JPS63311735A - Dot vernier for accurate alignment - Google Patents

Abstract

PURPOSE:To make it possible to discriminate immediately the shift in the X and Y directions of a first pattern by a method wherein the first resist pattern parts of the first pattern are formed in such a way that the surrounding first resist pattern parts are shifted in the inner side in the center direction by a prescribed fine size centering around the center of the first pattern. CONSTITUTION:First resist pattern parts 11 are formed in such a way that the surrounding first resist pattern parts 11 are located within the inner side in the center direction 0.1 mm by 0.1 mm, for example, centering around the center of a first pattern 10 and window parts 14 of a second pattern 10 are formed at equal intervals. Accordingly, the first pattern 10, for example, is ready-formed in a first layer and by forming the second pattern 12 in a second layer, the matching accuracy of the second layer to the first layer can be seen. In such a way, a coincidence point at some one place where the first resist pattern parts 11 of the first pattern 10 are apart from the centers of the window parts 14 of the second pattern 12 is found out and the amounts of shift in the X and Y directions of the first pattern at that time can be confirmed.

Description

DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a dot vernier for precision use for measuring alignment accuracy in noso turning of a device.

(Prior art) Fig. 3 is a plan view showing an example of the configuration of a conventional sub-comb pear vernier, in which the hatched part or the rest pattern gt is shown, and the part without the hatching is the window part 2 (the part without the rest). It is.

In Figure 3 (4), the upper and lower @patterns are 0 around center 3.
．． They are shifted inward by 1 μm, and in Figure 3 (B), combs/# turns are arranged at equal intervals.

If the elbow turn shown in FIG. 3 (4) and the shoulder turn tM shown in FIG. It was made to measure with accuracy (alignment deviation Jit)'.

(Problem to be solved by the invention) However, in the type (2) vernier with the above configuration.

It was necessary to measure the shear current in the X and Y directions separately, and it took a long time to move the pattern from the X direction to the Y direction using a microscope, and problems such as an increase in the area of 9 turns were common. .

This invention solves the problems of the above-mentioned prior art.
The present invention provides a dot vernier for alignment accuracy that solves the problem of long measurement time by measuring the amount of deviation in the X direction and the Y direction separately.

(Problem t - Means for Solving) This invention provides a dot vernier for alignment precision, in which a plurality of dot verniers are arranged in the vertical and horizontal directions, and the first dot vernier is arranged in a plurality of dot verniers in the vertical and horizontal directions, and the ones around the center are shifted inward by minute dimensions. The first to ninth turns each include a pattern part, and the second turn each includes a window part of a size that can accommodate each individual pattern of the first pattern.

(Function) According to the present invention, since the dot vernier for alignment TrJ is configured as described above, when the first/# turn and the second pattern are arranged, a If each of the first resist and main turn parts of the first pattern are positioned, and the alignment accuracy of the first pattern and the second set turn is high, the wind parts can be placed at equal intervals, so that the first resist part can be placed in one place on the central wind part. If the pattern parts match and the alignment accuracy is low, the 8/9 button part will fit in one place of the window part which is off the center, and the above-mentioned problem can be eliminated.

(Example) Hereinafter, an example of the alignment accuracy dot/Yarnier of the present invention will be described based on the drawings.

FIG. 1(4) is the first /'e applied to the embodiment.
FIG. 1B is a plan view of the second turn.

In the first pattern-10 of ill(4), a large number of first lujist pattern parts 11 (shaded parts) are arranged in the vertical and horizontal directions, and this lujist pattern part 11 is Pattern part 1 around the center
1 is shifted inward in the center direction by about 0.11111.

The dimensions of this 0,1 dragon are numerical values determined from the accuracy of the device, and are not particularly limited to these numerical values.

Next, the second pattern 12 in FIG. 1(B) is of a size that each of the first patterns 11 can fit in the main turn part 13, and is arranged at equal intervals in the horizontal direction in the window part 14 (the part without the rest). are formed into an array.

A "+"-shaped pernier 5 and a rectangular vernier 16 are provided at the corner of the second pattern plate.

The shapes of the patterns 41 and the second pattern are not limited to the illustrated quadrilaterals, and may be triangular or other shapes, but it is preferable that the first pattern 41 and the second pattern 12 have similar shapes.

Next, as shown in FIG. You can find a place where only one matches.

In other words, in this example, /ri,;giresost/zeturn part 11 is centered around the center (・), and the first nosost pattern 11 is inside by Q,ill, and the second pattern Since the portions 14 are formed at equal intervals, for example, the 1st turn 9 in FIG. By forming this on the second layer, it is possible to check the alignment accuracy of the 2Nth layer with respect to the first layer.

When the first and second layers are well aligned, for example, as shown in FIG.
1 appears to be gradually moving inward in each window section 14.

On the other hand, if the alignment between the first and second layers is poor, the first resist pattern section 11 of the turf 10 may be placed in the window section 14 of the second pattern 12 at a location shifted from the center.
They appear to match only in places, and the remaining first arm turn portions 11 appear to be biased inward within the valley wind portions 14.

In this way, any I Ir! where the first resist pattern portion 11 of the first pattern 10 is separated from the center of the window portion 14 of the second arm turn 12 . You can find the matching point at location A and check the amount of deviation in the X direction and Y direction at that time.

In other words, the window part 14A and the first/first part are shaded in FIG.
#Resist of turn 10, 9th turn part 11/? The judgment can be made based on how many &Y 71i +o] the point is shifted from the center in the X direction with respect to the matching point with the turn portion 11A.

In addition, in the above description, the second pattern i 2tt layer,
Although the first pattern L Oi is the second layer, it goes without saying that the reverse may be used.

(Effect of the invention) As described in detail above, according to the present invention.

, 4 of 41 patterns The Lusosto Z-turn part is made so that the 1st Lusosto Z-turn part is shifted inward in one direction from the center by a predetermined minute dimension with the center as the center, and the second
Since the window portions of each turn are formed at equal intervals and the positioning of the window portions and the first resist pattern portion is performed, deviations in the X and Y directions can be immediately determined and measurement does not take much time. ! This has the advantage that the chain of turns can be relatively small, and furthermore, the degree of device aperture can be immediately determined by adding up the number of dots.

[Brief explanation of drawings]

FIG. 1 (4) is a plan view of the first pattern applied to an embodiment of the dot vernier for alignment accuracy of the present invention;
Figure 1 (B) is a plan view of the 2nd and 9th turns, Figure 2 is a diagram showing the 1st zR turn and the 2nd pattern laid down, Figure 3 (4), Figure 3 ( B) is a plan view showing an example of the configuration of a conventional comb-shaped vernier, and FIG. 4 is a diagram showing the entire comb-shaped vernier shown in FIGS. 3(A) and 3(B) in a resting state. lO...1st/arm turn, 11. IIA... 1st pattern, t 2... 2nd pattern, 13...
・Second resist I turn part, 14.14A...window part O

Claims (1)

[Scope of Claims] (a) Arranged in the vertical and horizontal directions with the same shape and the same size,
(b) a first pattern including a plurality of first resist pattern portions whose peripheral portions are shifted inward by a predetermined minute dimension with the center as the center; A dot pernier for alignment accuracy comprising: a second pattern including window portions arranged at intervals; and a dot pernier for alignment accuracy.