JPH01162760A - Vacuum-deposition vessel - Google Patents
Vacuum-deposition vesselInfo
- Publication number
- JPH01162760A JPH01162760A JP31888787A JP31888787A JPH01162760A JP H01162760 A JPH01162760 A JP H01162760A JP 31888787 A JP31888787 A JP 31888787A JP 31888787 A JP31888787 A JP 31888787A JP H01162760 A JPH01162760 A JP H01162760A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- vacuum
- evaporation
- evaporator
- reflecting glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001771 vacuum deposition Methods 0.000 title abstract 3
- 239000011521 glass Substances 0.000 claims abstract description 29
- 238000010894 electron beam technology Methods 0.000 claims abstract description 22
- 239000000463 material Substances 0.000 claims abstract description 22
- 238000001704 evaporation Methods 0.000 claims description 19
- 230000008020 evaporation Effects 0.000 claims description 19
- 238000007738 vacuum evaporation Methods 0.000 claims description 3
- 230000008018 melting Effects 0.000 abstract description 9
- 238000002844 melting Methods 0.000 abstract description 9
- 238000007740 vapor deposition Methods 0.000 abstract description 6
- 230000005540 biological transmission Effects 0.000 abstract description 3
- 239000011364 vaporized material Substances 0.000 abstract description 2
- 230000008016 vaporization Effects 0.000 abstract 2
- 238000009834 vaporization Methods 0.000 abstract 2
- 230000000903 blocking effect Effects 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、真空容器構造に係り、特に、電子線加熱式蒸
発源で蒸発を行う真空容器構造に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a vacuum vessel structure, and particularly to a vacuum vessel structure in which evaporation is performed using an electron beam heating type evaporation source.
電子線ビームにより真空蒸着を行う場合、電子線ビーム
を蒸発材に正しく照射するため、電子線ビームのスポッ
ト径、あるいは、スポット径の中心が蒸発材の中心に位
置し、ビーム照射されているかどうか、電子線の照射位
置を制御し蒸着を行う。このため、電子線ビームの蒸発
材への照射状態、及び、蒸発材の溶融状態をｍ１ｌｌ察
する必要がある。一般には、真空容器の一部に、のぞき
窓が設けられている。しかし、のぞき窓自身に蒸着が行
われるため蒸着材の観察が困難になる等の間屈がある。When performing vacuum evaporation using an electron beam, in order to properly irradiate the evaporator with the electron beam, it is necessary to check the spot diameter of the electron beam or whether the center of the spot diameter is located at the center of the evaporator and the beam is irradiated. , vapor deposition is performed by controlling the irradiation position of the electron beam. For this reason, it is necessary to monitor the irradiation state of the evaporation material with the electron beam and the melting state of the evaporation material. Generally, a viewing window is provided in a part of the vacuum container. However, since the vapor deposition is performed on the viewing window itself, there is some bending that makes it difficult to observe the vapor deposited material.
特開昭６１−２０７５７１号公報によれば、蒸着粒子の
飛散防止について記載されているが、蒸発時における蒸
発材の観察についての考慮がされていなかった。According to JP-A-61-207571, prevention of scattering of evaporated particles is described, but no consideration is given to observation of evaporation material during evaporation.
従来、蒸発材の溶融状態は、のぞき窓から５？３を行っ
ていた。しかし、のぞき窓自身に烹着が行われ、のぞき
窓からの蒸発材の直接ｂ’ｆｔ ｔ４が田辺になる等の
問題があった。一方、筒状の飛散防止器を配設し、真空
容器内壁への蒸若物の付着を防止したものもある。しか
し、電子線ビームで蒸着を行う場合、電子線ビームのス
ポット径や、スポットの位置を二次元走査するため、蒸
発材を溶融する際、電子線ビームの照射状態および蒸発
材の溶融状態を１１察する必要がある。従来技術は、こ
の点について考慮されていなかった。Conventionally, the molten state of the evaporative material was checked through a viewing window. However, there were problems in that the peephole itself was evaporated, and the evaporative material directly b'ft t4 from the peephole became tanabe. On the other hand, some are equipped with a cylindrical anti-scattering device to prevent spatter from adhering to the inner wall of the vacuum container. However, when performing evaporation with an electron beam, the spot diameter and spot position of the electron beam are two-dimensionally scanned, so when melting the evaporation material, the irradiation state of the electron beam and the melting state of the evaporation material are need to be observed. The prior art did not take this point into account.
