it has a position display pattern indicating at least the position of the cell.
K1男 以下、図面を用いて本発明の詳細な説明する。K1 man Hereinafter, the present invention will be explained in detail using the drawings.
第1図は本発明によるゲートアレイ集積回路の一実施例
の概略図であり、第2図と同等部分は同一符号により示
す0図においては、内部セルアレイ列3の各セル間を結
ぶ通常の信号配線層である1層及び2層(図示せず)の
上部のグランド強化配線層である3層にグランド強化配
線パターン4が設けられており、このグランド強化配線
パターン4にロケーション目安パターン5及び6を設け
ることにより配線領域を侵すことなく各セルの位置を表
示することができるのである。FIG. 1 is a schematic diagram of an embodiment of a gate array integrated circuit according to the present invention. In FIG. 0, parts equivalent to those in FIG. A ground reinforcing wiring pattern 4 is provided in the third layer, which is a ground reinforcing wiring layer, above the first and second wiring layers (not shown), and location guide patterns 5 and 6 are provided on this ground reinforcing wiring pattern 4. By providing this, it is possible to display the position of each cell without encroaching on the wiring area.
この場合、チッ1内周辺のグランド強化配線パターン4
に250しμs]間隔(A)で凹状のロケーション目安
パターン5を設け、縦方向のグランド強化配線パターン
4には左右交互に250[μs1間隔(B)で凸状のロ
ケーション目安パターン6を設けている。この凹凸状の
ロケーション目安パターン5及び6により、目的のセル
や配線パターンの位置を容易かつ正確に表わすことが可
能である。そのなめ、図面上の同一箇所を容易に探すこ
とができるのである。In this case, the ground reinforcement wiring pattern 4 around the chip 1
Concave location guide patterns 5 are provided at intervals of 250 μs (A), and convex location guide patterns 6 are provided alternately on the left and right at intervals of 250 μs (B) in the vertical ground reinforcing wiring pattern 4. There is. These uneven location reference patterns 5 and 6 make it possible to easily and accurately represent the position of a target cell or wiring pattern. This makes it easy to find the same location on the drawing.
なお、本実施例においては矩形の凹凸パターンを設けて
いるが、三角形や半円形の凹凸パターンにしても良いこ
とは明らかであり、どのような形状のものでも同様の効
果が得られる。In this embodiment, a rectangular uneven pattern is provided, but it is obvious that a triangular or semicircular uneven pattern may be used, and the same effect can be obtained with any shape.
発明の詳細
な説明したように本発明は、ゲートアレイ集積回路にお
いて、チップ上にセルや配線パターンの位置を示すパタ
ーンを設けることにより、顕微鏡等でチエツクして異常
な箇所を発見した際にチップ内の位置を正確、かつ容易
に表現することができ、モニタ図との照合も容易にでき
るという効果がある。DETAILED DESCRIPTION OF THE INVENTION As described in detail, the present invention provides patterns that indicate the positions of cells and wiring patterns on a chip in a gate array integrated circuit, so that when an abnormality is found by checking with a microscope etc., the chip can be easily detected. This has the advantage that the position within can be expressed accurately and easily, and comparison with the monitor diagram can be easily performed.
第1図は本発明の実施例によるゲートアレイ集積回路の
概略図、第2図は従来のゲートアレイ集積回路の概略図
である。
主要部分の符号の説明
1・・・・・・LSIチップ
2・・・・・・入出力パッド
3・・・・・・内部セルアレイ列FIG. 1 is a schematic diagram of a gate array integrated circuit according to an embodiment of the present invention, and FIG. 2 is a schematic diagram of a conventional gate array integrated circuit. Explanation of symbols of main parts 1... LSI chip 2... Input/output pad 3... Internal cell array column
Claims (1)
て、少なくとも前記セルの位置を示す位置表示パターン
を有することを特徴とするゲートアレイ集積回路。(1) A gate array integrated circuit having a plurality of cells, characterized in that it has a position display pattern indicating at least the position of the cell.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP608288A JPH01186648A (en) | 1988-01-14 | 1988-01-14 | Gate array integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP608288A JPH01186648A (en) | 1988-01-14 | 1988-01-14 | Gate array integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01186648A true JPH01186648A (en) | 1989-07-26 |
Family
ID=11628630
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP608288A Pending JPH01186648A (en) | 1988-01-14 | 1988-01-14 | Gate array integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01186648A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06163695A (en) * | 1992-11-25 | 1994-06-10 | Mitsubishi Electric Corp | Semiconductor device |
US9490207B2 (en) | 2007-10-22 | 2016-11-08 | Rohm Co., Ltd. | Semiconductor device having a copper wire within an interlayer dielectric film |
-
1988
- 1988-01-14 JP JP608288A patent/JPH01186648A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06163695A (en) * | 1992-11-25 | 1994-06-10 | Mitsubishi Electric Corp | Semiconductor device |
US9490207B2 (en) | 2007-10-22 | 2016-11-08 | Rohm Co., Ltd. | Semiconductor device having a copper wire within an interlayer dielectric film |
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