JPH0116511Y2 - - Google Patents

Info

Publication number
JPH0116511Y2
JPH0116511Y2 JP1983053186U JP5318683U JPH0116511Y2 JP H0116511 Y2 JPH0116511 Y2 JP H0116511Y2 JP 1983053186 U JP1983053186 U JP 1983053186U JP 5318683 U JP5318683 U JP 5318683U JP H0116511 Y2 JPH0116511 Y2 JP H0116511Y2
Authority
JP
Japan
Prior art keywords
heating coil
frequency heating
reaction tube
tube
fixation frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1983053186U
Other languages
English (en)
Japanese (ja)
Other versions
JPS59158437U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5318683U priority Critical patent/JPS59158437U/ja
Publication of JPS59158437U publication Critical patent/JPS59158437U/ja
Application granted granted Critical
Publication of JPH0116511Y2 publication Critical patent/JPH0116511Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP5318683U 1983-04-08 1983-04-08 気相成長装置 Granted JPS59158437U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5318683U JPS59158437U (ja) 1983-04-08 1983-04-08 気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5318683U JPS59158437U (ja) 1983-04-08 1983-04-08 気相成長装置

Publications (2)

Publication Number Publication Date
JPS59158437U JPS59158437U (ja) 1984-10-24
JPH0116511Y2 true JPH0116511Y2 (OSRAM) 1989-05-16

Family

ID=30183530

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5318683U Granted JPS59158437U (ja) 1983-04-08 1983-04-08 気相成長装置

Country Status (1)

Country Link
JP (1) JPS59158437U (OSRAM)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5443650Y2 (OSRAM) * 1974-03-14 1979-12-17
JPS6054919B2 (ja) * 1976-08-06 1985-12-02 株式会社日立製作所 低圧反応装置

Also Published As

Publication number Publication date
JPS59158437U (ja) 1984-10-24

Similar Documents

Publication Publication Date Title
KR100435119B1 (ko) 매엽식처리장치
JPH0834187B2 (ja) サセプタ
US6301434B1 (en) Apparatus and method for CVD and thermal processing of semiconductor substrates
JP4970683B2 (ja) 基板をエピタキシャルにより処理するための装置及び方法
JPH0594950A (ja) 反応室の設計及び化学蒸着反応器における粒子発生を最小限にする方法
JP2001522138A5 (OSRAM)
JP7392440B2 (ja) 結晶成長装置
KR100375396B1 (ko) 준고온벽을갖춘반응챔버
JPH0116511Y2 (OSRAM)
JP3693739B2 (ja) 高周波誘導加熱炉
JPH07118466B2 (ja) サセプタ
JPS58169906A (ja) 気相成長装置
CN115637490B (zh) 集成式分子束外延坩埚制作方法、外延坩埚及分子束源炉
JP2764416B2 (ja) サセプタ
JP2848416B2 (ja) 気相成長装置
JPS59207622A (ja) 半導体薄膜気相成長装置
JP2901546B2 (ja) 半導体装置の製造装置
JPS636833A (ja) 気相成長装置
JPS6058613A (ja) エピタキシャル装置
CN116024654B (zh) 一种成膜装置晶片加热热场
JPH07118465B2 (ja) 縦型エピタキシャル装置用サセプター
US20180002809A1 (en) Cvd reactor with a multi-zone heated process chamber
JPS6159279B2 (OSRAM)
JPH0350325U (OSRAM)
JPS6188517A (ja) ウエハ処理装置