本発明の目的は、蒸発材を溶融する際、のぞき窓を蒸発
物の付着で汚す事なく、かつ、容易に蒸発材の溶融状態
、及び、電子線ビームの照射状態をａ察することができ
る真空容器構造を提供することにある。It is an object of the present invention to provide a vacuum system that can easily observe the melting state of the evaporator and the irradiation state of the electron beam without staining the observation window with adhesion of the evaporator when melting the evaporator. The objective is to provide a container structure.
上記目的は、真空容器内部に、蒸発材に相対向して複数
板の反射ガラス板を配置する事により達成される。The above object is achieved by arranging a plurality of reflective glass plates inside the vacuum container so as to face the evaporator.
真空容器内部に蒸発材に相対向して二段に配置された二
枚の反射ガラス板は次のような働きをする。まず、蒸発
材は電子線ビームにより加熱されて赤熱する。この発熱
光により蒸発材は、まず、上段の反射ガラス板に反射し
、次いで、下段のガラス板に反射する。そして、下段の
ガラスとほぼ水平に位置したのぞき窓から下段のガラス
板に反射されている蒸発材を観察する事が容易となる。Two reflective glass plates arranged in two stages facing the evaporator inside the vacuum container function as follows. First, the evaporative material is heated by an electron beam and becomes red-hot. This emitted light causes the evaporation material to first be reflected on the upper reflective glass plate, and then reflected on the lower glass plate. Then, it becomes easy to observe the evaporative material reflected on the lower glass plate from the viewing window located almost horizontally to the lower glass plate.
のぞき窓は、上段、下段の二枚の反射ガラス板が、のぞ
き窓への蒸発飛散防止板になるので、のぞき窓が汚れる
等の問題はない。さらに、反射ガラス板に蒸着物が付着
しても容易に蒸発材を反射するので何ら問題はない。な
お、反射ガラス板への反射は、蒸発に伴う蒸発材の発熱
光を利用して１１察出来るのでｌＢ！察に対する光量の
問題もない。The two reflective glass plates at the top and bottom of the peephole prevent evaporation from scattering into the peephole, so there is no problem with the peephole getting dirty. Furthermore, even if vapor deposits adhere to the reflective glass plate, there is no problem since the vaporized material is easily reflected. Note that the reflection on the reflective glass plate can be detected by using the emitted light of the evaporator as it evaporates, so 1B! There is no problem with the amount of light for detection.
本発明の一実施例を第１図により説明する。 An embodiment of the present invention will be explained with reference to FIG.
真空容器３の中には、電子線加熱式蒸発源が配置され、
フィラメント１からの電子線２を偏光してハース８の中
に配置された蒸発材７に照射し、蒸発材の溶融を行う。An electron beam heating type evaporation source is arranged inside the vacuum container 3,
The electron beam 2 from the filament 1 is polarized and irradiated onto the evaporator 7 placed in the hearth 8 to melt the evaporator.
この時、蒸発材７が適正な溶融状態を作るため、電子線
ビームのスポット径と偏光位置が蒸発材７の中心になる
ように調整しながら蒸発材７の溶融を行う。従って、溶
融する時、電子線ビームの位置が蒸発材７に正しく照射
されているかどうか、真空容器３の外部から観察する必
要がある。のぞき窓４から直接観察は可能であるがのぞ
き窓４に蒸着が行われ、光の透過が徐々に減少するため
、ついには観察が田辺になる等の問題があった。At this time, in order to make the evaporator 7 in a proper melted state, the evaporator 7 is melted while adjusting the spot diameter and polarization position of the electron beam to be at the center of the evaporator 7. Therefore, when melting, it is necessary to observe from outside the vacuum container 3 whether the position of the electron beam is correctly irradiating the evaporation material 7. Although direct observation is possible through the peephole 4, vapor deposition is performed on the peephole 4, and the transmission of light gradually decreases, resulting in the problem that the observation becomes blurry.
本発明は、のぞき窓４の内側に反射ガラス板５および６
を蒸発材７に相対向した位置、及び、角度で配置する。The present invention provides reflective glass plates 5 and 6 on the inside of the viewing window 4.
is placed at a position and angle opposite to the evaporator 7.
そして、反射ガラス板５、および、６の反射により、の
ぞき窓４が蒸着されることなく真空容器３の外部から容
易に蒸発材７の溶融状態と電子線ビームの照射状態を観
察することができる。Due to the reflection from the reflective glass plates 5 and 6, the molten state of the evaporator 7 and the irradiation state of the electron beam can be easily observed from outside the vacuum container 3 without the observation window 4 being evaporated. .
即ち、第２図に示すように、蒸発材７は、反射ガラス板
５の下面に反射し、さらに、反射ガラス板６の上面に反
射され、この反射ガラス板６の上面に写った像を、のぞ
き窓４から観察する。反射ガラス板６の下面とガラス押
え板９′は、のぞき窓４への蒸着を防止する飛散防止板
を兼ねる配置になっているので、のぞき窓４が蒸着され
光の透過が減少するようなことはない。また、ガラス押
え板９は開口部を設けであるので、のぞき窓４からは、
反射ガラス板５の上面に写った像を容易に観察すること
ができる。反射ガラス板６の下面に蒸着が行われても、
反射像を得るのに何ら問題はない。さらに、反射像を得
る光源は、蒸発材７の溶融時の発熱光を利用するため、
観察上の支障はまったくない。That is, as shown in FIG. 2, the evaporative material 7 is reflected on the lower surface of the reflective glass plate 5, and further reflected on the upper surface of the reflective glass plate 6, and the image reflected on the upper surface of the reflective glass plate 6 is Observe through the peephole 4. The lower surface of the reflective glass plate 6 and the glass holding plate 9' are arranged to also serve as a scattering prevention plate to prevent vapor deposition onto the viewing window 4, so that there is no possibility that the viewing window 4 will be deposited and the transmission of light will be reduced. There isn't. In addition, since the glass holding plate 9 is provided with an opening, from the peephole 4,
The image reflected on the upper surface of the reflective glass plate 5 can be easily observed. Even if vapor deposition is performed on the lower surface of the reflective glass plate 6,
There is no problem in obtaining a reflected image. Furthermore, since the light source for obtaining the reflected image utilizes the emitted light when the evaporative material 7 is melted,
There are no problems with observation.
本発明によれば、のぞき窓への蒸着を防止することがで
き、かつ、真空容器外部から蒸発材の溶融時のａｍが可
能となる。According to the present invention, it is possible to prevent evaporation from being deposited on the viewing window, and it is also possible to perform evaporation during melting of the evaporator from outside the vacuum container.
第１図は本発明の一実施例の真空容器内部の要部断面図
、第２図は本発明の要部であるのぞき窓、反射ガラス板
の配置と反射像の経路を示す説明図である。
１・・・フィラメント、２・・・電子線、３・・・真空
容器。
４・・・のぞき窓、５・・・反射ガラス板、６・・・反
射ガラス板、７・・・蒸発材、８・・・ハース、９・・
・反射ガラス押え板、９′・・・反射ガラス押え板兼然
発飛敗防止板。FIG. 1 is a sectional view of the main parts inside a vacuum container according to an embodiment of the present invention, and FIG. 2 is an explanatory diagram showing the arrangement of a viewing window and a reflective glass plate, which are the main parts of the present invention, and the path of a reflected image. . 1...Filament, 2...Electron beam, 3...Vacuum container. 4... Peephole, 5... Reflective glass plate, 6... Reflective glass plate, 7... Evaporation material, 8... Hearth, 9...
・Reflective glass holding plate, 9'... A plate that also serves as a reflective glass holding plate and prevents it from flying off.
Claims (1)
つて前記蒸発材を蒸着する真空蒸着容器において、 前記真空容器の内部に、蒸発源に相対向して、複数板の
反射ガラス板を配置させたことを特徴とする真空蒸着容
器。[Claims] 1. An evaporation material installed in a vacuum container, and a vacuum evaporation container in which the evaporation material is evaporated by an electron beam, inside the vacuum container, facing the evaporation source, A vacuum evaporation container characterized by arranging a plurality of reflective glass plates.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31888787A JPH01162760A (en) | 1987-12-18 | 1987-12-18 | Vacuum-deposition vessel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31888787A JPH01162760A (en) | 1987-12-18 | 1987-12-18 | Vacuum-deposition vessel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01162760A true JPH01162760A (en) | 1989-06-27 |
Family
ID=18104074
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31888787A Pending JPH01162760A (en) | 1987-12-18 | 1987-12-18 | Vacuum-deposition vessel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01162760A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114540784A (en) * | 2021-07-14 | 2022-05-27 | 苏州佑伦真空设备科技有限公司 | Wide window of observation angle |
| CN114592178A (en) * | 2021-07-14 | 2022-06-07 | 苏州佑伦真空设备科技有限公司 | Window without dead angle |
-
1987
- 1987-12-18 JP JP31888787A patent/JPH01162760A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114540784A (en) * | 2021-07-14 | 2022-05-27 | 苏州佑伦真空设备科技有限公司 | Wide window of observation angle |
| CN114592178A (en) * | 2021-07-14 | 2022-06-07 | 苏州佑伦真空设备科技有限公司 | Window without dead angle |
| CN114540784B (en) * | 2021-07-14 | 2023-09-05 | 苏州佑伦真空设备科技有限公司 | Window with wide observation angle |
| CN114592178B (en) * | 2021-07-14 | 2023-09-15 | 苏州佑伦真空设备科技有限公司 | Window without dead angle |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH01162760A (en) | Vacuum-deposition vessel | |
| KR20190132888A (en) | Deposition apparatus and method for removing nozzle clogging | |
| JPH0149786B2 (en) | ||
| JPH02270962A (en) | Sputtering device | |
| KR102237185B1 (en) | A deposition apparatus | |
| JP2010255059A (en) | Vacuum deposition device | |
| JP4982004B2 (en) | Protection plate device | |
| EP0887434A1 (en) | Apparatus for level control of a molten metal pool | |
| JPH0336262A (en) | Vacuum film forming device | |
| JPH02168547A (en) | Scanning electron microscope | |
| JPH076967A (en) | Epitaxial growth observing apparatus | |
| JP2689449B2 (en) | Reflection electron diffraction device | |
| JP2890686B2 (en) | Laser sputtering equipment | |
| JPH089160Y2 (en) | Film forming equipment | |
| JP2000144386A (en) | Formation of thin film by laser vapor deposition and laser vapor deposition device used in this formation of thin film | |
| JPS63109168A (en) | Vacuum deposition device | |
| JPH0279348A (en) | Reflecting electron microscope | |
| JPH062115A (en) | Laser-beam machine and production of shielding plate for the machine | |
| JPH04350158A (en) | Vacuum vapor deposition device | |
| JPS63297294A (en) | Device for molecular-beam epitaxy | |
| JPH03243760A (en) | Vapor deposition device | |
| JPH06111321A (en) | Vapor deposition device | |
| JPS6350461A (en) | Vapor deposition device using electron gun | |
| JPS5832197Y2 (en) | electronic microscope | |
| JP2010053373A5 (en) |